电扫描型单缝单丝强流离子束发射度测量仪

 介绍了一台基于电偏转扫描方法的强流离子束发射度仪，讨论了发射度仪硬件的系统构成和设计要点，该发射度仪采用阶梯型电压对通过前缝的束流进行扫描来获得束流散角信息。并对测量计算软件和数据处理方法进行了介绍，采用了先扣除本底，再设置阈值的方法进行数据处理。处理后的数据利用程序可获得均方根和边界发射度、束斑大小、最大正负散角以及发射度相图。利用该发射度仪对ECR离子源引出的强流质子束的发射度进行了测量，并对测量数据进行了分析。对于引出电压为50 kV、脉冲重复频率为166 Hz、脉冲宽度为1 ms、平均束流强度为4 mA的质子脉冲束，其归一化均方根发射度为0.27 pmm·mrad。     

ECR氧离子源及整体分离环RFQ加速器低能输运系统的研制

根据研制分离作用RFQ和升级改造1MeV ISR RFQ的需要,设计了一台ECR 0+离子源及低能输运(LEBT)系统.低能输运系统使用2个静电透镜聚焦柬流,在引出电压22kV时,EBT末端得到6mA以上总脉冲束流、束流归一化均方根发射度为0.127πmm.mrad.束腰可前后移动160mm.     

含氘电极真空弧等离子体空间分布特性诊断研究

真空弧放电等离子体含有多种离子成分,并且各离子在空间上具有不同的分布规律.本文针对金属氘化物电极真空弧离子源,搭建了一台紧凑型磁分析装置,用来研究放电等离子体中氘离子与金属离子的空间分布.当离子源弧流为100 A左右时,该装置能有效地传输引出束流,并且具有较好的二次电子抑制效果,可准确获得各离子流强.利用该装置测量并获得了氘化钛含氘电极真空弧放电等离子体内氘离子和钛离子空间分布规律,结果表明:径向上,氘离子和钛离子都呈高斯分布,但氘离子分布均匀,而钛离子相对集中在轴线附近,导致轴线附近氘离子比例最低;轴向上,所有离子数量都以自然指数函数减少,而且相对幅度接近,所以氘离子比例几乎不变.本文研究结果不仅有助于理解真空弧放电等离子体膨胀过程,还可以指导金属氘化物电极真空弧离子源及其引出设计.     

ECR氧离子源及整体分离环RFQ加速器低能输运系统的研制

根据研制分离作用RFQ和升级改造1MeV ISR RFQ的需要,设计了一台ECR O⁺离子源及低能输运(LEBT)系统. 低能输运系统使用2个静电透镜聚焦束流, 在引出电压22kV时, LEBT末端得到6mA以上总脉冲束流、束流归一化均方根发射度为0.12πmm﹒mrad. 束腰可前后移动160mm.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

电偏转扫描法测量高电荷态ECR源发射度

成功地研制了一套适合于低能离子束流发射度测量的电偏转扫描探测器.对该探测器的原理和结构作了较详细的描述,并给出该探测器对兰州近代物理研究所高电荷态ECR源LECR3引出离子束流发射度的测量结果.典型结果为:在引出高压为15.97kV,引出束流为190μA时,O⁴⁺水平发射度(x方向)为137πmm·mrad,垂直发射度(y方向)为120πmm·mrad(包括90%束流).最后,对测量结果作了一些分析和讨论.     

ECR源低能强流高电荷态离子束四维发射度测量仪的研制

为全面研究ECR（Electron Cyclotron Resonance）离子源引出的高电荷态离子束流品质,获取ECR离子源引出离子束流的横向四维相空间分布,提高向加速器的注入效率,中国科学院近代物理研究所研制了一台高精度Pepper Pot型发射度测量仪PEMiL（Pepper pot Emittance Meter in Lanzhou）。根据使用需求,利用KBr晶体喷涂技术取代传统的CsI闪烁体成像技术,解决了束流光斑重叠效应,获得了边界清晰的束流图像;并开发了相应的数据处理分析程序,以分析处理得到的束流横向四维相空间分布。利用PEMiL获得了75 keV,170 eμA的O5+束流横向四维发射度。分析结果表明:PEMiL测量分析后的束流发射度结果可靠性高,荧光屏电荷累积效应造成的发射度差异不超过25%,PEMiL可作为ECR离子源引出离子束流品质诊断的有效装置。     

负氢潘宁型离子源的束流引出测量

在中国工程物理研究院流体物理研究所自行研制的负氢潘宁型离子源上进行负氢束流引出测量实验,采用单电极、双电极、三电极束流引出测量方法进行初步束流引出测量,束流强度的实验测量结果远远高于空间限制流的理论计算值。因此,提出一种电屏蔽盒的直流束流引出测量方法。阐述了电屏蔽盒直流束流引出测量的基本方法、束流轨迹的CST数值模拟以及束流引出测量实验结果。研究表明:引出电压为2 kV,引出间隙为3 mm,磁感应强度为0.435 T时,得到较为精确的负氢束流引出强度约100 A。通过空间电荷限制流的V3/2定律进行拟合,推算得到引出电压为40 kV时,负氢束流强度约达到4 mA。     

用掩蔽注入法研究钛注入H13钢的耐磨性

采用由金属蒸汽真空弧离子源引出的强束流钛、碳离子对H13钢进行表面改性研究.钛和碳离子注入剂量分别为3×1017和1×1017cm-2,引出电压分别为48和30kV，平均束流密度分别为47和20μA·cm-2.为了保持相同的摩擦磨损实验条件，注 入过程中采用掩蔽注入技术.摩擦磨损实验结果表明，钛离子注入H13钢提高了其耐磨性，并大幅度降低其摩擦系数.利用卢瑟福背散射谱测量了离子注入表面的成分，并采用逐层递推 法得出了钛在H13钢中的浓度深度分布，借助掠面x射线衍射考察了注入表面的相结构. 关键词： 钛离子注入 金属蒸汽真空弧 卢瑟福背散射 掠面x射线衍射     

强电场中的脉冲束流强度测量方法

针对强电场中电场渗透的问题,采用特殊的法拉第筒法测量脉冲束流强度:在法拉第筒入口处用栅网屏蔽强电场,并用在收集板上加正压的方式抑制二次电子。采用解析计算和数值模拟方式对栅网的形状进行了选择,在同样的栅网丝宽和透过率的前提下,通过正六边形栅网的渗透电场最弱,因此选择正六边形栅网。将设计的法拉第筒用于一台真空弧离子源的束流强度测量,获得了该离子源的束流强度波形,其峰值流强约为550 mA;利用测量结果计算了混合离子束在Cu收集板上的二次电子发射系数,约为2.0。     

Low energy ion beams by laser interaction

We developed an ion accelerator with a double accelerating gap system supplied by two power generators of different polarity. The ions were generated by laser ion source technique. The laser plasma induced by an excimer KrF laser, freely expanded before the action of accelerating fields. After the first gap action, the ions were again accelerated by a second gap. The total acceleration can imprint a maximum ion energy up to 160 keV per charge state. We analysed the extracted charge from a Cu target as a function of the accelerating voltage at laser energy of 9, 11 and 17 mJ deposited on a spot of 0.005 cm². The peak of current density was 3.9 and 5.3 mA for the lower and medium laser energy at 60 kV. At the highest laser energy, the maximum output current was 11.7 mA with an accelerating voltage of 50 kV. The maximum ion dose was estimated to be 10¹² ions/cm². Under the condition of 60 kV accelerating voltage and 5.3 mA output current the normalized emittance of the beam measured by pepper pot method was 0.22 π mm mrad.     

基于平行玻璃板的半导体激光器阵列光束整形

为得到质量均衡的大功率激光束,分别以条形和面阵半导体激光器为模型,基于平行玻璃板对光束的偏移作用,对准直后激光束进行分割和重排,并在Zemax软件中进行了仿真。条形半导体激光器初始发散角为40和10,整形前已准直光束快慢轴方向的光参数积分别为0.455 2 mmmrad和20.484 mmmrad,光束质量相差较大,整形后快慢轴方向光参数积分别为2.731 2 mmmrad和3.414 0 mmmrad,实现了快慢轴方向光束质量均衡。利用平行玻璃板消除面阵半导体激光器中存在的发光死区,整形后快慢轴方向光参数积分别为7.002 mmmrad和10.242 mmmrad ,整形系统耦合效率为90.13%。     

激光驱动的光阴极研究

论述激光驱动的光阴极实验研究。包括直流高压真空试验系统，测试装置和实验结果及其分析讨论。ＬａＢ６、纯金属铜（Ｃｕ）和钐（Ｓｍ）以及半导体碲化铯（Ｃｓ２Ｔｅ）三类有代表性光阴极的量子效率分别是６×１０－４、３．８×１０－４、１１．６×１０－４和（２～６）×１０－２。利用ＫｒＦ激光，１８ｋＶ极间电压下饱和电流密度分别为７０Ａ／ｃｍ２、５０Ａ／ｃｍ２、１０２Ａ／ｃｍ２和５７Ａ／ｃｍ２。用多孔板法测得的归一化发射度约１０πｍｍ·ｍｒａｄ。     

电子束亮度及多孔板法测量发射度的原理

本文探讨了利用多孔板法测量四维横向相空间中均匀分布以及高斯分布的电子束发射度的测量原理。结果表明,对于四维均匀分布的电子束,该法测量的是电子束的边发射度,并且光斑尺寸随着小孔位置不同而变化;对于高斯分布的电子束,该法测量的是电子束的均方根发射度,其光斑尺寸与小孔位置无关。     

Emittance measurement & optimization for the photocathode RF gun with laser profile shaping

The Laser Undulator Compact X-ray source(LUCX) is a test bench for a compact high brightness X-ray generator,based on inverse Compton Scattering at KEK,which requires high intensity multi-bunch trains with low transverse emittance.A photocathode RF gun with emittance compensation solenoid is used as an electron source.Much endeavor has been made to increase the beam intensity in the multi-bunch trains.The cavity of the RF gun is tuned into an unbalanced field in order to reduce space charge effects,so that the field gradient on the cathode surface is relatively higher when the forward RF power into gun cavity is not high enough.A laser profile shaper is employed to convert the driving laser profile from Gaussian into uniform.In this research we seek to find the optimized operational conditions for the decrease of the transverse emittance.With the uniform driving laser and the unbalanced RF gun,the RMS transverse emittance of a 1 nC bunch has been improved effectively from 5.46 πmm.mrad to 3.66 πmm.mrad.     

一台14GHzCAPRICE型ECR离子源的束流引出

An ion beam extracted from an ECRIS suffers from the inhomogeneous distribution of cold electrons within the minimum B configuration,necessary to confine the plasma.Especially for higher ion currents,the space charge force is not negligible any more,and because of the nonlinear force,emittance growth will occur. Measurements of the profile and the emittance of the beam directly behind the source show the complicated correlation between extraction voltage and plasma density.The emittance has been measured with a pepper pot device to account for the inhomogeneous azimuthal distribution of the beam.These results indicate that further information about the profile is required.To visualize the beam profile a tantalum foil with a thickness of 20μm has been used for an electrical beam power between 10 and 50W.Looking on the back side of the foil with a CCD camera it is possible to record the profile in real time.As a more sensitive diagnostic tool viewing targets made from BaF has been used. Three dimensional computer simulations have been used to identify the reason for the structures,observed in measurements.     

Plasma parameter diagnosis using hydrogen emission spectra of a quartz-chamber 2.45 GHz ECRIS at Peking University

A quartz-chamber 2.45 GHz electron cyclotron resonance ion source(ECRIS) was designed for diagnostic purposes at Peking University [Patent Number: ZL 201110026605.4]. This ion source can produce a maximum 84 m A hydrogen ion beam at 50 k V with a duty factor of 10%. The root-mean-square(RMS) emittance of this beam is less than 0.12π mm mrad. In our initial work,the electron temperature and electron density inside the plasma chamber had been measured with the line intensity ratio of noble gases. Based on these results, the atomic and molecular emission spectra of hydrogen were applied to determine the dissociation degree of hydrogen and the vibrational temperature of hydrogen molecules in the ground state, respectively. Measurements were performed at gas pressures from 4×10~(-4) to 1×10~(-3) Pa and at input peak RF power ranging from 1000 to 1800 W. The dissociation degree of hydrogen in the range of 0.5%-10% and the vibrational temperature of hydrogen molecules in the ground state in the range of 3500-8500 K were obtained. The plasma processes inside this ECRIS chamber were discussed based on these results.