Monte Carlo方法研究低能电子束曝光沉积能分布规律

建立一个描述低能电子在多元多层介质中散射的物理模型,运用MonteCarlo方法模拟低能电子在靶体胶衬底中的复杂散射过程,在此基础上通过大量计算研究入射束能、胶层厚度、衬底材料等不同曝光条件对抗蚀剂沉积能密度分布的影响,获得沉积能分布规律:适量的低束能、薄胶层、低原子序数衬底可以使前散射电子对胶中沉积能密度分布的贡献增大、背散射电子的贡献减小,从而提高曝光分辨率. 关键词： 电子束曝光 MonteCarlo方法 低能电子散射 能量沉积     

Design, Fabrication and Test of a Soft X-Ray Even-Order Transmission Grating

Most transmission gratings in the x-ray region work with their first orders and dispersion is limited by the line density achievable with current fabrication technology. We present a novel design of a two-dimensional x-ray transmission grating. The grating works with higher dispersion using its second orders, and the influence from first and third orders can be suppressed. A grating according to the novel design is fabricated and its diffraction performance is tested in comparison with a traditional x-ray transmission grating with the same line density. The novel grating could be especially useful when high dispersion is desired while the fabrication of high-density gratings becomes more difficult.     

用反应离子刻蚀制备的纯位相片将高斯型激光束变换为均匀束

用光学变换一般理论设计出仅用两个纯位相片构成的光学系统可以将高斯型激光束变换为均匀束。本文对两个纯位相片的位相分布函数进行了计算并设计出10台阶量化的纯位相片。制备纯位相片的方法是采用超大规模集成电路中微细加工技术。实验结果表明能量转换效率高于95％,输出波形与理论计算一致。 关键词：     

Fabrication of ll-nm-Wide Silica-Like Lines Using X-Ray Diffraction Exposure

Fine silica-like fines with 11 nm width are successfully fabricated using x-ray Fresnel diffraction exposure. X-rays pass a mask of 175-nm-wide lines and 125-nm-wide spaces and form sharp peaks on a wafer coated with a layer of hydrogen silsesquioxane resist （HSQ）. By precisely controlling the mask-wafer gap at 10μm using the laser interferogram method, the fine structures are defined on HSQ. Experimental images are reproduced by a simulation using the one-dimensional beam propagation method. This lithographic technique presents a novel and convenient way to fabricate fine silica-like structures and devices in nano-optical and nanoelectronic applications.     

微纳加工技术在微纳电子器件领域的应用

微纳加工技术推动着集成电路不断缩小器件尺寸和提高集成度，光学光刻技术依然是目前的主流微纳加工技术，同时有多种替代技术如电子束直写、极紫外光刻和投影电子束技术，文章介绍了自上而下的微纳加工技术的进展及其在微纳器件研制的重要作用。     

微纳金属光学结构制备技术及应用

微纳光学结构制备技术一直是微纳光子学器件发展的技术瓶颈.针对微纳光学结构制备技术向小尺寸、高精度和广泛应用发展的趋势,报道了基于电子束、X射线和接近式光学的混合光刻制作微纳金属光学结构技术.针对微纳光子学器件复杂图形开发了微光刻数据处理体系,基于矢量扫描电子束光刻设备在自支撑薄膜上进行1×高分辨率图形形成,利用X射线光...