首页 | 本学科首页   官方微博 | 高级检索  
     检索      

双频容性耦合等离子体密度径向均匀性研究
引用本文:蒋相站,刘永新,毕振华,陆文琪,王友年.双频容性耦合等离子体密度径向均匀性研究[J].物理学报,2012,61(1):15204-015204.
作者姓名:蒋相站  刘永新  毕振华  陆文琪  王友年
作者单位:1. 大连理工大学物理与光电工程学院, 大连 116024; 2. 新疆工业高等专科学校, 乌鲁木齐 830091
基金项目:国家自然科学基金重点项目 (批准号: 10635010) 资助的课题.
摘    要:利用自主研制的全悬浮双探针, 对影响双频容性耦合等离子体径向均匀性的因素进行了研究. 发现低频功率、放电气压和放电间距对径向均匀性有明显影响. 合适的低频功率、放电气压及较大的极板间距可以得到更均匀的等离子体. 采用与实验相同的放电参数, 利用改进的二维流体模型进行理论模拟, 得到了不同极板间距下径向离子密度分布, 并和实验测量结果进行了比较, 两者的变化趋势基本符合. 关键词: 双频容性耦合等离子体 径向均匀性 全悬浮双探针 二维流体模型

关 键 词:双频容性耦合等离子体  径向均匀性  全悬浮双探针  二维流体模型
收稿时间:2010-12-14
修稿时间:2/4/2011 12:00:00 AM

Radial density uniformity of dual frequency capacitively coupled plasma
Jiang Xiang-Zhan,Liu Yong-Xin,Bi Zhen-Hu,Lu Wen-Qi and Wang You-Nian.Radial density uniformity of dual frequency capacitively coupled plasma[J].Acta Physica Sinica,2012,61(1):15204-015204.
Authors:Jiang Xiang-Zhan  Liu Yong-Xin  Bi Zhen-Hu  Lu Wen-Qi and Wang You-Nian
Institution:School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;Xinjiang Ploytechnical College, Urumqi 830091, China;School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
Abstract:The influences on dual frequency capacitively coupled plasma radial uniformity are studied with a newly developed complete floating double probe. It is found that low frequency power, discharge pressure and gap have significant effects on radial uniformity. The results show that a suitable low frequency power, discharge pressure and larger discharge gap can achieve more uniform plasma. Finally, the improved two-dimensional fluid model simulations are performed with the same discharge parameters in experiment. The radial ion density distributions are obtained for different discharge gaps. The results are almost consistent with each other.
Keywords:dual frequency capacitively coupled plasma  radial uniformity  complete floating double probe  improved 2D fluid simulations
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号