多孔硅在30~180℃温区光致发光谱的研究

对长期存放在空气中的多孔硅样品和即时制备的多孔硅样品分别在室温~180℃下进行了光致发光（PL）温度效应的研究.两类样品的PL呈现不同的变化规律.前者的PL还表现为双峰,且长波PL峰随温度升高蓝移;后者的PL表现为单峰,且PL峰位随温度升高红移.基于量子限制效应对后者进行了解释;而前者难以用分立的量子限制和表面发光中心模型来解释,实验结果表明两种机制之间可能有较复杂的耦合效应发生.     

多孔硅的制备条件对其光致发光特性的影响

不同的实验条件下制备的多孔硅的光致发光(PL)特性是不同的,这是许多研究产生分歧的主要原因。对比分析了阳极氧化电流密度、阳极氧化时间、溶液浓度以及自然氧化时间对多孔硅光致发光光谱的影响。认为在一定的范围内,多孔硅的发光峰位会随电流密度的增大而蓝移,要获得较强的发光,需要选择合适的电流密度;随着腐蚀时间的延长,多孔硅的发光峰位也发生蓝移。当HF酸的浓度较小时,峰位随浓度的增大表现为向低能移动;而当HF酸的浓度较大时,峰位随浓度的增大则表现为移向高能。多孔硅在空气中自然氧化,其发光峰位发生蓝移,而发射强度随放置时间的延长而降低。并用量子限制模型和发光中心模型对实验结果进行解释。     

多孔硅的光致发光机制

人们已经提出了许多解释多孔硅发光的理论模型,每个模型都可以针对某些实验现象做出合理的解释,而对其他的实验结果就可能无法解释甚至相悖,因此多孔硅的发光机制至今仍是需要进一步研究和解决的问题。通过改变阳极氧化的条件,制得了一系列样品,其光致发光谱主要有四个峰。随着制备条件的改变,各个峰位的变化不大,但峰值强度比的变化比较大。随着自然氧化时间的延长,各个峰位的变化很小,有红移也有蓝移,有的则基本不变;而峰值强度的减弱幅度较大,但对应于各个峰位幅度的减弱是均衡的。分析实验现象产生的原因,认为多孔硅的发光是多种发光机制共同作用的结果;多孔硅纳米量子线的一定尺寸分布,不仅使光致发光谱存在一定的带宽,而且也是产生多峰现象的原因之一;多孔硅的结构特征对其发光特性起着决定性的作用。     

离子注入对多孔硅可见光发射特性的影响

本文在前期对多孔硅发光机理研究的基础上,研究了离子注入对多孔硅光致发光的影响.实验表明离子注入除了可以降低多孔硅光致发光的强度外,还将使多孔硅的光致发光光谱谱峰产生蓝移、半高宽展宽,并在多孔硅发光谱带中产生一些发光减弱区和次峰结构.文中最后对实验现象做了解释.     

多孔硅光致发光的温度效应研究

通过对多孔硅光致发光峰随测量温度变化的研究，发现随测量温度的下降，光致发光峰位有两种截然不同的移动方向：发光峰中心波长较长的样品，主峰向低能方向移动(即红移)；而发光峰位波长较短的样品则向高能方向移动(即蓝移).根据多孔硅光致发光峰的温度效应，定性地给出了发光效率随波长变化的模拟曲线，并由此能较好地解释多孔硅光致发光峰位随温度变化而移动的实验现象. 关键词：     

发光不衰减的多孔硅

用一种新的方法制备出了具有不同衰减的光致发光特性的多孔硅。如此制备的多孔硅新鲜样品,其发光峰位强度比普通多孔硅高２￣２．５倍,将样品在室温下暴露于空气中,其发光强度在前４个月中单调增加,然后达到饱和。在随后的８个月中,没有观察到发光衰减,发光峰位也没有发生变化,这种发光稳定性被归因子于多孔硅表面所形成的稳定的Ｆｅ－Ｓｉ键。文章探讨了发光不衰减、峰位不蓝移的机理,并为多孔硅发光的量子限域模型提供了强     

内电场对纳米硅光致发光谱的影响

从量子限制发光中心模型出发，计算了纳米硅的光致发光（PL）特征与发光中心间的关系. 研究发现，纳米硅与发光中心间的内电场对载流子复合率及峰位振荡有着十分重要的影响. 在2—5 nm的尺寸范围内，纳米硅发光中心上的载流子复合概率远大于内部复合概率，仅需考虑发光中心上的载流子复合发光. 还发现发光中心与纳米硅粒子间的内电场对于纳米硅的发光峰位振荡有着显著的影响.发光中心与纳米硅粒子间的内电场的存在会显著减小纳米硅粒子的内部发光效率以及外部相应发光中心上的发光强度，使得纳米硅PL谱的峰位随纳米晶粒尺寸变化而发生 关键词： 内电场 纳米硅 光致发光 量子限制发光中心     

非桥氧空穴发光中心对铁钝化多孔硅光致发光的影响

采用水热腐蚀法制备了铁钝化多孔硅样品,样品光致发光谱的荧光峰位于2.0eV附近,半峰宽约为0.40eV。激发波长从240nm增大到440nm的过程中,荧光峰先红移再蓝移,最后基本稳定,变化曲线呈勺型。通过分析15片发光多孔硅样品的统计结果,发现荧光峰逆转所对应的激发波长位于330nm附近,相应的激发光子能量约为3.8eV。样品光致发光谱随激发波长的勺型变化过程与≡Si—O↑和≡Si—O↑…H—O—Si≡两类非桥氧空穴发光中心共同作用时的发光行为一致。     

大气中长期存放与长时间热氧化后多孔硅光致发光峰能量的会聚

改变阳极氧化的工艺条件,制备出光致发光峰能量位于1.4—2.0eV范围内的大量多孔硅样品,其中45块样品在大气中存放一年,102块样品在200℃下热氧化(累计达200小时).在上述两种情况下,光致发光峰能量在氧化后都会聚到1.70—1.75eV能量范围.假设在充分氧化的多孔硅中包裹纳米硅的氧化层中,存在发光能量处于～1.70—1.75eV的发光中心,上述实验结果可以用量子限制/发光中心模型解释. 关键词：     

InP基InAs量子线异常的变温光致发光谱研究北大核心CSCD

制备了InAs/InAlGaAs/InP(001)量子线结构,利用变温光致发光谱(PL)研究了InAs量子线的光学特性.随温度增加InAs量子线PL谱的发光峰位呈异常的S型变化,即:在15K^35K时峰位红移;在35K^55K温度范围内峰位发生了蓝移;随后随温度进一步增加,峰位再次发生红移.分析认为这种S型峰位的变化可能是由于不同温度下载流子的不同复合机制所引起的.     

Structure and photoluminescence properties of ZnS films grown on porous Si substrates

ZnS films were deposited on porous silicon (PS) substrates with different porosities. With the increase of PS substrate porosity, the XRD diffraction peak intensity decreases and the surface morphology of the ZnS films becomes rougher. Voids appear in the films, due to the increased roughness of PS structure. The photoluminescence (PL) spectra of the samples before and after deposition of ZnS were measured to study the effect of substrate porosity on the luminescence properties of ZnS/PS composites. As-prepared PS substrates emit strong red light. The red PL peak of PS after deposition of ZnS shows an obvious blueshift. As PS substrate porosity increases, the trend of blueshift increases. A green emission at about 550 nm was also observed when the porosity of PS increased, which is ascribed to the defect-center luminescence of ZnS. The effect of annealing time on the structural and luminescence properties of ZnS/PS composites were also studied. With the increase of annealing time, the XRD diffraction peak intensity and the self-activated luminescence intensity of ZnS increase, and, the surface morphology of the ZnS films becomes smooth and compact. However, the red emission intensity of PS decreases, which was associated with a redshift. White light emission was obtained by combining the luminescence of ZnS with the luminescence of PS.     

氮团簇离子注入单晶硅的光致发光谱研究

氮团簇离子N⁺₁₀注入单晶硅直接诱发其表层转化为纳米晶结构, 导致光学性质发生显著变化. 在250—320nm波段的紫外光激励下,在330—500nm光区出现明显的光发射带,并在360nm附近产生强度极高、单色性良好的发射峰,其强度达到N⁺注入试样或基底的5倍,是N⁺₂注入试样的1.5倍. 在可见光区的730nm附近和近红外区的830nm附近也出现发光带. 所有上述发光都非常稳定,可长时间保持其发 关键词： 光致发光 团簇离子注入 硅单晶 纳米晶结构     

多孔硅发光与量子尺寸效应的实验研究

利用电化学阳极腐蚀的方法制备了多孔硅膜,实验发现多孔硅膜为多层结构,表面层为纳米结构,其余为微米结构,多孔硅的物理及化学结构的研究表明多孔硅是一种表面上含硅、氧、氢、氟元素组成的化合物包覆着的纳米晶硅粒和微米硅丝.多孔硅的发光主要来自表面纳米结构层,亚微米结构层并未见发光,从实验上证实了多孔硅的发光与量子尺寸效应紧密关联.     

Excess Si concentration dependence of the photoluminescence of Si nanoclusters in SiO2 fabricated by ion implantation

A method for the fabrication of luminescent Si nanoclusters in an amorphous SiO₂ matrix by ion implantation and annealing, and the detailed mechanisms for the photoluminescence are reported. We have measured the implanted ion dose, annealing time and excitation energy dependence of the photoluminescence from implanted layers. The samples were fabricated by Si ion implantation into SiO₂ and subsequent high-temperature annealing. After annealing, a photoluminescence band below 1.7 eV has been observed. The peak energy of the photoluminescence is found to be independent of annealing time and excitation energy, while the intensity of the luminescence increases as the annealing time and excitation energy increase. Moreover, we found that the peak energy of the luminescence is strongly affected by the dose of implanted Si ions especially in the high dose range. These results indicate that the photons are absorbed by Si nanoclusters, for which the band-gap energy is modified by the quantum confinement effects, and the emission is not simply due to direct electron–hole recombination inside Si nanoclusters, but is related to defects probably at the interface between Si nanoclusters and SiO₂, for which the energy state is affected by Si cluster–cluster interactions. It seems that Si nanoclusters react via a thin oxide interface and the local concentrations of Si nanoclusters play an important role in the peak energy of the photoluminescence.     

脉冲激光沉积法制备的纳米硅薄膜的结构与光学性质

采用二次阳极氧化法,制备了多孔氧化铝模板。在真空背景下,用脉冲激光沉积法,在多孔氧化铝模板上沉积一层硅,制成了硅与多孔氧化铝的复合膜,然后用盐酸将多孔氧化铝模板完全腐蚀掉,制备均匀分布着硅纳米线的硅膜。用扫描电子显微镜、X射线衍射、光致发光对纳米硅的结构和光学性质进行了测试分析。结果表明:硅纳米线的直径约为67.5nm,长度约为100nm,数密度约10¹¹/cm²。光致发光谱是可见光范围内的一个宽发射峰,上面叠加了许多具有精细结构的尖峰,尖峰之间的波长间隔不相等,但能量间隔相等。分析了样品的结构特点,利用量子限制模型和表面发光中心模型对光谱进行了解释,提出了一个新的能级模型,求出了各个尖峰对应激发态能级的量子数。为探讨纳米硅的发光机制和实现硅发光器件的制备提供了实验依据。     

Simple fabrication of nanostructured silicon and photoluminescence

Porous Si (PS) was fabricated simply by electrochemical anodic etching of a Si wafer. By a combination of SEM, EDX and infrared spectrum measurements hydrogen-terminated crystalline Si surfaces were identified. Transparent Si nanocolloids were obtained via thermally-initiated hydrosilation of the hydrogenated Si surfaces reaction with unsaturated 1-undecene. In contrast to weak luminescence in the hydrogenated PS dispersed in toluene, intense luminescence was observed in the Si nanocolloid. In the Si nanocolloid, both strong luminescence and long-term stability can be correlated with alkylated passivation, as formation of Si–C bonds identified in infrared spectrum. Additionally, the oxidation effect was noticeable in affecting the luminescence of nano-Si during the process.     

多孔硅后处理对其镶嵌染料光学特性的影响

对多孔硅进行真空退火处理和暴露大气快速退火处理,将有机染料香豆素102(C102)镶嵌其中,研究镶嵌复合膜发光特性的变化。通过比较多孔硅退火处理前、后傅立叶红外(FT-IR)吸收光谱的变化,从多孔硅与镶嵌染料分子间的能量传递方式角度出发,解释了PS表面态氧化能改善镶嵌复合膜发光特性的原因。实验通过改变多孔硅表面态,提高了复合膜的发光效率和多孔硅基体的透明程度,证明了多孔硅是一种良好的载体,在发展固体激光器方面有一定的应用,同时为实现硅基蓝绿发光开辟一条新的途径。     

Room temperature visible light emission from Si/SiO2 multilayers: Roles of interface electronic states and silicon phase

We have studied luminescence properties and microstructure of 20 patterns Si/SiO₂ multilayers. The photoluminescence spectra consist of two gaussian bands in the visible-infrared spectral region. It has been demonstrated that the strong PL band is caused by the radiative recombination in the Si/SiO₂ interfaces states, whereas the weaker band originates from radiative recombination in the nanosized Si layers. The peak shift of this latter band shows a discontinuity that corresponds to a crystalline-to-amorphous phase change when the Si layers are thinner than 30 Å. The peak energy as a function of the layer thickness is interpreted using a quantum confinement model in the case of amorphous Si layers.     

Luminescence properties of Er in SiN/PS : Er

The decrease in luminescence from host porous silicon (PS) by thermal annealing prevents the optical activation of Er ions. We prepared a SiN layer on erbium-doped porous silicon (PS : Er) as the capping layer by photo-chemical vapor deposition (photo-CVD). After deposition of SiN, the sample was annealed in pure Ar atmosphere for optical activation. We observed an Er-related emission at 1532 nm with a full-width at half-maximum (FWHM) of 10 nm at 18 K from the sample with the SiN layer. In contrast, no emission was observed from the sample without the SiN layer. At 300 K, the peak intensity of Er³⁺-related photoluminescence (PL) for the sample annealed at 1100°C decreased to 40.0% of that observed at 18 K. From these results, it was found that the SiN layer on PS:Er is useful for both host PS and Er-related 1.5 μm luminescences.