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Diamond-like carbon (DLC) films have been deposited using three different
techniques: (a) electron cyclotron resonance---plasma source ion
implantation, (b) low-pressure dielectric barrier discharge, (c)
filtered---pulsed cathodic arc discharge. The surface and mechanical properties of
these films are compared using atomic force microscope-based tests. The experimental results
show that hydrogenated DLC films are covered with soft surface layers
enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface
layers of tetrahedral amorphous carbon (ta-C) films have graphite-like
structure. The formation of soft surface layers can be associated with the
surface diffusion and growth induced by the low-energy deposition process.
For typical CVD methods, the atomic hydrogen in the plasmas can contribute
to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched
surface layers. The high-energy ion implantation causes the
rearrangement of atoms beneath the surface layer and leads to an increase in film
density. The ta-C films can be deposited using the medium energy carbon ions
in the highly-ionized plasma. 相似文献
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