淀积气压对脉冲激光淀积La掺杂钛酸铅薄膜介电性能的影响

利用脉冲激光淀积法在Pt/Ti/SiO2/Si衬底上制备了28mol%La掺杂钛酸铅薄膜.采用不同的淀积氧气压，并分析了其对薄膜微观结构和介电性能的影响.结果表明，在2Pa左右的气压下淀积的薄膜具有好的结晶度和介电系数.在频率为10kHz时28mol%La掺杂钛酸铅薄膜的介电系数达852，并且保持了较低的损耗.同时制备了其他La掺杂浓度的PbTiO3薄膜，发现它们也有类似的特点.对此作了定性解释. 关键词： 脉冲激光淀积 PLT薄膜 气压 介电增强

The effect of oxygen pressure on the dielectric properties of pulsed laser deposited La-doped PbTiO3 thin film

Pb0.72La0.28TiO.3(PLT28) thin films have been prepared on Pt/Ti/SiO2/Si substrates by pulsed laser deposition under various oxygen pressu re. Experimental study indicated that the oxygen pressure exerts a strong impact on the microstructure and the dielectric properties of the thin films. The film deposited under an oxygen pressure of 2Pa had a larger dielectric constant an d kept a low dielectric loss. At 10kHz frequency, the dielectric constant was approximately 852 and the dielectric loss was 0.0110 Meanwhile, we found that other La- modified PbTiO3 films have the same relation between dielectric con stant and pressure as the above. Possible explanation is given for this.