沉积于MgO基片上的La0.7Ca0.3MnO3薄膜的应变弛豫和磁电阻特性

利用90°离轴射频磁控溅射方法将La_0.7Ca_0.3MnO₃(LCMO)沉积于(001)取向的MgO单晶基片上,薄膜厚度变化范围为5nm到200nm. 通过掠入射X射线衍射技术测量了LCMO/MgO薄膜的面内晶格常数, 结合常规X射线衍射研究了LCMO薄膜的晶格应变及其弛豫情况, 用四探针法测量了薄膜的磁电阻特性.结果表明, LCMO/MgO薄膜均为(001)取向生长, 在厚度小于5nm时已经发生应变弛豫, 当薄膜厚度为100nm以上时, 薄膜的微应变接近于完全弛豫, 并表现出与块体材料类似的磁电阻特性, 具有较大的磁电阻和较高的磁电阻峰值温度.     

La1-xTexMnO3晶格结构的X射线粉末衍射分析

通过X射线粉末衍射数据，用Rietveld精修方法分析了Te部分替换LaMnO₃中La后，其晶格参数及其结构对称性所发生的变化.结果表明：Te掺杂LaMnO₃系列样品具有R3C的晶格结构对称性，其MnO₆八面体晶格还产生了伸张畸变，畸变程度随Te掺杂量的增加而增大.此外根据Mn—O—Mn键角、e_g电子能带的带宽、A位离子平均半径及A位离子尺寸失配度等的变化特点，推测Te掺杂LaMnO₃样品除居里温度等相变物理量将随x增加而非线性变化外，还可能产生自旋玻璃态、相分离等宏观现象. 关键词： 庞磁电阻效应 La-Te-Mn-O X射线衍射 Rietveld精修     

氧压对SrTiO3和SrNb0.2Ti0.8O3薄膜晶格参数的影响及激光感生热电电压效应

采用脉冲激光沉积技术制备了SrTiO₃和SrNb_0.2Ti_0.8O₃薄膜.X射线衍射分析表明在LaAlO₃(100)单晶平衬底上生长的SrTiO₃及SrNb_0.2Ti_0.8O₃薄膜是沿［001］取向的近外延生长.随着氧压在一定范围内逐渐增大,SrTiO₃薄膜的晶格参数减小,而SrNb_0.2Ti_0.8O₃薄膜的晶格参数先减小后增大.同时摸索出制备具有二维电子气超晶格(SrTiO₃/SrNb_0.2Ti_0.8O₃)_L的最佳氧压为1.0×10^-2Pa.另外在LaAlO₃(100)倾斜衬底上制备的SrNb_0.2Ti_0.8O₃薄膜中观察到激光感生热电电压效应. 关键词： 0.2Ti_0.8O₃薄膜')" href="#">SrNb_0.2Ti_0.8O₃薄膜 晶格参数 激光感生热电电压 脉冲激光沉积     

薄膜厚度对La1.85Sr0.15CuO4薄膜结构和超导电性的影响

使用直流同轴磁控溅射法,在SrTiO₃(STO)衬底上成功制备出c取向的La_1.85Sr_0.15CuO₄(LSCO)超导薄膜.通过电输运测量系统和X射线衍射仪研究了薄膜厚度对LSCO(x＝0.15)薄膜电学性质和晶体结构的影响.实验证明随着膜厚增加,(006)衍射峰的半高宽(Full Width at Half Maximum,FWHM)逐渐减小,薄膜的取向性增强,与此同时,薄膜的超导转变温 关键词： 1.85Sr_0.15CuO₄薄膜')" href="#">La_1.85Sr_0.15CuO₄薄膜 超导电性 晶体结构     

SrTiO3掺杂La-K-Mn-O系统的电磁性质

用溶胶-凝胶制备了La_0.833K_0.167MnO₃-SrTiO₃ (LKMO/STO)系列样品，并研究了它们的结构、磁性和输运特性.X射线衍射实验表明，1200℃烧结的LKMO/STO (STLK12)是一个均匀的固溶相.其电阻率表现为绝缘体的行为，而纯La_0.833K_0.167MnO₃ (LKMO)样品随温度的升高则有金属-绝缘体转变.在低场下(μ₀H=0.02 T)，对STLK12样品，当温度从220 K降低到4 K时，磁电阻从0.2%升高到11%.在高场下(μ₀H=5.5 T)，随着温度降低，磁电阻几乎是线性增大.在4.2 K时，达到65%.比纯LKMO样品40%的磁电阻高出了25%. 我们用晶界处的自旋极化隧穿效应定性地解释了这种增强的磁电阻效应. 关键词： 低场磁电阻 高场磁电阻 自旋极化隧穿 钙钛矿     

氧压对Ba0.6Sr0.4TiO3薄膜晶格常数的影响及BaTiO3/Ba0.6Sr0.4TiO3超晶格的制备

采用脉冲激光沉积(PLD)技术,经一系列的优化实验成功地制备了BaTiO₃(BT)和Ba_0.6Sr_0.4TiO₃(BST)单层膜.X射线衍射分析表明,在LaAlO₃(001)单晶平衬底上生长的BT和BST薄膜都是沿[001]取向的近外延生长.且随着氧压在10^-3—25 Pa范围内逐渐增大,BST薄膜的晶格常数与氧压之间近似满足Boltzmann函数关系.其次,在此优化条件下还 关键词： 超晶格 晶格常数 激光感生热电电压 脉冲激光沉积     

应变增强Nb掺杂SrTiO3薄膜热电性能

高性能热电材料的发展有望帮助解决未来能源危机,且随着可穿戴器件的发展与应用,热电材料和器件除了要具备更高的热-电转化性能以外,还必须具有良好的柔性.将热电材料制成薄膜既可以为微型器件供电,也有潜力应用于柔性器件.本文使用脉冲激光沉积方法,在商用SrTiO₃ (STO)和La_0.3Sr_0.7Al_0.65Ta_0.35O₃ (LSAT)衬底上制备得到了不同厚度的高质量铌掺杂钛酸锶薄膜(Nb:STO),并对薄膜的表面形貌、结构以及热电性能进行表征与测试.结果显示,使用LSAT作为衬底可以对薄膜施加面内压应变,随着薄膜厚度的增大,应变逐渐释放并接近于块体Nb:STO.随着厚度的增大,薄膜的热电性能逐渐提升,在STO衬底上生长的208 nm厚样品的室温功率因子相比于52 nm样品提升了187%.此外, 144 nm厚度的Nb:STO/LSAT薄膜室温塞贝克系数达到了265.95 μV/K,这是由于衬底应变导致薄膜样品的能带变化.本工作表明通过应变工程调控铌掺杂钛酸锶薄...     

La1－xPrxMnO3(x=0.1，0.2)薄膜庞磁电阻性质的研究

一种新的庞磁电阻氧化物薄膜La_1-xPr_xMnO₃(x=0.1，0 .2)薄膜用脉冲激光沉积(PLD)方法生长在(100)SrTiO₃单晶基底上.XRD结果显示 薄膜具有很好的外延单晶取向.电输运和磁性质的研究表明薄膜具有显著的庞磁电阻效应(CM R)效应，其中磁电阻比率达95％(在5T的磁场下).X射线光电子能谱(XPS)的结果表明薄膜体 系中Pr离子的价态为+4价，因此该薄膜很可能是电子掺杂的庞磁电阻体系. 关键词： 脉冲激光沉积 1-xPr_xMnO₃')" href="#">La_1-xPr_xMnO₃ 电子 掺杂 庞磁电阻     

(Ce0.8Sm0.2O2-δ/Y2O3:ZrO2)N超晶格电解质薄膜的制备及表征

采用脉冲激光沉积技术(PLD), 在MgO单晶基底上, 依次沉积氧化钐掺杂的氧化铈(Ce_0.8Sm_0.2O_2-δ, SDC)和钇稳定氧化锆(8 mol%Y₂O₃:ZrO₂, YSZ)制备了五种(SDC/YSZ)_N (N=3, 5, 10, 20, 30) 超晶格电解质薄膜. 利用X射线衍射(XRD)、高分辨透射电子显微镜(HR-TEM)和交流阻抗对其形貌、相结构和电学性能进行了表征. 结果显示, (SDC/YSZ)_N超晶格电解质薄膜之间形成了明显的界面和较好的超晶格结构; 薄膜表面颗粒生长均匀、致密、平滑, 在薄膜的界面处没有元素相互扩散也未出现裂纹, 外延生长良好; 电导率随着(SDC/YSZ)_N超晶格电解质界面数的增加而增加, 而活化能则随之减少, 是较为理想的低温固体氧化物燃料电池电解质.     

(La0.7Sr0.3MnO3)m(BiFeO3)n超晶格间隔的La0.7Sr0.3MnO3三明治结构制备及表征

采用射频磁控溅射的方法在SrTiO₃（001） 基片上制备了（La_0.7Sr_0.3MnO₃）_m（BiFeO₃）_n超晶格间隔的La_0.7Sr_0.3MnO₃三明治结构.X射线衍射分析证明（La_0.7Sr_0.3MnO_{关键词： 超晶格薄膜 电诱导效应 隧道效应}     

PREPARATION OF a-AXIS ORIENTED YBa2Cu3Ox THIN FILMS

The a-axis oriented YBa₂Cu₃O_x(YBCO) thin films could be grown on (100) SrTiO₃(STO) substrates with STO buffer layers by dc and rf magnetron sputtering either by low-ering the deposition temperature, or by using a self-template technique. For the latter, the resistivity of the thin film at 290K along the substrate [001] direction is about four times larger than that in the [010] direction. The zero resistance temperatures T_c0 are 89 K in both directions. So high quality a-axis oriented YBCO thin films can be prepared by the self-template technique. Also the T_c0 increase monotonously with the reduction of the thickness of the YBCO seed layer.     

Influence of microstructures on exchange bias behaviors of La0.7Sr0.3MnO3/La0.33Ca0.67MnO3 bilayers

Ferromagnetic La_0.7Sr_0.3MnO₃ (LSMO) and antiferromagnetic La_0.33Ca_0.67MnO₃ (LCMO) layers were grown on SrTiO₃ (STO) substrates by the pulsed laser deposition technique. LSMO films had rougher surfaces and larger grain sizes than LCMO films. Fully strained bilayers, in which each layer was as thin as 10 nm, were prepared by changing their stacking sequences, i.e. LSMO/LCMO/STO and LCMO/LSMO/STO. The former had higher T_C (350 K) than the latter (300 K), and exchange bias effects were only observed in the former bilayers. This revealed that microstructures could play an important role in the transport and magnetic properties of manganese oxide thin films.     

Highly oriented La2/3Ca1/3MnO3 films grown on silicon-on-insulator substrates by pulsed laser deposition

High quality La_2/3Ca_1/3MnO₄(LCMO) thin films have been deposited on silicon-on-insulator (SOI) substrates only buffered by yt tria-stabilized zirconia (YSZ) by using the pulsed laser deposition (PLD) technique. The results obtained from X-ray diffraction (XRD), reflection high energy electron diffraction (RHEED), scanning electron microscopy (SEM) and magnetization investigations indicate that the LCMO films are highly oriented both in-plane and out-of-plane. The Curie temperature T _c is close to 260 K and the insulator–metal (I–M) transition appears around 220 K. The conducting mechanism at low temperatures is dominated by the electron–magnon scattering. A tensile stress from the film–substrate lattice mismatch results in magnetic ‘easy axes’ in the film plane and the magnetic anisotropy energy increases with cooling. A maximum magnetoresistance (MR) is observed near 190 K, with the external magnetic field either parallel or vertical to the LCMO film plane. Moreover, the large intrinsic high-field magnetoresistance (HFMR) and the very small extrinsic low-field magnetoresistance (LFMR) again reveal that the LCMO films on SOI substrates are highly oriented thin films of good crystallinity.     

Epitaxial strain-induced magnetic anisotropy in Sm3Fe5O12 thin films grown by pulsed laser deposition

Sm₃Fe₅O₁₂ thin films of various thicknesses were grown on a (0 0 1)-oriented Gd₃Ga₅O₁₂ substrate by pulsed laser deposition. The crystal structure of the films was strongly dependent on film thickness. The lattice was strained for thinner films due to a lattice mismatch between the film and substrate. This lattice strain was relaxed when the film thickness exceeded a critical thickness of around 660 Å. It is suggested that the epitaxial strain induces uniaxial magnetic anisotropy with an out-of-plane magnetic easy axis.     

La0.67Ca0.33MnO3薄膜中的矫顽力随膜厚与衬底的变化

系统研究了衬底为SrTiO3和LaAlO3上的La0.67Ca0.33MnO3薄膜中的矫顽力随厚度和应变的变化。结构分析表明薄膜为（001）方向织构，而且薄膜中的晶粒尺寸随着薄膜厚度的减小而减小。磁测量表明矫顽力先随着膜厚的减小而增加，在t=10-25nm附近到达一极大值。随后，矫顽力随厚度的减小而降低。还得出矫顽力的大小与测量方向有关：t≥25nm (t≤10nm)时，难磁化方向的矫顽力大于（小于）易磁化方向的矫顽力。据此，我们提出：在厚膜（t≥25nm）中，矫顽力变化由畴壁钉扎机制决定；在超薄膜（t≤10nm）中，则与磁畴的形核机制有关。根据t= 5、10、25、400nm的LCMO/STO薄膜的初始磁化曲线，以及t=5，50nm的LCMO/LAO薄膜的小磁滞回线的测量，我们对薄膜中矫顽力机制作了验证，并且还讨论了钉扎和形核机制发生的非均匀区的尺寸。     

Response of the capacitance of a planar La0.67Ca0.33MnO3/SrTiO3/La0.67Ca0.33MnO3 heterostructure to an electric field

Manganite film electrodes were integrated with a spacer layer of strontium titanate to produce an epitaxial La_0.67Ca_0.33MnO₃/(1000 nm)SrTiO₃/La_0.67Ca_0.33MnO₃ (LCMO/STO/LCMO) heterostructure by laser ablation. At T = 300 K, the mechanical stresses in the STO layer relaxed to a considerable extent, while the LCMO electrodes were found to be under biaxial lateral tensile strain, with the lattice unit cell of the top electrode distorted considerably stronger (a _∥/a _⊥ ≈ 1.026) than that of the bottom electrode (≈1.008) (a _∥ and a _⊥ are the unit cell parameters in the substrate plane and along the normal to its surface, respectively). The reciprocal of the capacitance C of the plane-parallel LCMO/STO/LCMO film capacitors thus formed increased almost linearly with increasing temperature T in the range 50–250 K. At T < 100 K, the capacitance C decreased by approximately 50% in an electric field E = 40 kV/cm. After the electric field E was varied as 0 → + 100 kV/cm → 0, the capacitance C decreased by approximately 3% and the maximum in the C(E, T > 200 K) dependence shifted by approximately 9 kV/cm with respect to the point E = 0.     

Film thickness dependence of electro-optic effect in epitaxial BaTiO3 thin films

Based on the phenomenological Landau-Devonshire theory, we investigate the film thickness dependence of ferroelectric and electro-optic properties of epitaxial BaTiO₃ thin films grown on SrTiO₃ and MgO substrates. By using the effective substrate lattice parameter concept, the film thickness dependence of misfit strain is incorporated into the theory. Therefore, the film thickness dependence of ferroelectric and electro-optic properties in epitaxial BaTiO₃ thin films can be explained. Moreover, a large quadratic electro-optic effect was obtained in the BaTiO₃ thin films, which is in good agreement with the experimental result of BaTiO₃ thin films on the MgO substrate.     

Thickness induced magnetic anisotropic properties of Tb-Fe-Co thin films

The influence of Tb₂₅Fe₆₁Co₁₄ thin film thicknesses varying from 2 to 300 nm on the structural and magnetic properties has been systematically investigated by using of X-ray diffraction, scanning electron microscopy, transmission electron microscopy, magnetization, and magneto-optic Kerr effect microscopy measurements. Thin film growth mechanism is pursued and controlled by ex-situ X-ray refractometry measurements. X-ray diffraction studies reveal that the Tb₂₅Fe₆₁Co₁₄ films are amorphous regardless of thin films thicknesses. The magnetic properties are found to be strongly related to thickness and preferred orientation. With an increase in film thickness, the easy axis of magnetization is reversed from in-plane to out-of-plane direction. The change in the easy axes direction also affects the remanence, coercivity and magnetic anisotropy values. The cause for the magnetic anisotropy direction change from in-plane to out-of-plane can be related to the preferred orientation of the thin film which depends on the large out-of-plane coercivity and plays an important role in deciding the easy axes direction of the films. According to our results, up to the 100 nm in-plane direction is dominated over the whole system under major Fe-Fe interaction region, after that point, the magnetic anisotropy direction change to the out-of-plane under major Tb-Fe/Tb-Co interaction region and preferred orientation dependent perpendicular magnetic anisotropic properties become more dominated with 2.7 kOe high coercive field values.     

Thickness dependence of electroresistance in La0.67Ca0.33MnO3 epitaxial films

The electroresistance (ER) of La_0.67Ca_0.33MnO₃ (LCMO) epitaxial thin films with different thicknesses was studied. For the 110 nm thick LCMO film, its ER shows a maximum at T_p, where the resistance shows a peak, and decreases to zero at lower temperatures. While for the 30 nm thick LCMO film, its ER is remarkable in a wide temperature range. Another interesting observation in this work is that the electric current can tune the magnetoresistance of the ultrathin LCMO thin film. The results were discussed by considering the coexistence of ferromagnetic metallic phase with the charge ordered phase, and the variation of the phase separation with film thickness and electric current. This work also demonstrates that electric current can tune the magnetoresistance of the manganites, which is helpful for their applications.