色散SiO2/TiO2薄膜组成的Fibonacci序列一维光子晶体在可见光波段的传输特性

用特征矩阵法研究了由正常色散SiO₂/TiO₂薄膜组成的Fibonacci序列一维光子晶体在可见光波段的传输特性,并与无色散时的传输特性做了对比。结果表明,随序列项数的增加,相应的前一序列的透射谱中透射率较低的凹带逐渐变成禁带,禁带数增加;初始介质是低折射率的SiO₂薄膜时比高折射率的TiO₂薄膜时各序列的透射谱中的禁带数多,各禁带的宽度和中心波长基本相同;在总厚度一定的条件下,随SiO₂薄膜的厚度增大（TiO₂薄膜的厚度减小）,禁带的宽度减小,禁带的中心波长基本不变;随入射角增大,禁带的中心波长向短波方向移动,禁带宽度变小。在其它相同条件下,无色散时的最宽禁带和最宽禁带的中心波长比有色散时的最宽禁带和最宽禁带的中心波长都有增加。     

溶胶-凝胶TiO2和SiO2光学膜的结构

本文研究了TiO₂和SiO₂溶胶-凝胶光学膜在低温热处理下的组分、形貌特征、光散射特性.AES分析结果表明,在TiO₂膜和SiO₂膜的交界面处,Ti和Si相互扩散,从而证实了在多层膜中,膜层之间、膜层和基底之间有Ti-O-Si(或Si-O-Ti,或Si-O-Si)化学键形成.AES和ESCA分析结果显示溶胶-凝胶膜经过低温处理后C的含量较高,这归结为溶胶—凝胶膜的工艺特点.AFM测试结果显示,溶胶—凝胶TiO₂光学膜的表面形貌具有显著的柱状结构,薄膜表面起伏大约是7.5nm.TiO₂,SiO₂单层膜的表面散射率随着热处理温度的提高而变大,对于不同陈化时间的溶液镀制的膜有不同的表面散率.     

真空沉积法制备InSb纳米颗粒

采用真空沉积的方法在SiO₂基片上制备出了纳米InSb颗粒薄膜.利用原子力显微镜对4片样品表面进行分析,从其表面形貌图和三维图中可以观察到有粒径均匀的纳米InSb颗粒形成并且均匀地分布在SiO₂基片表面.实验表明,通过改变镀膜时间可以得到具有不同颗粒尺寸的InSb纳米颗粒,并且颗粒直径与沉积时间和厚度成正比.     

二氧化硅纳米结构径向呼吸振动的理论研究

运用密度泛函理论的B3LYP方法,在6-31G(d)基组水平上,计算了由Si₂O₂二元环组成的准一维SiO₂纳米链及三元环(3MR)、四元环(4MR)、六元环(6MR)和八元环(8MR)组成的SiO₂纳米管的Raman振动光谱。从Raman光谱发现纳米链和纳米管的径向呼吸振动频率随链或管长的增加而频率移动相反,即分别发生红移和蓝移,但随着链和管趋于无限长频率趋近稳定值;同时,随着直径的增大,振动频率减小。在小尺寸时,由于结构内部的应力影响使频率移动更明显,进一步对键长和键角分析说明,结构应力的作用使频率随尺寸变化发生移动。     

基于TFCALC软件的薄膜偏光分束镜的设计

根据Macnielle薄膜偏光分束镜的设计原理,利用膜系设计软件对偏光分束镜进行优化设计.总结了偏光镜设计时参考波长、入射角以及膜层数随波长的变化规律,给出了LaK₂基底,ZrO₂和SiO₂为高低膜料的薄膜偏光分束镜优化设计方案,为薄膜偏光分束镜的设计和镀膜工艺提供了参考依据.     

紫外波段有机染料DMT掺杂SiO2薄膜的光谱特性

本文采用溶胶凝胶法合成了紫外波段有机染料DMT掺杂SiO₂薄膜和块体材料薄膜中掺杂浓度高达124×10^-2mol/L,块体材料浓度掺至15×10^-3mol/L由于SiO₂“笼”的束缚作用,在荧光光谱中未观察到荧光猝灭现象;由于SiO₂“笼”的极化作用,370nm的发射峰较其在环己烷中发生了34～44nm左右的红移;580～590nm的发射峰的量子效率比370nm的发射峰略高.     

氩离子轰击对四面体非晶碳膜内应力和摩擦系数影响的研究

利用磁过滤真空阴极电弧技术制备了sp³键大于80%的四面体非晶碳(ta-C)薄膜, 通过冷阴极离子源产生keV能量的氩离子轰击ta-C薄膜,研究了氩离子轰击能量对ta-C薄膜结构, 内应力以及耐磨性的影响.通过X射线光电子能谱和原子力显微镜研究了氩离子轰击对薄膜结构 与表面形貌的改性,研究表明,氩离子轰击诱导了ta-C薄膜中sp³键向sp²键的转化, 并且随着氩离子轰击能量的增大,薄膜中sp²键的含量逐渐增多, 薄膜内应力随着氩离子轰击能量的增大逐渐减小.氩离子轰击对薄膜的表面形貌有较大影响, 在薄膜表面形成刻蚀坑,并且改变了薄膜的表面粗糙度,随着氩离子轰击能量的增大, 薄膜的表面粗糙度也会逐渐增大.通过摩擦磨损仪的测试结果,氩离子轰击对薄膜的初始摩擦系数影响较大, 但是对薄膜的稳定摩擦系数影响较小,经过氩离子轰击前后的ta-C薄膜的摩擦系数为0.1左右, 并且具有优异的耐磨性.     

杂质分布设计对钛酸锶钡薄膜结构和性能的影响

用溶胶-凝胶方法在Pt/Ti/SiO₂/Si衬底上制备了Na⁺的不同浓度均匀掺杂和成分梯度掺杂(上梯度)钛酸锶钡(Ba_0.25Sr_0.75TiO₃)薄膜.电性能测试表明随着均匀掺杂浓度的增加，薄膜介电常数和损耗都减小，而漏电流先减小(掺杂浓度小于2.5mol%时)后又逐渐增加.场发射扫描电镜分析表明，均匀掺杂浓度增加到2.5mol%后薄膜表面呈疏松多孔状结构，这可能是导致漏电流又逐渐增大的原因.Na⁺的上梯度掺杂避免了掺杂浓度增加到2.5mol%后薄膜生长过程中出现的孔洞现象，于是薄膜的综合电性能得到了进一步提高.深入、系统地分析了杂质不同分布方式对薄膜结构和性能有不同影响的原因.     

TiO2纳米薄膜微观结构及光学性能研究

用sol-gel法制备了纳米TiO₂薄膜,用原子力显微镜(AFM)观察了薄膜的表面形貌,测量了薄膜的表面粗糙度(RMS)为2.832 nm;用红外光谱(IR)研究了TiO₂薄膜前驱体溶胶的组成; 探讨了TiO₂薄膜的焙烧温度、层数等制备条件对TiO2光催化活性的影响,结果发现在490℃,8层膜的TiO₂活性最高.     

Laser Resistance of Ta2O5/SiO2 and ZrO2/SiO2 Optical Coatings under 2μm Femtosecond Pulsed Irradiation

Ta₂O₅/SiO₂ and ZrO₂/SiO₂ high reflecting (HR) coatings are prepared by ion beam sputtering and electron beam evaporation, respectively. The laser-induced damage thresholds (LIDTs) of these samples are investigated with 2 μm femtosecond pulse lasers (80 fs, 1 kHz). It is found that the Ta₂O₅/SiO₂ HR coating has a higher capability of laser damage resistance than the ZrO₂/SiO₂ HR coating in the 2 μm femtosecond regime. The scanning electron microscope results show that the damage sites of the ZrO₂/SiO₂ HR coating have a relatively porous structure, the loose structure of coatings will provide more sites for water molecules, and the LIDTs of HR coatings will be reduced as a result of the strong water absorption at the wavelength of 2 μm.     

Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition

ZrO₂ thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on structure and related properties of ZrO₂ thin films were studied. Transmittance, thermal absorption, structure and residual stress of ZrO₂ thin films were measured by spectrophotometer, surface thermal lensing technique (STL), X-ray diffraction and optical interferometer, respectively. The results showed that the structure and related properties varied progressively with the increase of oxygen partial pressure. The refractive indices and the packing densities of the thin films decreased when the oxygen partial pressure increased. The tetragonal phase fraction in the thin films decreased gradually as oxygen partial pressure increased. The residual stress of film deposited at base pressure was high compressive stress, the value decreased with the increase of oxygen partial pressure, and the residual stress became tensile with the further increase of oxygen pressure, which was corresponding to the evolution of packing densities and variation of interplanar distances.     

氧分压对ZrO2薄膜激光损伤阈值的影响

 在不同的氧分压下用电子束热蒸发的方法制备了ZrO₂薄膜。分别通过X射线衍射、光学光谱、热透镜技术、抗激光辐照等测试，对所制备样品的微结构、折射率、吸收率及激光损伤阈值进行了测量。实验结果表明，薄膜中晶粒主要是四方相为主的多晶结构，并且随着氧分压的增加，结晶度、折射率以及弱吸收均逐渐降低。薄膜的激光损伤阈值开始随着氧分压增加从18.5J/cm²逐渐增加，氧分压为9×10^-3Pa时达到最大，值为26.7 J/cm²，氧分压再增加时则又降低到17.5 J/cm²。由此可见，氧分压引起的薄膜微结构变化是ZrO₂薄膜激光损伤阈值变化的主要原因。     

Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

Amorphous and polycrystalline zirconium oxide thin films have been deposited by reactive rf magnetron sputtering in a mixed argon/oxygen or pure oxygen atmosphere with no intentional heating of the substrate. The films were characterized by high-resolution transmission electron microscopy (HR-TEM), atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and capacitance versus voltage (C-V) measurements to investigate the variation of structure, surface morphology, thickness of SiO₂-like interfacial layer as well as dielectric characteristics with different oxygen partial pressures. The films deposited at low oxygen partial pressures (less than 15%) are amorphous and dense with a smooth surface. In contrast, the films prepared at an oxygen partial pressure higher than 73% are crystallized with the microstructure changing from the mixture of monoclinic and tetragonal phases to a single monoclinic structure. The film structural transition is believed to be consequences of decrease in the oxygen vacancy concentration in the film and of increase of the energetically neutral particles in the plasma due to an increased oxygen partial pressure. SE measurements showed that significant interfacial SiO₂ growth has taken place above approximately 51%. The best C-V results in terms of relative dielectric constant values are obtained for thin films prepared at an oxygen partial pressure of 15%.     

Development of structural and optical properties of WOx films upon increasing oxygen partial pressure during reactive sputtering

WO_x films were prepared by reactive dc magnetron sputtering using tungsten target. Sputtering was carried out at a total pressure of 1.2 Pa using a mixture of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films. The deposition rate decreases significantly as the surface of the target is oxidized. X-Ray diffraction revealed the amorphous nature of all the films prepared at oxygen partial pressures higher than 1.71×10⁻³ Pa. For higher oxygen partial pressures, fully transparent films were deposited, which showed a slight increase in optical band gap with increasing oxygen partial pressure, while the refractive index was simultaneously decreased.     

Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films

Molybdenum trioxide thin films were prepared by reactive pulsed laser deposition on Corning 7059 glass substrates. The influence of oxygen partial pressure and deposition temperature on the structure, surface morphology and optical properties of these films was studied to understand the growth mechanism of MoO₃ thin films. The films formed at 473 K in an oxygen partial pressure of 100 mTorr exhibited predominantly a (0k0) orientation, corresponding to an orthorhombic layered structure of α-MoO₃. The evaluated optical band gap of the films was 3.24 eV. The crystallite size increased with increase of deposition temperature. The films formed at an oxygen partial pressure of pO₂=100 mTorr and at a deposition temperature greater than 700 K exhibited both (0k0) and (0kl) orientations, representing α-β mixed phases of MoO₃. The films formed at an oxygen partial pressure less than 100 mTorr were found to be sub-stoichiometric with α-β mixed phases. The investigation revealed the growth of polycrystalline and single-phase orthorhombic-layered-structure α-MoO₃ thin films with composition nearly approaching the nominal stoichiometry at moderate substrate temperatures in an oxygen partial pressure of 100 mTorr. Received: 9 April 2001 / Accepted: 6 August 2001 / Published online: 17 October 2001     

沉积速率和氧分压对HfO2薄膜残余应力的影响

采用ZYGO MarkIII-GPI数字波面干涉仪对以K9玻璃为基底的电子束蒸发方法制备的HfO₂薄膜中的残余应力进行了研究,讨论了沉积速率、氧分压这两种工艺参量对HfO₂薄膜残余应力的影响.实验结果表明：在所有的工艺条件下,薄膜的残余应力均为张应力;随着沉积速率的升高,氧分压的减小,薄膜的堆积密度逐渐增大,而残余应力呈减小趋势.同时用X射线衍射技术测量分析了不同工艺条件下HfO₂薄膜的晶体结构,探讨了HfO₂薄膜晶体 关键词： 残余应力 2薄膜')" href="#">HfO₂薄膜 沉积速率 氧分压     

Effect of ambient gas on structural and optical properties of titanium oxynitride films

Titanium oxynitride films have been deposited on glass substrates by reactive RF magnetron sputtering of titanium target. The influence of oxygen partial pressure in N₂ + Ar and N₂ + He mixtures was examined on structural and optical properties of titanium oxynitride films. The prepared samples were characterized by X-ray diffraction, EDS, surface profilometer, AFM and contact angle measurement system. With increase in oxygen partial pressure, the grain size decreases from ∼70 nm to ∼50 nm in N₂ + Ar mixture, while from ∼60 nm to ∼37 nm in N₂ + He mixture. The thickness calculated from optical transmission data and surface profilometer is in good agreement with each other. The deposited samples are hydrophobic by nature and the contact angle was found to decrease with increase in oxygen partial pressure. Samples prepared in oxygen partial pressure ≥5.5% show transmittance of about 97% in the visible region of the spectrum in both N₂ + Ar and N₂ + He mixtures. The atomic mass of the sputtering gas (Ar and He) significantly affects the primary crystallite size, orientation as well as band gap. We were able to relate the better crystallisation of titanium atoms with low partial pressure of oxygen when films are deposited in helium instead of argon due to Penning ionization.     

Investigation on properties of TiO2 thin films deposited at different oxygen pressures

TiO₂ thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO₂ thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO₂ thin films all were amorphous because deposition particles did not possess enough energy to crystallize.     

Structural and luminescent characteristics of pulsed laser deposited Eu3+-doped Y2O3 thin films

Thin films of Eu-doped Y₂O₃ were deposited using the pulsed laser ablation technique on amorphous fused silica substrates. The effect of oxygen partial pressure (pO₂) and substrate temperature on the structural and optical characteristics of the deposited films were investigated. All the deposited films were crystalline, showing preferred orientation along the (111) plane, irrespective of oxygen partial pressure and substrate temperature. The film deposited at 0.005?mbar pO₂ exhibited better crystallinity with minimum FWHM at a substrate temperature of 600°C. All the films deposited at various substrate temperatures and different partial pressure (at 600°C) exhibited a red luminescence peak at 615?nm corresponding to the ⁵D₀–⁷F₁ transition in Eu³⁺. Photoluminescence excitation spectra exhibited two bands, one corresponding to band to band excitation (212?nm) of the host and the other to charge transfer band excitation (245?nm). A microstructure analysis revealed that surface roughness of the as-deposited films increases with increase in oxygen partial pressure.     

氧气分压对TiO2薄膜结构、磁性及输运性质的影响

采用脉冲激光沉积技术在LaAlO_3(100)基片上制备了TiO_2薄膜,研究了氧气分压对薄膜结构、磁性与输运性质的影响.结构测量表明,TiO_2薄膜的结构与沉积过程中的氧气分压有关,氧气分压的增大有利于薄膜向锐钛矿相转变.磁性测量表明,在较高的氧气分压下制备的TiO_2薄膜表现为顺磁性,在较低氧气分压下制备的TiO_2薄膜表现出明显的室温铁磁性,其铁磁性与氧空位有密切关系.输运测量进一步表明,TiO_2薄膜表现为半导体导电特性,在具有铁磁性的薄膜中还观察到了低温磁电阻效应.