La2/3Ca1/3MnO3薄膜的光致电阻率变化特性

射频磁控溅射法制备了La2/3Ca1/3MnO3纳米薄膜(LCMO).该薄膜发生FM-PM相变的转变点温度为Tc≈308K(近似为电阻峰值温度Tp);在不同温度下的光电导性质实验表明所制备的LCMO薄膜在连续激光作用时低温段(TTc时,ΔR/R＜0,即光电导效应.调制激光脉冲光响应实验发现,光致信号强度和温度及偏置电流之间存在非线性关系:光致电阻率增大信号极大值为偏置电流的二次函数,而极大值对应的温度和偏置电流成线性关系,同时,光响应有一个截止温度,并且存在最佳光响应偏置电流和温度条件.分析认为LCMO薄膜的光致电阻率变化特性和材料的eg↓自旋电子的状态以及与此相应的小极化子的形成有关.     

La0.8Ca0.2MnO3/SrTiO3薄膜厚度对其结构及磁学性能的影响

采用多种X射线衍射技术和磁电阻测量技术研究了不同厚度的La_0.8Ca_0.2MnO₃/SrTiO₃ (LCMO/STO)薄膜的应变状态及其对磁电阻性能的影响.结果表明，在STO(001)单晶衬底上生长的LCMO薄膜沿［00l］取向生长.LCMO薄膜具有伪立方钙钛矿结构，随着薄膜厚度的增加，面内晶格参数增加，垂直于面内的晶格参数减小,晶格参数a和b相近，略小于c.LC 关键词： X射线衍射 微结构 应变 物理性能     

厚度与应变效应对La0.67Ca0.33MnO3薄膜电输运与居里温度的影响

在厚度为25—400nm范围内，系统地研究了 (001)SrTiO_3(STO), (001)LaAlO_3(LAO)衬底上La_0.67Ca_0.33Mn_O.3 (LCMO)薄膜的电输运与居里温度T_C随薄膜厚度及衬底的变化. 结果表明，随薄膜变薄，电阻率ρ增加，T_C降低. 对于同一薄膜厚度，LCMO/STO薄膜的ρ大于LCMO/LAO基上的薄膜的ρ. T_C衬底的依赖关系则与ρ相反. 分析表明，LCMO薄膜的低温区电阻温度(ρ-T) 符合关系式ρ=ρ_0+Bω_s/sin h^2(ω_s/2/k_BT)+CT^n， 其中ρ_0为剩余电阻；等号右端第二项反映软光学模声子对电子散射的贡献；第三项包括其余可能散射机 理在电输运过程中所起的作用；B，ωs（软光学模声子的平均频率）与C都为拟合系数. 高温区的电输运则由小极化子跃迁模型ρ=DT×exp（E_a/k_BT）描述（E_a为极化子激 发能）. 根据ρ_0，ωs，E_a以及T_Ｃ变化，初步讨论了薄膜中的厚度与应变效应. 进一步 研究发现ωs，E_a的变化与T_C相关，从而说明极化子效应为影响T_C变化的主要因素. 关键词： 锰氧化物薄膜 电输运 居里温度 极化子     

YBa2Cu3O7-δ/LaAlO3和Tl2Ba2CaCu2O8/LaAlO3高温超导薄膜内的应变对其微波表面电阻影响的研究

YBa₂Cu₃O_7-δ/LaAlO₃ (YBCO/LAO) 超导薄膜是通过热蒸发沉积方法制备的,实验中使用的Tl₂Ba₂CaCu₂O₈/LaAlO₃ (TBCCO/LAO) 超导薄膜是通过直流磁控溅射方法制备的.通过分析两片超导薄膜的XRD谱计算出了两片超导薄膜内的应变,ΔC_{关键词： YBCO/LAO TBCCO/LAO 超导薄膜 应变 表面电阻}     

磁控溅射法制备的CaCu3Ti4O12薄膜

采用溅射方法成功地制备了CaCu3₃Ti4₄O12₁₂薄膜， 用原子力显微镜、x射线衍射（XRD）仪和LCR分析仪对样品进行形貌、物相结构和介电性质的研究.XRD表明，薄膜比块体的晶 格常数小但晶格畸变较大；LCR测量结果显示，在相同温度下薄膜比块体的相对介电常数低 ，薄膜相对介电常数由低到高转变时对应的温度较高且激活能较大.分析表明：薄膜的相对 介电常数较低是样品中晶相含量较低、缺陷较多使内部阻挡层电容大量减小、致密度不高引 起的；薄膜中 关键词： 磁控溅射 3Ti4₄O12₁₂')" href="#">CaCu3₃Ti4₄O12₁₂ 介电常 数 激活能     

化学溶液法制备的Pb(Mg1/3Nb2/3)O3-PbTiO3薄膜的光学性能

用化学溶液方法在宝石衬底及有LaNiO₃缓冲层的Pt/TiO₂/SiO₂/Si衬底上制备了92%Pb(Mg_1/3Nb_2/3)O₃-8%PbTiO₃(PMNT)薄膜，X射线衍射测试结果表明：在有LaNiO₃缓冲层的Pt/TiO₂/SiO₂/Si衬底上制备的PMNT薄膜几乎是纯钙钛矿相，且薄膜 关键词： PMNT薄膜 光学性能 化学溶液法     

热蒸发与离子束溅射制备LaF3薄膜的光学特性

研究了钼舟热蒸发工艺和离子束溅射方法制备的单层LaF₃薄膜的特性。首先,采用分光光度计测量了LaF₃薄膜的透射率和反射率光谱,使用不同模型拟合得出薄膜的折射率和消光系数。然后,采用应力仪测量了加热和降温过程中LaF₃薄膜的应力-温度曲线。最后,采用X射线衍射仪测试了薄膜的晶体结构。实验结果表明,热蒸发制备的LaF₃（RH LaF₃）存在折射率的不均匀性,在193 nm,其折射率和消光系数分别为1.687和5×10^-4,而离子束溅射制备的LaF₃（IBS LaF₃）折射率和消光系数分别为1.714和9×10^-4。两种薄膜表现出相反的应力状态,RH LaF₃薄膜具有张应力,而IBS LaF₃具有压应力,退火之后其压应力减小。热蒸发制备的MgF₂/LaF₃减反膜在193 nm透过率为99.4%,反射率为0.04%,离子束溅射制备的AlF₃/LaF₃减反膜透过率为99.2%,反射率为0.1%。     

(La0.7Sr0.3MnO3)m(BiFeO3)n超晶格间隔的La0.7Sr0.3MnO3三明治结构制备及表征

采用射频磁控溅射的方法在SrTiO₃（001） 基片上制备了（La_0.7Sr_0.3MnO₃）_m（BiFeO₃）_n超晶格间隔的La_0.7Sr_0.3MnO₃三明治结构.X射线衍射分析证明（La_0.7Sr_0.3MnO_{关键词： 超晶格薄膜 电诱导效应 隧道效应}     

基于Si掺杂Sb2Te3薄膜的相变存储器研究

采用磁控三靶(Si，Sb及Te)共溅射法制备了Si掺杂Sb₂Te₃薄膜，作为对比，制备了Ge₂Sb₂Te₅和Sb₂Te₃薄膜，并且采用微加工工艺制备了单元尺寸为10μm×10μm的存储器件原型来研究器件性能.研究表明，Si掺杂提高了Sb₂Te₃薄膜的晶化温度以及薄膜的晶态和非晶态电阻率，使得其非晶态与晶态电阻率之比达到10⁶，提高了器件的电阻开/关比；同Ge₂Sb₂Te₅薄膜相比，16at% Si掺杂Sb₂Te₃薄膜具有较低的熔点和更高的晶态电阻率，这有利于降低器件的RESET电流.研究还表明，采用16at% Si掺杂Sb₂Te₃薄膜作为存储介质的存储器器件原型具有记忆开关特性，可以在脉高3V、脉宽500ns的电脉冲下实现SET操作，在脉高4V、脉宽20ns的电脉冲下实现RESET操作，并能实现反复写/擦，而采用Ge₂Sb₂Te₅薄膜的相同结构的器件不能实现RESET操作. 关键词： 相变存储器 硫系化合物 2Te₃薄膜')" href="#">Si掺杂Sb₂Te₃薄膜 SET/RESET转变     

微纳米加工技术对La2/3Ca1/3MnO3材料性能影响的研究

利用脉冲激光沉积(PLD)方法制备了La2/3Ca1/3MnO3(LCMO)外延薄膜.然后利用微纳米加工技术对LCMO薄膜材料进行了局部改造,制造出宽度仅为83纳米的弱联接结构,并对此进行了一系列的物性改变研究.发现在测量电流不变(1μA)的情况下,R～T曲线在120K附近有一个尖锐的跳变,跳变的温度区间很窄.此外,测量电流和外加磁场的增加,都能对跳变现象产生抑制作用.目前认为这种现象的产生是由于相分离的原因导致的.     

锰位铁掺杂La0.67Sr0.33FexMn1-xO3薄膜的光诱导效应

分别采用溶胶-凝胶法和脉冲激光沉积的方法制备了La_067Sr_033Fe_xMn_1-xO₃(x=0, 005, 010, 015)系列块材和薄膜,研究了Fe部分替代对La_067Sr_033Fe_xMn_1-xO₃薄膜 关键词： 光诱导 Fｅ掺杂 晶格效应     

La0.82Te0.18MnO3薄膜的输运特性和光诱导效应

用脉冲激光沉积法制备了非金属Te掺杂的钙钛矿锰氧化物La_0.82Te_0.18MnO₃单晶薄膜.该薄膜从83 K升温至373 K过程中发生金属-绝缘体相变，转变点温度为283 K.其电阻率在T<T_MI时符合电子-电子、电子-磁振子散射公式；在T>T_MI时为小极化子输运.薄膜在低温段连续激光(波长为532 nm，40 mW)作用下电阻率显著增大，电阻变化率在253 K达到最大值51.1%,该变化率远大于相同条件下的空穴掺杂材料；在高温段产生了较小的光电导，电阻变化率小于10%.这些现象主要与激光激励下自旋系统和小极化子的变化有关.La_0.82Te_0.18MnO₃薄膜在激光诱导下具有明显的与自旋相关的弛豫现象.激光开始作用时薄膜电阻率随时间的变化符合指数关系. 关键词： 0.82Te_0.18MnO₃薄膜')" href="#">La_0.82Te_0.18MnO₃薄膜 光诱导 输运特性 电子掺杂     

La2/3Sr1/3MnO3/BaTiO3复合薄膜的制备及其电致磁电效应研究

使用脉冲激光沉积技术,在LaAlO₃(001)单晶基片上制备了La_2/3Sr_1/3MnO₃(LSMO)/BaTiO₃(BTO)双层薄膜.X射线衍射分析显示,LSMO层和BTO层呈现纯(001)取向.原子力显微镜研究表明,薄膜表面晶粒大小均匀,排列致密,表面均方根粗糙度为1.4 nm.复合薄膜的磁学、电学性能研究表明,其具有良好的磁学和介电性能.电输运测试显示,与在BTO层上施加正方向 关键词： 磁电效应 铁电/铁磁异质结构 脉冲激光沉积     

溶胶-凝胶法制备(Ba0.7Sr0.3)TiO3/LaNiO3异质薄膜及其结构和介电性质研究

采用改进的溶胶-凝胶方法在单晶Si(100)衬底上制备了介电性能优异的(Ba_0.7Sr_0.3)TiO₃/LaNiO₃异质薄膜.实验发现，在750 ℃下 、O₂气氛中晶化的LaNiO₃薄膜的电阻率最小.C-V与I-V特性测量表明(Ba_0.7Sr_0.3)TiO₃薄膜具有优异的介电性能，在频率为50kHz、零偏压下的相对介电常数ε_r>300，偏压为6V时漏电流密度J_L<1.2×10^-6A/cm². 关键词： xSr_1-x)TiO_３铁电薄膜')" href="#">(Ba_xSr_1-x)TiO_３铁电薄膜 ３底电极')" href="#">LaNiO３底电极 溶胶-凝胶法     

The suppression of structural phase transformation in LaVO3 and La1−xSrxVO3 thin films fabricated by pulsed laser deposition

Highly oriented (100) thin films of LaVO₃ and La_1−xSr_xVO₃ have been fabricated by pulsed laser deposition in a reducing atmosphere. The films show a transition from insulating to metallic behaviour in the composition region of x, 0.175<x<0.200. In the single crystals of the antiferromagnetic insulating phase, a first-order structural phase transition is observed few degrees below the magnetic transition, which manifests itself as a kink in the temperature dependence of resistivity. In the highly oriented thin films of LaVO₃ and La_1−xSr_xVO₃ fabricated on lattice matched substrates in this study, the structural phase transformation in the insulating phase has been suppressed. The electrical conduction is found to take place via hopping through localized states at low temperatures. The metallic compositions show a non-linear (T^1.5) behaviour in the temperature dependence of resistivity. V (2p) core level spectra of these films show a gradual change in the relative intensities of V³⁺ and V⁴⁺ ions as the value of x increases.     

Transverse laser induced thermoelectric voltage effect in tilted La0.5Sr0.5CoO3 thin films

The transverse laser induced thermoelectric voltage effect has been investigated in tilted La_0.5Sr_0.5CoO₃ thin films grown on vicinal cut LaAlO₃ (1 0 0) substrates when films are irradiated by pulse laser at room temperature. The detected voltage signals are demonstrated to originate from the transverse Seebeck effect as the linear dependence of voltage on tilted angle in the range of small tilted angle. The Seebeck coefficient anisotropy ΔS of 0.03 μV/K at room temperature is calculated and its distorted cubic structure is thought to be responsible for this. Films grown on a series of substrates with different tilted angles show the optimum angle of 19.8° for the maximum voltage. Film thickness dependence of voltage has also been studied.     

Electric current-induced giant electroresistance in epitaxial La0.67Sr0.33MnO3 thin films

The electronic transport behavior of La_0.67Sr_0.33MnO₃ epitaxial thin films with different thicknesses has been investigated under various applied DC currents. The 20 and 70 nm thick films show a giant negative electroresistance (ER). In contrast, the films with 100 nm thickness show unusual giant positive ER, which can reach 30% with the current density of 1.8×10⁸ A/cm² at room temperature. It is interesting that the electric current can also change the magnetoresistance of the films. The results were explained by considering the spin polarized current induced increase of ferromagnetic metallic phase and current-induced lattice distortion via electron wind force under high current density.     

Anisotropic magnetoresistance of partially relaxed SrRuO3 films

The SrRuO₃ films (50 nm thick) grown by laser evaporation on (001)(LaAlO₃)_0.3 + (Sr₂AlTaO₆)_0.7 substrates were under partially relaxed biaxial compressive mechanical stresses. The films consisted of crystallites with lateral dimensions of 40–100 nm and a relative azimuthal misorientation of about 0.9°. Ferromagnetic ordering of spins in the SrRuO₃ films was manifested by a change in the slope of the temperature dependence of their electrical resistivity ρ at T ≈ 155 K. For a magnetic field H parallel to the measuring current, the maximum values (∼7.5%) of the magnetoresistance MR = [ρ(μ₀ H = 5 T) − ρ(μ₀ H = 0)]/ρ(μ₀ H = 0) were observed at temperatures of about 100 K. At T = 95 K (μ₀ H = 5 T), the anisotropic magnetoresistance of the films was 8% and increased by a factor of approximately 1.5 with decreasing temperature to 4.2 K.     

Reversal transient laser-induced voltages in La2/3Ca1/3MnO3 films

This paper reports that the transient laser-induced voltages have been observed in La2/3Ca1/3MnO3 thin films on MgO （001） in the absence of an applied current. A peak voltage of - 0.15 V was detected in response to 0.015J pulse of 308 nm laser. It is demonstrated that the signal polarity is reversed when the films are irradiated through the substrate rather than at the air/film interface. Off-diagonal thermoelectricity may support the inversion of the signal when the irradiation direction is reversed.