A thin-film transistor with a very thin a-Si:H layer and its application for an LC panel

One of the disadvantages of applying an a-Si:H thin-film transistor (TFT) to an active matrix-addressed liquid crystal (LC) panel is that a TFT with an a-Si:H has a very large photo-leakage current because of the high photo-conductivity of an a-Si:H itself.We have tried decreasing the photo-leakage current by varying the thickness of an a-Si:H layer (L) in TFTs and investigated the characteristics of TFTs, mainly drain voltage versus drain current containing photo-leakage current (I _ph).As a result, it is shown that lnI _ph is proportional to InL, and its gradient is 1.5–2.0. We assume that the thinner an a-Si:H layer is, the more effective the recombination of carriers at the interface states is forI _ph.We have applied TFT with a very thin a-Si:H layer (30nm) to a full-color active matrix-addressed LC panel for a moving picture display and realized a display of good quality under illuminated condition of 5×10⁴lx without a shading layer in it.     

The study of a new n/p tunnel recombination junction and its application in a-Si：H/μc-Si：H tandem solar cells

This paper reports that a double N layer (a-Si:H/μc-Si:H) is used to substitute the single microcrystalline silicon n layer (n-μc-Si:H) in n/p tunnel recombination junction between subcells in a-Si:H/μc-Si:H tandem solar cells. The electrical transport and optical properties of these tunnel recombination junctions are investigated by current-voltage measurement and transmission measurement. The new n/p tunnel recombination junction shows a better ohmic contact. In addition, the n/p interface is exposed to the air to examine the effect of oxidation on the tunnel recombination junction performance. The open circuit voltage and FF of a-Si:H/μc-Si:H tandem solar cell are all improved and the current leakage of the subcells can be effectively prevented efficiently when the new n/p junction is implemented as tunnel recombination junction.     

双极模式SiC JFET功率特性的研究

研究了常关型SiC 双极模式结型场效应晶体管(BJFET)的工作机理并建立了数值模型. 仿真结果表明SiC BJFET的双极工作模式可以有效的降低器件的开态电阻,折中器件的正反向特性而不增加工艺难度. 仿真结果还表明SiC BJFET的双极工作模式会延长器件的开关时间. 关键词： 碳化硅 双极型 结型场效应晶体管 模型     

非晶硅界面缓冲层对非晶硅锗电池性能的影响

针对非晶硅锗电池本征层高锗含量时界面带隙失配以及高界面缺陷密度造成电池开路电压和填充因子下降的问题,通过在PI界面插入具有合适带隙的非晶硅缓冲层,不仅有效缓和了带隙失配,降低界面复合,同时也通过降低界面缺陷密度改善内建电场分布,从而提高了电池的收集效率. 进一步引入IN界面缓冲层以及对非晶硅锗本征层进行能带梯度设计,在仅采用Al背电极时,单结非晶硅锗电池转换效率达8.72%. 关键词： 非晶硅缓冲层 非晶硅锗薄膜太阳电池 带隙 界面     

a-Si:H结的横向光生伏特效应

本文通过理论分析研究了a-Si:H 结中横向光生伏特效应的定态与瞬态特性. 所得结果表明理论与实验非常符合. 值得注意的是, 按理论关系应用常规不掺杂a-Si:H 特性值估算的两个重要参数(样品中的薄层电阻1 / a , 和传输时间T_m均比由实验得出的值大得多. 基于合理的分析. 我们认为在a-Si:H 层中平行于结输运的电子可能具有异乎寻常高的载流子迁移率。 关键词：     

a-Si:H结的横向光生伏特效应

本文通过理论分析研究了a-Si:H结中横向光生伏特效应的定态与瞬态特性。所得结果表明理论与实验非常符合。值得注意的是,按理论关系应用常规不掺杂a-Si:H特性值估算的两个重要参数(样品中的薄层电阻1/σ_s和传输时间T_m)均比由实验得出的值大得多。基于合理的分析。我们认为在a-Si:H层中平行于结输运的电子可能具有异乎寻常高的载流子迁移率。 关键词：     

内嵌CuO薄膜对并五苯薄膜晶体管性能的改善

制备了基于内嵌氧化物铜(CuO)薄膜的并五苯薄膜晶体管器件. 将3 nm CuO薄膜内嵌入到并五苯(pentacene)中, 作为空穴注入层, 降低电极与并五苯之间的空穴注入势垒. 相对于纯并五苯薄膜晶体管器件, 研制的晶体管的迁移率、阈值电压(V_TH)、电流开关比(I_on/I_off) 等参数都有明显改善. X射线光电子能谱数据表明, 这种空穴注入势垒的降低源自并五苯向CuO的电子转移.     

Damage effect and mechanism of the GaAs pseudomorphic high electron mobility transistor induced by the electromagnetic pulse

The damage effect and mechanism of the electromagnetic pulse(EMP) on the GaAs pseudomorphic high electron mobility transistor(PHEMT) are investigated in this paper. By using the device simulation software, the distributions and variations of the electric field, the current density and the temperature are analyzed. The simulation results show that there are three physical effects, i.e., the forward-biased effect of the gate Schottky junction, the avalanche breakdown, and the thermal breakdown of the barrier layer, which influence the device current in the damage process. It is found that the damage position of the device changes with the amplitude of the step voltage pulse. The damage appears under the gate near the drain when the amplitude of the pulse is low, and it also occurs under the gate near the source when the amplitude is sufficiently high, which is consistent with the experimental results.     

钙钛矿/硅叠层太阳电池中平面a-Si:H/c-Si异质结底电池的钝化优化及性能提高

最近,旋涂法制备的钙钛矿/平面硅异质结高效叠层太阳电池引起人们广泛关注,主要原因是相比于绒面硅衬底制备的钙钛矿/硅叠层太阳电池,其制备工艺简单、制备成本低且效率高.对于平面a-Si:H/c-Si异质结电池, a-Si:H/c-Si界面的良好钝化是获得高转换效率的关键,进而决定了钙钛矿/硅异质结叠层太阳电池的性能.本文主要从硅片表面处理、a-Si:H钝化层和P型发射极等方面展开研究,通过对硅片表面的氢氟酸(HF)浸泡时间和氢等离子体预处理气体流量、a-Si:H钝化层沉积参数、钝化层与P型发射极(I/P)界面富氢等离子体处理的综合调控,获得了相应的优化工艺参数.对比研究了p-a-Si:H和p-nc-Si:H两种缓冲层材料对I/P界面的影响,其中高电导、宽带隙的p-nc-Si:H缓冲层既能够降低I/P界面的缺陷态,又可以增强P型发射层的暗电导率,提高了前表面场效应钝化效果.通过上述优化,制备出最佳的P-type emitter layer/aSi:H(i)/c-Si/a-Si:H(i)/N-type layer (inip)结构样品的少子寿命与implied-Voc分别达到2855μs和709 mV,表现出良好的钝化效果.应用于平面a-Si:H/c-Si异质结太阳电池,转换效率达到18.76%,其中开路电压达到681.5 mV,相对于未优化的电池提升了34.3 mV.将上述平面a-Si:H/c-Si异质结太阳电池作为底电池,对应的钙钛矿/硅异质结叠层太阳电池的开路电压达到1780 mV,转换效率达到21.24%,证明了上述工艺优化能够有效地改善叠层太阳电池中的硅异质结底电池的钝化及电池性能.     

微晶硅锗太阳电池本征层纵向结构的优化

采用射频等离子体增强化学气相沉积技术, 研究了辉光功率对微晶硅锗材料结构特性和光电特性的影响, 提出使用功率梯度的方法制备微晶硅锗薄膜太阳电池本征层. 优化后的微晶硅锗本征层不仅保持了晶化率纵向分布的均匀性, 而且形成了沿生长方向由宽到窄的渐变带隙分布, 使电池的填充因子和短路电流密度都得到了提高. 采用此方法制备的非晶硅/微晶硅锗双结叠层电池转换效率达到了9.54%.     

Optically controlled characteristics of a new heterojunction field effect transistor

A new heterojunction field effect transistor has been proposed and studied analytically to investigate its suitability as a high speed optical detector. The characteristics of the device have been studied in the dark as well as in the illuminated conditions. In the new structure the Schottky gate of a typical high electron mobility transistor (HEMT) has been replaced by a junction gate in order to facilitate the absorption of optical radiation. The performance of the new device has been compared with that of the existing HEMT structure for similar application. It is seen that the absorption of optical radiation of suitable wavelength in the larger bandgap material results into conductivity modulation of the channel giving rise to a considerable change in the saturation drain current in illuminated conditions. This enables the device to respond to an intensity modulated optical signal. It has further been observed that due to an increased optical absorption region the modified structure shows a much better optical sensitivity than the existing one.     

单电子晶体管电流解析模型及数值分析

本文首先建立单电子晶体管的电流解析模型, 然后将蒙特卡罗法与主方程法结合进行数值分析, 研究了栅极偏压、漏极偏压、温度与隧道结电阻等参数对器件特性的影响. 结果表明: 对于对称结, 库仑台阶随栅极偏压增大而漂移; 漏极电压增大, 库仑振荡振幅增强, 库仑阻塞则衰减; 温度升高将导致库仑台阶和库仑振荡现象消失. 对于非对称结, 源漏隧道结电阻比率增大, 库仑阻塞现象越明显. 关键词： 单电子晶体管 解析模型 蒙特卡罗法 主方程法     

高$lt;i$gt;k$lt;/i$gt;栅介质小尺寸全耗尽绝缘体上锗p型金属氧化物半导体场效应晶体管漏源电流模型

通过求解沟道的二维泊松方程得到沟道表面势和沟道反型层电荷, 建立了高k栅介质小尺寸绝缘体上锗(GeOI) p型金属氧化物半导体场效应晶体管(PMOSFET)的漏源电流解析模型. 模型包括了速度饱和效应、迁移率调制效应和沟长调制效应, 同时考虑了栅氧化层和埋氧层与沟道界面处的界面陷阱电荷、氧化层固定电荷对漏源电流的影响. 在饱和区和非饱和区, 漏源电流模拟结果与实验数据符合得较好, 证实了模型的正确性和实用性. 利用建立的漏源电流模型模拟分析了器件主要结构和物理参数对跨导、漏导、截止频率和电压增益的影响, 对GeOI PMOSFET的设计具有一定的指导作用. 关键词： 绝缘体上锗p型金属氧化物半导体场效应晶体管 漏源电流模型 跨导 截止频率     

Organic insulator layer influence on the electrical properties of N,N’-di (2-ethylhexyl) - 3, 4, 9, 10-perylene diimide organic thin-film transistors: Experiment and modeling

In this work, n- type organic thin film transistors (OTFTs) based on different kinds of organic dielectrics were fabricated, characterized and theoretically investigated. Three kinds of organic insulators were applied as dielectric gate which are: divinyl tetramethyl disiloxane-bis (benzo-cyclobutene) (BCB), poly(vinylalcohol) (PVA) and poly (4-vinyl phenol) (PVP). Analytical model was applied to describe the electrical behavior of the fabricated OTFTs and to explain the absence of saturation of the drain current for the device based on PVA dielectric. In addition, Meyer–Neldel rule-grain boundary model was applied for the calculation of total resistance of OTFTs based on different dielectrics materials. The theoretical results of output characteristics and total resistance showed an excellent agreement with the experimental measurements. The experimental and theoretical calculations revealed that the n-channel OTFTs based on BCB as an insulator layer exhibited superior electrical characteristics in terms of threshold voltage, mobility and drain current compared with the devices based on PVA and PVP as a gate insulator layer. The device based on BCB organic insulator layer has the largest mobility of 4?×?10^?3 cm² V^?1 s^?1, the smallest leakage current relative to the devices based on PVA and PVP. While, the device fabricated with PVP organic insulator gate has a large trap density on the PVP-EHPDI interface which causes a pronounced decrease in field effect mobility and consequently drain current.     

A New High Performance Realization of Hyperchaotic Modified Canonical Chua Circuit Using JFETs

A new implementation of hyperchaotic modified canonical Chua circuit using junction field-effect transistors （JFETs） is proposed. The design is based on a source coupled JFET circuit to approximate a smooth cubic nonlinearity and a two-terminal negative resistance element containing a p-n-p silicon transistor and an n-channel JFET. The realization is supported by Orcad Pspice simulation and numerical MATLAB results. The hyperchaotic nature is confirmed by two positive Lyapunov exponents associated with the attractor which is a fractal with a Lyapunov dimension between 3 and 4.     

Field-effect transistor based on a combination of nanometer film and undoped semiconductor

The metal oxide nanometer film semiconductor field-effect transistor (MONSFET) is reported. In this device, a combination of undoped semiconductor and nanometer film serves as the active layer. When a negative gate-source voltage is applied, electrons from the nanometer film enter into the semiconductor layer to form the conducting channel, and the drain current increases without saturation. This structure makes more materials available for the active layer, and thus suggests a new route to enrich the applications as well as to enhance the performances.     

纳米体硅鳍形场效应晶体管单粒子瞬态中的源漏导通现象

体硅鳍形场效应晶体管(FinFET)是晶体管尺寸缩小到30 nm以下应用最多的结构,其单粒子瞬态产生机理值得关注.利用脉冲激光单粒子效应模拟平台开展了栅长为30, 40, 60, 100 nm Fin FET器件的单粒子瞬态实验,研究FinFET器件单粒子瞬态电流脉冲波形随栅长变化情况;利用计算机辅助设计(technology computer-aided design, TCAD)软件仿真比较电流脉冲产生过程中器件内部电子浓度和电势变化,研究漏电流脉冲波形产生的物理机理.研究表明,不同栅长Fin FET器件瞬态电流脉冲尾部都存在明显的平台区,且平台区电流值随着栅长变短而增大;入射激光在器件沟道区下方体区产生高浓度电子将源漏导通产生导通电流,而源漏导通升高了体区电势,抑制体区高浓度电子扩散,使得导通状态维持时间长,形成平台区电流;尾部平台区由于持续时间长,收集电荷量大,会严重影响器件工作状态和性能.研究结论为纳米Fin FET器件抗辐射加固提供理论支撑.     

A novel structure of a high current gain 4H-SiC BJT with a buried layer in base

In this paper, a new structure of a 4H-SiC bipolar junction transistor (BJT) with a buried layer (BL) in the base is presented. The current gain shows an approximately 100% increase compared with that of the conventional structure. This is attributed to the creation of a built-in electric field for the minority carriers to transport in the base which is explained based on 2D device simulations. The optimized design of the buried layer region is also considered by numeric simulations.     

高电子迁移率晶体管放大器高功率微波损伤机理

在TCAD半导体仿真环境中,建立了0.25 m栅长的AlGaAs/InGaAs高电子迁移率晶体管(HEMT)低噪声放大器与微波脉冲作用的仿真模型,基于器件内部的电场强度、电流密度和温度分布的变化,研究了1 GHz的微波从栅极和漏极注入的损伤机理。研究结果表明,从栅极注入约40.1 dBm的微波时,HEMT内部峰值温度随着时间的变化振荡上升,最终使得器件失效,栅下靠源侧电流通道和强电场的同时存在使得该位置最容易损伤;从漏极注入微波时,注入功率的高低会使器件内部出现不同的响应过程,注入功率存在一个临界值,高于该值,器件有可能在第一个周期内损伤,损伤位置均在漏极附近。在1 GHz的微波作用下,漏极注入比栅极注入更难损伤。     

A unified drain current 1/f noise model for GaN-based high electron mobility transistors

In this work, we present a theoretical and experimental study on the drain current 1/f noise in the AIGaN/GaN high electron mobility transistor （HEMT）. Based on both mobility fluctuation and carrier number fluctuation in a two- dimensional electron gas （2DEG） channel of AlGaN/GaN HEMT, a unified drain current 1/f noise model containing a piezoelectric polarization effect and hot carrier effect is built. The drain current 1/f noise induced by the piezoelectric polarization effect is distinguished from that induced by the hot carrier effect through experiments and simulations. The simulation results are in good agreement with the experimental results. Experiments show that after hot carrier injection, the drain current 1/f noise increases four orders of magnitude and the electrical parameter degradation Agm/gm reaches 54.9%. The drain current 1/f noise degradation induced by the piezoelectric effect reaches one order of magnitude; the electrical parameter degradation Agm/gm is 11.8%. This indicates that drain current 1/f noise of the GaN-based HEMT device is sensitive to the hot carrier effect and piezoelectric effect. This study provides a useful reliability characterization tool for the A1GaN/GaN HEMTs.