Coupled THz Waveguide Utilizing Surface Plasmon Polaritons on Thin Dielectric Slab Sandwiched between Two Corrugated Metallic Claddings

We present a comprehensive experimental study of terahertz （THz） wave propagation utilizing surface plasmon polaritons （SPPs） on the interfaces of a thin dielectric core layer sandwiched between two corrugated metallic claddings. THz wave impinges on the structured surfaces at normal incidence. Long-lasting oscillation propagation features are observed in the temporal waveform after traveling through the periodic arrays. The enhanced THz transmission can be achieved due to the coupling between incident waves to SPPs at the bottom and top interfaces. The finite element method is used to simulate the field distribution and the transmission mode in the waveguide. The hybrid waveguide with low absorption has great potential applications in THz integrated devices.     

溶胶-凝胶SiO2薄膜氨热两步后处理

 以正硅酸乙酯为前驱体,氨水作催化剂,采用溶胶-凝胶法提拉镀制SiO₂双面膜,对薄膜进行氨处理和热处理。采用椭偏仪、分光光度计、红外光谱、扫描探针显微镜、静滴接触角测量仪表征薄膜的特性。研究表明：经氨热两步后处理,膜厚持续减小,折射率经氨处理先增大了0.236,再经热处理又减小了0.202,膜层透光性变好,透过率峰值持续向短波方向移动;经两步后处理的膜面平整度明显变好,与水的接触角先增大到58.92°后减小到38.07°。     

熔石英亚表面缺陷附近光强分布的数值模拟

 熔石英亚表面缺陷对光场的调制是导致激光辐照场破坏的主要因素。采用有限元方法对熔石英亚表面缺陷（平面和锥形划痕）周围的光强分布进行了数值模拟。结果表明：划痕形状、几何尺寸、方位角、光的入射角等是影响划痕周围光强分布的主要因素;前表面划痕对光强的增强效果比后表面弱;在理想形状的划痕截面和表面同时发生内全反射时,平面划痕周围的光强增强效果明显。锥形划痕周围的光强分布为正确解释交叉划痕的夹角平分线附近的损伤提供了理论依据。     

First-principles study of disordering tendencies in Gd2B2O7（B=Ti,Sn,Zr） compounds

This paper performs the density functional theory calculations to obtain some factors influencing the response of pyrochlores Gd2B2O7(B = Ti,Sn,Zr) to ion irradiation-induced amorphization.The 48f oxygen position parameter x,cohesive energy,bond type and defect-formation energy are discussed.The results show that parameter x can be used to indicate the disordering tendencies within a given pyrochlore family.Bond type,cohesive energy and defect-formation energies can be used to explain some experimental observations,but they are not determined exclusively by radiation "resistance" for a different pyrochlore family.     

溶胶-凝胶SiO2酸性膜与碱性膜的激光损伤行为

 采用溶胶-凝胶技术分别在K9基片上镀制了光学厚度相近的单层SiO₂酸性膜和碱性膜。测试了两类薄膜的激光损伤阈值;分别采用透射式光热透镜技术、椭偏仪、原子力显微镜、扫描电镜和光学显微镜研究了两类薄膜的热吸收、孔隙率、微观表面形貌、激光辐照前薄膜的杂质和缺陷状况以及激光辐照后薄膜的损伤形貌。实验结果表明：相对于碱性膜,酸性膜有更大的热吸收和更小的孔隙率,因此其激光损伤阈值较小;两类薄膜不同的损伤形貌与薄膜的热吸收系数与微观结构有关。     

Double Wire-Grid Terahertz Polarizer on Low-Loss Polymer Substrates

A double-wire-grid polarizer was fabricated on both sides of a low-loss polythene film by simple electroplating and photolithographic micro-processing techniques. The performances of the polarizer were measured using a terahertz time-domain spectrometer （THz-TDS）. The transmittance is more than 70% and below 2% in the parallel and perpendicular directions of the polarizer, respectively. The extinction ratio is better than 22 dB in the broad frequency range of 0.5–3 THz, which is higher than the conventional free-standing polarizer in the high frequency region.     

物理法和化学法制备的单层ZrO2膜的激光损伤行为差异

 分别采用电子束热蒸发技术和溶胶-凝胶技术在K9基片上镀制了光学厚度相近的ZrO₂单层薄膜,测试了两类薄膜的激光损伤阈值。分别采用透射式光热透镜技术、椭偏仪、原子力显微镜和光学显微镜研究了两类薄膜的热吸收、孔隙率、微观表面形貌、激光辐照前薄膜的杂质和缺陷状况以及激光辐照后薄膜的损伤形貌。实验结果表明：两类薄膜的不同损伤形貌与薄膜的热吸收与微观结构有关， 物理法制备的ZrO₂膜结构致密紧凑，膜层的杂质和缺陷多；化学法制备的ZrO₂膜结构疏松多孔，膜层纯净杂质少，激光损伤阈值达26.9 J/cm²；因物理法制备的ZrO₂膜拥有更大的热吸收(115.10×10^-6)和更小的孔隙率(0.20)，其激光损伤阈值较小(18.8 J/cm²)，损伤主要为溅射和应力破坏，而化学法制备的ZrO₂膜的损伤主要为剥层。理论上对实验结果进行了解释。     

熔石英亚表面划痕激光诱导损伤阈值实验研究

 用原子力显微镜和光学显微镜观测酸蚀后熔石英亚表面划痕，并根据形貌特征将其分为Boussinesq-point-force crack(BPFC)、Hertzian-conical scratch(HCS)和Plastic indent(PI)三类，测试了各类划痕的损伤阈值，讨论了激光损伤机制。结果表明锐度较大的BPFC损伤阈值不超过2.0 J/cm<>2；深度小于1 μm的 HCS阈值可达2.6 J/cm²；形变较大的PI阈值至2.8 J/cm2，形变较小的PI的激光损伤阈值与无缺陷材料相当。BPFC 和深度超过1 μm的HCS是导致熔石英损伤阈值低的主要因素。     

酸蚀深度对熔石英三倍频激光损伤阈值的影响

 采用干涉仪和台阶仪测试蚀刻深度随时间的变化,结合材料去除速率测量,研究了HF酸蚀液对熔石英表面蚀刻的影响。测试了蚀刻后损伤阈值和表面粗糙度的变化。研究表明,熔石英表面重沉积层厚度约16 nm,亚表面缺陷层大于106 nm;重沉积层去除后损伤阈值增大,随亚表面缺陷层暴露其阈值先降低后又增加,最后趋于稳定;然而,随蚀刻时间的增加,其表面粗糙度增大。分析表明,蚀刻到200 nm能有效地提高熔石英的低损伤阈值,有利于降低初始损伤点数量和提高熔石英表面的机械强度。     

1.064 μm脉冲激光作用下SiO2薄膜纹波损伤的模拟

 用1.064 μm波长的单脉冲(6 ns)激光对K9玻璃基底上电子束沉积的单层SiO₂薄膜进行了辐照损伤实验。以扫描电镜对K9基底的断面进行分析,并采用表面热透镜装置对膜层中的缺陷进行了检测,最后采用Matlab偏微分工具箱对缺陷的散射光光场进行了有限元模拟。实验研究表明：膜层中存在缺陷,基底中也存在大量缺陷。模拟研究表明：缺陷的位置越深,形成的条纹间距也越宽;当缺陷的形状不规则时,在局部出现近似平行的纹波结构;当缺陷的数目增加时,这些缺陷的散射光的叠加就形成相互叠加的条纹。