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1.
在满足工艺要求的前提下,通过模拟光栅衍射,设计出镂空透射光栅模型,在此基础上将电子束和X射线光刻技术相结合,研究了制造2000 l/mm X射线镂空透射光栅的新工艺技术.首先利用电子束光刻和微电镀技术在镂空聚酰亚胺薄膜底衬上制备X射线母光栅掩模.然后利用X射线光刻和微电镀技术实现了光栅图形的复制,之后采用紫外光刻和微电镀技术制作加强筋结构,最后通过腐蚀体硅和等离子体刻蚀聚酰亚胺完成镂空透射光栅的制作.从此新的制造工艺结果上来看.制备的光栅栅线平滑,占空比合理,侧壁陡直,不同光栅之间一致性好,完全可以满足应用需求,充分表明了该制造技术是透射式X射线衍射光学元件制造的良好选择.  相似文献   
2.
Freeform optical surfaces (FOSs) will be the best elements in the design of compact optical systems in the future. However, it is extremely difficult to measure freeform surface with sufficient accuracy, which impedes the development of the freeform surface. The design and fabrication of computer-generated hologram (CGH) , which has been successfully applied to the tests for aspheric surfaces, cannot be directly adopted to test FOSs due to their non-rotational asymmetry. A novel ray tracing planning method combined with successively optimizing even and odd power coefficients of phase polynomials in turn is proposed, which can successfully design a non-rotational asymmetry CGH for the tests of FOSs with an F-θ lens. A new eight-step fabrication process is also presented aiming to solve the problem that the linewidth on the same circle of the CGH for testing freeform surface is not uniform. This problem cannot be solved in the original procedure of CGH fabrication. The test results of the step profiler show that the CGH fabricated in the new procedure meets the requirements.  相似文献   
3.
利用螺旋型波带片进行边缘增强成像   总被引:4,自引:1,他引:3       下载免费PDF全文
为了提高对等离子体内界面区域的诊断精度,研究了利用螺旋型波带片实现边缘增强成像的技术。制作了用于可见光波段的一阶螺旋型波带片,最外环宽度3μm。利用螺旋型波带片对振幅式物体进行了边缘增强成像,实验获得了成像物体内边界区域的清晰图像,界面区域的成像强度得到很大增强。通过实验测量发现,当物距在菲涅耳衍射区域内时,螺旋型波带片也能够获取较好的成像质量,表明螺旋型波带片具有较大的视场角,能够对大尺度物体进行边缘成像。基于螺旋型波带片的边缘增强成像可以弥补传统成像方式对界面区域成像的不足,提高对等离子体内界面区域的诊断能力。  相似文献   
4.
The C ls and 0 ls electrons in polymethyl methacrylate etched by different incident laser intensities are analysed by x-ray photoelectron spectroscopy. The results show that when the incident laser fluence increases gradually,the percentage of carbon atoms in C-C bonds decreases while the one in carbonyl group (C=O) and alkoxy group (C-O) increases, and the percentage of oxygen atoms in C=O bonds increases while the one in C-O bonds decreases. Based on the analysis of the chemical structure, the energy level transition, energy diversion, and dissociation of bonds are theoretically examined, which is consistent with the experimental results.  相似文献   
5.
为降低干涉带来的影响,将一种随机位相分布引入菲涅耳透镜阵列,对阵列中每一个菲涅耳透镜施加0或π的二值化位相变化,打乱阵列位相的周期性排布,减少微透镜后多光束在匀化面干涉带来的影响.通过数值计算对激光束的匀化过程进行了模拟,设计的菲涅耳透镜口径为0.5 mm,焦距为6mm,阵列数目为20×20,光斑整体均匀度达到90%,光束能量利用率达到96%.利用设计和制备的16台阶随机位相型菲涅耳透镜阵列对1 064nm波长的激光光束进行匀化,均匀度为83%,光束能量利用率为89%.研究结果表明,通过引入随机位相可有效减少干涉带来的影响,提高微透镜阵列对单模高斯光束的匀束效果.  相似文献   
6.
高线密度X光透射光栅衍射效率   总被引:1,自引:1,他引:0       下载免费PDF全文
高线密度X光透射光栅是各种高分辨光栅摄谱仪的核心色散元件,为了获得较高的光谱分辨率,工作在2~5 keV能区的光谱仪需要使用5000 l/mm的X射线透射光栅。为了获得光栅的绝对衍射效率,采用同步辐射光在多个能点对5000 l/mm的X光透射光栅进行衍射效率实验标定,通过光栅相对衍射效率拟合获得了光栅结构参数,与光栅结构测量结果非常接近。然后,采用衍射效率的矩形栅线模型,计算得到了光栅的绝对衍射效率。  相似文献   
7.
This paper reports a procedure of soft x-ray lithography for the fabrication of an organic crossbar structure.Electron beam lithography is employed to fabricate the mask for soft x-ray lithography,with direct writing technology to the lithograph positive resist and polymethyl methacrylate on the polyimide film.Then Au is electroplated on the polyimide film.Hard contact mode exposure is used in x-ray lithography to transfer the graph from the mask to the wafer.The 256-bits organic memory is achieved with the critical dimension of 250 nm.  相似文献   
8.
在满足工艺要求的前提下,通过模拟光栅衍射,设计出镂空透射光栅模型,在此基础上将电子束和X射线光刻技术相结合,研究了制造2000 1/mm X射线镂空透射光栅的新工艺技术.首先利用电子束光刻和微电镀技术在镂空聚酰亚胺薄膜底衬上制备X射线母光栅掩模.然后利用X射线光刻和微电镀技术实现了光栅图形的复制,之后采用紫外光刻和微电镀技术制作加强筋结构,最后通过腐蚀体硅和等离子体刻蚀聚酰亚胺完成镂空透射光栅的制作.从此新的制造工艺结果上来看.制备的光栅栅线平滑,占空比合理,侧壁陡直,不同光栅之间一致性好,完全可以满足应用需求,充分表明了该制造技术是透射式X射线衍射光学元件制造的良好选择.  相似文献   
9.
Interferometric optical testing using computer-generated hologram (CGH) can give highly accurate measurement of aspheric surfaces has been proved. After the system is designed, a phase function is obtained according to the CGH's surface plane. For the requirement of accuracy, an optimization algorithm that transfers the phase function into a certain mask pattern file is presented in this letter, based on the relationship between the pattern error of CGH and the output wavefront accuracy. Then the writing machine is able to fabricate such a mask with this kind of file. With that mask, an improved procedure on fabrication of phase type CGH is also presented. Interferometrie test results of an aspherie surface show that the whole test system obtains the demanded accuracy.  相似文献   
10.
In the research of inertial confinement fusion (ICF), diagnosis of soft x-ray spectra radiated from pellet implosion is a crucial approach to compre- hend the space-time characteristic of plasma and the laser-plasma interactions. Conventional black- white transmission grating (TG) as a speetrophotom- etry element has been widely used in the region of op- tical measurements. However, the inherent high-order diffraction of black-white TG can overlap the informa- tion from the first order diffraction. The uncertainty of unfolding the complex process is the main diffi- culty in precise spectral analysis, which greatly hin- ders being able to stripe out the reasonably physical information. Quantum-dot-array diffraction grat- ing (QDADG) proposed by Cao, where the trans- mittance distribution obeys the sine form exactly, is an ideal amplitude TG and has perfect properties of pro- ducing just one pair of conjugate first order diffraction lines and suppressing the high order diffraction.The traditional fabrication technique for QDADG is the electron beam lithography (EBL) and the x-ray lithog- raphy (XRL). Owing to its capability of gen- erating patterns and the high resolution, EBL plays an increasingly important role in the micromachining, and is recognized as the main approach of fabricating a mask. The fabrication of nanoscale patterns with steep cross section is the superiority of XRL, which possesses the advantages of high efficiency, nanoscale resolution and great penetration capability. On the basis of the above-mentioned processing technique, 1000 line/mm quasi-sinusoidal single-order diffraction TG with the minimal feature structure of 500 nm was reported by Kuang et al., and can be applied in the ICF research. For single order diffraction grating, unfortunately, the promotion and application of EBL and XRL are restricted by the complex process, long period, difficult manufacture and the existence of the supporting film that absorbs x-rays and distorts the light information.  相似文献   
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