基于ITO/聚甲基丙烯酸甲酯/Al的有机阻变存储器SPICE仿真

探索了ITO/PMMA/Al器件的阻变机理及其SPICE电路仿真, 通过优化聚甲基丙烯酸甲酯(PMMA)层退火温度, 器件可实现连续擦-读-写-读操作. 基于不同退火温度PMMA薄膜的表面形貌研究, 构建了单层有机阻变器件的非线性电荷漂移模型, 以及描述该模型掺杂区界面移动的状态方程, 并通过反馈控制积分器建立了SPICE仿真电路. 最后, 代入器件实际测量参数, 得到与器件实际结果基本一致的电流-电压模拟曲线. 结果验证了单层有机器件的阻变机理, 说明该非线性电荷漂移模型的SPICE仿真在有机阻变器件仿真中同样适用. 关键词： 有机阻变存储器 非线性电荷漂移 SPICE仿真     

电荷耦合器件的γ辐照剂量率效应研究

对电荷耦合器件进行了不同剂量率的γ辐照实验,通过多种参数的测试探讨了剂量率与电荷耦合器件性能退化的关系,并对损伤的物理机理进行分析。辐照和退火结果表明:暗信号和暗信号非均匀性是γ辐照的敏感参数,电荷转移效率和饱和输出电压随剂量累积有缓慢下降的趋势;暗场像素灰度值整体抬升,像元之间的差异显著增加;电荷耦合器件的暗信号增量与剂量率呈负相关性,器件存在潜在的低剂量率损伤增强效应。分析认为,剂量率效应是由界面态和氧化物陷阱电荷竞争导致的。通过电子-空穴对复合模型、质子输运模型和界面态形成对机理进行了解释。     

Plasma immersion ion implantation with dielectric substrates

Plasma immersion ion implantation (PIII) is a novel implantation technique for high-dose/high-current implants. Using the SPICE circuit simulator to model the PIII process, the sheath voltage and ion energy distribution are examined. Implanting into a dielectric substrate results in a significant voltage buildup in the wafer, reducing the effective implant energy. Increasing the pulse voltage raises the dose/pulse, but at the cost of an expanded implant energy spread. Increasing the plasma ion density also raises the dose/pulse, but at the cost of a wider implant energy spread and a lower coupling efficiency. Increasing the substrate thickness reduces both the coupling efficiency and dose/pulse while broadening the energy spread. The large voltage generated across the dielectric substrate decreases the charge neutralization time significantly, reducing the possibility of gate oxide damage     

Highly sensitive polymer photodetectors with a wide spectral response range

A series of highly sensitive polymer photodetectors(PPDs) was fabricated with P3HT100-x:PBDT-TS1x:PC71BM1 as the active layers, where x represents the PBDT-TS1 doping weight ratio in donors. The response range of PPDs can cover from the UV to near-infrared regions by adjusting the PBDT-TS1 doping weight ratio. The best external quantum efficiency(EQE) values of ternary PPDs with P3HT:PBDT-TS1:PC_(71)BM(50:50:1 wt/wt/wt) as the active layers reach 830%, 720%,and 330% under 390-, 625-, and 760-nm light illumination and-10 V bias, respectively. The large EQE values indicate that the photodetectors utilise photomultiplication(PM). The working mechanism of PM-type PPDs can be attributed to interfacial trap-assisted hole tunnelling injection from the external circuit under light illumination. The calculated optical field and photogenerated electron volume density in the active layers can well explain the EQE spectral shape as a function of the PBDT-TS1 doping weight ratio in donors.     

公共格栅像素CdZnTe探测器的能谱特性

使用同一块CdZnTe晶体设计制作了像素大小不等的4×4公共格栅像素CdZnTe探测器。通过能谱测定实验及权重势和电场仿真,研究了公共格栅像素CdZnTe探测器中的小像素效应和引导效应。结果表明:由于小像素效应较弱,较大的像素不能有效消除"空穴拖尾",能谱特性较差;由于晶体内部以及像素和公共格栅间隙表层的电荷损失,较小的像素能谱特性也较差。在像素宽度为0.8 mm时,得到了对662keV的137Cs放射源的最佳能量分辨率3.80%和峰谷比5.65。适当增大公共格栅偏压可以引导电子向阳极像素运动,促进电荷的完全收集,改善探测器的能谱特性。过大的偏压则会造成像素和公共格栅间表面漏电流的增加,探测器的能谱特性也会恶化。在像素宽度为0.8mm时最佳偏压为-60V。     

电荷失配对SiC半超结垂直双扩散金属氧化物半导体场效应管击穿电压的影响

Si C半超结垂直双扩散金属氧化物半导体场效应管(VDMOSFET)相对于常规VDMOSFET在相同导通电阻下具有更大击穿电压.在N型外延层上进行离子注入形成半超结结构中的P柱是制造Si C半超结VDMOSFET的关键工艺.本文通过二维数值仿真研究了离子注入导致的电荷失配对4H-Si C超结和半超结VDMOSFET击穿电压的影响,在电荷失配程度为30%时出现半超结VDMOSFET的最大击穿电压.在本文的器件参数下,P柱浓度偏差导致击穿电压降低15%时,半超结VDMOSFET柱区浓度偏差范围相对于超结VDMOSFET可提高69.5%,这意味着半超结VDMOSFET对柱区离子注入的控制要求更低,工艺制造难度更低.     

Low specific on-resistance GaN-based vertical heterostructure field effect transistors with nonuniform doping superjunctions

A novel Ga N-based vertical heterostructure field effect transistor(HFET) with nonuniform doping superjunctions(non-SJ HFET) is proposed and studied by Silvaco-ATLAS,for minimizing the specific on-resistance(R_(on)A) at no expense of breakdown voltage(BV).The feature of non-SJ HFET lies in the nonuniform doping concentration from top to bottom in the n-and p-pillars,which is different from that of the conventional Ga N-based vertical HFET with uniform doping superjunctions(un-SJ HFET).A physically intrinsic mechanism for the nonuniform doping superjunction(non-SJ) to further reduce R_(on)A at no expense of BV is investigated and revealed in detail.The design,related to the structure parameters of non-SJ,is optimized to minimize the R_(on)A on the basis of the same BV as that of un-SJ HFET.Optimized simulation results show that the reduction in R_(on)A depends on the doping concentrations and thickness values of the light and heavy doping parts in non-SJ.The maximum reduction of more than 51% in R_(on)A could be achieved with a BV of 1890 V.These results could demonstrate the superiority of non-SJ HFET in minimizing R_(on)A and provide a useful reference for further developing the Ga N-based vertical HFETs.     

全三维电离粒子有源像素探测器优化仿真

提出了一种双外延高能离子注入的单片集成有源像素探测器的传感器结构,以提升传感器对电荷的收集性能和辐射加固,并进行了三维工艺模拟和物理级器件仿真计算.研究结果表明,所提出的传感器结构改善了内部电场和电势的分布,且目标电极的电荷收集效率提高70%,电荷收集时间减少64%.此外,当等效中子辐射流通量在1012—1015cm-2范围内时,所提出的传感器结构比标准传感器结构有更高的电荷收集能力.     

液电脉冲激波特性分析

基于相应的数学模型来表征液电脉冲激波的产生和传播过程,搭建了液电式碎岩综合试验平台,分析了典型的激波特性的仿真和实测结果。给出了不同充电电压下液电脉冲激波特性的仿真结果,并分析了充电电压对激波特性的影响。结果表明:充电电压为11 kV时,激波的压力峰值为2.67 MPa,激波能量为27.30 J,波前时间为2.16μs,激波加载速率为1.24 MPa/μs,电能转化为激波能量的效率为13.35%;提高电容充电电压,激波压力峰值和激波能量增大,波前时间减少,激波加载速率增加,但电能转化为激波能量的效率降低。利用建模分析的方法,可以根据放电回路参数预测液电脉冲激波特性,从而为进一步研究激波破碎岩石的形态和效果提供理论依据。     

掺磷光材料有机电致发光器件的能量传递

将高量子效率的磷光材料fac-tris-2-phenylpyridine iridium(III) (Ir(ppy)3)按不同的比例掺杂到具有载流子传输能力的主体材料poly(N-vinylcarbazole) (PVK)中作为发光层制备磷光电致发光器件。通过对器件发光机制的研究,发现光致发光过程中起主导作用的是Fo¨ster能量转移机制;而在电致发光过程中,器件的发光性能受Dexter能量转移和电荷陷获2种能量传递形式的影响。器件的I-V-L特性表明：Ir(ppy)3的掺杂比例为5%时,器件的光功率效率最大,能量转移最充分。     

单轴应变SiNMOSFET源漏电流特性模型

本文在建立单轴应变Si NMOSFET迁移率模型和阈值电压模型的基础上, 基于器件不同的工作区域, 从基本的漂移扩散方程出发, 分别建立了单轴应变Si NMOSFET源漏电流模型. 其中将应力的影响显式地体现在迁移率和阈值电压模型中, 使得所建立的模型能直观地反映出源漏电流特性与应力强度的关系. 并且对于亚阈区电流模型, 基于亚阈区反型电荷, 而不是采用常用的有效沟道厚度近似的概念, 从而提高了模型的精度. 同时将所建模型的仿真结果与实验结果进行了比较, 验证了模型的可行性. 该模型已经被嵌入进电路仿真器中, 实现了对单轴应变Si MOSFET 器件和电路的模拟仿真.     

Formation of electrohydrodynamic flows in strongly nonuniform electric fields for two charge-formation modes

The main features of the formation of electrohydrodynamic (EHD) flows are analyzed for two basic regimes of electrization of weakly conducting liquids: injection from the electrode surface and dissociation in the bulk. Analysis is carried out on the basis of the results of computer simulation of EHD flows in a strongly nonuniform electric field in the needle-plane electrode system. This system creates favorable conditions for the injection as well as dissociation mechanisms of charge formation. Typical features are revealed for each model of charge formation. The current-time characteristics of the transient process of stabilization of EHD flows are calculated.     

多阶平衡式Cockcroft-Walton电路的等效模型与输出特性

基于电路的输出效果,采用电荷转移原理阐述平衡式Cockcroft-Walton(C-W)倍压电路较为复杂的物理过程,将电路中二极管的非线性导通特性等效为周期性线性导通的数学解析模型,推导了表征其输出特性的纹波电压和带载输出电压的理论输出表达式。采用仿真软件对比了基本式和平衡式C-W电路的输出特性曲线,结果表明平衡式拓扑结构的纹波大小约为基本式拓扑结构的8%。同时建立的多阶平衡式C-W电路纹波电压理论模型计算值略低于电路软件仿真值,带载输出电压的理论模型计算值与仿真值的相对误差低于10%。     

SOI部分耗尽SiGe HBT集电结空间电荷区模型

SOI上的薄膜异质SiGe晶体管通过采用"折叠"集电极,已成功实现SOI上CMOS与HBT的兼容.本文结合SOI薄膜上的纵向SiGe HBT结构模型,提出了包含纵向、横向欧姆电阻和耗尽电容的"部分耗尽 (partially depleted) 晶体管"集电区简化电路模型.基于器件物理及实际考虑,系统建立了外延集电层电场、电势、耗尽宽度模型,并根据该模型对不同器件结构参数进行分析.结果表明,空间电荷区表现为本征集电结耗尽与MOS电容耗尽,空间电荷区宽度随集电结掺杂浓度减小而增大,随集电结反偏电压提高而增大, 关键词： SOI SiGe HBT 集电区 空间电荷区模型     

A simulation study on p-doping level of polymer host material in P3HT:PCBM bulk heterojunction solar cells

In this study,we investigate the influence of doping on the charge transfer and device characteristics parameters in the bulk heterojunction solar cells based on poly(3-hexylthiophene)(P3HT) and a methanofuUerene derivative(PCBM).Organic semiconductors are also known to be not pure and they have defects and impurities,some of them are being charged and act as p-type or n-type dopants.Calculations of the solar cell characteristics parameters versus the p-doping level have been done at three different n-dopings(N_d) that consist of 5 × 10~(17) cm~(-3),10~(18) cm~(-3),and 5 × 10~(18) cm~(-3).We perform the analysis of the doping concentration through the drift-diffusion model,and calculate the current and voltage doping dependency.We find that at three different n-dopant levels,optimum p-type doping is about N_p = 6 × 10~(18) cm~(-3).Simulation results have shown that by increasing doping level,V_(oc) monotonically increases by doping.Cell efficiency reaches its maximum at somewhat higher doping as FF has its peak at N_p = 3 × 10~(18) cm~(-3).Moreover,this paper demonstrates that the optimum value for the p-doping is about N_p = 6 × 10~(18) cm~(-3) and optimum value for n-dopant is N_d = 10~(18) cm~(-3),respectively.The simulated results confirm that doping considerably affects the performance of organic solar cells.     

基于红色荧光染料3-(dicyanomethylene)-5, 5-dimethyl-1-(4-dimethylamino-styryl) cyclohexene的高性能白色有机电致发光器件

研究了基于红色荧光染料3-（dicyanomethylene）-5, 5-dimethyl-1-（4-dimethylamino-styryl） cyclohexene（DCDDC）的白色有机电致发光器件的性能,分别制备了基于DCDDC超薄层和DCDDC掺杂主体材料的两种器件结构: 1）indium-tin oxide（ITO）/N, N′-diphenyl-N, N′-bis（1-naphthyl-pheny1）-1, 1′-biphenyl-4, 关键词： 有机电致发光器件 白色发光 红色荧光染料 掺杂     

Building a Simple Model of a Pulse-Frequency-Modulation Photosensor and Demonstration of a 128 x 128-pixel Pulse-Frequency-Modulation Image Sensor Fabricated in a Standard 0.35-$mUm Complementary Metal-Oxide Semiconductor Technology

We present a simple model of the pulse-frequency-modulation (PFM) photosensor that provides explicit relationships between circuit parameters and output characteristics. The model treats the PFM photosensor with a feedback loop as an open loop circuit. Several characteristics such as output pulse frequency for light intensity and photosensitivity are expressed by device parameters of a photodiode, reset transistor, and chain of inverters. The relationships derived from the proposed model help us to comprehend the results by simulation program with integrated circuit emphasis (SPICE) or experiments. We design and fabricate a 128 x 128-pixel PFM image sensor with photosensitivity of 0.15 Hz/lux. As a demonstration, a figure of a dinosaur is captured using the fabricated image sensor to discuss its operation. Characteristics of a normal pixel and white and black defect pixels are measured and discussed based on the results of formulations.     

Test of a fine pitch SOI pixel detector with laser beam

A silicon pixel detector with fine pitch size of 19 μm× 19 μm, developed based on SOI(silicon-oninsulator) technology, was tested under the illumination of infrared laser pulses. As an alternative method for particle beam tests, the laser pulses were tuned to very short duration and small transverse profile to simulate the tracks of MIPs(minimum ionization particles) in silicon. Hit cluster sizes were measured with focused laser pulses propagating through the SOI detector perpendicular to its surface and most of the induced charge was found to be collected inside the seed pixel. For the first time, the signal amplitude as a function of the applied bias voltage was measured for this SOI detector, deepening understanding of its depletion characteristics.     

同轴型变阻抗线传输特性的电磁场与电路仿真比较

利用CST微波工作室软件对新一代Z箍缩驱动装置中变阻抗传输线部分进行了三维电磁场仿真,建立了同轴型指数线模型,在外导体内半径保持100mm不变、输入端特性阻抗0.203Ω、输出端特性阻抗2.16Ω、输入角频率14×106 rad/s的半正弦脉冲TEM波的情况下,发现传输过程中会产生少量非TEM模,线的尺寸变化越剧烈,产生的非TEM模能量越多。在传输线足够长的情况下,电磁场仿真得到的电压传输效率与电路仿真结果相差不到1%,因此可以用电路仿真结果代替电磁场仿真。     

Theoretical analytic model for RESURF AlGaN/GaN HEMTs

In this paper, we propose a two-dimensional(2D) analytic model for the channel potential and electric field distribution of the RESURF AlGaN/GaN high electron mobility transistors(HEMTs). The model is constructed by two-dimensional Poisson's equation with appropriate boundary conditions. In the RESURF AlGaN/GaN HEMTs, we utilize the RESURF effect generated by doped negative charge in the AlGaN layer and introduce new electric field peaks in the device channels,thus, homogenizing the distribution of electric field in channel and improving the breakdown voltage of the device. In order to reveal the influence of doped negative charge on the electric field distribution, we demonstrate in detail the influences of the charge doping density and doping position on the potential and electric field distribution of the RESURF AlGaN/GaN HEMTs with double low density drain(LDD). The validity of the model is verified by comparing the results obtained from the analytical model with the simulation results from the ISE software. This analysis method gives a physical insight into the mechanism of the AlGaN/GaN HEMTs and provides reference to modeling other AlGaN/GaN HEMTs device.