AlN插入层对AlxGa1-xN/GaN界面电子散射的影响

本文研究AlN作为Al_xGa_1-xN/GaN插入层引起的电子输运性质的变化, 考虑了Al_xGa_1-xN和AlN势垒层的自发极化、压电极化对Al_xGa_1-xN/AlN/GaN双异质结高电子迁移率晶体管(HEMT)中极化电荷面密度、二维电子气(2DEG) 浓度的影响, 分析了AlN厚度与界面粗糙度散射和合金无序散射的关系; 结果表明, 2DEG 浓度、界面粗糙度散射和合金无序散射依赖于AlN层厚度, 插入一层1–3 nm薄的AlN层, 可以明显提高电子迁移率.     

A theoretical and experimental evaluation of III-nitride solar-blind UV photocathode

We have developed a superior solar-blind ultraviolet (UV) photocathode with an Al_xGa_1-xN photocathode (x ～ 0.45) in semi-transparent mode, and assessed spectra radiant sensitivity related to practical use. Before being grown over a basal plane sapphire substrate by low-pressure metal organic chemical vapor deposition (MOCVD), a reasonable design was made to the photocathode epitaxy structure, focusing on the Al_xGa_1-xN: Mg active layer, then followed by a comprehensive analysis of the structural and optical characterization. The spectra radiant sensitivity is peaked of 41.395 mA/W at wavelength 257 nm and then decreases by about 3 to 4 decades at 400 nm demonstrating the ability of this photocathode for solar-blind application prospects.     

氮化物抛物量子阱中类氢杂质态能量

采用变分方法研究氮化物抛物量子阱(GaN/Al_xGa_1-xN)材料中类氢杂质态的能级,给出基态能量、第一激发态能量、结合能和跃迁能量等物理量随抛物量子阱宽度变化的函数关系.研究结果表明,基态能量、第一激发态能量、基态结合能和1s→2p±跃迁能量随着阱宽L的增大而减小,最后接近于GaN中3D值.GaN/Al_0.3Ga_0.7N抛物量子阱对杂质态的束缚程度比GaAs/Al_0.3Ga_0.7As抛物量子阱强,因此,在GaN/Al_0.3-Ga_0.7N抛物量子阱中束缚于杂质中心处的电子比在GaAs/Al_0.3Ga_0.7As抛物量子阱中束缚于杂质中心处的电子稳定.     

GaN/In_xGa_(1-x)N型最后一个量子势垒对发光二极管内量子效率的影响

GaN/In_xGa_(1-x)N型最后一个量子势垒结构能有效提高发光二极管(LED)器件内量子效率,缓解LED效率随输入电流增大而衰减的问题.本文综述了该结构及其结构变化——In组分梯度递增以及渐变、GaN/In_xGa_(1-x)N界面极化率改变等对改善LED器件性能的影响及优势,归纳总结了不同结构的GaN/In_xGa_(1-x)N型最后一个量子垒的工作机理,阐明极化反转是该结构提高LED性能的根本原因.在综述该结构发展的基础之上,通过APSYS仿真计算,进一步探索和深入分析了该结构中In_xGa_(1-x)N层的In组分及其厚度变化对LED内量子效率的影响.结果表明:In组分的增加有助于在GaN/In_xGa_(1-x)N界面产生更多的极化负电荷,增加GaN以及电子阻挡层处导带势垒高度,减少电子泄漏,从而提高LED的内量子效率;但GaN/In_xGa_(1-x)N型最后一个量子势垒中In_xGa_(1-x)N及GaN层厚度的变化由于会同时引起势垒高度和隧穿效应的改变,因而In_xGa_(1-x)N和GaN层的厚度存在一个最佳比值以实现最大化的减小漏电子,提高内量子效率.     

Output light power of InGaN-based violet laser diodes improved by using a u-InGaN/GaN/AlGaN multiple upper waveguide

The upper waveguide(UWG) has direct influences on the optical and electrical characteristics of the violet laser diode(LD) by changing the optical field distribution or barrier of the electron blocking layer(EBL). In this study, a series of In GaN-based violet LDs with different UWGs are investigated systematically with LASTIP software. It is found that the output light power(OLP) under an injecting current of 120 mA or the threshold current(Ith) is deteriorated when the UWG is u-In_(0.02)Ga_(0.98)N/GaN or u-In_(0.02)Ga_(0.98)N/Al_xGa_(1-x)N(0 ≤ x ≤ 0.1), which should be attributed to small optical confinement factor(OCF) or severe electron leakage. Therefore, a new violet LD structure with u-In_(0.02)Ga_(0.98)N/GaN/Al_(0.05)Ga_(0.95)N multiple layer UWG is proposed to reduce the optical loss and increase the barrier of EBL. Finally,the output light power under an injecting current of 120 mA is improved to 176.4 mW.     

Al组分对MOCVD制备的AlxGa1-xN/AlN/GaN HEMT电学和结构性质的影响

采用金属有机化合物化学气相沉积（MOCVD）方法制备了不同Al组分（x=0.19,0.22,0.25,0.32）的Al_xGa_1-xN/AlN/GaN 结构的高电子迁移率晶体管（HEMT）材料。研究了Al_xGa_1-xN势垒层中Al组分对HEMT材料电学性质和结构性质的影响。研究结果表明,在一定的Al组分范围内,二维电子气（2DEG）浓度和迁移率随着Al组分的升高而增大。然而,过高的Al组分导致HEMT材料表面粗糙度增大,2DEG迁移率降低,该实验现象在另一方面得到了原子力显微镜测试结果的验证。在最佳Al组分（25%）范围内,获得的 HEMT材料的2DEG浓度和室温迁移率分别达到1.2×10¹³ cm^-2和1 680 cm²/（V·s）,方块电阻低至310 Ω/□。     

RAS在线监测AlGaAs的MOCVD生长

通过瞬态反射各向异性谱和瞬态反射谱在线监测和研究了AlxGa1-xAs的生长过程,利用金属有机化合物汽相淀积技术在GaAs (001)衬底上生长了多层AlxGa1-xAs结构.选择最适合在线监测生长过程的探测光能量,在此探测光能量处所得到的反射各向异性谱和反射谱的信号在生长过程中有很明显的振荡行为产生.研究发现,通过瞬...     

Dependence of Spin-orbit Parameters in AlxGa1-xN/GaN Quantum Wells on the Al Composition of the Barrier

In this paper, we obtain considerable spin-orbit (SO) parameters in Al_xGa_1-xN/GaN quantum wells (QWs) with sheet carrier concentration N_s =120×10 ¹¹/cm². With increasing Al content (x) of the barrier, the SO parameters increase as a whole, and the two major contributions are found to be the decrease of the expansion region of the envelope functions and the increase of the polarized electric field in the well. Compared with the Rashba parameters for the first two subbands, the intersubband SO parameter is a bit smaller and varies more slowly with x. The results indicate the SO parameters, especially the Rashba parameters can be engineered by the Al composition of the barrier, which may be helpful to the spin manipulation of III-nitride low-dimensional heterostructures.     

AlGaN合金中局域态和极化电场的竞争机制

通过MOVPE方法生长了不同Al组分的3块Al_xGa_1-xN样品,利用稳态光谱和时间分辨光谱对其样品的光学特性进行了分析。鉴于影响氮化物发光性质的极化电场或局域态的单一机制不能充分解释我们的实验现象,提出了局域态-内部极化电场竞争的机制。通过对实验数据的分析,得出如下重要结论：样品PL峰位蓝移的温度起点基本对应于局域态和极化电场起作用的交替点,PL峰位发生蓝移的温度起点与光强-温度曲线的斜率出现明显变化的温度点一致;随着温度的升高,若AlGaN合金样品中PL峰位存在二次蓝移,则说明样品中电场分布不均匀。     

Electronic Structure and Magnetic Properties of Cr-Doped AlN

To understand the electronic and magnetic properties, we have studied Cr-doped zinc-blende AlN system in detail by applying a first-principle plane wave pseudopotential method based on the density functional theory within the local spin density approximation. The analyses of the band structures, density of states, exchange interactions, and magnetic moments show that Al1-xCrxN alloys may exhibit a half-metallic ferromagnetism character, that Cr in the diluted doping limit forms near-midgap deep levels, and that the total magnetization of the cell is 3μB per Cr atom, which does not change with Cr concentration. Moreover, we have succeeded in predicting that Al1-xCrzN alloys in x = 0.0625 has a very high Curie temperature, and lind that ferromagnetic exchange interaction between magnetic dopants is short-ranged.     

Simultaneous Effects of HydrostaticPressure and Conduction Band Non-parabolicity on BindingEnergies and Diamagnetic Susceptibility of a Hydrogenic Impurityin Spherical Quantum Dots

Simultaneous effects of conduction band non-parabolicity and hydrostatic pressure on the binding energies of 1S, 2S, and 2P states along with diamagnetic susceptibility of an on-center hydrogenic impurity confined in typical GaAs/Al_xGa_1-xAs spherical quantum dots are theoretically investigated using the matrix diagonalization method. In this regard, the effect of band non-parabolicity has been performed using the Luttinger-Kohn effective mass equation. The binding energies and the diamagnetic susceptibility of the hydrogenic impurity are computed as a function of the dot radius and different values of the pressure in the presence of conduction band non-parabolicity effect. The results we arrived at are as follows: the incorporation of the band edge non-parabolicity increases the binding energies and decreases the absolute value of the diamagnetic susceptibility for a given pressure and radius; the binding energies increase and the magnitude of the diamagnetic susceptibility reduces with increasing pressure.     

Piezoelectric polarization and quantum size effects on the vertical transport in AlGaN/GaN resonant tunneling diodes

In this work,the electronic properties of resonant tunneling diodes(RTDs) based on GaN-AlxGa(1-x)N double barriers are investigated by using the non-equilibrium Green functions formalism(NEG).These materials each present a wide conduction band discontinuity and a strong internal piezoelectric field,which greatly affect the electronic transport properties.The electronic density,the transmission coefficient,and the current–voltage characteristics are computed with considering the spontaneous and piezoelectric polarizations.The influence of the quantum size on the transmission coefficient is analyzed by varying GaN quantum well thickness,Al_xGa_(1-x)N width,and the aluminum concentration x_(Al).The results show that the transmission coefficient more strongly depends on the thickness of the quantum well than the barrier;it exhibits a series of resonant peaks and valleys as the quantum well width increases.In addition,it is found that the negative differential resistance(NDR) in the current–voltage(I–V) characteristic strongly depends on aluminum concentration xAl.It is shown that the peak-to-valley ratio(PVR) increases with xAlvalue decreasing.These findings open the door for developing vertical transport nitrides-based ISB devices such as THz lasers and detectors.     

Lattice damage in InGaN induced by swift heavy ion irradiation

The microstructural responses of In_0.32Ga_0.68N and In_0.9Ga_0.1N films to 2.25 GeV Xe ion irradiation have been investigated using x-ray diffraction, Raman scattering, ion channeling and transmission electron microscopy. It was found that the In-rich In_0.9Ga_0.1N is more susceptible to irradiation than the Ga-rich In_0.32Ga_0.68N. Xe ion irradiation with a fluence of 7× 10¹¹ ions·cm^-2 leads to little damage in In_0.32Ga_0.68N but an obvious lattice expansion in In_0.9Ga_0.1N. The level of lattice disorder in In_0.9Ga_0.1N increases after irradiation, due to the huge electronic energy deposition of the incident Xe ions. However, no Xe ion tracks were observed to be formed, which is attributed to the very high velocity of 2.25 GeV Xe ions. Point defects and/or small defect clusters are probably the dominant defect type in Xe-irradiated In_0.9Ga_0.1N.     

缓冲层InxGa1-xAs组分对In0.82Ga0.18As结晶质量和表面形貌的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料.研究缓冲层In_xGa_1-xAs的In组分对In_0.82Ga_0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层In_xGa_1-xAs的In组分影响高温生长的外延层In_0.82Ga_0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In_0.82Ga_0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳.     

部分有序(AlxGa1-x)0.51In0.49P(x=0.29)合金的发光衰退过程

利用时间分辨光谱研究了(Al_xGa_1-x)_0.51In_0.49P合金的时间衰退过程,观察到载流子的转移过程和PL谱峰蓝移现象。这和变温发光谱中谱峰的Z-型依赖关系相吻合。这种现象明显表明了载流子的转移过程和子带的存在,证实了我们对超晶格带折叠效应的猜测。子带是由于有序结构的超晶格效应使导带的L带折叠到Γ带,载流子在时间衰退过程中从Γ带转移到L带。时间分辨光谱的蓝移现象同时也揭示了PL变温谱中谱峰反常蓝移现象的来源。     

Novel method to determine effective length of quantum confinement using fractional-dimension space approach

The binding energy and effective mass of a polaron confined in a GaAs film deposited on an Al_xGa_1-x As substrate are investigated, for different film thickness values and aluminum concentrations and within the framework of the fractional-dimensional space approach. Using this scheme, we propose a new method to define the effective length of the quantum confinement. The limitations of the definition of the original effective well width are discussed, and the binding energy and effective mass of a polaron confined in a GaAs film are obtained. The fractional-dimensional theoretical results are shown to be in good agreement with previous, more detailed calculations based on second-order perturbation theory.     

AlxGa1-xN晶体薄膜中铝含量的卢瑟福背散射精确测定

采用金属有机化合物气相淀积法在(0001)取向的蓝宝石衬底上生长一层 大约20 nm厚的AlN缓冲层, 在缓冲层上生长大约2 μm厚、 晶体质量良好的Al_xGa_1-xN外延层, 通过深紫外光致发光法测量发光峰的能量E_g 判断外延层中铝含量的均匀性, 取样品均匀性良好的氮铝镓外延片进行卢瑟福背散射(RBS)实验, 通过两个高能离子束实验室分别进行RBS随机谱分析, 每个实验室测量六个样品, 由分析软件拟合随机谱获得外延层中的x_Al. 并对样品的均匀性、堆积校准、计数统计、散射角、离子束能量与阻止截面 等影响测量结果准确性的不确定度来源进行分析. 结果表明, 采用入射离子⁴He, 能量为2000 keV, 散射角为165° 时, 氮铝镓外延片中铝含量(x=0.8) 的测量不确定度为2.0%, 包含扩展因子k=2. 关键词： 氮铝镓 卢瑟福背散射 测量不确定度 金属有机化合物气相淀积法     

不同散射机理对 Al2O3/InxGa1-xAs nMOSFET 反型沟道电子迁移率的影响

通过考虑体散射、界面电荷的库仑散射以及 Al₂O₃/In_xGa_1-xAs 界面粗糙散射等主要散射机理, 建立了以 Al₂O₃为栅介质In_xGa_1-xAs n 沟金属-氧化物-半导体场效应晶体管 (nMOSFETs) 反型沟道电子迁移率模型, 模拟结果与实验数据有好的符合. 利用该模型分析表明, 在低至中等有效电场下, 电子迁移率主要受界面电荷库仑散射的影响; 而在强场下, 电子迁移率则取决于界面粗糙度散射. 降低界面态密度, 减小 Al₂O₃/In_xGa_1-xAs 界面粗糙度, 适当提高In含量并控制沟道掺杂在合适值是提高 InGaAs nMOSFETs 反型沟道电子迁移率的主要途径. 关键词： InGaAs MOSFET 反型沟道电子迁移率 散射机理     

Influences of polarization effect and p-region doping concentration on the photocurrent response of solar-blind p–i–n avalanche photodiodes

The influences of polarization and p-region doping concentration on the photocurrent response of Al0.4Ga0.6N/Al0.4Ga0.6N/Al0.65Ga0.35N p–i–n avalanche photodetector are studied in a wide range of reverse bias voltages.The simulation results indicate that the photocurrent under high inverse bias voltage decreases with the increase of polarization effect,but increases rapidly with the increase of effective doping concentration in p-type region.These phenomena are analyzed based on the calculations of the intensity and distribution of the electric field.A high p-region doping concentration in the p–i–n avalanche photodetector is shown to be important for the efficient compensation for the detrimental polarization-induced electrostatic field.     

Al0.6Ga0.4N/GaN/Al0.3Ga0.7N/Al0.6Ga0.4N量子阱中的Rashba自旋劈裂

正如人们所知, 可以通过电场或者设计非对称的半导体异质结构来调控体系的结构反演不对称性(SIA)和Rashba自旋劈裂. 本文研究了Al_0.6Ga_0.4N/GaN/Al_0.3Ga_0.7N/Al_0.6Ga_0.4N量子阱中第一子带的Rashba 系数和Rashba自旋劈裂随Al_0.3Ga_0.7N插入层(右阱)的厚度w_s以及外加电场的变化关系, 其中GaN层(左阱)的厚度为40-w_s Å. 发现随着w_s的增加, 第一子带的Rashba系数和Rashba自旋劈裂首先增加, 然后在w_s>20 Å 时它们迅速减小, 但是w_s>30 Å时Rashba自旋劈裂减小得更快, 因为此时k_f也迅速减小. 阱层对Rashba系数的贡献最大, 界面的贡献次之且随w_s变化不是太明显, 垒层的贡献相对比较小. 然后, 我们假w_s=20 Å, 发现外加电场可以很大程度上调制该体系的Rashba系数和Rashba自旋劈裂, 当外加电场的方向同极化电场方向相同(相反)时, 它们随着外加电场的增加而增加(减小). 当外加电场从-1.5×10⁸ V·m^-1到1.5×10⁸ V· m^-1变化时, Rashba系数随着外加电场的改变而近似线性变化, Rashba自旋劈裂先增加得很快, 然后近似线性增加, 最后缓慢增加. 研究结果表明可以通过改变GaN层和Al_0.3Ga_0.7N层的相对厚度以及外加电场来调节Al_0.6Ga_0.4N/GaN/Al_0.3Ga_0.7N/Al_0.6Ga_0.4N量子阱中的Rashba 系数和Rashba自旋劈裂, 这对于设计自旋电子学器件有些启示.