利用倒梯矩形电子阻挡层降低深紫外激光二极管的电子泄露

为了有效降低深紫外激光二极管(DUV-LD)在有源区的电子泄露,提出了一种新颖的具有倒梯矩形的电子阻挡层(EBL)结构。通过使用Crosslight软件将矩形,梯矩形和倒梯矩形三种不同的结构进行仿真研究,比较三种结构器件的能带图、辐射复合率、电子空穴浓度、P-I以及V-I特性等,得出倒梯矩形EBL更能有效地抑制电子的泄露,从而改善了器件的光学和电学性能。     

利用W形空穴阻挡层降低AlGaN基深紫外激光二极管的空穴泄露

本文设计了V形和W形的空穴阻挡层(HBL)结构,改善空穴在AlGaN基深紫外激光二极管(DUV-LD)n型区的泄露问题.使用Crosslight软件,将参考型矩形、V形和W形三种空穴阻挡层结构进行仿真研究,分别比较了三种不同结构的DUV-LD能带、n区空穴浓度、辐射复合率、电光转换效率、有源区载流子浓度等特性,结果表明,具有W形空穴阻挡层的DUV-LD拥有更高的空穴有效势垒高度、更高的辐射复合率、更低的空穴泄露以及更好的斜率效率,可以有效降低深紫外激光二极管在n型区的空穴泄露,提升其光学和电学性能.     

利用倒双阶渐变阶梯形电子阻挡层减少深紫外激光二极管的电子泄露

本文提出了用双阶渐变阶梯和倒双阶渐变阶梯形电子阻挡层(EBL)以减少AlGaN基深紫外激光二极管(DUV-LDs)在p型区的电子泄露,并用Crosslight软件模拟仿真了双阶渐变阶梯和倒双阶渐变阶梯形EBL结构的光电特性,结果发现：具有倒双阶渐变阶梯形EBL的激光器拥有比双阶渐变阶梯形EBL激光器更高的斜率效率(SE),更高的输出功率,更低的阈值电流和阈值电压,更高的有效势垒高度和更低的电子泄露.这意味着前者拥有更强的抑制电子泄露的能力.在与矩形EBL结构对比中发现,所提出的结构还提高了有源区载流子浓度和辐射复合速率,进一步提高了DUV-LDs的光电性能.     

多量子势垒双阻挡层结构对AlGaN 基深紫外激光二极管的性能优化

为提高AlGaN基深紫外激光二极管(Deep Ultraviolet Laser Diodes,DUV-LD)有源区内载流子浓度,减少载流子泄露,提出一种DUV-LD双阻挡层结构,相对于传统的单一电子阻挡层(Electron Blocking Layer, EBL)结构,又引入一空穴阻挡层(Hole Blocking Layer, HBL),仿真结果证明空穴阻挡层的应用能很好地减少空穴泄漏.同时又对双阻挡层改用五周期Al_0.98Ga_0.02N/Al_0.9Ga_0.1N多量子势垒层结构,结果显示与矩形EBL和HBL激光二极管相比,多量子势垒EBL和HBL激光二极管有更好的斜率效率,并且有源区内电子和空穴载流子浓度以及辐射复合速率都有效提高,其中多量子势垒EBL在阻挡电子泄露方面效果更显著.     

带间级联激光器电子注入区优化研究(特邀)EI北大核心CSCD

带间级联激光器有源区内部的物理机制复杂,尚未得到充分研究。优化了电子注入区结构,通过减小InAs/AlSb啁啾超晶格中InAs量子阱的厚度促进电子向光增益区的注入,在较低的电子注入区掺杂浓度下满足了光增益区电子数和空穴数基本相等的注入平衡条件,降低了有源区中自由载流子吸收和杂质散射造成的光损耗。采用该有源区结构的带间级联激光器实现了较好的室温激射性能,腔长4 mm、脊宽20μm且腔面未镀膜器件的阈值电流为200 mA,单腔面出光功率为55 mW。通过分析2~5 mm不同腔长器件的电压-电流-光功率性能,得到器件的波导损耗仅为3 cm^(-1),有源区载流子寿命为0.7 ns。     

带间级联激光器电子注入区优化研究(特邀)

带间级联激光器有源区内部的物理机制复杂,尚未得到充分研究.优化了电子注入区结构,通过减小InAs/AlSb啁啾超晶格中InAs量子阱的厚度促进电子向光增益区的注入,在较低的电子注入区掺杂浓度下满足了光增益区电子数和空穴数基本相等的注入平衡条件,降低了有源区中自由载流子吸收和杂质散射造成的光损耗.采用该有源区结构的带间级...     

不规则H形量子势垒增强AlGaN基深紫外发光二极管性能

针对AlGaN基多量子阱中有效的平衡载流子注入问题,研究了有源区势垒层中Al组分调制形成的非规则H形量子势垒对AlGaN基深紫外发光二极管(LED)器件性能的影响及载流子的输运行为。研究发现,与多量子阱中常用的单Al组分势垒相比,加入Al组分较高的双尖峰势垒可以有效地提高内量子效率和光输出功率。进一步研究表明,电子在有源区因凸起的尖峰势垒而得到了有效的阻挡,减少了电子的泄露,而空穴获得更多的动能从而穿过较高的势垒进入有源区。因此,采用非对称H形量子势垒的深紫外LED器件中载流子输运实现了较好的平衡,量子阱中的载流子复合速率远高于普通的深紫外发光二极管。     

DPVBi空穴阻挡层对OLED性能的优化

研究了宽带隙有机小分子材料DPVBi作为空穴阻挡层对OLED器件效率和亮度的优化作用.DPVBi的引入有效地改善了以PEDOT:PSS做空穴注入层的OLED器件的空穴过剩问题.实验结果表明:通过优化DPVBi的厚度,插入30 nm厚的DPVBi空穴阻拦层可以有效地平衡OLED器件的电子和空穴浓度,降低器件的工作电压,优...     

阳极/有机层界面LiF层在OLED中的空穴缓冲作用

使用真空热蒸发镀膜法,在OLED层状结构中引入不同厚度的LiF作阳极修饰层,制备了结构为ITO/LiF/TPD/Alq₃/Al的器件。LiF超薄层的引入较好地修饰了ITO表面,减少了阳极和有机层界面缺陷态的形成,增强了器件的稳定性。实验结果表明: LiF层有效地阻挡空穴注入,增强载流子注入平衡,提高了器件的亮度和效率,含有1 nm厚LiF空穴缓冲层器件的性能最好,效率较不含缓冲层器件提高了近1.5倍。     

空穴注入层对蓝色有机电致发光器件性能的影响

以DPVBi为发光层,NPB为空穴传输层,在阳极ITO和NPB之间分别插入不同的空穴注入层CuPc和PEDOT:PSS,制备了两种结构的蓝色有机电致发光器件(OLEDs):ITO/CuPc/NPB/DPVBi/BCP/Alq3/Al和ITO/PEDOT:PSS/NPB/DPVBi/BCP/Alq3/Al,研究了不同空穴注入材料对蓝色OLEDs发光性能的影响,并与没有空穴注入层的器件进行了比较.其中CuPc分别采用旋涂和真空蒸镀两种丁艺,比较了不同成膜工艺对器件发光特性的影响.结果表明:加入空穴注入层的器件比没有空穴注入层器件性能要好,其中插入水溶性CuPc的器件,其发光亮度和效率虽然比蒸镀CuPc器件要低,但比插入PEDOT:PSS 器件发光性能要好.又由于水溶性CuPc采用旋涂工艺成膜,与传统CuPc相比,制备工艺简单,所以为一种不错的空穴注入材料.     

Improvement of light power and efficiency droop in GaN-based LEDs using graded InGaN hole reservoir layer

InGaN-based light-emitting diodes with graded indium composition p-type InGaN hole reservoir layer (HRL) are numerically investigated using the APSYS simulation software. It is found that by gradient increasing indium composition in growth direction of the p-InGaN HRL can improve light output power, lower current leakage and efficiency droop. Based on numerical simulation and analysis, these improvements on the electrical and optical characteristics are attributed mainly to tailoring energy band in p–n junction vicinal region, and finally enhanced the hole injection efficiency and electron blocking efficiency.     

Improvement of radiative recombination rate in deep ultraviolet laser diodes with step-like quantum barrier and aluminum-content graded electron blocking layer

The design of the active region structures, including the modifications of structures of the quantum barrier(QB) and electron blocking layer(EBL), in the deep ultraviolet(DUV) Al Ga N laser diode(LD) is investigated numerically with the Crosslight software. The analyses focus on electron and hole injection efficiency, electron leakage, hole diffusion,and radiative recombination rate. Compared with the reference QB structure, the step-like QB structure provides high radiative recombination and maximum output power. Subsequently, a comparative study is conducted on the performance characteristics with four different EBLs. For the EBL with different Al mole fraction layers, the higher Al-content Al Ga N EBL layer is located closely to the active region, leading the electron current leakage to lower, the carrier injection efficiency to increase, and the radiative recombination rate to improve.     

Performance improvement of blue InGaN light-emitting diodes with a specially designed n-AlGaN hole blocking layer

Blue InGaN light-emitting diodes (LEDs) with a conventional electron blocking layer (EBL), a common n-AlGaN hole blocking layer (HBL), and an n-AlGaN HBL with gradual Al composition are investigated numerically, which involves analyses of the carrier concentration in the active region, energy band diagram, electrostatic field, and internal quantum efficiency (IQE). The results indicate that LEDs with an n-AlGaN HBL with gradual Al composition exhibit better hole injection efficiency, lower electron leakage, and a smaller electrostatic field in the active region than LEDs with a conventional p-AlGaN EBL or a common n-AlGaN HBL. Meanwhile, the efficiency droop is alleviated when an n-AlGaN HBL with gradual Al composition is used.     

Performance improvement of blue light-emitting diodes with an AlInN/GaN superlattice electron-blocking layer

The characteristics of a blue light-emitting diode (LED) with an AlInN/GaN superlattice (SL) electron-blocking layer (EBL) are analyzed numerically. The carrier concentrations in the quantum wells, energy band diagrams, electrostatic fields, and internal quantum efficiency are investigated. The results suggest that the LED with an AlInN/GaN SL EBL has better hole injection efficiency, lower electron leakage, and smaller electrostatic fields in the active region than the LED with a conventional rectangular AlGaN EBL or a AlGaN/ GaN SL EBL. The results also indicate that the efficiency droop is markedly improved when an AlInN/GaN SL EBL is used.     

Performance improvement of GaN-based light-emitting diode with a p-InAlGaN hole injection layer

The characteristics of a blue light-emitting diode(LED)with a p-InAlGaN hole injection layer(HIL)is analyzed numerically.The simulation results indicate that the newly designed structure presents superior optical and electrical performance such as an increase in light output power,a reduction in current leakage and alleviation of efficiency droop.These improvements can be attributed to the p-InAlGaN serving as hole injection layers,which can alleviate the band bending induced by the polarization field,thereby improving both the hole injection efficiency and the electron blocking efficiency.     

Suppression of electron and hole overflow in GaN-based near-ultraviolet laser diodes

In order to suppress the electron leakage to p-type region of near-ultraviolet GaN/In_xGa_(1-x )N/GaN multiple-quantumwell(MQW) laser diode(LD), the Al composition of inserted p-type AlxGa_(1-x)N electron blocking layer(EBL) is optimized in an effective way, but which could only partially enhance the performance of LD. Here, due to the relatively shallow GaN/In_(0.04)Ga_(0.96)N/GaN quantum well, the hole leakage to n-type region is considered in the ultraviolet LD. To reduce the hole leakage, a 10-nm n-type Al_xGa_(1-x)N hole blocking layer(HBL) is inserted between n-type waveguide and the first quantum barrier, and the effect of Al composition of Al_xGa_(1-x)N HBL on LD performance is studied. Numerical simulations by the LASTIP reveal that when an appropriate Al composition of Al_xGa_(1-x)N HBL is chosen, both electron leakage and hole leakage can be reduced dramatically, leading to a lower threshold current and higher output power of LD.     

Simulation study of blue InGaN multiple quantum well light-emitting diodes with different hole injection layers

InGaN-based light-emitting diodes with p-GaN and p-AlGaN hole injection layers are numerically studied using the APSYS simulation software.The simulation results indicate that light-emitting diodes with p-AlGaN hole injection layers show superior optical and electrical performance,such as an increase in light output power,a reduction in current leakage and alleviation of efficiency droop.These improvements can be attributed to the p-AlGaN serving as hole injection layers,which can alleviate the band bending induced by the polarization field,thereby improving both the hole injection efficiency and the electron blocking efficiency.