双频容性耦合等离子体相分辨发射光谱诊断

采用相分辨发射光谱法, 对双频容性耦合纯Ar和不同含O₂量的Ar-O₂混合气体放电等离子体的鞘层激发模式进行了探究. 在射频耦合电源上极板的鞘层区域处观察到两种电子激发模式: 鞘层扩张引起的电子碰撞激发模式和二次电子引起的电子碰撞激发模式; 并发现这两种激发模式均受到低频射频电源周期的调制. 在纯Ar放电等离子体中, 两种激发模式的激发轮廓相似; 而在Ar-O₂混合气放电等离子体中, 随着含O₂量的增加, 二次电子的激发轮廓变弱. 此外, 利用相分辨发射光谱法对不同含O₂量的Ar-O₂混合气放电下Ar的 750.4 nm谱线的平均低频电源周期轴向分布进行了研究, 得到了距耦合电源上极板约3.8 mm处为双频容性耦合射频等离子体的鞘层边界. 关键词： 双频容性耦合等离子体 等离子体鞘层 发射光谱     

等离子体刻蚀工艺的物理基础

介绍了等离子体刻蚀工艺背景以及有关等离子体刻蚀机理的研究进展，综述了等离子体刻蚀机理的研究方法，着重阐述了电容耦合放电和电感耦合放电等离子体物理特性，特别是双频电容耦合放电等离子体和等离子体鞘层研究中的关键问题。     

Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopy

Plasma parameters from the discharge characteristics of a 13.56 MHz capacitively coupled radio frequency Ar plasma are evaluated on the basis of homogeneous discharge model for wide range of operating pressure. The homogeneous discharge model of capacitively coupled radio frequency discharge is modified to take into account the nonlinear plasma series resonance effect. The effect of drift velocity of the electron due to change in radio frequency electric field and operating pressure is also considered. Considerable dependent of plasma parameters on the drift velocity of the electron as well as on the plasma series resonance effect are observed in low pressure. An irregular variation of calculated plasma density with operating pressure is observed, which is reconfirmed with optical emission spectroscopy.     

Diagnostic of capacitively coupled radio frequency plasma by homogeneous discharge model

In this Letter, a plasma diagnostic technique is reported to evaluate the plasma parameters of capacitively coupled radio frequency argon plasma on the basis of homogeneous discharge model. The technique is implemented for wide range of operating pressure ranging from few mTorrs to atmospheric pressure. Considerable dependence of plasma parameters on the plasma series resonance effect and the drift velocity of the electron for low pressure plasma and on the ion density for atmospheric pressure plasma jet were observed.     

Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiative model

This paper proposes a simple collisional-radiative model to characterise capacitively coupled argon plasmas driven by conventional radio frequency in combination with optical emission spectroscopy and Langmuir probe measurements. Two major processes are considered in this model, electron-impact excitation and the spontaneous radiative decay. The diffusion loss term, which is found to be important for the two metastable states (4s[3/2]₂, 4s'[1/2]₀), is also taken into account. Behaviours of representative metastable and radiative states are discussed. Two emission lines (located at 696.5 nm and 750.4 nm) are selected and intensities are measured to obtain populated densities of the corresponding radiative states in the argon plasma. The calculated results agree well with that measured by Langmuir probe, indicating that the current model combined with optical emission spectroscopy is a candidate tool for electron density and temperature measurement in radio frequency capacitively coupled discharges.     

悬浮型微波共振探针在电负性容性耦合等离子体中电子密度的测量

本文首先利用悬浮型微波共振探针测量了Ar等离子体的电子密度,并与朗缪尔双探针的测量结果进行了比较,表明了微波共振探针在低密度等离子体测量的可行性.对40.68 MHz单射频容性耦合Ar/SF₆和SF₆/O₂等离子体的测量结果表明:电负性气体SF₆掺入Ar等离子体显著降低了等离子体电子密度,但随着增加SF₆的流量,电子密度表现为缓慢下降;而O₂掺入SF₆等离子体中,电子密度则随着O₂流量的增加表现为持续的下降.另外,40.68 MHz/13.56 MHz双频激发的SF₆/O₂容性耦合离子体的电子密度并不随低频功率的变化而变化.本文对上述的实验现象进行了初步的解释.     

Atmospheric pressure plasma jet utilizing Ar and Ar/H_2O mixtures and its applications to bacteria inactivation

An atmospheric pressure plasma jet generated with Ar with H2O vapor is characterized and applied to inactivation of Bacillus subtilis spores. The emission spectra obtained from Ar/H2O plasma shows a higher intensity of OH radicals compared to pure argon at a specified H2O concentration. The gas temperature is estimated by comparing the simulated spectra of the OH band with experimental spectra. The excitation electron temperature is determined from the Boltzmann’s plots and Stark broadening of the hydrogen Balmer Hβline is applied to measure the electron density. The gas temperature, excitation electron temperature, and electron density of the plasma jet decrease with the increase of water vapor concentration at a fixed input voltage. The bacteria inactivation rate increases with the increase of OH generation reaching a maximum reduction at 2.6%(v/v) water vapor. Our results also show that the OH radicals generated by the Ar/H2O plasma jet only makes a limited contribution to spore inactivation and the shape change of the spores before and after plasma irradiation is discussed.     

双频容性耦合等离子体密度径向均匀性研究

利用自主研制的全悬浮双探针, 对影响双频容性耦合等离子体径向均匀性的因素进行了研究. 发现低频功率、放电气压和放电间距对径向均匀性有明显影响. 合适的低频功率、放电气压及较大的极板间距可以得到更均匀的等离子体. 采用与实验相同的放电参数, 利用改进的二维流体模型进行理论模拟, 得到了不同极板间距下径向离子密度分布, 并和实验测量结果进行了比较, 两者的变化趋势基本符合. 关键词： 双频容性耦合等离子体 径向均匀性 全悬浮双探针 二维流体模型     

脉冲射频容性耦合氩等离子体的发射探针诊断

利用工作在浮点模式下的发射探针,对500 Hz脉冲调制的27.12 MHz容性耦合氩气等离子体的空间电位和电子温度的时变特性进行了诊断.等离子体空间电位是通过测量强热状态下的发射探针电位获得的,而电子温度则是由发射探针在冷、热状态下的电位差来估算得到.测量结果表明:脉冲开启时,空间电位会快速上升并在300μs内趋于饱和;当脉冲关断后,空间电位经历了快速下降后趋于稳定的过程.电子温度在脉冲开启时存在过冲并趋于稳定的特征;而在脉冲关断期间,电子温度在300μs内则快速下降到0.45 e V后略有上升.无论在脉冲开启或关断期间,空间电位基本上都随功率和气压的变化存在有线性的依赖关系;而放电功率对脉冲开启期间过冲电子温度与稳态电子温度差异的影响较大.针对空间电位和电子温度在各阶段及不同放电条件下的时变特性,给出了相应的解释.     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Plasma characteristics and broadband electromagnetic wave absorption in argon and helium capacitively coupled plasma

A one-dimensional self-consistent calculation model of capacitively coupled plasma(CCP) discharge and electromagnetic wave propagation is developed to solve the plasma characteristics and electromagnetic wave transmission attenuation.Numerical simulation results show that the peak electron number density of argon is about 12 times higher than that of helium, and that the electron number density increases with the augment of pressure, radio frequency(RF) power, and RF frequency. However, the electron number density first increases and then decreases as the discharge gap increases. The transmission attenuation of electromagnetic wave in argon discharge plasma is 8.5-d B higher than that of helium. At the same time, the transmission attenuation increases with the augment of the RF power and RF frequency, but it does not increase or decrease monotonically with the increase of gas pressure and discharge gap. The electromagnetic wave absorption frequency band of the argon discharge plasma under the optimal parameters in this paper can reach the Ku band. It is concluded that the argon CCP discharge under the optimal discharge parameters has great potential applications in plasma stealth.     

The mechanism of hydrogen plasma passivation for poly-crystalline silicon thin film

The mechanism of hydrogen plasma passivation for poly-crystalline silicon （poly-Si） thin films is investigated by optical emission spectroscopy （OES） combined with Hall mobility, Raman spectra, absorption coefficient spectra, and so on. It is found that different kinds of hydrogen plasma radicals are responsible for passivating different defects in polySi. The Ha with lower energy is mainly responsible for passivating the solid phase crystallization （SPC） poly-Si whose crystallization precursor is deposited by plasma-enhanced chemical vapor deposition （PECVD）. The H＊ with higher energy may passivate the defects related to teh Ni impurity around the grain boundaries more effectively. In addition, Hβ and H7 with the highest energy are required to passivate intra-grain defects in the poly-Si crystallized by SPC but whose precursor is deposited bv low pressure chemical vapor deposition（LPCVD）     

60MHz电容耦合等离子体中电子能量分布函数特性研究

甚高频(频率大于30 MHz)耦合放电源由于能产生大面积高密度的等离子体而受到了人们的广泛关注. 采用电流、电压探针以及朗缪尔探针诊断技术对60MHz射频激发产生的容性耦合等离子体的放电特性及电子行为进行了研究. 实验结果表明,等离子体的等效电阻/电容随着射频输入功率的增加而减小/增加;等离子体中电子行为不仅依赖于射频输入功率,还与放电气压密切相关;放电气压的增加导致电子能量概率分布函数(EEPF)从双温Maxwellian分布向Druyvesteyn分布转变,而且转变气压远低于文献所报道的数值,这主要是由于在60MHz容性耦合等离子体中电子反弹共振加热效率大为降低. 关键词： 甚高频容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

Drift-wave fluctuation in an inviscid tokamak plasma

In order to describe the characterization of resistive drift-wave fluctuation in a tokamak plasma,a coupled inviscid two-dimensional Hasegawa–Wakatani model is investigated.Two groups of new analytic solutions with and without phase shift between the fluctuant density and the fluctuant potential are obtained by using the special function transformation method.It is demonstrated that the fluctuant potential shares similar spatio–temporal variations with the density.It is found from the solutions without phase shift that the effect of the diffusion and adiabaticity on the fluctuant density is quite complex,and that the fluctuation may be controlled through the adiabaticity and diffusion.By using the typical parameters in the quasi-adiabatic regime in the solutions with phase shift,it is shown that the density gradient becomes larger as the contours become dense toward the plasma edge and the contours have irregular structures,which reveal the nonuniform distribution in the tokamak edge.     

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N2-Ar射频放电等离子体广泛应用于微电子工业的刻蚀、氮化物薄膜的制备及金属表面氮化等技术领域。开发了N2-Ar混合气体容性耦合射频放电PIC/MC自洽模型,模型主要描述了e-,N2+,N+,Ar+等主要带电粒子的行为分布。等离子体的碰撞过程分别考虑了带电粒子(e-,N2+,N+,Ar+)与基态中性N2分子和Ar原子的21种碰撞反应过程。模拟结果表明,在纯N2及N2-Ar混合气体容性耦合射频放电中,各种带电粒子的数密度都在等离子体区达到最大值,且氮分子离子为主要粒子;在N2容性耦合射频放电中,加入10%氩气时,N+平均能量有所增加,在射频电极处两种氮离子(N2+,N+)高能粒子所占比例增加。本研究对认识N2-Ar射频放电等离子体过程微观机理具重要意义。     

Aspects of the dielectric upstream region barrier discharge in a plasma jet with configurations

A plasma column with a length of about 65 cm is generated in the upstream region of a plasma jet using dielectric barrier discharge configurations. The effects of experimental parameters such as the amplitude of the applied voltage and the driving frequency are investigated in aspects of the plasma column by the optical method. Results show that both the plasma length and the propagating velocity, as well as the discharge current, increase with the increase in the applied voltage or its frequency. The discharge mechanism is analysed qualitatively based on streamer theory, where photo-ionization is important. Furthermore, optical emission spectroscopy is used to investigate the electric field intensity of the upstream region.     

Effects of some parameters on the divertor plasma sheath characteristics and fuel retention in castellated tungsten tile gaps

Castellation of plasma facing components is foreseen as the best solution for ensuring the lifetime of future fusion devices. However, the gaps between the resulting surface elements can increase fuel retention and complicate fuel removal issues. To know how the fuel is retained inside the gaps, the plasma sheath around the gaps needs to be understood first. In this work, a kinetic model is used to study plasma characteristics around the divertor gaps with the focus on the H＋ penetration depth inside the poloidal gaps, and a rate-theory model is coupled to simulate the hydrogen retention inside the tungsten gaps. By varying the magnetic field strength and plasma temperature, we find that the H＋ cyclotron radius has a significant effect on the penetration depth. Besides, the increase of magnetic field inclination angle can also increase the penetration depth. It is found in this work that parameters as well as the penetration depth strongly affect fuel retention in tungsten gaps.     

Fabricating GeO2 passivation layer by N20 plasma oxidation for Ge NMOSFETs application

In this paper, oxidation of Ge surface by N2O plasma is presented and experimentally demonstrated. Results show that 1.0-nm GeO2 is achieved after 120-s N20 plasma oxidation at 300 ℃. The GeO2/Ge interface is atomically smooth. The interface state density of Ge surface after N20 plasma passivation is about - 3 × 1011 cm-2.eV-1. With GeO2 passivation, the hysteresis of metal-oxide-semiconductor （MOS） capacitor with A1203 serving as gate dielectric is reduced to - 50 mV, compared with - 130 mV of the untreated one. The Fermi-level at GeO2/Ge interface is unpinned, and the surface potential is effectively modulated by the gate voltage.     

Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition

This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.     

Energy spectrum of multi-radiation of X-rays in a low energy Mather-type plasma focus device

The multi-radiation of X-rays was investigated with special attention to their energy spectrum in a Mather-type plasma focus device （operated with argon gas）. The analysis is based on the effect of anomalous resistances. To study the energy spectrum, a four-channel diode X-ray spectrometer was used along with a special set of filters. The filters were suitable for detection of medium range X-rays as well as hard X-rays with energy exceeding 30 keV. The results indicate that the anomalous resistivity effect during the post pinch phase may cause multi-radiation of X-rays with a total duration of 300 ± 50 ns. The significant contribution of Cu-Kα was due to the medium range X-rays, nonetheless, hard X-rays with energies greater than 15 keV also participate in the process. The total emitted X-ray energy in the forms of Cu-K and Cu-K/3 was around 0.14 ± 0.02 （J/Sr） and 0.04 ±0.01 （J/Sr）, respectively. The total energy of the emitted hard X-ray （〉 15 keV） was around 0.12± 0.02 （J/Sr）.