MgB2 超薄膜的制备和性质研究

利用混合物理化学气相沉积法在6H-SiC(001)衬底上制备干净的MgB₂超导超薄膜.在本底气体压强、载气氢气流量等条件一定的情况下,改变B₂H₆流量及沉积时间,制备得到不同厚度的系列MgB₂超薄膜样品,并研究了超导转变温度T_c、剩余电阻率ρ_(42K)、上临界磁场H_c2等与膜厚的关系.该系列超薄膜沿c轴外延生长,随膜厚度的变小,T_c(0)降低,ρ_(42K)升高.膜在衬底上的生长遵循Volmer-Weber岛状生长模式.对于厚度为7.5 nm的MgB₂超薄膜,T_c(0) =32.8 K,ρ_(42K) =118 μΩcm,是迄今为止所观测到的厚度为7.5 nm的MgB₂超薄膜最高的T_c值;对于厚度为10 nm的MgB₂膜,T_c(0)=35.5 K,ρ_(42K)=17.7 μΩcm,上临界磁场μ₀H_c2估算为12 T左右,零磁场、4 K时的临界电流密度J_c=1.0×10⁷ A/cm²,是迄今为止10 nm厚MgB₂超薄膜的最高J_c值,且其表面连接性良好,均方根粗糙度为0.731 nm.这预示MgB₂超薄膜在超导纳米器件上具有广阔的应用前景. 关键词： 2超薄膜')" href="#">MgB₂超薄膜 薄膜生长 氢气流量 混合物理化学气相沉积     

高压下Y-Si-H体系晶体结构和超导性质的第一性原理研究

采用第一性原理计算方法,研究了三元氢化物Y-Si-H体系在高压下的晶体结构、电子性质及超导性质,发现了热力学稳定的YSiH₇、YSiH₉、YSi₂H₁₂和YSiH₁₈,以及热力学亚稳的YSi₂H₁₃、YSi₂H₁₄和Y₂SiH₁₇。电子性质计算表明,YSiH7为绝缘体,YSi₂H₁₃为半导体,其余氢化物均具有金属特性。通过麦克米兰方程估算超导转变温度(T_c)发现,YSi₂H₁₂具有最高的T_c,在100 GPa下为43.5 K。YSi₂H₁₄的动力学稳定压力可降至40 GPa,T_c为23.8 K,是Y-Si二元化合物中最高T_c的2倍,...     

高温超导薄膜中的涨落超导电性及其维度

对RBa₂Cu₃O_7-δ(R=Y,Gd)超导薄膜电阻温度关系的仔细测量,观察到在T_c附近有相当强的超导涨落现象,研究发现,多晶和外延的YBa₂Cu₃O_7-δ薄膜在T_c以上均呈现出2D涨落超导电性;而当温度趋向于T_c时,有—2D向3D的转变发生,这与Lawrence-Doniach理论很好地相符,实验中还发现,一 关键词：     

MgO(111)衬底MgB2 超薄膜的制备和性质研究

利用混合物理化学气相沉积法(HPCVD)在MgO(111)衬底上制备了干净的MgB₂超导超薄膜. 在背景气体压强, 载气氢气流量以及沉积时间一定的情况下, 改变B₂H₆的流量, 制备得到不同厚度系列的MgB₂超导薄膜样品, 并测量了其超导转变温度 T_c, 临界电流密度J_c等临界参量. 该系列超导薄膜沿c轴外延生长, 表面具有良好的连接性, 且有很高的超导转变温度T_c(0) ≈ 35-38 K和很小的剩余电阻率ρ(42 K) ≈ 1.8-20.3 μΩ·cm^-1. 随着膜厚的减小而减小, 临界温度变低, 而剩余电阻率变大. 其中20 nm的样品在零磁场, 5K时的临界电流密度J_c ≈ 2.3×10⁷ A/cm². 表明了利用HPCVD在MgO(111)衬底上制备的MgB₂超薄膜有很好的性能, 预示了其在超导电子器件中广阔的应用前景. 关键词： MgO(111)衬底 2超薄膜')" href="#">MgB₂超薄膜 混合物理化学气相沉积     

旋转激光淀积厚度均匀的超导薄膜

应用一光学变换传输系统，使得激光束通过该系统后可绕一定的半径旋转，旋转的激光束消融淀积大面积ＹＢａ２Ｃｕ３Ｏ７超导薄膜。以其片中心处的超导薄膜厚度的９０％为均匀区域界限，激光旋转半径为０，３ｍｍ和９ｍｍ时，淀积的超导薄膜厚度均匀区域面积分别为０．１４ｃｍ＾２、０．８２ｃｍ＾２、６．７９ｃｍ＾２。     

金属氢高温超导电性

本文利用晶体的平均电子半径r_s、离子质量M和声速v_j等较少参量表示Z价金属的有效声子谱α²F(ω)、电声子耦合常数λ和谱面积λ/2〈ω〉,并用Dynes的T_c公式,求得了金属氢、铅和铌的超导临界温度。计算表明,在零压下金属氢的λ=2.55,T_c=162K。 关键词：     

Bl结构MoNx薄膜的制备及物理性能研究

我们对以反应性溅射法制备的MoN_x薄膜测量了超导转变温度T_c,电阻率ρ(T)(从T_c起始到300K)。用X射线衍射技术、卢瑟福背散射(RBS)、俄歇谱仪和X射线光电子能谱(XPS)技术对这些样品进行了分析。实验结果表明T_c和ρ(T)随N含量改变而变化。当样品是B1结构时,T_c小于4.2K,而且样品内还有过量的N存在。俄歇分析表明,样品内有O,C杂质存在。这些因素都可能导致T_c很低,ρ(T)呈负的温度系数。 关键词：     

(Bi,Pb)2Sr2Ca2Cu3Oy单相样品的超导电性与载流子浓度

对(Bi,Pb)₂Sr₂Ca₂Cu₃O_y单相样品进行不同条件下的热处理,通过X射线衍射、电阻-温度关系、交流磁化率,以及Hall系数等测量,发现样品均具有较好的单相性,随着热处理条件的变化,其超导转变中点温度(T_c)有规律地分布在100—110K之间,T_c随载流子浓度(n_H)的增加而升高。实验结果表明,热处理条件对样品的相结构、超导 关键词：     

脉冲激光淀积BaTiO3薄膜的介电与铁电特性

用脉冲激光淀积方法在SrTiO₃衬底上制备了BaTiO₃/YBa₂Cu₃O_7-δ（铁电/超导）双层膜，X射线分析表明BaTiO₃薄膜是高度c取向的．对BaTiO₃薄膜的介电和铁电性能进行了实验研究．观察到铁电薄膜特有的电滞线和蝶型C-V曲线，薄膜呈现出较好的铁电性，在铁电随机存储等领域有重要的应用前景 关键词：     

γ射线作用下氧化铪基MOS结构总剂量效应研究

使用原子层淀积方法得到了7.8 nm厚度的HfO₂薄膜并通过直接溅射金属铝电极得到了Al/HfO₂/Si MOS电容结构,测量得到了HfO₂基MOS结构在60Co γ射线辐照前后的电容-电压特性,使用原子力显微镜得到了HfO₂薄膜在辐照前后的表面微观形貌,使用X射线光电子能谱方法测量得到了HfO₂薄膜在辐照前后的化学结构变化。研究发现,使用原子层淀积方法制备的HfO₂薄膜表面质量较高;γ射线辐照在HfO₂栅介质中产生了数量级为1012 cm-2的负的氧化层陷阱电荷;HfO₂薄膜符合化学计量比,介质内部主要的缺陷为氧空位且随着辐照剂量的增加而增加,说明辐照在介质中引入了陷阱从而导致MOS结构性能的退化。     

Pulsed laser deposition conditions and superconductivity of FeSe thin films

We report the effects of growth conditions on the superconducting properties of FeSe films epitaxially grown on LaAlO₃ substrates by pulsed laser deposition (PLD). Customary materials characterization techniques [X-ray diffraction (XRD), in-situ X-ray photoelectron spectroscopy (XPS), in-situ ultra-violet photoelectron spectroscopy (UPS), and scanning electron microscopy (SEM)] revealed the films had a c-axis oriented tetragonal structure with lattice constants dependent on the growth temperature (varied from 100 to 600°C). The standard four-point probe method was used to measure the resistivity and superconducting transitions. Films grown at 400–550°C showed a clear superconducting onset but no zero resistance down to 2 K. The highest superconducting onset temperature (T_c^onsetT_{\mathrm{c}}^{\mathrm{onset}}) of 8 K was observed in films grown at 500°C and the onset temperature was clearly correlated to the ratio of the lattice constants (c/a). As the thickness of the FeSe films increased from 27 nm to 480 nm, T_c^onsetT_{\mathrm{c}}^{\mathrm{onset}} also increased as the strain in the system was relaxed.     

多层膜外退火方法制备MgB2超导薄膜

报道了利用电子束蒸发的Mg/B多层膜作为前驱体，然后退火制备MgB₂薄膜的工作. 实验中发现，采用翻转膜面的退火处理方式可以有效地避免降温过程中Mg蒸气在薄膜表面形成的颗粒凝结，由此稳定地实现了面积为10 mm×10 mm，均匀、平整的超导薄膜的制备，T_c达35 K，转变宽度为0.8 K，在5 μm×5 μm的区域内薄膜的平均粗糙度小于10 nm. 为了便于后续器件制作过程中的微加工工艺，研究了膜厚小于1000 ?时薄膜的成相规律，发现当样品厚度减薄后，T_c会有明显降低. 通过调整前驱薄膜中的不同分层厚度，仍可实现转变温度达30 K以上、厚度约600 ?的MgB₂薄膜，在20 K时的临界电流密度为2.4×10⁶ A/cm².     

Preparation of high J c YBa2Cu3O7−δ superconducting thin films by ion beam sputtering deposition

Preparation of high T _c and high J _c YBa₂Cu₃O_7– superconducting thin films by ion beam sputtering deposition is reported. The main factors affecting the composition of the films and the orientation of the crystal grains have been examined. Experimental results show that the Y, Ba and Cu composition of as-deposited films can be conveniently and accurately adjusted by a combined sputtering target which consists of a large sintered target of YBa₂Cu₃O_7– and a small one that is Ba and Cu rich (YBa_2.5Cu_3.3O_x). Fabrication conditions of highly oriented superconducting thin films are described. YBa₂Cu₃O_7– superconducting films with zero resistance at 88–90.5K and critical current density J _c (at 77K) of 1.5×10⁵ A/cm² are obtained.     

Deposition of smooth high-<Emphasis Type="Italic">T</Emphasis><Subscript>c</Subscript> superconducting films with a solid-state YAG: Nd<Superscript>3+</Superscript> laser

A method is presented for the deposition of smooth epitaxial high-T _c superconducting films using a pulsed infrared YAG: Nd³⁺ laser and velocity filtration. This method is based on the removal of drops and solid particles from the flow of deposited substance with a fast shutter made of a rotating disk. The deposited smooth homogeneous YBa₂Cu₃O_7?δ films have a critical temperature T _c > 90 K. The surface concentration of drops is less than 3 × 10² cm^?2, and their amount is decreased by more than six orders of magnitude.     

High-T c superconducting Bi−Sr−Ca−Cu−O thin films prepared by laser-induced plasma deposition

High-T _c superconducting thin films of Bi–Sr–Ca–Cu oxides were prepared by laser-induced plasma deposition of high-T _c superconducting Bi₂Sr₂Ca₁Cu₂O_x and Bi₂Sr₂Ca₂Cu₃O_x targets in vacuum and a short post-annealing in air at 875°C. Thin films (thickness <500 nm) with a critical temperatureT _c -onset of 95 K can be prepared on silicon substrate material with a SrTiO₃ interface layer. The thin films were completely superconducting between 80 and 90 K. The stoichiometry transfer of superconducting target material by laser-induced plasma deposition was investigated.     

Model of current and optical conductivity switching in YBa2Cu3O7−x films

A model is proposed for the thermal and electrical responses of films of the high-T _c superconducting material YBa₂Cu₃O7_7−x to current and optical pulses. Numerical calculations are compared with experimental data for current pulses of duration 100 μs and laser pulses of duration 0.1 ns; this yields improved data on the thermal conductivity of thin YBa₂Cu₃O7_7−x films (1.5–2 W/m·K) and thermal resistance of the film-substrate contact (5×10⁻⁸m²·K/W) in the neighborhood of the superconducting transition. This model can be used for optimizing the film structure parameters and control regimes for switching elements for pulses lasting longer than 0.1 ns. Zh. Tekh. Fiz. 69, 77–82 (October 1999)     

Effect of cation composition on the superconducting properties and on the microstructure of YBaCuO thin films

The surface morphology and superconducting properties of YBaCuO epitaxial films prepared through magnetron sputtering from targets of different cation composition were systematically studied. It was shown that small changes in the growth conditions and relatively small variations in the cation composition of the condensate noticeably affect the surface morphology of the films and their structural and superconducting properties, thus offering an efficient way of controlling the YBCO film parameters. It was found that the 90° off-axis configuration of the magnetron sputtering system permits realization of growth conditions in which the grown films do not contain CuO precipitates and exhibit good superconducting properties (T_c≥88 K, j_c(77 K)≥4×10⁶ A/cm²).     

Effect of CeO2 buffer layer thickness on the structures and properties of YBCO coated conductors

Biaxially textured YBa₂Cu₃O_7−x (YBCO) films were grown on inclined-substrate-deposited (ISD) MgO-textured metal substrates by pulsed laser deposition. CeO₂ was deposited as a buffer layer prior to YBCO growth. CeO₂ layers of different thickness were prepared to evaluate the thickness dependence of the YBCO films. The biaxial alignment features of the films were examined by X-ray diffraction 2θ-scans, pole-figure, ?-scans and rocking curves of Ω angles. The significant influence of the CeO₂ thickness on the structure and properties of the YBCO films were demonstrated and the optimal thickness was found to be about 10 nm. High values of T_c = 91 K and J_c = 5.5 × 10⁵ A/cm² were obtained on YBCO films with optimal CeO₂ thickness at 77 K in zero field. The possible mechanisms responsible for the dependence of the structure and the properties of the YBCO films on the thickness of the CeO₂ buffer layers are discussed.     

SUPERCONDUCTING PROPERTIES AND STRUCTURAL PERFECTION OF EPITAXIAL YBa2Cu3O7-x THIN FILMS

High quality epitaxial YBa₂Cu₃O_7-x thin films have been succcessfully prepared by dc magnetron sputtering deposition, on (100) and (110) aligned SrTiO₃, LaAlO₃ and yttria-stabilized zirconia (YSZ) substrates. The films showed zero resistance around 90 K and had a J_c (at 77 K, H=0) over 10⁶A/cm². It was found that superconducting properties and structures of the films were strongly dependent on oxygen pressure and substrate temperature. The epitaxial structure of the films have been studied by X-ray diffraction. Rutherford backscattering and channeling spectroscopy, X-ray double-crystal diffraction and transmission election microscopy. The experimental results demonstrated that the epitaxial YBa₂Cu₃O_7-x films had excellent superconducting properties and quite perfect structure.     

Production of YBa2Cu3O7−x superconducting thin films by pulsed pseudospark electron beam evaporation

Thin-film superconducting YBa₂Cu₃O_7–x layers have been produced in a single-step process by pulsed electron beam evaporation from a stoichiometric 1-2-3 target. The films were produced at the 100 surface of SrTiO₃ substrates heated to a temperature of approximately 1000 K in a pure oxygen atmosphere of about 10 Pa total pressure. After deposition the films were cooled in situ within 20 minutes to ambient temperature. At present, the films are polycrystalline and show a T_c,zero of 83 K with a transition width of 3–5 K. Critical current densities of 7·10⁴ A/cm² at 4.2 K and zero magnetic field have been achieved. The pulsed electron beams used in these experiments are produced by a pseudospark discharge; the estimated energy density deposited at the target surface by the electron beam is of the order of 4 J/cm².