双频容性耦合等离子体密度径向均匀性研究

利用自主研制的全悬浮双探针, 对影响双频容性耦合等离子体径向均匀性的因素进行了研究. 发现低频功率、放电气压和放电间距对径向均匀性有明显影响. 合适的低频功率、放电气压及较大的极板间距可以得到更均匀的等离子体. 采用与实验相同的放电参数, 利用改进的二维流体模型进行理论模拟, 得到了不同极板间距下径向离子密度分布, 并和实验测量结果进行了比较, 两者的变化趋势基本符合. 关键词： 双频容性耦合等离子体 径向均匀性 全悬浮双探针 二维流体模型     

One-dimensional hybrid simulation of the electrical asymmetry effect caused by the fourth-order harmonic in dual-frequency capacitively coupled plasma

A one-dimensional hybrid model was developed to study the electrical asymmetry effect(EAE) caused by the fourthorder harmonic in a dual-frequency capacitively coupled Ar plasma.The self-bias voltage caused by the fourth-order frequency changes periodically with the phase angle,and the cycle of self-bias with the phase angle is π/2,which is half of that in the second-order case.The influence of the phase angle between the fundamental and its fourth-order frequency on the ion density profiles and the ion energy distributions(IEDs) were studied.Both the ion density profile and the IEDs can be controlled by the phase angle,which provides a convenient way to adjust the sheath characters without changing the main discharge parameters.     

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

A high-density RF ion source is an essential part of a neutral beam injector. In this study, the authors attempt to retrofit an original regular RF ion source reactor by inserting a thin dielectric tube through the symmetric axis of the discharge chamber. With the aid of this inner tube, the reactor is capable of generating a radial magnetic field instead of the original transverse magnetic field, which solves the E × B drift problem in the current RF ion source structure. To study the disturbance of the dielectric tube, a fluid model is introduced to study the plasma parameters with or without the internal dielectric tube, based on the inductively coupled plasma(ICP) reactor. The simulation results show that while introducing the internal dielectric tube into the ICP reactor, both the plasma density and plasma potential have minor influence during the discharge process, and there is good uniformity at the extraction region. The influence of the control parameters reveals that the plasma densities at the extraction region decrease first and subsequently slow down while enhancing the diffusion region.