全内反射显微技术探测亚表面缺陷新方法研究

亚表面缺陷的检测和去除对于提高光学元件的激光损伤阈值至关重要。结合全内反射显微技术和数字图像处理技术获得光学元件亚表面缺陷信息的新方法,利用显微镜系统的有限焦深,对亚表面缺陷沿深度方向扫描,可以获得不同离焦量下的散射图像,通过数字图像处理技术,建立缺陷散射图像清晰度评价值与离焦量的关系,通过清晰度曲线得到亚表面缺陷的深度位置及深度尺寸。模拟全内反射显微平台的成像过程,讨论微调焦过程中全内反射显微成像的特点。缺陷深度位置及深度尺寸的测量精度主要由载物台精密调焦机构的精度以及显微镜的焦深决定,一般可达微米量级。利用飞秒激光加工技术制备尺寸和位置已知的微结构,使用该方法准确获得了微结构信息,验证了该方法的有效性。     

全内反射荧光显微术

全内反射荧光显微技术是当今世界上最具前途的新型生物光学显微技术之一 ,可以用来实现对单个荧光分子的直接探测。它利用全内反射产生的隐失波照明样品 ,使照明区域限定在样品表面的一薄层范围内 ,因此具有其它光学成像技术无法比拟的高的信噪比和对比度。近年来 ,已被生物物理学家们广泛应用于单分子的荧光成像中。本文系统的介绍了全内反射荧光显微技术的原理、国内外的发展和现状及其在生物学上的应用 ,并对其未来做了展望。     

全内反射荧光显微术

全内反射荧光显微技术是当今世界上最具前途的新型生物光学显微技术之一，可以用来实现对单个荧光分子的直接探测。它利用全内反射产生的隐失波照明样品，使照明区域限定在样品表面的一薄层范围内，因此具有其它光学成像技术无法比拟的高的信噪比和对比度。近上来，已被生物物理学家们广泛应用于单分子的荧光成像中。本文系统的介绍了全内反射荧光显微技术的原理。国内外的发展和现状及其在生物学上的应用，并对其未来做了展望。     

抛光表面的亚表层损伤检测方法研究

光学元件磨削加工引入的亚表面损伤威胁着光学元件的使用性能及寿命,成为现阶段高能激光发展的瓶颈问题,特别是抛光表面光学元件的亚表面损伤检测已成为光学元件制造行业的研究热点和难点.本文结合光学共聚焦成像、层析技术、显微光学、光学散射以及微弱信号处理等技术,给出了基于光学共焦层析显微成像的光学元件亚表面损伤检测方法.分析了不同针孔大小对测量准确度的影响,并首次给出了亚表面损伤的纵向截面分布图.与腐蚀法比较结果显示:针对自行加工的同一片K9玻璃,采用本文提出的方法测得的亚表面损伤深度45 μm左右;采用化学腐蚀处理技术,对光学元件逐层刻蚀,观察得到的亚表面损伤深度50~55 μm.两者基本一致,进一步验证了本文采用的方法可以实现对光学元件亚表面损伤的定量、非破坏检测.     

基于微米SDOCT的玻璃亚表面缺陷散射系数测量

用搭建的微米谱域光学相干层析(SDOCT)系统对玻璃亚表面缺陷进行了深度分辨率、非接触、非破坏性测量,并用建立的单次散射模型对得到的断层图像进行计算,得到玻璃亚表面缺陷的散射系数。实验结果表明,利用散射系数可以有效区分玻璃亚表面不同深度的损伤结构。玻璃亚表面散射系数的深度分辨率测量有利于对玻璃亚表面缺陷光学特性的分析,对于精密光学元件的加工和检测具有重要意义。     

基于过焦扫描光学显微镜的光学元件亚表面缺陷检测方法

微/纳米尺度亚表面缺陷会降低光学元件等透明样品的物理特性,严重影响光学及半导体领域加工制造技术的发展。为了快速、无损检测透明样品亚表面缺陷,本文针对光学元件亚表面内微米量级缺陷的检测需求,提出了一种基于过焦扫描光学显微镜（TSOM）的检测方法。利用可见光光源显微镜和精密位移台,沿光轴对亚表面缺陷进行扫描,得到亚表面缺陷的一系列光学图像。将采集到的图像按照空间位置进行堆叠,生成TSOM图像。通过获得所测特征的最大灰度值来获得亚表面缺陷的定位信息。提出方法对2000μm深亚表面缺陷的定位相对标准差达到0.12%。该研究为透明样品亚表面缺陷检测及其深度定位提供了一种新方法。     

低亚表面损伤石英光学基底的加工和检测技术

制备低亚表面损伤的超光滑光学基底,是获得高损伤阈值薄膜的前提条件。针对石英材料在不同加工工序中引入亚表面损伤层的差异,首先利用共焦显微成像结合光散射的层析扫描技术,对W10和W5牌号SiC磨料研磨后的亚表面缺陷进行了检测,讨论了缺陷尺寸与散射信号强度、磨料粒径与损伤层深度间的对应关系;同时,采用化学腐蚀处理技术对抛光后样品的亚表面形貌进行了刻蚀研究,分析了化学反应生成物和亚表面缺陷对刻蚀速率的影响、不同深度下亚表面缺陷的分布特征,以及均方根粗糙度与刻蚀深度间的联系。根据各道加工工艺的不同采用了相应的亚表面检测技术,由此来确定下一道加工工序,合理的去除深度,最终获得了极低亚表面损伤的超光滑光学基底。     

光学元件亚表面缺陷的损伤性检测方法

在磨削、研磨和抛光加工过程中产生的微裂纹、划痕、残余应力等亚表面缺陷会导致熔石英元件抗激光损伤能力下降,如何快速、准确地检测亚表面损伤成为光学领域亟待解决的关键问题。采用HF酸蚀刻法、角度抛光法和磁流变斜面抛光法对熔石英元件在研磨加工中产生的亚表面缺陷形貌特征及损伤深度进行了检测和对比分析,结果表明,不同检测方法得到的亚表层损伤深度的检测结果存在一定差异,HF酸蚀刻法检测得到的亚表面损伤深度要比角度抛光法和磁流变斜面抛光法检测结果大一些。且采用的磨粒粒径越大,试件表面及亚表面的脆性断裂现象越严重,亚表面缺陷层深度越大。     

光学元件亚表面缺陷结构的蚀刻消除

 针对强激光光学元件的应用要求，对光学材料在研磨和抛光过程中形成的亚表面缺陷进行了分析，并借鉴小工具数控抛光和Marangoni界面效应，提出采用数控化学刻蚀技术来实现光学表面面形和微结构形貌的高精度加工，对亚表面缺陷具有很好的克服和消除作用。通过实验对亚表面缺陷的分布位置和特性进行了分析，同时实验验证了在静止和移动条件下Marangoni界面效应的存在，对材料的定量去除进行了实验，提出了亚表面缺陷的去除方法。     

减少光学元件亚表面缺陷的方法研究

针对强激光光学元件的应用要求,对光学材料在研磨和抛光过程中形成的亚表面缺陷进行了分析,并借鉴小工具数控抛光和Marangoni界面效应,提出采用数控化学刻蚀技术来实现光学表面面形和微结构形貌的高准确度加工．通过实验对亚表面缺陷的分布位置和特性进行了分析,实验验证了在静止和移动条件下Marangoni界面效应的存在．对材料的定量去除进行了实验,提出了亚表面缺陷的去除方法．     

Observation of a modulation effect caused by a microsphere resonator strongly coupled to a dielectric substrate

The effect of modulation caused by a microsphere resonator is experimentally investigated with a model system consisting of a microsphere resonator and a plane substrate. We used total internal reflection microscopy (TIRM), which is a combination of conventional optical microscopy and the total internal reflection method, and observed the intensity distribution under the resonator in the evanescent-wave incidence condition. The TIRM patterns drastically change when the wavelength of the incident beam is scanned across a resonance. The response of the system is discussed on the basis of a recent proposal of traveling-wave resonance.     

Structured illumination in total internal reflection fluorescence microscopy using a spatial light modulator

In wide-field fluorescence microscopy, illuminating the specimen with evanescent standing waves increases lateral resolution more than twofold. We report a versatile setup for standing-wave illumination in total internal reflection fluorescence microscopy. An adjustable diffraction grating written on a phase-only spatial light modulator controls the illumination field. Selecting appropriate diffraction orders and displaying a sheared (tilted) diffraction grating allows one to tune the penetration depth in very fine steps. The setup achieves 91 nm lateral resolution for green emission.     

Shear-affected depletion interaction

We investigate the influence of flow fields on the strength of the depletion interaction caused by disc-shaped depletants. At low mass concentration of discs, it is possible to continuously decrease the depth of the depletion potential by increasing the applied shear rate until the depletion force is not perceivable experimentally. Above a threshold in the platelet mass concentration, the depletion potential can no longer be affected by flow in the accessible range of shear rates. While the observed decrease of depletion strength at low depletant concentration may be ascribed to flow alignment of the discs, it is not clear why the influence of flow is vanishing at high concentrations. In order to observe these effects, a modification of the established total internal reflexion microscopy (TIRM) technique is be implemented. We show the suitability of these modifications to measure particle-wall interaction potentials under non-equilibrium conditions for systems where particles are exposed to a shear.     

Subsurface damage in optical substrates

The origin, character, analysis and treatment of subsurface damage (SSD) were summarized in this paper. SSD, which was introduced to substrates by manufacture processes, may bring about the decrease of laser-induced damage threshold (LIDT) of substrates and thin films. Nondestructive evaluation (NDE) methods for the measurement of SSD were used extensively because of their conveniences and reliabilities. The principle, experimental setup and some other technological details were given for total internal reflection microscopy (TIRM), high-frequency scanning acoustic microscopy (HFSAM) and laser-modulated scattering (LMS). However, the spatial resolution, probing depth and theoretic models of these NDE methods demanded further studies. Furthermore, effective surface treatments for minimizing or eliminating SSD were also presented in this paper. Both advantages and disadvantages of ion beam etching (IBE) and magnetorheological finishing (MRF) were discussed. Finally, the key problems and research directions of SSD were summarized.     

Imaging subsurface reflection phase with quantized electrons

Lead quantum wells (QW) epitaxially grown on annealed Pb/Si(111) interface form a model system for the study of interactions between quantized electrons and adiabatically modulated boundaries. Tunnel spectra of this system reveal a previously unknown adiabatic shift of QW resonances due to lateral variations of the electronic reflection phase at the buried interface. With this effect, lateral distribution of the subsurface reflection phase can be probed, using scanning tunneling microscopy.     

熔石英亚表面缺陷附近光强分布的数值模拟

 熔石英亚表面缺陷对光场的调制是导致激光辐照场破坏的主要因素。采用有限元方法对熔石英亚表面缺陷（平面和锥形划痕）周围的光强分布进行了数值模拟。结果表明：划痕形状、几何尺寸、方位角、光的入射角等是影响划痕周围光强分布的主要因素;前表面划痕对光强的增强效果比后表面弱;在理想形状的划痕截面和表面同时发生内全反射时,平面划痕周围的光强增强效果明显。锥形划痕周围的光强分布为正确解释交叉划痕的夹角平分线附近的损伤提供了理论依据。     

Heterodyne holographic microscopy of gold particles

We report experimental results on heterodyne holographic microscopy of subwavelength-size gold particles. The apparatus uses continuous green-laser illumination of the metal beads in a total internal reflection configuration for dark-field operation. Detection of the scattered light at the illumination wavelength on a charge-coupled-device array detector enables 3D localization of brownian particles in water.     

光学元件损伤在线检测图像处理技术

针对光学元件损伤图像中损伤区域的高精度检测问题,对内全反射照明下光学元件损伤图像的处理技术进行了研究。根据在线检测图像中损伤区域中心峰值的信号强度高于局部背景的信号强度这一特点,利用高斯滤波器生成待检测图像的局部信号强度比图像,实现了对损伤区域的低漏检率自动定位;根据CCD的成像原理,利用辐射标定的方法建立起损伤区域的尺寸与其在图像中总灰度的关系方程,实现了损伤区域的亚像素高精度尺寸测量。实验结果表明,与传统的光学元件损伤图像处理算法相比,本文提出的算法在保持低漏检率的同时大大提高了损伤区域的测量精度。     

Transformation of intensity fluctuations in nonlinear reflection of light

The transformation of intensity fluctuations accompanying the nonlinear resonance reflection of light from a glass-resonant gas interface is discussed. The illumination of the interface at angles close to the critical angle for total internal reflection is found to have certain advantages over orthogonal incidence. At the maximum of the strongest resonance, the reflected light intensity amounts to more than 50% of the incident light. In these conditions, a squeezing of the amplitude (photon) fluctuations is observed in the radiation generated by a semiconductor laser-nonlinear selective reflector system. A simple semiclassical theory adequately describes some important characteristics of this system: the shape of the reflection resonances, the strength of the saturation fields, and so on.