低能质子在半导体材料Si 和GaAs中的非电离能损研究

非电离能损(NIEL)引起的位移损伤是导致空间辐射环境中新型光电器件失效的主要因素.由于低能时库仑相互作用占主导地位，一般采用Mott-Rutherford微分散射截面，但它没考虑核外电子库仑屏蔽的影响.为此，本文采用解析法和基于Monte-Carlo方法的SRIM程序计算了考虑库仑屏蔽效应后低能质子在半导体材料Si,GaAs中的NIEL，SRIM程序在计算过程中采用薄靶近似法, 并与其他作者的计算数据和实验数据进行了比较.结果表明：用SRIM程序计算NIEL时采用薄靶近似法处理是比较合理的，同时考虑库仑     

300 eV—1GeV质子在硅中非电离能损的计算

非电离能损(NIEL)引起的位移损伤是导致空间辐射环境中新型光电器件失效的主要因素.引起质子在硅中NIEL的作用机理有库仑相互作用和核相互作用,质子能量范围从位移损伤阈能到1 GeV.当质子能量位于低能区时,库仑相互作用占主导地位,采用解析方法和TRIM程序计算NIEL;当质子能量位于高能区时,NIEL主要来自质子与靶原子核的弹性和非弹性相互作用,使用MCNPX/HTAPE3X进行模拟仿真计算由核反应引起的NIEL.实现了能量范围为300 eV—1 GeV的质子入射硅时NIEL的计算.计算结果表明,MCNPX/HTAPE3X可用于计算高能质子在材料中产生的反冲核所引起的NIEL,结合解析方法和TRIM程序可计算得到由于库仑相互作用引起的NIEL.     

中能质子在Si和GaAs中导致的非电离能损研究

非电离能损(NIEL)引起的位移损伤效应是空间装置失效的原因之一. 运用改进的Monte Carlo程序SHIELD, 建立了质子的NIEL计算手段, 模拟计算了能量范围在10—400MeV的中能质子在硅和砷化镓中的NIEL的大小和分布.     

质子和1MeV中子在硅中能量沉积的模拟计算

在现有中子截面数据和粒子与物质相互作用的理论基础上,编写了计算中子非电离能量损失(NIEL)和电离能量损失(IEL)程序,利用该程序和引进的TRIM95程序计算了1MeV中子和质子在硅中IEL和NIEL的大小和分布等,并对计算结果进行了分析和比较.     

近地轨道质子和α粒子入射InP产生的位移损伤模拟

磷化铟(InP)材料具有禁带宽度大、电子迁移率高、耐高温、抗辐照等优点,是制备航天器电子器件的优良材料.近地轨道内的质子和α粒子对近地卫星威胁巨大,其在InP电子器件中产生的位移损失效应是导致InP电子器件电学性能下降的主要因素.本文使用蒙特卡罗软件Geant4研究近地轨道的质子与α粒子分别经过150μm二氧化硅和2.54 mm铝层屏蔽后,在500/1000/5000μm InP材料中产生的非电离能量损失(non-ionizing energy loss, NIEL)、平均非电离损伤能随深度分布以及年总非电离损伤能.研究发现:低能质子射程短且较易发生非电离反应,入射粒子能谱中低能粒子占比越大,材料厚度越小, NIEL值越大;计算质子和α粒子年总非电离损伤能,质子的年总非电离损伤能占比达98%,表明质子是近地轨道内产生位移损伤的主要因素;α粒子年总非电离损伤能占比小,但其在InP中的NIEL约为质子的2—10倍,应关注α粒子在InP中产生的单粒子位移损伤效应.本文计算为InP材料在空间辐射环境的应用提供了参考依据.     

质子和中子在硅中位移损伤等效性计算

基于蒙特卡罗软件Geant4,探讨质子与硅的库仑散射和核反应及中子与硅的核反应产生反冲原子沉积非电离能量的过程,建立质子和中子在硅中的非电离能量阻止本领计算方法。在此方法中,描述了原子间库仑散射的物理过程,模拟带电粒子与晶格原子之间的屏蔽库仑散射。计算得到不同能量质子和中子在硅中因库仑散射和核反应产生反冲原子的非电离能量沉积及阻止本领的等效性,计算结果与中子ASTM标准及文献计算得到的质子数据符合很好。     

质子入射AlxGa1–xN材料的位移损伤模拟

氮化镓材料由于优良的电学特性以及耐辐照性能,其与不同含量Al_xGa_1–xN材料组成的电子器件,有望应用于未来空间电子系统中.然而目前关于氮化镓位移损伤机理研究多关注于氮化镓材料,对于Al_xGa_1–xN材料位移损伤研究较少.本文通过两体碰撞近似理论模拟了10 keV—300 MeV质子在不同Al元素含量的Al_xGa_1–xN材料中的位移损伤机理.结果表明质子在Al_xGa_1–xN材料中产生的非电离能损随质子能量增大而下降,当质子能量低于40 MeV时,非电离能损随着Al含量的增大而变大,当质子能量升高时该趋势相反;分析由质子导致的初级撞出原子以及非电离能量沉积,发现不同Al_xGa_1–xN材料初级撞出原子能谱虽然相似,然而Al元素含量越高,由弹性碰撞产生的自身初级撞出原子比例越高;对于质子在不同深度造成的非电离能量沉积,弹性碰撞导致的能量沉积在径迹末端最大,而非弹性碰撞导致的能...     

极化效应对Bohr速度能区O5+离子在低密度氢等离子体中的能损影响

基于HIRFL加速器装置的低能束实验平台,实验测量了1.07 MeV(～66.9 keV/u)高电荷态O⁵⁺离子穿过中性氢气和部分电离的低密度氢等离子体靶后的能量损失,观测到等离子体中离子能损减小的新实验现象.分别考虑部分电离等离子体对炮弹离子的电荷屏蔽效应以及靶区原子的极化效应(Barkas修正),重新计算了离子能损,讨论了离子能损减小的可能物理机制.研究结果表明:在部分电离的低密度等离子体中,靶区的原子极化效应将显著影响Bohr速度能区离子的能量损失过程.     

空间重离子入射磷化铟的位移损伤模拟

磷化铟(InP)具备电子迁移率高、禁带宽度大、耐高温、耐辐射等特性,是制备空间辐射环境下电子器件的重要材料.随着电子器件小型化,单个重离子在器件灵敏体积内产生的位移损伤效应可能会导致其永久失效.因此,本文使用蒙特卡罗软件Geant4模拟空间重离子(碳、氮、氧、铁)在InP材料中的输运过程,计算重离子的非电离能量损失(non-ionizing energy loss, NIEL),得到重离子入射InP材料的位移损伤规律,主要结论有:1) NIEL值与原子序数的平方成正比,重离子原子序数越大,在InP材料中产生位移损伤的能力越强;2)重离子NIEL比次级粒子NIEL大3—4个量级,而NIEL与核弹性碰撞产生的反冲原子的非电离损伤能成正比,说明重离子在材料中撞出的初级反冲原子是导致InP材料中产生位移损伤的主要原因; 3)空间辐射环境中重离子数目占比少,一年中重离子在0.0125 mm3 InP中产生的总非电离损伤能占比为2.52%,但重离子NIEL值是质子和a粒子的2—30倍,仍需考虑单个空间重离子入射InP电子器件产生的位移损伤效应.4)低能重离子在较厚材料中完全沉积导致平均非电离损伤能分布不均匀(前高后低),使NIEL值随材料厚度的增大而略微减小,重离子位移损伤严重区域分布在材料前端.研究结果为InP材料在空间辐射环境中的应用打下基础.     

辐射复合截面的扭曲波计算

采用非相对论量子计算方法计算了电子与高电荷态离子碰撞的辐射复合截面, 其中连续态电子的波函数是由扭曲波近似方法(DWBE)获得. 计算了低能电子与中、低核电荷的高电荷态离子(类H和类Li)的辐射复合截面, 并与采用有效电荷的库仑波计算结果进行了比较, 说明了扭曲波计算的重要性.     

质子在碳化硅中不同深度的非电离能量损失

利用蒙特卡罗方法,应用Geant4程序,模拟计算了1—500 MeV质子在碳化硅材料中的非电离能量损失,并研究了不同种类的初级反冲原子对非电离能量损失的贡献.模拟结果表明:在相同质子辐照下,碳化硅材料中的非电离能量损失要比硅、镓等半导体材料更小,说明碳化硅器件的稳定性更好,抗位移损伤能力更强;当靶材料足够厚时,在不同能量质子辐照下,材料损伤最严重的区域会随着质子入射能量的增加从质子射程末端逐渐前移到材料表面;不同种类的初级反冲原子对非电离能量损失的贡献表明,在低能质子辐照下,28Si和~(12)C是位移损伤的主要原因,而随着质子能量的增加,通过核反应等过程产生的次级离子迅速增多,并对材料浅层造成严重的位移损伤.     

Effects of screening on the rate of energy loss in degenerate surface layers of compound semiconductors at low lattice temperatures

The energy loss rate of an electron in degenerate surface layers of a compound semiconductor for inelastic interaction with deformation and piezoelectric acoustic phonons is calculated with due account of the screening of the perturbing potential under the condition of low lattice temperature when the approximations of the well known traditional theory is not valid. The numerical results obtained for GaAs and CdS exhibits interesting features, significantly different from what follows if one either makes the traditional approximation of negligible phonon energy or disregards the screening of the scattering potential.     

Improvement of energy loss near edge structure calculation using Wien2k

The density functional theory (DFT) is a recognised method for the calculation of electronic properties of materials. As such it can also be used for the calculation of energy loss near edge structures. Some care has to be taken since the DFT is intended for ground state calculation. The effect of the core hole left by the excited electron is different in an insulator and in a metal and can be observed in both cases. For an insulator (MgO, Si), a supercell calculation is needed while in the case of copper, extremely good agreement with experiment can be obtained with a partial core hole calculation. In the particular case of the WIEN code (APW method) we show that calculation of low lying edges (Si L at 99eV) where the initial state is not strongly localised can only be done within the dipole approximation and with some care. Random alloys (CuNi) have been calculated previously using a supercell; we show that a particular version of the virtual crystal approximation gives promising results.     

Stopping power contribution due to target and projectile excitation/ionization: a comparative study

A comparative study of stopping power codes for different ions in compounds has been made by comparing the computed stopping power values using different codes with the corresponding experimental data. Two computer codes, semiempirical SRIM2006.02 and theoretical CasP3.2 have been used to evaluate and compare the stopping powers of different compounds for protons (125 KeV), helium (500 KeV) and lithium ion (175 KeV) projectiles. The energy behaviour of stopping power of various compounds for helium ion in the energy range (0.3–2.0 MeV) has been studied. The merits and demerits of the adopted formulations are highlighted. It has been observed that the calculation based on SRIM2006.02 provides the best agreement with the experimental data as compared to CasP3.2 code. The stopping power contribution due to target and projectile excitation/ionization at low energies has been evaluated and discussed with reference to CasP3.2 code. From these comparative studies it has been concluded that the target and projectile excitation-ionization increases the stopping power (>20%) at lower energies.     

Proton radiation damage in SrTiO3 thin film by computer simulation

Perovskite ferroelectrics (FEs) have high endurance to radiation. Strontium titanate (STO) (SrTiO₃) is a kind of perovskite FE with a large dielectric constant, which has attracted a good deal of attention due to its excellent dielectric, photoelectric and optical properties. The proton radiation damage in STO thin films is investigated by computer simulations in this work. The threshold displacement energy is an important input parameter for Monte Carlo simulation based on a binary collision approximation model, so we first use molecular dynamics to calculate the averaged threshold displacement energy of Sr, O and Ti atom. The calculated values are 67, 50 and 136 eV, which are obviously larger than default value (25 eV) in the Stopping and Range of Ions in Matter (SRIM) code. The results of the SRIM simulation demonstrate the dependency of vacancy number and position distribution on the proton's energy and the angle of incidence.     

Effects of screening of the interaction potential on the mobility characteristics of degenerate surface layers in compound semiconductors at low lattice temperatures

The rates of scattering of the conduction electrons in degenerate two-dimensional electron gas in the surface of compound semiconductors at low lattice temperatures have been obtained for interaction with the piezoelectric and deformation potential acoustic phonons, under different prevailing conditions. The calculations have been carried out taking due account of the screening of the interaction potential at low temperatures where again the phonon energy cannot be neglected in comparison to the average thermal energy of the electrons and, as a result, the equipartition approximation for the phonon distribution can hardly be valid. The scattering rates thus obtained for inversion layers in GaAs and ZnO are found to depend upon the carrier energy, the lattice temperature and the level of degeneracy in quite involved manners, which are very different from what follows if one makes the simplifying approximation of negligible phonon energy or disregards the effects of screening. The mobility characteristics are then obtained using these scattering rates. The results show how the screening of the interaction potential and the finite energy of the intravalley acoustic and piezoelectric phonons significantly change the mobility characteristics of the degenerate surface layers at low lattice temperatures. The inadequacies of the present theory are pointed out and recommendations for possible refinements are discussed.