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Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopy |
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| Authors: | B Bora H Bhuyan M Favre E Wyndham H Chuaqui CS Wong |
| Institution: | 1. Department of Physics, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Santiago, Chile;2. Comisión Chilena de Energía Nuclear (CCHEN), Casila 188-D, Santiago, Chile;3. Plasma Technology Research Centre, Physics Department, University of Malaya, 50603 Kuala Lumpur, Malaysia |
| Abstract: | Plasma parameters from the discharge characteristics of a 13.56 MHz capacitively coupled radio frequency Ar plasma are evaluated on the basis of homogeneous discharge model for wide range of operating pressure. The homogeneous discharge model of capacitively coupled radio frequency discharge is modified to take into account the nonlinear plasma series resonance effect. The effect of drift velocity of the electron due to change in radio frequency electric field and operating pressure is also considered. Considerable dependent of plasma parameters on the drift velocity of the electron as well as on the plasma series resonance effect are observed in low pressure. An irregular variation of calculated plasma density with operating pressure is observed, which is reconfirmed with optical emission spectroscopy. |
| Keywords: | Capacitively couple radio frequency plasma Homogeneous discharge model Plasma parameters Electrical discharge characteristics Optical emission spectroscopy |
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