共查询到18条相似文献,搜索用时 187 毫秒
1.
采用原子力显微镜(AFM)、俄歇电子能谱(AES)和显微压痕分析等手段对射频等离子体增强化学气相沉积法制备的掺氮类金刚石(DLC:N)薄膜的微观结构和力学性能进行了研究.结果表明,随着含氮量的增加,DLC薄膜的AFM表面形貌中出现了几十纳米的颗粒,原子侧向力显微镜和AES分析表明这种纳米颗粒是x大于0.126的非晶氮化碳CNx结构.这种非晶DLC/CNx的纳米复合结构,减小了薄膜的内应力,从而提高了薄膜与衬底的附着力.
关键词:
类金刚石碳膜
微观结构
附着特性 相似文献
2.
利用反应磁控溅射方法在单晶硅和高速钢(W18Cr4V)基片上制备出不同C含量Ti-B-C-N纳米复合薄膜. 使用X射线衍射和高分辨透射电子显微镜研究了Ti-B-C-N纳米复合薄膜的组织和微观结构,用纳米压痕仪测试了它们的硬度和弹性模量. 结果表明,利用往真空室通入C2H2气体的方法制备得到的Ti-B-C-N纳米复合薄膜中,在所研究成分范围内只发现TiN基的纳米晶. 当C2H2流量较小时,C元素的加入可以促进Ti-B-C
关键词:
Ti-B-C-N薄膜
磁控溅射
微观结构
力学性能 相似文献
3.
利用电化学方法在室温下成功地沉积了类金刚石(DLC)薄膜和非晶CNx薄膜,并 对制备条件进行了讨论.通过扫描电子显微镜、傅里叶变换红外光谱技术,分析了薄膜的表面形貌和化学结合状态.场发射测量结果表明:DLC膜和非晶CNx的开启场分别为88和 10V/μm;并且在23V/μm的电场下,DLC膜和非晶CNx膜的发射电流密度分别达到10 和037mA/cm2.
关键词:
电化学沉积
类金刚石薄膜
x薄膜')" href="#">CNx薄膜
场致电子发射 相似文献
4.
不同沉积条件下,在单晶硅基底上沉积了含氮氟化类金刚石(FN-DLC)薄膜,用静滴接触角/表面张力测量仪测量了水与FN-DLC膜表面的接触角.用X射线光电子能谱、Raman光谱和傅里叶变换吸收红外光谱(FTIR)分析了薄膜的组分和结构.用原子力显微镜观测了薄膜的表面形貌.结果表明,FN-DLC薄膜疏水性能主要取决于薄膜表面的化学结构、薄膜表面极化强度的强弱、以及薄膜的表面粗糙度的大小.sp3/sp2的比值减小,CF2基团含量增加,薄膜粗糙度增加,接触角增大;反之,则接触角减小.在工艺上,沉积温度和功率的减小,气体流量比r(r=CF4/[CF4+CH4])的增加,都会使水的浸润性变差,接触角增大.
关键词:
氟化类金刚石膜
疏水性
接触角 相似文献
5.
采用分子动力学(MD)模拟研究了离子束辅助沉积(1BAD)生长类金刚石(DLC)膜的物理过程.分 别选C2分子和Ar离子作为沉积源和辅助沉积粒子.改变Ar的入射能量和到达比(A r/C),研 究了它对DLC膜结构的影响.重点讨论了Ar辅助沉积引起表面原子的瞬间活性变化对薄膜结构 产生的影响.分析表明,由于Ar离子的轰击引起的能量和动量的传递,大大地增强了C原子在 表面的反冲动能及迁移概率,增加了合成薄膜的SP3键含量.研究结果和实验 观察一致,并从合成机理上给出了一些定量解释.
关键词:
类金刚石膜
离子束辅助沉积
分子动力学模拟 相似文献
6.
利用脉冲高能量密度等离子体法在光学玻璃衬底上、在室温下成功的制备了光滑、致密、均匀的纳米类金刚石膜.工艺研究表明:放电电压和放电距离以及工作气体种类对纳米类金刚石膜的沉积起着关键作用.利用拉曼光谱、扫描电镜以及电子能量损失谱分析薄膜的形态结构表明:薄膜具有典型的类金刚石特征;纳米类金刚石膜的晶粒尺寸小于20nm甚至为非晶态;类金刚石膜中含有一定量的氮原子,随着沉积能量的升高,氮的含量增大.纳米类金刚石膜的薄膜电阻超过109Ω/cm2.对放电溅射过程进行了理论分析,结果与工艺研究的结论吻合. 相似文献
7.
以CF4,CH4和N2为源气体,利用射频等离子体增强化学气相沉积法,在不同功率下制备了含氮氟化类金刚石膜.用俄歇电子能谱、拉曼光谱、X射线光电子能谱和傅里叶变换红外光谱对薄膜的电子结构和化学键进行了表征,并结合高斯分峰拟合方法分析了薄膜中sp2,sp3结构比率.结果表明,制备的薄膜属于类金刚石结构,不同沉积功率下,薄膜内的sp2/sp3值在2.0—9.0之间,随着沉积功率的增加薄膜内sp2的相对含量增加.膜内主要有C—Fx(x=1,2),C—C,C=C和C≡N等化学键.沉积功率增加,C—C基团增加,膜内F的浓度降低,C—F基团减少,薄膜的关联加强,稳定性提高.
关键词:
含氮氟化类金刚石膜
sp结构
化学键结构
射频功率 相似文献
8.
9.
在对不同有机溶剂分子结构分析的基础上,选取甲醇、DMF(N,N-二甲基甲酰胺)和乙腈溶液为碳源,以脉冲直流电源电解有机溶液的方法在Si片上制得了含氢类金刚石薄膜(DLC薄膜),并研究了退火对薄膜结构的影响.通过X射线光电子能谱(XPS),喇曼(Raman)和红外(IR)光谱对薄膜的结构进行了分析表征.XPS表明薄膜的主要成分为C,喇曼光谱显示所得薄膜为典型DLC薄膜.喇曼和红外光谱还表明,膜中含有大量H并且主要键合于sp3碳处.随着退火的进行薄膜中的H被去除.随温度升高薄膜电阻率的下
关键词:
类金刚石薄膜
退火 相似文献
10.
不同条件下,在单晶硅基片上沉积了含氮氟化类金刚石(FN-DLC)薄膜.原子力显微(AFM)形貌显示,掺N后,薄膜变得致密均匀.傅里叶变换吸收红外光谱(FTIR)表明,随着r(r=N2/[N2+CF4+CH4])的增大薄膜中C—H键的逐渐减少,C〖FY=,1〗N和C≡N键含量逐渐增加.X射线光电子能谱(XPS)的C1s和N1s峰拟合结果发现,N掺入导致在薄膜中出现β-C3N4和a-CNx(x=1,2,3)成分.Roman散射谱的G峰向高频方向位移和峰值展宽等证明:随着r的增大,薄膜内sp2键态含量增加.
关键词:
氟化类金刚石膜
键结构
氮掺杂 相似文献
11.
Diamond-like carbon (DLC) films have been deposited using three different
techniques: (a) electron cyclotron resonance---plasma source ion
implantation, (b) low-pressure dielectric barrier discharge, (c)
filtered---pulsed cathodic arc discharge. The surface and mechanical properties of
these films are compared using atomic force microscope-based tests. The experimental results
show that hydrogenated DLC films are covered with soft surface layers
enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface
layers of tetrahedral amorphous carbon (ta-C) films have graphite-like
structure. The formation of soft surface layers can be associated with the
surface diffusion and growth induced by the low-energy deposition process.
For typical CVD methods, the atomic hydrogen in the plasmas can contribute
to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched
surface layers. The high-energy ion implantation causes the
rearrangement of atoms beneath the surface layer and leads to an increase in film
density. The ta-C films can be deposited using the medium energy carbon ions
in the highly-ionized plasma. 相似文献
12.
P. Vijai Bharathy D. Nataraj Paul K. Chu Q. Yang J. Silvestre-Albero 《Applied Surface Science》2010,257(1):143-150
Amorphous diamond like carbon (DLC) and titanium incorporated diamond like carbon (Ti-DLC) thin films were deposited by using reactive-biased target ion beam deposition method. The effects of Ti incorporation and target bias voltage on the microstructure and mechanical properties of the as-deposited films were investigated by means of X-ray photoelectron spectroscopy, Raman spectroscopy, transmission electron microscopy and nano-indentation. It was found that the Ti content in Ti-DLC films gets increased with increasing target bias voltage. At about 4.2 at.% of Ti, uniform sized well dispersed nanocrystals were seen in the DLC matrix. Using FFT analysis, a facility available in the TEM, it was found that the nanocrystals are in cubic TiC phase. Though at the core, the incorporated Ti atoms react with carbon to form cubic TiC; most of the surface exposed Ti atoms were found to react with the atmospheric oxygen to form weakly bonded Ti-O. The presence of TiC nanocrystals greatly modified the sp3/sp2 hybridized bonding ratio and is reflected in mechanical hardness of Ti-DLC films. These films were then tested for their biocompatibility by an invitro cell culturing test. Morphological observation and the cell proliferation test have demonstrated that the human osteoblast cells well attach and proliferate on the surface of Ti incorporated DLC films, suggesting possible applications in bone related implant coatings. 相似文献
13.
用脉冲偏压电弧离子镀方法在硬质合金基体上制备了一系列不同成分的C-N-V薄膜.用X射线光电子能谱、激光Raman光谱、 X射线衍射(XRD)、透射电子显微镜(TEM)和纳米压痕等方法分别研究了薄膜的成分、结构与性能.Raman光谱,XRD和TEM结果表明,所制备的薄膜为在类金刚石(DLC)非晶基体上匹配有VN晶体的碳基复合薄膜.随V和N含量的增加,薄膜硬度与弹性模量先增加后下降,在N含量为204%,V含量为218%时薄膜硬度与弹性模量具有最大值,分别为368和5697 GPa,高于相同条件下制备的
关键词:
C-N-V薄膜
类金刚石薄膜
纳米复合薄膜
电弧离子镀 相似文献
14.
Nanocomposite TiC/a-C:H film prepared on titanium aluminium alloy substrates by PSII assistant MW-ECRCVD 下载免费PDF全文
Thin films of titanium carbide and amorphous hydrogenated carbon have been synthesized on titanium aluminium alloy substrates by PSII assisted MW-ECRCVD with a mirror field. The microstructure, chemical composition and mechanical property were investigated. Using XPS and TEM, the films were identified to be a-C:H film containing TiC nanometre grains (namely, the so-called nanocomposite structure). The size of TiC grains of nanocomposite TiC/DLC film is about 5 nm. The nanocomposite structure has obvious improvement in the mechanical properties of DLC film. The hardness of a-C:H film with Ti is enhanced to 34 G Pa~ while that of a-C:H film without Ti is about 12 G Pa, and the coherent strength is also obviously enhanced at the critical load of about 35N. 相似文献
15.
UBMS技术制备DLC薄膜的光学常数椭偏分析 总被引:2,自引:0,他引:2
采用宽光谱变角度椭圆偏振仪对非平衡磁控溅射(UBMS)技术沉积的类金刚石(DLC)薄膜的光学常数进行了测量与分析。在建立模型时,根据DLC薄膜成膜特性,分析和调整了模型结构;综合考虑了表面粗糙度、薄膜与基底表面及界面因素对测试结果的影响,将表面层和界面层分离出来,并采用有效介质方法对它们的影响作了近似处理。结果表明:硅基底上采用UBMS技术制备DLC薄膜的椭偏数据,经该模型拟合后均方误差(MSE值)从37.39下降到4.061,提高了测量精度。 相似文献
16.
The influence of the structures and compounds of DLC coatings on the barrier properties of PET bottles 下载免费PDF全文
To reduce the oxygen transmission rate through a
polyethylene terephthalate (PET) bottle (an organic plastic)
diamond-like carbon (DLC) coatings on the inner surface of the PET
bottle were deposited by radio frequency plasma-enhanced chemical
vapour deposition (RF-PECVD) technology with C2H2 as the
source of carbon and Ar as the diluted gas. As the barrier layer to
humidity and gas permeation, this paper analyses the DLC film
structure, composition, morphology and barrier properties by Fourier
transform infrared, atomic force microscopy, scanning electron
microscopy and oxygen transmission rate in detail. From the
spectrum, it is found that the DLC film mainly consists of
sp3 bonds. The barrier property of the films is significantly
relevant to the sp3 bond concentration in the coating, the film
thickness and morphology. Additionally, it is found that DLC film
deposited in an inductively coupled plasma enhanced capacitively
coupled plasma source shows a compact, homogeneous and crack-free
surface, which is beneficial for a good gas barrier property in PET
bottles. 相似文献
17.
用射频等离子体方法在玻璃基底上制备的类金刚石(DLC)薄膜,采用离子注入法掺氮,并对掺氮DLC薄膜紫外(UV)辐照前后的性能变化进行了研究。研究结果表明:随氮离子注入剂量及UV辐照时间的增加,位于2 930cm-1附近的SP
3C-H吸收峰明显变小,而位于1 580cm-1附近的SP2C-H吸收峰则明显增强,薄膜的电阻率明显呈下降趋势;随UV辐照时间的增加,位于1 078cm-1附近的Si-O-Si键数量及位于786cm-1附近的Si-C键数量明显增加。即氮离子注入和UV辐照明显改变了DLC薄膜的结构与特性。 相似文献
18.
Guojun Zhang Bin Li Bailing Jiang Fuxue Yan Dichun Chen 《Applied Surface Science》2009,255(21):8788-8793
TiN, TiC and Ti(C, N) films have been respectively prepared using closed-field unbalanced magnetron sputtering ion plating technology, with graphite target serving as the C supplier in an Ar-N2 mixture gas. Bonding states and microstructure of the films are characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) in combination with transmission electron microscopy (TEM). The friction coefficients are measured by pin-on-disc test and the wear traces of deposited films are observed by optical microscope. Results show that the TiN film and Ti(C, N) film exhibit dense columnar structure while the TiC film exhibits a mixed microstructure of main nanocrystallite and little amorphous phases. The Ti(C, N) film has the highest microhardness value and the TiC film has the lowest. Because of small amount of pure carbon with sp2 bonds existing in the film, the friction coefficients of Ti(C, N) and TiC multilayer films are lower than that of TiN film. In addition, the multilayer structure of films also contributes visually to decrease of friction coefficients. The TiC film has extremely low friction coefficient while the wear ratio is the highest in all of the films. The results also show that the Ti(C, N) film has excellent anti-abrasion property. 相似文献