热处理CZ-Si中新施主与氧沉淀产物的对应关系

本文利用霍耳测量、红外测量及透射电子显微镜等手段,对热处理CZ-Si中的新施主及氧沉淀进行了研究。常规电子显微镜(TEM)结果表明,经650—750℃热处理的CZ-Si中主要形成点状及杆状缺陷。新施主的形成与点状缺陷关系密切。根据高分辨电子显微镜(HREM)观察,这些点状缺陷相当于晶体结构为β-方石英的片状SiO₂晶态沉淀,它们与硅基体界面上有半数硅原子处于失配状态,失配原子的悬挂键可以成为新施主的来源。新施主的产生受控于β-方石英沉淀物的形核、长大及其结构变化。 关键词：     

硅蹼中位错和层错的X射线貌相研究

利用X射线投影貌相术观察和分析了硅蹼中的位错和层错。在生长态硅蹼中,除观察到柏氏矢量为1/2<110>的刃型、螺型与60°全位错以及柏氏矢量为1/6<112>的Shockley刃型半位错外,还观察到平行于硅蹼表面的大面积层错和蹼中的60°,30°Shockley半位错。位错在热处理过程中运动并发生位错反应形成近六角形的位错网络。热处理改变生长态硅蹼中层错的组态和衬度,并由于杂质聚集破坏了Shockley半位错的消象法则。还观察到层错象中的位错。对所观察的结果都分别作了分析和简要的讨论。 关键词：     

硅单晶中铜沉淀物的几何形态

本文利用红外显微镜和化学浸蚀的方法,研究了硅单晶中铜沉淀物的几何形态。实验表明,用红外显微镜观察到的各种形态的沉淀物是由{110}面上的片状沉淀组成的,样品的性质对它的形态没有影响。 关键词：     

直拉硅单晶原生漩涡缺陷的研究

本文用化学腐蚀方法,从含有漩涡缺陷的原生CZ硅单晶中分离出尺寸在1000—6000?间的氧沉淀,制成萃取复型样品,用TEM对氧沉淀作微区电子衍射分析。同时,观察硅薄膜中漩涡缺陷的TEM象,确定了二者的对应关系。结果表明,构成漩涡缺陷的氧沉淀主要是呈方形片的热液石英(keatite,silicak)及少量呈六角片的α方英石(α-cristobalite),沉淀片周边沿<110>方向,惯习面前者的为{100},后者的为{111}。样品的红外吸收光谱表明,方片状热液石英沉淀可能与1224cm^-1吸收峰相对应。 关键词：     

钼单晶体中亚晶界位错结构的研究

本文应用蚀象法对电子束浮区区熔法制得的原生态钼单晶体中的亚晶界位错结构进行了直接观测。对于实验结果进行了细致的分析,并与亚晶界的Frank公式的一些预期结果比较,全面地证实了理论预测。对(111)面上平行蚀线方向的测量表明,它们大体沿着1/2〈111〉刃型位错的滑移面及攀移面的交线,从而证实了它们是这种位错所组成的一组位错倾侧型晶界。通过对蚀斑三叉亚晶界的分析,检验了推广后的Read-Shockley公式,同时表明存在着两组位错的倾侧晶界。对于(111)面上观察到的15组蚀线网络进行了分析,结果表明其中5组是1/2〈111〉/〈100〉网络,9组是〈100〉/〈110〉网络。分析中,除去应用Carrington等所发展的极图分析法以外,我们还根据Frank公式所规定的网线间距的关系式,提出了进一步定量检验的分析方法。实践证明,当极图分析不能获得唯一的结果时,这种定量检验法可以有效地确定位错网络的Burgers矢量。此外,我们还观察到奇位错和亚晶界交互作用的事例,特别是奇位错在亚晶界上引起“台阶”以及夹杂物和亚晶界交互作用的迹象。不同类型的亚晶界交接以及非平衡态的亚晶界也是经常可以观察到的。以上结果表明,蚀象法对于定量地研究原生态晶体中的亚晶界位错结构是极其有效的,其能力并不亚于电子显微镜薄膜透射法。     

铜晶体中类层错四面体的结构及其演化

运用分子动力学方法,研究了金属铜单晶中不同形状的Frank位错环演化形成的各种类层错四面体稳定构型.对其形成过程的细致分析表明,这些稳定构型都可以用统一的位错分解和位错反应过程来解释.模拟结果表明,在零温下各种Frank位错环存在各自的临界尺寸,小于临界尺寸的Frank位错环不能长成类层错四面体结构.对梯形、六边形等Frank位错环演化过程的模拟表明,在形成稳定类层错四面体的过程中,存在位错生长和回缩的振荡现象.振荡现象是由于位错间的排斥和吸引相互作用不同步或弹性波传播的延迟效应引起的. 关键词： 层错四面体 位错 分子动力学     

集中力作用下硅中位错结构

本文用化学侵蚀法研究了硅单晶样品在800—1000℃印压得到的位错“花结”。实验结果说明:印压产生的位错分布在{111}滑移面上;位错线的取向大部分是<110>或<112>方向。分析并观察到在压印下有两种位错环,一种是柏格斯矢量沿<110>方向并平行于(111)印压面;一种是柏格斯矢量沿<110>方向并与印压面相交。对位错环的结构进行了分析。     

α-Fe纯I型裂纹扩展中位错形成过程的三维分子动力学模拟

通过分子动力学方法模拟了三维 α-Fe I型裂纹的单向拉伸实验中的裂纹扩展过程。研究了在不同温度下裂纹扩展时位错的形成过程和断裂机理。计算结果表明,裂纹扩展过程是位错不断发射的过程。 裂纹尖端附近先形成无位错区和层错,当裂纹处应力增加到KI=0.566 MPam1/2时,裂纹尖端附近的某一层原子会逐渐分叉形成两层原子,分层后的原子层继续分离形成位错;当应力KI 达到0.669MPam1/2时第一个位错发射。随着温度的升高,临界应力强度因子逐渐降低,同时位错发射也相应地加快。     

暗视场及相衬显微术及其对Nd:YAG晶体中缺陷研究

暗视场及相衬显微术的分辨率可达10～500(?),采用这两种技术可以十分清淅地观察到用引上法及温梯法生长的Nd:YAG晶体中的点缺陷集团,小尺寸位错环,蜷线位错,片状缺陷时精细结构.特别是观察到非缀饰刃位错及混台位错的图像.对非缀饰位错的观察已用化学腐浊,光双折射貌相术及X射线形貌术作了证明.     

α-Fe纯I型裂纹扩展中位错形成过程的三维分子动力学模拟

通过分子动力学方法模拟了三维 α-Fe I型裂纹的单向拉伸实验中的裂纹扩展过程。研究了在不同温度下裂纹扩展时位错的形成过程和断裂机理。计算结果表明,裂纹扩展过程是位错不断发射的过程。 裂纹尖端附近先形成无位错区和层错,当裂纹处应力增加到KI=0.566 MPam1/2时,裂纹尖端附近的某一层原子会逐渐分叉形成两层原子,分层后的原子层继续分离形成位错;当应力KI 达到0.669MPam1/2时第一个位错发射。随着温度的升高,临界应力强度因子逐渐降低,同时位错发射也相应地加快。     

Formation and nature of swirl defects in silicon

Point defect agglomerates in dislocation-free silicon crystals, usually called “swirls”, have been investigated by means of high-voltage electron microscopy. It was found that a single swirl defect consists of a dislocation loop or a cluster of dislocation loops. By contrast experiments it could be shown that these loops are formed by agglomeration of self-interstitial atoms. Generally the loops have a/2〈110〉 Burgers vectors, but in specimens with high concentrations of carbon (～10¹⁷ cm^?3) and oxygen (～10¹⁶ cm^?3) also dislocation loops including a stacking fault were observed. In crystals grown at growth rates higher thanv=4 mm/min no swirls are observed; lower growth rates do not markedly affect the size and shape of the dislocation loops. With decreasing impurity content (particulary of oxygen and carbon) the swirl density decreases, whereas the dislocation loop clusters become larger and more complex. A model is presented which describes the formation of swirls in terms of agglomeration of silicon self-interstitials and impurity atoms.     

β—SiC外延层中晶体缺陷的观察

用腐蚀法研究了β-SiC外延层中的晶体缺陷。腐蚀剂为熔融氢氧化钾。三角形尖底蚀坑对应于位错。在β-SiC中的全位错为立方晶系的73°位错和60°位错。不同堆垛方式的β-siC生长层相遇时将形成{111}交界层错,其腐蚀图象为平行于<110>方向的直线。60°位错可分解为两个1/6<112>SchockLey不全位错,并夹着一片{111}层错构成扩展位错。三个1/6<110>压杆位错与三片{111}层错可构成层错锥体。正、反堆垛的β-SiC可形成尖晶石律双晶,双晶面为(111)。腐蚀法和X射线劳厄法证实了这种双晶的存在。 关键词：     

INTERACTION OF OXYGEN PRECIPITATES WITH STRUCTURAL DEFECTS IN CZ Si CRYSTALS

This paper ia dealing with the interaction between oxygen precipitates and structural defects in CZ Si crystals. Different lattice defects: dislocation loops, rod-like defects and stacking faults have been observed as a consequence of oxygen precipitation. In turn, these defects also promote the nucleation and growth of the oxygen precipitates. It is shown that the dislocation dipole is more efficient than single dislocation in enhancing the oxygen precipitate formation.     

γ-TiAl金属间化合物面缺陷能的分子动力学研究

运用分子动力学方法，对γ-TiAl金属间化合物的面缺陷能(层错能和孪晶能)进行了研究. 计算得到γ-TiAl不同滑移系(或孪生系)的整体堆垛层错能曲线，结果表明，γ-TiAl较一般fcc晶体结构的金属可动滑移系(孪生系)的数量减少，在外界条件下呈脆性. 研究孪生系(1/6)〈112〉{111}的弛豫的整体堆垛层错(GSF)能和整体孪晶(GTF)能曲线，对不稳定层错能γ_usf、稳定层错能γ_sf和不稳定孪晶能γ_usf值进行分析，可以预知， γ-TiAl的主要变形机理为孪生系(1/6)〈112〉{111}的孪生和普通滑移系(1/6)〈110〉{111}的滑移，以及超滑移系(1/2)〈011〉{111}的滑移. 关键词： γ-TiAl')" href="#">γ-TiAl 堆垛层错能 孪晶能 分子动力学     

Atomic configuration of a 12〈111〉 {110} edge dislocation in α-Fe

The atomic arrangement around a $\text{1}\text{2}$〈111〉 {110} edge dislocation in an α-Fe crystallite embedded in an elastic continuum is calculated, using the Johnson-I interatomic potential. A narrow dislocation without any stacking fault results, although there is some displacement in the core parallel to the dislocation line.     

TEM study on relationship between stacking faults and non-basal dislocations in Mg

Recent interest in the study of stacking faults and non-basal slip in Mg alloys is partly based on the argument that these phenomena positively influence mechanical behaviour. Inspection of the published literature, however, reveals that there is a lack of fundamental information on the mechanisms that govern the formation of stacking faults, especially I1-type stacking faults (I1 faults). Moreover, controversial and sometimes contradictory mechanisms have been proposed concerning the interactions between stacking faults and dislocations. Therefore, we describe a fundamental transmission electron microscope investigation on Mg 2.5 at. % Y (Mg–2.5Y) processed via hot isostatic pressing (HIP) and extrusion at 623 K. In the as-HIPed Mg–2.5Y, many 〈c〉 and 〈a〉 dislocations, together with some 〈c + a〉 dislocations were documented, but no stacking faults were observed. In contrast, in the as-extruded Mg–2.5Y, a relatively high density of stacking faults and some non-basal dislocations were documented. Specifically, there were three different cases for the configurations of observed stacking faults. Case (I): pure I2 faults; Case (II): mixture of I1 faults and non-basal dislocations having 〈c〉 component, together with basal 〈a〉 dislocations; Case (III): mixture of predominant I2 faults and rare I1 faults, together with jog-like dislocation configuration. By comparing the differences in extended defect configurations, we propose three distinct stacking fault formation mechanisms for each case in the context of slip activity and point defect generation during extrusion. Furthermore, we discuss the role of stacking faults on deformation mechanisms in the context of dynamic interactions between stacking faults and non-basal slip.     

Dependence of the critical radius of partial dislocation loops on the stacking fault energy in semiconductors

The dislocation loop size distribution in semiconductors CdTe, ZnTe, ZnSe, ZnS, CdS, GaAs, Si, and Ge has been studied using transmission electron microscopy. The experimental results have been compared with theoretical computations of the critical radii of the transition of partial dislocation loops to full ones with allowance for the dislocation loop formation energy and stacking fault energy of the materials. It has been shown that the critical radius depends on the stacking fault energy and is an important characteristic in the analysis of the defect formation processes in semiconductors.     

晶体生长的层错机制及其生长动力学

面心立方晶体中层错矢量为1/6<112>和1/3<111>的堆垛层错在生长面{111}上的露头处产生了亚台阶(sub-step)。基于亚台阶的原子图象的分析,本文讨论了层错生长机制及其生长动力学,证明了亚台阶处的成核势垒总是小于二维成核势垒,解释了近年来所观察到的堆垛层错作为生长台阶源的实验事实。 关键词：     

Accelerated oxygen precipitation in fast neutron irradiated Czochralski silicon

Annealing effect of the oxygen precipitation and the induced defects have been investigated on the fast neutron irradiated Czochralski silicon （CZ-Si） by infrared absorption spectrum and the optical microscopy. It is found that the fast neutron irradiation greatly accelerates the oxygen precipitation that leads to a sharp decrease of the interstitial oxygen with the annealing time. At room temperature （RT）, the 1107cm^-1 infrared absorption band of interstitial oxygen becomes weak and broadens to low energy side. At low temperature, the infrared absorption peaks appear at 1078cm^-1, 1096cm^-1, and 1182cm^-1, related to different shapes of the oxygen precipitates. The bulk microdefects, including stacking faults, dislocations and dislocation loops, were observed by the optical microscopy. New or large stacking faults grow up when the silicon self-interstitial atoms are created and aggregate with oxygen precipitation.