添加剂Ce~（4＋）对Co－P－PTFE复合镀层性能与结构的影响

探讨了添加剂Ｃｅ~（４＋）对Ｃｏ－Ｐ－ＰＴＦＥ复合镀层的影响,结果表明,添加剂Ｃｅ~（４＋）可降低Ｃｏ－Ｐ－ＰＴＦＥ复合镀层在３％ＮａＣｌ溶液中的腐蚀电流,提高其耐蚀性。同时使复合镀层微观结构发生变化,择优取向由（１００）面转变为（１１０）面,且晶粒尺寸降低．     

电化学聚合漆酚-锌金属螯合物合成及性质研究

以电化学方法合成了聚合漆酚（ＥＰＵ）,并用ＥＰＵ与二异丙氧基锌作用生成漆酚金属螯合物「ＥＰＵ－Ｚｎ（Ⅱ）」,采用原子发射光谱（ＡＥＳ）、ＦＴ－ＩＲ、ＤＭＴＡ、ＴＧ－ＤＴＡ和ＸＰＳ等对其进行表征,探讨其结构与性质。证明了螯合物中存在着因Ｚｎ（Ⅱ）和ＥＰＵ配位作用而引起的交联,故难溶于绝大多数的有机溶剂,玻璃化转变温度和耐热性能的提高。     

5—Br—PADAP作指示剂络合滴定法连续测定矿石中的锌和铜

本文在ｐＨ５．５的乙酸－乙酸钠介质中，对以５－Ｂｒ－ＰＡＤＡＰ作指示络合滴定法连续测定锌和铜进行了研究，对滴定的ｐＨ值及指示剂用进行了选择，试验了锌，铜不同配比的滴定结果，研究了共存离子的干扰。实验表明，用５－Ｂｒ－ＰＡＤＡＰ作指示剂，ＥＤＴＡ作滴定剂连续和铜，滴定点颜色变化敏锐，准确度高，锌和铜均在０－２０ｍｇ范围内与ＥＤＴＡ用量成正比，锌，铜比例在１：１０－１０：１范围内相互无影响。方法用于标     

锌镀层表面有机膦合钼聚多酸盐转化膜的研究

锌镀层表面有机膦合钼聚多酸盐转化膜的研究王济奎方景礼（南京化工大学应用化学系南京２１０００９）（南京大学应用化学研究所南京）关键词锌镀层，有机膦合钼聚多酸盐，转化膜钼酸盐和１－羟基乙－１，１二膦酸（ＨＥＤＰ，）均为被膜型缓蚀剂，可用于金属表面的钝化处...     

膜富集分光光度法测定微量锌

以５－Ｂｒ－ＰＡＤＡＰ为显色剂，用ＷＸ型混合纤维素滤膜（孔径０．６５μｍ，φ２５ｍｍ）富集微量锌，用乙醇溶解富集物（Ｚｎ（Ⅱ）－５－Ｂｒ－ＰＡＤＡＰ）分光光度法测定锌，Ｚｎ（Ⅱ）－５－Ｂｒ－ＰＡＤＡＰ在乙醇溶液中最大吸收波长为５５５ｎｍ，表观摩尔吸光系数１．０９×１０＾５Ｌ．ｍｏｌ＾－１．ｃｍ＾－１，锌量在０．１～５．０μｇ／５ｍＬ，范围内符合比耳定律，本法灵敏度高，操作简便，应用于食品，水样中锌     

FACILE AND HIGHLY STEREOSELECTIVE SYNTHESIS OF （2Z）－α－PHENYLSELENO－α，β－UNSATURATED KETONES

ＦＡＣＩＬＥＡＮＤＨＩＧＨＬＹＳＴＥＲＥＯＳＥＬＥＣＴＩＶＥＳＹＮＴＨＥＳＩＳＯＦ（２Ｚ）－α－ＰＨＥＮＹＬＳＥＬＥＮＯ－α，β－ＵＮＳＡＴＵＲＡＴＥＤＫＥＴＯＮＥＳ￥ＺｈｉＺｈｅｎＨＵＡＮＧ；ＸｉａｎＨＵＡＮＧ；ＹａｏＺｅｎｇＨＵＡＮＧ（Ｄｅｐａｒ...     

钛硅沸石合成过程中有机胺的作用

采用四丙基溴化铵（ＴＰＡＢｒ）为模板剂，分别以正丁胺（ＮＢＡ）、己二胺（ＨＤＡ）、二乙胺（ＤＥＡ）、乙二胺（ＥＤＡ）、三丙胺（ＴＰＡ）和四乙基氢氧化铵（ＴＥＡＯＨ）调节凝胶碱度，成功地合成出ＴＳ－１沸石．采用ＩＲ，ＸＲＤ，ＵＶ－Ｖｉｓ和ＮＭＲ等表征技术，详细考察了有机胺的作用及对钛进入沸石骨架的影响．结果表明，以ＴＥＡＯＨ为碱源时抑制钛进入骨架；以ＥＤＡ为碱源时合成的钛硅沸石结晶度低；以ＴＥＡＯＨ或ＮＢＡ为碱源时合成的钛硅沸石晶粒较均匀．有机胺在ＴＳ－１合成过程中只起到调节碱度的作用，未与ＴＰＡＢｒ联合起模板作用．     

双波长β修正分光光度法测定锌配合物的配位比

双波长β修正光度法能消除络合反应中过量络合剂的干扰，从而计算出配合物真实吸光度。据此可推出络合剂有效络合分率及配位比的计算公式。本法操作简便，结果较准确。确定了锌（Ⅱ）与铬黑Ｔ、双硫腙、二甲酚橙和苯基荧光酮显色体系，其配位比分别为１：３、１：２、１：１、和１：１。     

REACTIONS OF C_(60) WITH R_3SnH: A NEW SYNTHETIC TO C_(60)(RH)n AND THE PROPERTY OF C_(60) TO CATALYZE RADICAL REACTIONS

ＲＥＡＣＴＩＯＮＳＯＦＣ_（６０）ＷＩＴＨＲ_３ＳｎＨ：ＡＮＥＷＳＹＮＴＨＥＴＩＣＴＯＣ_（６０）（ＲＨ）ｎＡＮＤＴＨＥＰＲＯＰＥＲＴＹＯＦＣ_（６０）ＴＯＣＡＴＡＬＹＺＥＲＡＤＩＣＡＬＲＥＡＣＴＩＯＮＳ￥ＹｉＭｉｎＳＨＥ；ＹａＰｉｎｇＴＵ；ＸｉｎｇＨｕ...     

A HIGHLY EFFICIENT SYNTHESTS OF (2E)-α,β-UNSATURATED AMIDES

Ａ　ＨＩＧＨＬＹ　ＥＦＦＩＣＩＥＮＴ　ＳＹＮＴＨＥＳＴＳ　ＯＦ　（２Ｅ）－α，β－ＵＮＳＡＴＵＲＡＴＥＤ　ＡＭＩＤＥＳ￥ＪｉｎＸｉｎｇＤＵ；ＸｉａｎＨＵＡＮＧ（ＤｅｐａｒｔｍｅｏｔｏｆＣｈｅｍｉｓｔｒｙ，ＺｈｅｊｉａｎｇＮｏｒｍａｌＵｎｉｖｅｒｓｉｔ...     

(110)晶面全择优取向Cu镀层的制备及其条件优化

研究了添加剂聚乙二醇(PEG)、氯离子(Cl－)和电流密度对Cu的电沉积过程的影响, 着重探讨了制备(110)晶面全择优取向Cu镀层的电沉积条件及其形成机理. 循环伏安(CV)结果表明, PEG阻化Cu的电沉积, Cl－加快Cu的电沉积速率. XRD实验结果表明, PEG和Cl－在一定浓度范围有利于(110)晶面择优取向; 这两种不同特性的添加剂的协同作用可以制得(110)晶面全择优取向的较薄的Cu镀层; 所制备的全择优Cu镀层较稳定. 全择优取向Cu镀层形成的机理在于PEG和Cl－吸附过程联合起作用, 在不同晶粒的不同晶面进行选择吸附, 改变了晶面的生长速率及晶粒的快生长方向.     

碱性电镀光亮锌镍合金研究

在总结镀液的电化学特性和锌镍合金镀层的晶体结构与性能等实验结果的基础上,提出碱性电镀光亮锌镍合金的工艺规范和直接把锌酸盐镀锌液转化为碱性电镀光亮锌镍合金镀液的方法。生产实践证明,该工艺稳定,镀层光亮、耐腐性好、硬度较高、无氢脆,镍含量可在９～２０ｗｔ％范围内随意控制。     

高择优取向Cu电沉积层的XRD研究

采用电化学和XRD方法在CuSO4 +H2 SO4 电解液中获得Cu电沉积层并研究其结构 .结果表明 ,在 4 .0A/dm2 和 15 .0A/dm2 电流密度下可分别获得 (2 2 0 )和 (111)晶面高择优取向Cu镀层 ;Cu镀层晶面织构度随厚度提高而增大 ,获得 (111)晶面高择优Cu镀层的厚度约是 (2 2 0 )晶面的 7倍 ,说明Cu(2 2 0 )晶面比 (111)晶面是更易保留的晶面 ,且低电流密度下铜的电结晶更容易受电沉积条件控制 ;较高的沉积电流密度有利于晶核的形成 ;Cu镀层存在晶格畸变和晶胞参数的涨大     

高择优锌-镍合金电沉积的现场ECSTM研究

采用"二步包封"法制备了性能良好的电化学STM针尖.以此为基础采用ECSTM现场研究了工艺条件下HOPG上高择优锌-镍合金的电沉积过程.研究结果表明这种高择优沉积层以侧向生长方式生长,而表面上电化学活性差的晶面构成了晶体生长过程的保留面,从而进一步形成了与基底表面方向一致的高择优沉积层,X射线研究表明这一择优面为(100)晶面.     

Electrodeposition of zinc + cobalt alloys.: Relation between the electrochemical response and the composition and morphology of the deposits

The electrodeposition of cobalt and zinc + cobalt alloy in aqueous chloride solution has been studied on vitreous carbon electrodes under different concentration conditions (total concentration of metallic ion 0.1 mol dm ⁻³, chloride ion 1 mol dm ⁻³, pH = 3), particularly during the initial stages of the deposition process. For the alloy a relation has been found between the shape of the current-time transients, the morphology of the deposits, the stripping analysis and the results of X-ray microanalysis. The different alloy phases present in the deposits were identified using X-ray microanalysis data, stripping voltammetry results and literature data.The results indicate that the electrocrystallization of cobalt is inhibited even at very low concentrations of zinc in solution: voltammetric and galvanostatic results indicate that the deposition potentials always correspond to more negative values than those for cobalt deposition. This inhibition depends strongly on both the metallic ion ratio in solution and the applied overpotential (or current density). For Zn(II)/Co(II) ratios greater than 1/9, low overpotentials (or low current densities) favoured homogeneous and compact deposits that were rich in zinc and were mainly composed of γ-phases of zinc + cobalt alloy. However, when high overpotentials or current densities were used and/or when the Zn(II)/Co(II) ratio was very low (< 1/9), dendritic and non-homogeneous cobalt-rich deposits were obtained.     

搅拌条件下电流密度对Cu镀层的结构和表面形貌的影响

电沉积;晶体取向;搅拌条件下电流密度对Cu镀层的结构和表面形貌的影响     

Preparation of Cu, Ag, Fe and Al nanoparticles by the exploding wire technique

We describe a novel process for the production of nanoparticles of Cu, Ag, Fe and Al which involves exploding their respective wires, triggered by large current densities in the wires. The particles are characterised by X-ray diffraction (XRD) and atomic force microscopy (AFM). Particle sizes in the range 20–100nm were obtained employing this technique. The XRD results reveal that the nanoparticles continue to retain lattice periodicity at reduced particle sizes, displaying in some cases evidence of lattice strain and preferential orientation. In the case of Fe, Mossbauer spectroscopy reveals loss of ferromagnetism as a result of the reduced size of the particles. Dedicated to Professor C N R Rao on his 70th birthday     

Properties of Co-Mo coatings obtained by electrodeposition at pH 6.6

Cobalt-molybdenum coatings were prepared by electrodeposition in a sulfate-citrate bath and their morphology, structure and magnetic properties were analysed. Concentrations of 0.1 mol dm^–3 CoSO₄ and 0.005 mol dm^–3 Na₂MoO₄ at pH 6.6 led to Co-Mo deposits of 20–23% Mo that can be grown to several microns over graphite or copper substrates. At low deposition potentials or current densities, the deposits presented a close-packed hexagonal structure (hcp) that evolved to a (100)+(110) preferred orientation and acicular morphology as the deposit thickness increased. When the deposition potential or the current density was made more negative, a mixed crystalline+amorphous structure was obtained. The degree of crystallinity depended on the thickness: thin films were more amorphous than the thicker ones. Co-Mo deposits showed lower saturation magnetization (M_s) and coercivity (H_c) than the pure cobalt deposits. The crystalline+amorphous films showed the lowest H_c values (around 40 Oe).     

Systematic DFT-GGA study of hydrogen adsorption on transition metals

Computational study of hydrogen adsorption on (111) surface of transition metals with face centered cubic (fcc) lattice is reported and the results are compared with available experimental and theoretical data. In addition, dissociative adsorption of hydrogen on Pt(111), Pt(100) and Pt(110) is studied in the range of coverage from 0.25 to 1 monolayer. In the case of Pt(111) preferential adsorption site was found to be three-coordinated fcc-hollow site, while on Pt(100) and Pt(110) surface hydrogen settles on two-coordinated bridge and short bridge site, respectively. Hydrogen adsorption energy was found to decrease with the increasing coverage. Structural changes of studied Pt surfaces upon hydrogen adsorption have been compared with the experimental data existing in the literature and good qualitative agreement has been obtained.     

Effects of RF power on BZN thin‐film etching in SF6/Ar using surface analysis

Reactive ion etching (RIE) was used to etch bismuth zinc niobate (BZN) films in SF₆/ Ar plasma as a function of radio frequency (RF) power. Within the RF power range of choice, the etch rate of BZN films increases with increasing RF power. However, when RF power exceeds 200 W, the etch rate of films appears to increase at a slower rate. The structural properties of the BZN films before and after etching were characterized using X‐ray diffraction. As‐deposited film shows a cubic pyrochlore structure with preferential (222) plane orientation, but all the films etched at different reactive ion etching powers exhibit preferential (400) plane orientation. With increasing RF power, the ZnF₂ phase becomes evident. Also, the film surfaces before and after etching were analysed using XPS. Metal fluorides were found to remain on the surface, resulting in varying relative atomic percentages with RF power. Zn‐rich surfaces were formed because low‐volatile ZnF₂ residues were difficult to remove. Bi and Nb can be removed easily through chemical reactions because of their high volatility, whereas Bi–F and Nb–F, which were thought to be present in the form of a metal oxyfluoride, can still be detected using the narrow scan spectra. RF power has an effect on etch reaction through different plasma densities and particle energies, thus resulting in varying compositions and element chemical binding states. RF power also has an effect on the removal of residues. The minimum value of F atomic concentration is achieved at 150 W. Copyright © 2011 John Wiley & Sons, Ltd.