Fe/ZnO (0001)体系界面相互作用中薄膜厚度效应的光电子能谱研究

利用同步辐射光电子能谱(SRPES)和X射线光电子能谱(XPS)技术,系统研究了室温下Fe/ZnO界面形成过程中Fe薄膜与氧结尾的ZnO(000 1 )衬底之间的相互作用,结果显示初始沉积的Fe明显被表面氧氧化为Fe²⁺离子,在Fe覆盖度为0—3 nm的范围内,分别观察到与界面电荷传输、化学反应以及薄膜磁性相关的三个有意义的临界厚度,这一结果将有助于基于Fe/ZnO界面的相关器件的设计和研发. 关键词： Fe/ZnO 界面作用 同步辐射光电子能谱 X射线光电子能谱     

超薄Fe层在反铁磁NiO(001)面上沉积的研究

通过分子束外延(MBE)和脉冲激光沉积(PLD)方法，将1—10个Fe原子层(ML)以楔形方式沉积到反铁磁单晶NiO(001)基片上.表面磁光克尔效应的原位测试结果表明：通过MBE沉积的Fe原子层在Fe/NiO界面处产生了约2ML的磁死层；而通过PLD沉积的Fe原子层在Fe/NiO界面处产生了约3ML的磁死层.X射线光电子能谱对Fe/NiO界面进行研究的结果表明，在Fe原子与单晶NiO间发生了界面化学反应. 关键词： 磁性薄膜 表面磁性 X射线光电子能谱     

Fe/ZnO(0001)界面的同步辐射光电子能谱研究

利用同步辐射光电子能谱研究了Fe/ZnO生长模式、界面化学反应和电子结构.结果表明，Fe在ZnO(0001)表面以类SK模式生长(单层加岛状生长).当沉积约2?的Fe后，生长模式开始从二维层状生长转变成混合模式生长.界面价带谱和Fe3p芯能级谱的分析表明，在低覆盖度下，约有一个原子层(约1.5?)的Fe被ZnO(0001)面的外层O原子氧化，随着沉积厚度的增加，金属态Fe的信号逐渐增强.当吸附了5.1?的Fe时，出现了较强的金属Fe的Fermi边，说明出现了Fe的金属态.此外，在Fe原子吸附过程中，样品功函数在Fe厚度为0.2?时达到最小值4.5eV，偶极层形成后逐渐稳定在4.9eV.     

蓝宝石R面上ZnO薄膜的NH3掺杂研究

以NH₃为掺杂源,利用金属有机化学气相沉积(MOCVD)系统在蓝宝石R面上生长出掺氮ZnO薄膜。通过XRD,SEM测量优化了其生长参数,在610℃和在80sccm的NH₃流量下生长出了〈1120〉单一取向的ZnO薄膜。经Hall电阻率测量,得知该薄膜呈现弱p型或高电阻率,并对其光电子能谱进行了研究。     

α-P/GaAs(100)界面的光电子能谱研究

本文采用X射线光电子能谱、紫外光电子能谱和低能电子衍射对室温下P在GaAs(100)表面上的生长进行了研究。结果表明,在生长初期P是成团吸附的,随着淀积量的增加而生长成α-P薄膜,该薄膜的价带结构与等离子体淀积的α-P:H薄膜的价带结构相似。在界面处有约一单层的P与衬底表面的Ga成键。α-P覆盖层使GaAs表面势垒下降约0.2eV。 关键词：     

退火温度及退火气氛对ZnO薄膜的结构及发光性能的影响(英文)

采用脉冲激光沉积技术在Si/蓝宝石衬底上制备了ZnO薄膜,结合快速退火设备研究了不同退火温度(500~900℃)及退火气氛(N2,O2)对薄膜的结构及其发光性能的影响。并优化条件得到具有最小半峰全宽及最大晶粒尺寸的薄膜。X射线衍射(XRD)结果表明:氮气氛下退火的ZnO薄膜最佳退火温度为900℃;氧气氛下退火的ZnO薄膜最佳退火温度为800℃。红外(IR)光谱中,退火后Zn-O特征振动峰红移,说明在退火过程中,原子重新排布后占据较低能量位置;同样的退火温度下,氮气氛下退火的薄膜质量更优。同步辐射光电子能谱(synchrotron-based XPS)分别表征了未退火及N2,O2下900℃退火的ZnO薄膜,分峰拟合结果表明氧气氛下退火产生更多的氧空位。结构表征结合光致发光(PL)谱表明绿光的发光峰与氧空位有关。     

Sb掺杂SrTio3透明导电薄膜的光电子能谱研究

用X射线光电子能谱和同步辐射光电子能谱研究了Sb掺杂的钙钛矿型氧化物SrTi1-xSbxO3(x=0.05,0.10,0.15,0.20)薄膜的电子结构.薄膜由紫外脉冲激光淀积在SrTiO3(001)单晶衬底上.该薄膜系列在可见光波段透明,透过率均超过90%.其导电性与掺杂浓度有关,当Sb掺杂浓度x=0.05时,薄膜显示金属型导电性.X射线光电子能谱和同步辐射光电子能谱研究结果表明,Sb掺杂在母化合物SrTiO3的禁带内引入了浅杂质能级和深杂质能级.浅杂质能级上的退局域化电子离化到导带中会产生一定的传导电 关键词： 光电子能谱 光学透过率 脉冲激光沉积薄膜     

甲醇/TiO2(110)界面激发态的表征

用光电子能谱的方法研究了甲醇/TiO₂(110)界面的电子结构．在激发波长为400 nm的双光子光电子能谱(2PPE)中,探测到了一个末态能量在费米能级以上5.5 eV的共振信号．之前的研究[Chem. Sci. 1, 575 (2010)]表明,这个共振信号与甲醇在5配位的钛离子(Ti_5c)上的光催化解离相关．双光子光电子能谱同时携带初态和中间态的信息．为此设计了一个调谐激发光波长的2PPE实验以及一个单光子光电子能谱(1PPE)和2PPE对比的实验,结果一致表明这个共振信号来自于未占据的中间态,也就是激发态．能带色散关系测量表明这个激发态是局域的．时间分辨2PPE测得这个激发态的寿命是24 fs．     

Fe/ZnO(0001-)界面的同步辐射光电子能谱研究

利用同步辐射光电子能谱研究了Fe／ZnO生长模式、界面化学反应和电子结构．结果表明，Fe在ZnO（0001^-）表面以类SK模式生长（单层加岛状生长）．当沉积约2A的Fe后，生长模式开始从二维层状生长转变成混合模式生长．界面价带谱和Fe3p芯能级谱的分析表明，在低覆盖度下，约有一个原子层（约1．5A）的Fe被ZnO（0001）面的外层0原子氧化，随着沉积厚度的增加，金属态Fe的信号逐渐增强．当吸附了5．1A的Fe时，出现了较强的金属Fe的Fermi边，说明出现了Fe的金属态．此外，在Fe原子吸附过程中，样品功函数在Fe厚度为0．2A时达到最小值4．5．eV，偶极层形成后逐渐稳定在4．9eV．     

Fe离子注入多晶Al2O3的光电子能谱研究

本文应用光电子能谱(XPS)方法分析Fe离子注入多晶Al₂O₃样品中各离子的存在状态。通过微机对谱峰进行高斯拟合处理,得出注入离子Fe不同价态的相对含量。 关键词：     

A close correlation between induced ferromagnetism and oxygen deficiency in Fe doped In2O3

We report on the reversible manipulation of room temperature ferromagnetism in Fe (5%) doped In₂O₃ polycrystalline magnetic semiconductor. The X-ray diffraction and photoemission measurements confirm that the Fe ions are well incorporated into the lattice, substituting the In³⁺ ions. The magnetization measurements show that the host In₂O₃ has a diamagnetic ground state, while it shows weak ferromagnetism at 300 K upon Fe doping. The as-prepared sample was then sequentially annealed in hydrogen, air, vacuum and finally in air. The ferromagnetic signal shoots up by hydrogenation as well as vacuum annealing and bounces back upon re-annealing the samples in air. The sequence of ferromagnetism shows a close inter-relationship with the behavior of oxygen vacancies (V_o). The Fe ions tend to a transform from 3+ to 2+ state during the giant ferromagnetic induction, as revealed by photoemission spectroscopy. A careful characterization of the structure, purity, magnetic, and transport properties confirms that the ferromagnetism is due to neither impurities nor clusters but directly related to the oxygen vacancies. The ferromagnetism can be reversibly controlled by these vacancies while a parallel variation of carrier concentration, as revealed by resistance measurements, appears to be a side effect of the oxygen vacancy variation.     

Structure of MgO/V/MgO(0 0 1) thin films studied by the combination of X-ray photoemission and ion beam analysis techniques

The structure of epitaxial 40 Å thick V(0 0 1) films grown at room and high temperature (723 K) in MgO/V/MgO(0 0 1) model heterostructures is studied in detail by means of X-ray photoemission spectroscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The resulting structures of samples grown at both temperatures is very similar, including the eventual contamination by hydrogen in the V layer, and only subtle modifications at the V/MgO(0 0 1) interface have been observed. These differences at the very first V layers grown on MgO(0 0 1) surface could infer in the growth of the subsequent V layers. The influence of the nature of the V oxides at the V/MgO(0 0 1) interface on the properties of the 40 Å thick V(0 0 1) films is discussed.     

The Fe/ZnO(0 0 0 1) interface: Formation and thermal stability

The room temperature growth mode and the interface reaction of Fe films on single crystalline ZnO(0 0 0 1) substrates prepared in ultra high vacuum (UHV) has been investigated by means of X-ray photoelectron and Auger electron spectroscopy (XPS, AES), low energy electron diffraction (LEED) and low energy ion scattering spectroscopy (LEIS). The results show that Fe grows in the pseudo layer-by-layer mode. At ambient temperature the deposited Fe film reduces the underlying ZnO single crystal resulting in FeO at the interface and metallic Zn, which partially diffuses into the remaining Fe overlayer. Annealing leads to a stepwise oxidation of the Fe to FeO (670 K) and Fe₂O₃ (820 K). The Fe₂O₃ mixes with the substrate resulting in two (1 1 1) oriented textures of a spinel phase found by electron backscatter diffraction analysis (EBSD). Fe-based spin-injection may play a vital role for ZnO-based spintronic devices.     

Core level photoemission and STM characterization of Ta/Si(1 1 1)-7 × 7 interfaces

We present the results of scanning tunneling microscopy (STM) and photoemission spectroscopy (PES) of the Ta/Si(1 1 1)-7 × 7 system after deposition of Ta at substrate temperatures from 300 to 1250 K. The coverage of Ta varied from 0.05 up to 2.5 of a monolayer (ML). STM shows that at 300 K and coverage less than 1 ML, a disordered chemisorbed phase is formed. Deposition on a hot surface (above 500 K) produces round 3D clusters randomly distributed on the surface. Cluster height and their diameter are found to change drastically with annealing temperature and the Ta coverage. Analysis of photoemission data of the Si 2p core levels shows that at room temperature and at coverage ?1 ML core level binding energy shifts and intensity variations of Si surface related components are observed, which clearly indicate that the reaction starts already at 300 K. Shifts in the binding energy, changes of the peak shapes and intensity of the Ta 4f doublet at higher temperatures can be explained by the formation of stable silicide on the surface.     

Detection of Fe 3d electronic states in valence band and magnetic properties of Fe-doped ZnO film

Fe-doped ZnO film has been grown by laser molecular beam epitaxy (L-MBE) and structurally characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM), all of which reveal the high quality of the film. No secondary phase was detected. Resonant photoemission spectroscopy (RPES) with photon energies around the Fe 2p-3d absorption edge is performed to detect the electronic structure in the valence band. A strong resonant effect at a photon energy of 710 eV is observed. Fe³⁺ is the only valence state of Fe ions in the film and the Fe 3d electronic states are concentrated at binding energies of about 3.8 eV and 7 eV～ 8 eV. There are no electronic states related to Fe near the Fermi level. Magnetic measurements reveal a typical superparamagnetic property at room temperature. The absence of electronic states related to Fe near the Fermi level and the high quality of the film, with few defects, provide little support to ferromagnetism.     

Spectroscopic analysis of CIGS2/CdS thin film solar cell heterojunctions on stainless steel foil

This paper presents a spectroscopic analysis of the interface between a CuIn_1−xGa_xS₂ (CIGS2) absorber and a CdS buffer layer on stainless steel foil by Auger electron spectroscopy (AES), inverse photoemission spectroscopy (IPES) and photoelectron spectroscopy (PES) such as X-ray photoelectron spectroscopy (XPS), and ultraviolet photoelectron spectroscopy (UPS). By combining these spectroscopic techniques, detailed information about the electronic and chemical properties of the CIGS2 surface and the CdS/CIGS2 interface can be obtained. The gallium concentration in CIGS2 films was found to increase continuously towards the Mo back contact. XPS analysis showed the presence of KCO₃ on the surface of CdS, deposited on etched and un-oxidized samples indicating diffusion of potassium. No potassium was observed on oxidized as well as samples having thicker CdS (50 nm) indicating the effectiveness of oxidation and chemical bath deposition (CBD) process in cleaning the sample surface effectively. In addition, investigation of the electronic level alignment at the interface has been carried out by combining PES and IPES. Conduction band offset of −0.45 (±0.15) eV and a valence band offset of −1.06 (±0.15) eV were measured. These unfavorable conditions limit efficiency of CIGS2 thin film solar cells.     

Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0 0 1)

To investigate the initial growth of Fe films on Si(0 0 1) and the Fe/Si interface, Fe films at various thicknesses have been systematically studied by soft X-ray absorption spectroscopy (XAS) and X-ray photoemission spectroscopy (XPS). The Fe L edge XAS spectrum shows a strong thickness dependence with broader line-width for thinner films. Detailed analysis of the Fe absorption signal as a function of the thickness shows that the broad linewidth of Fe L edge XAS spectra is mostly contributed by the first Fe layer at the Fe/Si interface. In contrast to XAS, Fe 2p photoemission spectra for these films are identical. However, valence band photoemission also shows a strong thickness dependence. Comparing the valence band photoemission spectra of the thin Fe/Si(0 0 1) films with that of pure Si and the thickest Fe film, the difference spectra at all thicknesses show almost identical shape indicating the same origin: the Fe/Si interface. Thus, it is mainly the first Fe layer at Fe/Si layer that is reactive with the Si substrate changing its electronic structure.     

Photoemission study of the modification of the electronic structure of transition-metal overlayers on TiO2 surfaces: I. Fe on TiO2(1 1 0)

The electronic states of the Fe overlayers on TiO₂(1 1 0) surfaces have been investigated using normal-emission and resonant photoelectron spectroscopy with synchrotron radiation. It was found that Fe grows in a Stranski-Krastanov mode. At low coverages, Fe deposition on TiO₂(1 1 0) is supposed to create surface Ti³⁺(3d¹) ions leading to the same in-gap emission as that is produced by surface oxygen vacancies of TiO₂. At high coverages, Fe-induced in-gap emission is evolved into a bulk Fe spectrum. However, at the beginning, a Fermi edge is not observed, indicating that the small Fe clusters of non-metallic nature are formed. A sharp Fermi edge is formed at higher coverages, indicating that the cluster becomes metallic as the size increases.     

低覆盖度的Au/GaN(0001)界面的同步辐射研究

利用同步辐射光电子能谱研究了低覆盖度Au在GaN(0001)表面的初始生长模式,肖特基势垒高 度以及界面的电子结构.结果表明，Au沉积初始阶段有界面的化学反应,随后呈三维岛状生长 .由光电子能谱实验确定的肖特基势垒高度为14 eV. 通过对界面价带谱和Au 4f芯能级谱 的分析,确定了界面化学反应的存在.利用线性缀加平面波方法计算了GaN(0001)和Au的价带 态密度并分析了化学反应产生的机理,认为在初始阶段界面形成了Au_Ga合金. 关键词： 同步辐射 光电子能谱 Au/GaN欧姆接触 态密度