Zn1-xCoxO稀磁半导体薄膜的结构及其磁性研究

利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn1-zCoxO(x=0.01,0.02)稀磁半导体薄膜的结构和磁性.磁性测量结果表明Zn1-xCoxO样品都具有室温铁磁性.X射线衍射结果显示其薄膜样品具有结晶良好的纤锌矿结构.荧光X射线吸收精细结构测试结果表明,脉冲激光气相沉积法制备的样品中的Co离子全部进入ZnO晶格中替代了部分Zn的格点位置,生成单一相的Zn1-xCoxO稀磁半导体.通过对X射线吸收近边结构谱的分析,确定Zn1-xCoxO薄膜中存在O空位,表明Co离子与O空位的相互作用是诱导Zn1-xCoxO产生室温铁磁性的主要原因.     

氧化钙薄膜中缺陷诱导的高居里温度铁磁性研究

通过脉冲激光沉积在(111) 取向钇稳定的氧化锆(YSZ) 衬底上制备了氧化钙(CaO) 薄膜. 室温下磁滞回线的实验观测数据表明 CaO 薄膜具有明显的铁磁性. X 射线衍射和 X 射线光电子能谱分析表明,CaO 薄膜为(111) 取向, 没有杂质相. 在高真空条件下生长和退火的 CaO 薄膜都表现出铁磁性磁化行为, 而在相应的 CaO 靶材上没有检测到这种铁磁性. 结果表明, 氧空位浓度与氧化钙薄膜的磁化强度之间存在一定的相关性, 后退火对 CaO 薄膜磁性的影响说明, 氧空位浓度与氧化钙薄膜的铁磁性是相关的.     

氧化钙薄膜中缺陷诱导的高居里温度铁磁性研究（英文）

通过脉冲激光沉积在(111)取向钇稳定的氧化锆(YSZ)衬底上制备了氧化钙(CaO)薄膜.室温下磁滞回线的实验观测数据表明CaO薄膜具有明显的铁磁性.X射线衍射和X射线光电子能谱分析表明,CaO薄膜为(111)取向,没有杂质相.在高真空条件下生长和退火的CaO薄膜都表现出铁磁性磁化行为,而在相应的CaO靶材上没有检测到这种铁磁性.结果表明,氧空位浓度与氧化钙薄膜的磁化强度之间存在一定的相关性,后退火对CaO薄膜磁性的影响说明,氧空位浓度与氧化钙薄膜的铁磁性是相关的.     

NiFe2O4外延薄膜的制备及后退火效应研究

本文利用脉冲激光沉积方法制备了NiFe2O4磁性绝缘薄膜.X-射线衍射线性扫描测量表明,在MgO(110)单晶衬底上可以生长出高质量的NiFe2O4外延薄膜,原子力显微镜显示其具有平整的表面形貌.我们还研究了后退火处理对样品结构、表面形貌和磁性的影响.结果表明,后退火后薄膜的结构和表面形貌都发生了明显的改变,样品的磁性得到增强.这些效应可归结为在氧气氛下退火处理导致的氧含量的变化以及退火过程中阳离子分布和价态发生改变.     

氧缺陷导致的结构无序对La_(2/3)Sr_(1/3)MnO_3薄膜电输运特性的影响(英文)

为了澄清结构无序对电输运特性,特别是低温下电阻极小的影响,采用脉冲激光沉积方法在LaAlO3(100)基片上制备了两类La2/3Sr1/3MnO3薄膜.一块是在通40Pa氧气的气氛下沉积,沉积后不再进行通氧气的原位退火.另一块在同样通40Pa氧气的气氛下沉积,但沉积后再在6×104Pa的氧气气氛下进行原位退火.对两种薄膜的结构,磁特性和电输运特性进行了对比研究.结果表明:氧缺陷导致了薄膜结构的无序,更导致了类似自旋玻璃行为的磁无序.电输运特性结果表明原位退火使得薄膜的金属-绝缘体转变温度Tc从约195K提高到335K.对由于结构无序的存在对低温电阻较小行为的影响作了系统对比研究,曲线拟合的结果表明对于缺氧薄膜和进行了原位退火的薄膜的低温电阻较小行为的主要影响因素分别是类近藤散射作用和电子-电子相互作用,这一结果对于澄清庞磁电阻锰氧化物体系的低温电阻极小现象有一定积极意义.     

CdTe多晶薄膜沉积制备及其性能

在氩气和氧气混合气氛下,近空间升华法制备了CdTe多晶薄膜。薄膜的结构、性质决定于整个沉积过程。深入研究沉积过程中的热交换、物质输运,有助于获得结构致密具有良好光电性质的CdTe薄膜。分析了近空问沉积的物理机制,测量了近空间沉积装置内的温度分布,讨论了升温过程、气压与薄膜的初期成核的关系。结果表明,不同气压下制备的样品,均有立方相CdTe。此外,还有CdS和SnO2：F衍射峰。CdTe晶粒随气压增加有减小趋势;随气压的增加,透过率呈下降趋势,相应的CdTe吸收边向短波方向移动。采用衬底温度500℃,源温度620℃,在120℃的温差下,沉积时间4min上制备CdTe多晶薄膜,获得转换效率优良的结构为SnO2：F／CdS／CdTe／Au的集成电池。     

Zn1-xCoxO稀磁半导体薄膜的结构及其磁性研究

利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn_1-xCo_xO (x＝0.01,0.02)稀磁半导体薄膜的结构和磁性.磁性测量结果表明Zn₁-xCo_xO样品都具有室温铁磁性.X射线衍射结果显示其薄膜样品具有结晶良好的纤锌矿结构.荧光X射线吸收精细结构测试结果表明,脉冲激光气相沉积法制备的样品中的Co离子全部进入ZnO晶格中替代了部分Zn的格点位置,生成单一相的Zn_1-xCo_xO 稀磁半导体.通过对X射线吸收近边结构谱的分析,确定Zn_1-xCo_xO薄膜中存在O空位,表明Co离子与O空位的相互作用是诱导Zn_1-xCo_xO产生室温铁磁性的主要原因. 关键词： 1-xCo_xO稀磁半导体')" href="#">Zn_1-xCo_xO稀磁半导体 X射线吸收精细结构谱 脉冲激光气相沉积法     

Al/ZnO/Al薄膜的结构与磁性分析

采用直流磁控溅射的方法制备了Al/ZnO/Al纳米薄膜,并对薄膜分别在真空及空气中进行退火处理.利用X射线衍射仪(XRD)和物理性能测量仪(PPMS)分别对薄膜样品的结构和磁性进行了表征.XRD分析表明,不同的退火氛围对薄膜的微结构有着很大的影响.采用了一种新的修正方法对磁测量结果进行修正,计算了基底拟合误差的最大值,并对修正后样品的磁性进行了分析.结果显示,室温铁磁性可能与Al和ZnO基体之间发生的电荷转移以及在不同退火氛围下Al在ZnO晶格中的地位变化有关. 关键词： Al/ZnO/Al薄膜 铁磁性 磁性表征     

退火氛围对掺杂ZnO薄膜磁性的影响

采用直流磁控反应共溅法制备了非磁性元素Al和磁性元素Co掺杂的ZnO薄膜, 样品原位真空退火后再空气退火处理. 利用X射线衍射仪(XRD) 和物理性能测量仪(PPMS) 对薄膜的结构和磁性进行了表征. XRD和PPMS结果表明, 不同的退火氛围对掺杂薄膜的结构和磁性有着很大的影响. 真空退火的Al掺杂ZnO薄膜没有观察到铁磁性, 而空气退火的样品却显示出明显的室温铁磁性, 铁磁性的来源与空气退火后导致Al和ZnO基体间电荷转移增强有关. 而对于Co掺杂ZnO薄膜, 真空退火后再空气退火, 室温铁磁性明显减弱. 其磁性变化与Co离子和ZnO基体间电荷转移导致磁性增强和间隙Co原子被氧化导致磁性减弱有关.     

FeMn掺杂AlN薄膜的制备及其特性研究

采用直流磁控共溅射技术, 以Ar与N₂为源气体, 硅片为衬底成功地制备了Fe, Mn掺杂AlN薄膜. 利用X射线衍射和拉曼光谱研究了工作电流、靶基距离等工艺参数的改变对薄膜结构的影响. 利用扫描电子显微镜和能谱分析仪对薄膜的表面形貌和组成成分进行了分析. 利用振动样品磁强计在室温下对Fe, Mn掺杂AlN薄膜进行了磁性表征. Mn掺杂AlN薄膜表现出顺磁性的原因可能是由于Mn掺杂浓度较高, 在沉积过程部分Mn以团簇的形式存在, 反铁磁性的Mn团簇减弱了体系的铁磁交换作用. Fe掺杂AlN薄膜表现出室温铁磁性, 这可能是AlFeN三元化合物作用的结果. 随着Fe 掺杂AlN薄膜中Fe原子浓度从6.81%增加到16.17%, 其饱和磁化强度M_s由0.27 emu·cm^-3逐渐下降到0.20 emu·cm^-3, 而矫顽力H_c则由57 Oe增大到115 Oe (1 Oe=79.5775 A/m), 这一现象与Fe离子间距离的缩短及反铁磁耦合作用增强有关. 关键词： 直流磁控共溅射 氮化铝薄膜 结构 磁性     

Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition

ZrO₂ thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on structure and related properties of ZrO₂ thin films were studied. Transmittance, thermal absorption, structure and residual stress of ZrO₂ thin films were measured by spectrophotometer, surface thermal lensing technique (STL), X-ray diffraction and optical interferometer, respectively. The results showed that the structure and related properties varied progressively with the increase of oxygen partial pressure. The refractive indices and the packing densities of the thin films decreased when the oxygen partial pressure increased. The tetragonal phase fraction in the thin films decreased gradually as oxygen partial pressure increased. The residual stress of film deposited at base pressure was high compressive stress, the value decreased with the increase of oxygen partial pressure, and the residual stress became tensile with the further increase of oxygen pressure, which was corresponding to the evolution of packing densities and variation of interplanar distances.     

Effect of oxygen pressure on properties of Bi---Sr---Ca---Cu---O thin films grown by laser deposition

We present the results of a study of the effect of oxygen pressure on the properties of Bi---Sr---Ca---Cu---O (BSCCO) thin films grown by laser ablation. Films of the same phase, which were deposited at different oxygen pressures, show quite different properties. Here, we define the phases of BSCCO films from their c-axis lattice constants calculated from the 2θ X-ray diffraction angle of the 002 peak. In-situ films deposited at high oxygen pressure (≥ 100 mTorr) show higher critical temperatures and critical current densities. However, by post annealing, transport properties of films deposited at low oxygen pressure (several 10 mTorr) are improved significantly. With respect to this difference, the results of X-ray diffraction and energy dispersive X-ray spectroscopy studies, and Hall effect measurements are discussed.     

氧气分压对反应溅射制备TiO2薄膜带隙的影响

在不同的氧气分压下 ,用直流反应磁控溅射法制备了玻璃基TiO2 薄膜试样 ,测试了试样的荧光发射光谱。结果表明 ,氧气分压为 0 35和 0 6 5Pa时 ,荧光光谱在 370 ,4 72和 5 14nm处出现发射峰 ;氧气分压为 0 10和 0 15Pa时 ,发射光谱峰出现在 370和 4 90nm处。试样带隙为 3 35eV。0 35和 0 6 5Pa氧气分压下溅射的试样在带隙中有两个分别低于导带底 0 72和 0 94eV的缺陷能级 ,0 10和 0 15Pa氧气分压下溅射的试样在带隙中有一个位于导带底 0 2 3和 1 2 9eV之间的缺陷能带 ;增加氧气分压 ,缺陷能带转变成两个缺陷能级 ,在 0 6 5Pa氧气分压下 ,缺陷能级几乎消失。     

Development of structural and optical properties of WOx films upon increasing oxygen partial pressure during reactive sputtering

WO_x films were prepared by reactive dc magnetron sputtering using tungsten target. Sputtering was carried out at a total pressure of 1.2 Pa using a mixture of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films. The deposition rate decreases significantly as the surface of the target is oxidized. X-Ray diffraction revealed the amorphous nature of all the films prepared at oxygen partial pressures higher than 1.71×10⁻³ Pa. For higher oxygen partial pressures, fully transparent films were deposited, which showed a slight increase in optical band gap with increasing oxygen partial pressure, while the refractive index was simultaneously decreased.     

Microstructural and optical properties of nanocrystalline undoped zirconia thin films prepared by pulsed laser deposition

The zirconium oxide (ZrO₂) thin films are deposited on Si (100) and quartz substrates at various substrate temperatures (room temperature–973 K) at an optimized oxygen partial pressure of 3×10^?2 mbar using pulsed laser deposition technique. The effect of substrate temperature on microstructural, optical and mechanical properties of the films is investigated. The X-ray diffraction studies show that the films deposited at temperatures ≤773 K are monoclinic, while the films deposited at temperatures ≥873 K show both monoclinic and tetragonal phases. Tetragonal phase content increases with the increase of substrate temperatures. The surface morphology and roughness are investigated using atomic force microscope in contact mode. The optical properties of the films show that the refractive indices (at 550 nm) are found to increase from 1.84 to 2.35 as the temperature raises from room temperature (RT) to 973 K. Nanoindentation measurements show that the hardness of the films is 11.8 and 13.7 GPa for the films deposited at 300 and 973 K, respectively.     

Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films

High-k ZrO₂ thin films suitable for microelectronics applications were deposited by DLI-MOCVD method on planar Si (1 0 0) and pores etched in Si (1 0 0). The effects of various experimental parameters such as temperature of substrates, injection frequency, concentration of the precursor and oxygen partial pressure in the reactive chamber, were investigated in order to produce a single tetragonal ZrO₂ phase which exhibits, according to the literature, the best permittivity.Taking into account the crystal structure, microstructure and chemistry of the films, the expected phase was successfully deposited for high temperature of substrates, relatively high feeding rate and low oxygen partial pressure. Although the 3D coverage is actually not perfect in high aspect ratio pores, the electric properties of this sample are very promising with permittivity up to 27.     

淀积气压对脉冲激光淀积La掺杂钛酸铅薄膜介电性能的影响

利用脉冲激光淀积法在Pt/Ti/SiO2/Si衬底上制备了28mol%La掺杂钛酸铅薄膜.采用不同的淀积氧气压，并分析了其对薄膜微观结构和介电性能的影响.结果表明，在2Pa左右的气压下淀积的薄膜具有好的结晶度和介电系数.在频率为10kHz时28mol%La掺杂钛酸铅薄膜的介电系数达852，并且保持了较低的损耗.同时制备了其他La掺杂浓度的PbTiO3薄膜，发现它们也有类似的特点.对此作了定性解释. 关键词： 脉冲激光淀积 PLT薄膜 气压 介电增强     

Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films

The influence of the oxygen partial pressure on the properties of indium tin oxide films deposited by rf reactive magnetron sputtering has been studied. The oxygen partial pressure was varied from 3.2 × 10⁻⁴ to 1.0 × 10⁻³ mbar. It has been found that the 4 × 10⁻⁴ mbar of oxygen partial pressure is a critical point. When the oxygen partial pressure is lower than 4 × 10⁻⁴ mbar, the deposition rate of the films is high; the films have low transmittance and electrical resistivity; the X-ray diffraction shows that the films have a random orientation and the images of the scanning electron microscopy show that the films surface are smooth without structure. When the pressure is higher than 4 × 10⁻⁴ mbar, the deposition rate is low and does not change as the oxygen partial pressure is further increased; the transmittance and the electrical resistivity are both high; the films show the preferred orientation along the (440) direction; the films surface show a clear structure and as the pressure is increased further, the films become porous. Considering both the factor of transmittance and resistivity, the optimum oxygen partial pressure will be 3.6 × 10⁻⁴ mbar. The films prepared at this pressure have 80% transmittance and 9 × 10⁻⁴ Ω cm resistivity.     

氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响

采用ZYGO MarkⅢ-GPI数字波面干涉仪、NamoScopeⅢa型原子力显微镜对不同氧分压下电子束蒸发方法制备的SiO₂薄膜中的残余应力及表面形貌进行了研究, 结果发现：随着氧分压的增大, 薄膜中的压应力值逐渐减小, 最后变为张应力状态; 同时薄膜的表面粗糙度也随着氧分压的增大而逐渐增大. 另外, 折射率对氧分压也非常敏感, 随着氧分压的增大呈现出了减小的趋势. 这些现象主要是由于氧分压的改变使得SiO₂薄膜结构发生了变化引起的.     

二氧化钒薄膜的低温制备及其性能研究

针对VO₂薄膜在微测辐射热计上的应用，采用射频反应溅射法，在室温下制备氧化钒薄膜；研究了氧分压对薄膜沉积速率、电学性质及成分的影响.通过调节氧分压，先获得成分接近VO₂的非晶化薄膜，再在400℃空气中氧化退火，便可制得高电阻温度系数，低电阻率的VO₂薄膜，电阻温度系数约为-4%/℃，薄膜方块电阻为R_□为100—300kΩ；薄膜在室温下沉积，400℃下退火的制备方法与微机电加工(micro electromechanic 关键词： 二氧化钒 电阻温度系数 氧分压 射频反应溅射法