非均匀性对增透膜增透特性的影响

通过对基底与膜层、膜层之间界面处非均匀性对增透膜增透性能影响的讨论,得到以下结论:在沉积初期,由于基底表面特性和沉积参数的波动,从而在基底与膜层之间产生过渡层,使增透性能减弱,对增透膜的增透效果影响较大;在膜层之间的过渡层,正余弦过渡使增透性能变强,双曲、指数使增透性能减弱,但影响较小,线性渐变基本没有影响。实验镀制了增透膜并对其进行拟合分析,发现基底与膜层以及膜层之间的过渡层按正余弦变化时与实验结果比较吻合,并给予了解释。     

结合傅里叶变换合成法设计均匀薄膜

基于傅里叶变换合成法的基本原理,合成了一个K9基底上的负滤光片,合成的渐变折射率薄膜具有期望光学特性,但实际制备难度很大,因此将其细分为足够多层离散折射率的均匀薄膜,由于实际薄膜材料种类有限,不能获得任意折射率膜层,鉴于两层高低折射率薄层可近似为一层中间折射率膜层的思想,将膜系转化成一个可实际制备的膜系结构:膜系采用ZrO2和SiO2两种膜料,膜层总数为183层,经单纯形调法优化后,膜层总厚度为7.09 μm,通带和截止带内平均透射比分别为97.56%和3.13%,其结果优于直接采用傅里叶方法合成的非均匀膜系,与期望透射比曲线吻合更好.说明通过这种思想设计任意光谱特性的膜系是可行的,也使傅里叶变换合成法设计的薄膜实际制备成为可能.     

非均匀性对单层膜光学特性的影响

探讨了不同规律的非均匀性对单层膜的光谱特性的影响,与均匀单层膜对比发现：折射率正变引起透射率的极大值减小,折射率负变引起透射率的极大值变大,当非均匀性很小时,透射率的极小值基本不变.对实验制备的单层膜从实验和理论上进行了对比并给出了较好的拟合,发现在薄膜和基底的界面处存在一过渡层,过渡层可近似为线性,并从理论上给予了分析解释.     

Glan-Taylor棱镜端面增透膜的研制

为了提高Glan-Taylor棱镜的透射率，改善其使用性能，研究了Glan-Taylor棱镜增透膜的设计、制备及测试.经过多次工艺实验选择了膜料并找到了合适的蒸镀条件，较好的解决了膜层与冰洲石晶体的附着力,用膜系软件进行了优化设计，并利用电子束蒸发方法实际制备了设计的膜系.最后利用岛津UV3101分光光度计测试了棱镜端面增透膜的反射光谱特性，测量结果表明镀膜以后在设计的光谱区域内端面的反射率均小于0.4％，并且膜层牢固.     

锗窗口红外宽光谱增透膜的研制

红外宽光谱增透膜作为红外光学系统中的关键元件,其研究是一项比较复杂而备受重视的工作。针对风云二号辐射计锗窗口的宽光谱增透膜的要求,通过对镀膜材料在既定工艺条件下的光学参数的准确拟合,采用非对称等效层理论,并将材料光学参数拟合值代入到膜系的优化过程中,从而得到能够与实际情况接近的理论设计膜系。经过工艺优化后,研制出的宽光谱增透膜在要求的3.5～4.0μm,6.3～7.6μm,10.3～11.3μm三个通道的平均透射率均大于96%,而11.5～12.5μm通道的平均透射率大于94%。膜层能够经受住浸泡、高温高湿等一系列环模试验的检验,完全满足项目的使用要求。     

溶胶—凝胶工艺提拉法制备二氧化硅增透膜

采用溶胶-凝胶工艺用提拉法在石英基片上制备了具有优良的光学特性、高激光损伤阈值和均匀性良好的多孔二氧化硅单层增透膜和“有机硅-SiO₂”双层增透膜系.考察了提拉速率对透射特性的影响,并比较了提拉法和液面下降法对所制备膜层的厚度的影响.透射光谱测量表明,在钕玻璃高功率激光的基频(1060nm)、倍频和三倍频等重要激光波长处均得到较为理想的增透,透射率达到99%以上.     

用二氧化钛、二氧化硅和氟化镁膜料镀制0.4μm～1.1μm超宽带增透膜

对0.4μm~1.1μm超宽带增透膜的镀制工艺进行了研究。根据长期从事该工作的经验和对膜料性能的研究,结合国产设备的实际情况,在膜料的选取上主要考虑其透明光谱区域、折射率、材料的蒸发方式、机械特性、化学稳定性及抗高能辐射等因素;最终选择用二氧化钛、二氧化硅和氟化镁3种常用膜料镀制0.4μm~1.1μm超宽带增透膜。涉及该膜系的膜层共有8层,结构为:玻璃■H■M■H■M■H■M■H■L■空气■。制作工艺方便简单、稳定,制做的膜层具有较好的光谱和机械性能,满足光电仪器实际使用要求。     

用二氧化钛、二氧化硅和氟化镁膜料镀制0．4μm-1．1μm超宽带增透膜

对0．4μm-1．1μm超宽带增透膜的镀制工范进行了研究。根据长期从事该工作的经验和对膜料性能的研究，结合国产设备的实际情况，在膜料的选取上主要考虑其透明光谱区域、折射率、材料的蒸发方式、机械特性、化学稳定性及抗高能辐射等因素；最终选择用二氧化钛、二氧化硅和氟化镁3种常用膜料镀制0．4μm-1．1μm超宽带增透膜。涉及该膜系的膜层共有8层，结构为：│玻璃│H│M│H│M│H│M│H│L│空气│。制作工艺方便简单、稳定，制做的膜层具有较好的光谱和机械性能，满足光电仪器实际使用要求。     

建筑节能薄膜的设计与制备

对介质－金属组合的建筑节能薄膜进行了理论设计，给出双导和三层膜的理论参数，用计算机模拟了大面积薄膜的膜厚均匀性分布，获得了最佳的蒸发源配置，实验上达到了满足实际使用的均匀性要求，最后给出了实际样品的光谱特性。     

二氧化硅增透膜微观结构与激光损伤阈值的调控

采用溶胶-凝胶技术制备了二氧化硅增透膜,通过向溶胶中添加高分子聚乙烯醇缩丁醛（PVB）,调控胶体的粒径,进而控制膜层微观结构,研究膜层微观结构与激光损伤阈值的关系。纳米粒度仪和扫描探针显微镜测试表明:PVB加入溶胶后,控制了二氧化硅胶粒的生长,使二氧化硅胶粒生长更均匀,因而膜层的微观结构更均匀。当PVB质量分数为1%时,胶体粒径为15 nm,分散系数小于0.1。用该胶体镀膜,膜层均匀,表面粗糙度小于3.25 nm。并且PVB加入后增加了膜层胶粒间的黏附性,使得膜层强度增大。PVB加入使膜层的激光损伤阈值有所增加。当PVB的添加量为1%时,膜层的激光损失阈值从30.0 J/cm2增加到40.1 J/cm2。膜层激光损伤阈值的增加与膜层微观均匀性和物理强度的增加有关。     

Accuracy design of ultra-low residual reflection coatings for laser optics

Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.     

Amorphous Er2O3 films for antireflection coatings

This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.     

多层膜体折射率弱不均匀度反演计算的近似模型及性能分析

实际应用中的薄膜或多或少存在体折射率不均匀缺陷,其准确表征对于镀膜工艺参数调校、低损耗薄膜设计与制备分析等具有影响。从Schr-der近似出发,推导了体折射率弱不均匀薄膜的膜系特征矩阵,通过特征矩阵法推广,建立了体折射率弱不均匀多层膜光谱特性计算的近似模型。利用基于有效介质理论的多层均匀膜近似方法,讨论了上述近似模型的有效性、计算精度和时间消耗特性。结果表明,上述模型矩阵计算中引入体折射不均匀度这一参数,为多层膜体折射率不均匀缺陷反演提供了一种有效的手段,为基于宽带光谱测量数据拟合的膜层缺陷数值反演应用奠定了基础。     

4H-SiC基底Al_2O_3/SiO_2双层减反射膜的设计和制备

在4H-SiC基底上设计并制备了Al2O3SiO2紫外双层减反射膜,通过扫描电镜(SEM)和实测反射率谱来验证理论设计的正确性.利用编程计算得到Al2O2和SiO2的最优物理膜厚分别为42.0 nm和96.1 nm以及参考波长λ=280 nm处最小反射率为0.09%.由误差分析可知,实际镀膜时保持双层膜厚度之和与理论值一致有利于降低膜系反射率.实验中应当准确控制SiO2折射率并使Al2O3折射率接近1.715.用电子束蒸发法在4H-SiC基底上淀积Al2O3SiO2双层膜,厚度分别为42 nm和96 nm.SEM截面图表明淀积的薄膜和基底间具有较强的附着力.实测反射率极小值为0.33%,对应λ=276 nm,与理论结果吻合较好.与传统SiO2单层膜相比,Al2O3SiO2双层膜具有反射率小,波长选择性好等优点,从而论证了其在4H-SiC基紫外光电器件减反射膜上具有较好的应用前景.     

Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates

Al₂O₃/SiO₂ films have been prepared by electron-beam evaporation as ultraviolet (UV) antireflection coatings on 4H-SiC substrates and annealed at different temperatures. The films were characterized by reflection spectra, ellipsometer system, atomic force microscopy (AFM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. As the annealing temperature increased, the minimum reflectance of the films moved to the shorter wavelength for the variation of refractive indices and the reduction of film thicknesses. The surface grains appeared to get larger in size and the root mean square (RMS) roughness of the annealed films increased with the annealing temperature but was less than that of the as-deposited. The Al₂O₃/SiO₂ films maintained amorphous in microstructure with the increase of the temperature. Meanwhile, the transition and diffusion in film component were found in XPS measurement. These results provided the important references for Al₂O₃/SiO₂ films annealed at reasonable temperatures and prepared as fine antireflection coatings on 4H-SiC-based UV optoelectronic devices.     

用低压反应离子镀的方法制备Ge_(1-x)C_x单层非均匀增透膜的研究

用低压反应离子镀(RLVIP)的方法在Ge基底上制备了Ge1-xCx单层非均匀增透薄膜。随着沉积速率在0.05~0.4nm/s之间的变化,其折射率在2.31~3.42之间可变。实验结果表明,镀制的Ge1-xCx单层非均匀增透保护薄膜均为无定形结构,并实现了从2000~8000nm的宽波段增透。当沉积速率为0.1nm/s时,单面平均透过率从68.6%提高到了80.9%,比单面未镀膜时提高了17.9%。通过对薄膜的稳定性和牢固度进行测试表明,制备的Ge1-xCx单层非均匀增透薄膜具有良好的性能。     

Anisotropic antireflection coatings: use as a laser intracavity polarization-direction selector

A double-layer anisotropic antireflection coating is designed and fabricated using the technique of serial bideposition. Both layers in the coating are biaxial with nanostructural columns directed normal to the substrate. Incident light with the p polarization encounters a pair of quarter-wave layers with refractive indices that satisfy the standard relationship for zero reflectance at the design wavelength. Light with the s polarization meets non-quarter-wave layers and different indices and hence is partially reflected. As an example to illustrate potential applications of the coating, we have used a thin glass plate with anisotropic antireflection coatings on both sides as an intracavity element to select the direction of polarization of an open-cavity HeNe laser.     

Optical characterization of thin thermal oxide films on copper by ellipsometry

A complete optical characterization in the visible region of thin copper oxide films has been performed by ellipsometry. Copper oxide films of various thicknesses were grown on thick copper films by low temperature thermal oxidation at 125 °C in air for different time intervals. The thickness and optical constants of the copper oxide films were determined in the visible region by ellipsometric measurements. It was found that a linear time law is valid for the oxide growth in air at 125 °C. The spectral behaviour of the optical constants and the value of the band gap in the oxide films determined by ellipsometry in this study are in agreement with the behaviour of those of Cu₂O, which have been obtained elsewhere through reflectance and transmittance methods. The band gap of copper oxide, determined from the spectral behaviour of the absorption coefficient was about 2 eV, which is the generally accepted value for Cu₂O. It was therefore concluded that the oxide composition of the surface film grown on copper is in the form of Cu₂O (cuprous oxide). It was also shown that the reflectance spectra of the copper oxide–copper structures exhibit behaviour expected from a single layer antireflection coating of Cu₂O on Cu. Received: 19 July 2001 / Accepted: 27 July 2001 / Published online: 17 October 2001     

Design of wideband graded-index antireflection coatings at oblique light incidence

We suggest a design method of graded-refractive-index (GRIN) antireflection (AR) coating for s-polarized or p-polarized light at off-normal incidence. The spectrum characteristic of the designed antireflection coating with a quintic effective refractive-index profile for a given state of polarization has been discussed. In addition, the genetic algorithm was used to optimize the refractive index profile of the GRIN antireflection for reducing the mean reflectance of s- and p-polarizations. The average reflectance loss was reduced to only 0.04% by applying optimized GRIN AR coatings onto BK7 glass over the wavelength range from 400 to 800 nm at the incident angle of θ₀ =70°.     

减反膜的梯度化与激光损伤阈值之间的关系研究

光学减反膜是激光系统的重要组成部分，也是在激光照射下最容易发生损伤的部分，如何提高减反膜的激光损伤阈值是研究的热点之一。在保持目标透射光谱要求和膜系总光学厚度不变的前提下，研究了不同梯度化减反膜与激光损伤阈值之间的关系。首先采用混合渐变膜系设计方法设计了一种渐变减反膜系，G/H₁→H/L/A；其次通过渐变折射率分层等效方法将渐变减反膜系进行不同的梯度化，并利用PECVD技术，在K9玻璃上沉积了满足光学性能指标要求的不同渐变减反膜系(多层梯度渐变膜系和相应的坡度渐变膜系)；最后进行了激光损伤阈值(LIDT)测量。研究结果表明:在保持目标透射光谱要求和膜系总光学厚度不变的前提下，渐变减反膜系相比于传统减反膜系，抗激光损伤阈值有明显的提高；随着梯度化层数的增加，渐变减反膜系的激光损伤阈值呈减小的趋势；对于相同膜层的渐变折射率薄膜，采用坡度法制备的样片抗激光损伤阈值均优于采用梯度化制备的样片。