等离子体氧轰击硅生成缺陷的研究

本文对等离子体氧轰击硅产生的缺陷进行了研究。发现等离子体氧轰击在硅中引入两个缺陷E₁(E_c—0.46eV)及E₂(E_c—0.04eV)。测量了缺陷的光电离截面谱,分析表明,缺陷E₂的电子声子相互作用很强,其Frank-Condon移动达0.76eV,缺陷E₁的电子声子相互作用较小,其Frank-Condon移动为0.04eV。由实验结果得到与缺陷E₁、E₂相耦合的声子模分别为hω_p⁽¹⁾=28meV,hω_p⁽²⁾=20meV。 关键词：     

电子辐照硅层中缺陷能级的研究

用12MeV电子辐照硅p⁺n结,在硅中除引入氧空位E₁(E_c-0.19eV),双空位E₂(E_c-0.24eV)和E₄(E_c-0.44eV)外,还引入缺陷E₃(E_c-0.37eV)。用DLTS方法和反向恢复时间测量研究了这些能级的退火行为,可以看到,E₃的退火温度最高(≈520℃)。由退火特 关键词：     

注氮GaAs中的深能级及其对自由载流子的补偿

详细研究了注氮n型GaAs中深的和浅的杂质缺陷的电学性质。深能级瞬态谱(DLTS)技术测量表明,能量为140keV和剂量为1×10¹³cm^-2的氮离子注入并经800℃退火30min的GaAs中存在四个电子陷阱,E₁(0.111),E₂(0.234),E₃(0.415),E₄(0.669)和一个空穴陷阱H(0.545),而在能量为20keV和剂量为5×10^{14关键词：}     

高温电子辐照硅中缺陷的研究

本文对高温电子辐照硅中产生的缺陷进行了研究,发现缺陷的引进率随电子辐照温度的增加而增加,在达到极值温度T_m后,缺陷的引进率将随之而下降,T_m值与缺陷的退火激活能有关。E₃缺陷(E_c—0.36eV)浓度在高温电子辐照中显著增加,在330℃高温电子辐照时,E₃缺陷浓度为室温电子辐照的6倍。研究结果表明,E₃缺陷的可能结构为与多空位和氧有关的复合体。 关键词：     

硅中三空位V3-的超精细相互作用的理论计算

利用Koster-Slater的格林函数方法,计算了硅中三空位V₃^-的电子态能级和波函数.结果表明,V₃^-在禁带中有五条能级:E_(A2)=0.417eV,E_(B1)=0.492eV,E_(B2¹)=0.512ev, E_(A1)=0.532eV,E_(B2²)=0.608eV.根据算得的超精细相互作用常数同实验值的比较,定出V₃^-处于B₁态.V₃^-的B₁态点据第1壳层的几率为60.2％,但主要集中在三空位所确定的平面内的二个原子上. 关键词：     

Li2Mo2O6多晶材料的结构与电性能的研究

本文用固相反应烧结制备出Li₂Mo₂O₆多晶材料。经X射线分析、红外光谱和电子顺磁共振谱(EPR)的研究,确定了它的结构是Li₂Mo₂O₄和MoO₂两个晶相组成的烧结体。钼离子以四价状态存在于MoO₂晶相结构中。采用交流阻抗谱分析了晶界与温度变化的相关性。测得了样品的ln(σ_总T)-1/T 曲线是由两段直线和一段曲线所组成;总电导率化能σ_27℃=1.36×10^-3(Ω·cm)^-1,σ_115℃=1.49×10^-3(Ω·cm)^-1,σ_300℃=9.71×10^-3(Ω·cm)^-1,σ_370℃=2.42×10^-3(Ω·cm)^-1;电导活化能E₁=0.043eV,E₂=0.235eV,E_平均=0.76eV。采用维格纳极化电池法测得电子电导率σ_e,σ_e27℃=2.240×10^-5(Ω·cm)^-1,σ_e300℃=4.476×10^-3(Ω·cm)^-1。实验证明,室温下材料为固体电解质,300℃附近为良好的离子与电子混合导体。 关键词：     

非截面二维光子晶体排列矩形波导的全模式分析

在对周期性结构进行谐波分析的基础上，导出了非截面二维光子晶体排列矩形波导的本征值方程. 基于此方程，可以对该类光子晶体波导的所有可能模式进行分析. 分析认为，非截面二维光子晶体排列矩形波导内能存在的模式包括E_(y)，TE_y，H_(y)和TM_y模式；改变波导高度，可以实现E_(y)模式和H_(y)模式与其他模式通带的完全分离. 然而改变任一结构参数，都不能使E_(y)和H_(y)的各个模式通带，以及E_(y)1模式和H_(y)1模式的通带完全隔离. 波导单模工作的带宽由E_(y)1和E_(y)2模式的低端截止频率决定. 关键词： 波导 光子晶体 本征值方程 模式     

电子顺磁共振“AsGa”的光淬灭行为与EL2亚稳态机理

根据Goltzene等人最近关于原生LEC,HB,压缩变形和中子辐照GaAs中电子顺磁共振(EPR)“As_Ga”谱低温光淬灭实验结果,结合Baraff和Schlüter最近关于EL2亚稳态的理论计算,本文认为可进一步证实作者之一在1981年提出的EL2(As_GaV_AsV_Ga)缺陷模型,同时还对Wager和Van Vechten最近提出的EL2(As_GaV_AsV_Ga)的亚稳态机理加以评述和修正。 关键词：     

磁场对石墨烯中弱耦合极化子性质的影响

研究了磁场作用下石墨烯中电子与表面光学声子弱耦合情况下的极化子的性质。采用线性组合算符和Pekar变分法分别推导出了石墨烯中弱耦合极化子的基态能量E₀、第一激发态能量E₁和跃迁频率ω随磁场强度B和德拜截止波数k_d之间的变化关系。数值计算结果表明,极化子的基态能量E₀随磁场强度B变化的曲线（k_d一定时）和E₀随k_d的变化曲线（B一定时）均会分裂成对称的两条,并且当B一定时E₀的绝对值随k_d的增加而增加。在k_d一定时,极化子的第一激发态能量E₁和跃迁频率ω均为磁场B的增函数;在B一定时,E₁和ω均随k_d的增加而增大。     

硅离子注入层的电场调制反射光谱

结合剥层技术,对略高于临界剂量的P⁺注入p-Si层,进行了电解液电场调制反射(以下简称EER)光谱研究,对非均匀的结构无序材料的光学测量,提出采用“特效波长”的建议,硅的这一波长是E₁,E₁+△₁能区的349O?(hω≈3.55eV),c-Si和α-Si对3490?光波的吸收系数均等于10⁶cm^-1,将((△R)/R)_3.55ev按深度x的分布同无序度的 关键词：     

少子陷阱特性和铍硅共注半绝缘GaAs空穴陷阱

用深能级瞬态谱（ＤＬＴＳ）技术测量了高温退火的Ｂｅ和Ｓｉ共注入的ＬＥＣ半绝缘ＧａＡｓ（无掺杂）。在多子脉冲作用下的Ａｌ／Ｂｅ－Ｓｉ共注ＬＥＣＳＩＧａＡｓ肖特基势垒中，观测到Ｅ₀₁（０．２９８），Ｅ₀₂（０．３４１），Ｅ₀₃（０．５５５）和Ｅ₀₄（０．８２１）等四个电子陷阱以及两个主要的少子（空穴）陷阱Ｈ＇₀₃（０．５４）和Ｈ″₀₃（０．５７）。两少子陷阱的ＤＬＴＳ信号具有若干特点，比如它们的ＤＬＴＳ·峰难于通过增宽脉冲达到最大高度；以及峰的高度强烈地依赖于温度等。这些现象可以用少子陷阱的少子俘获和热发射理论进行合理地解释。鉴于用ＤＬＴＳ技术测量这种陷阱的困难，我们用恒温电容瞬态技术测定它们的空穴表观激活能分别为０．５４和０．５７ｅＶ。它们是新观测到的和Ｂｅ－Ｓｉ共注ＳＩＧａＡｓ有关缺陷。 关键词：     

Characterization of defects introduced in Sb doped Ge by 3 keV Ar sputtering using deep level transient spectroscopy (DLTS) and Laplace-DLTS (LDLTS)

We have used deep level transient spectroscopy (DLTS), and Laplace-DLTS to investigate the defects created in antimony doped germanium (Ge) by sputtering with 3 keV Ar ions. Hole traps at E_V+0.09 eV and E_V+0.31 eV and an electron trap at E_C−0.38 eV (E-center) were observed soon after the sputtering process. Room temperature annealing of the irradiated samples over a period of a month revealed a hole trap at E_V+0.26 eV. Above room temperature annealing studies revealed new hole traps at E_V+0.27 eV, E_V+0.30 eV and E_V+0.40 eV.     

Characterization of deep level defects in sublimation grown p-type 6H-SiC epilayers by deep level transient spectroscopy

In this study deep level transient spectroscopy has been performed on boron–nitrogen co-doped 6H-SiC epilayers exhibiting p-type conductivity with free carrier concentration (N_A–N_D)∼3×10¹⁷ cm⁻³. We observed a hole H₁ majority carrier and an electron E₁ minority carrier traps in the device having activation energies E_v+0.24 eV, E_c −0.41 eV, respectively. The capture cross-section and trap concentration of H₁ and E₁ levels were found to be (5×10⁻¹⁹ cm², 2×10¹⁵ cm⁻³) and (1.6×10⁻¹⁶ cm², 3×10¹⁵ cm⁻³), respectively. Owing to the background involvement of aluminum in growth reactor and comparison of the obtained data with the literature, the H₁ defect was identified as aluminum acceptor. A reasonable justification has been given to correlate the E₁ defect to a nitrogen donor.     

A study of deformation-produced deep levels inn-GaAs using deep level transient capacitance spectroscopy

Deformation-produced deep levels, both of electron and hole traps, have been studied using deep level transient capacitance spectroscopy (DLTS) for an undopedn-type GaAs (HB grown) compressed at 440°C. Concentrations of two grown-in electron trap levels (E _c −0.65eV andE _c −0.74eV) and one grown-in hole trap level (E _v +∼0.4eV) increase with plastic deformation, while that of a grown-in electron trap level (E _c −∼0.3eV) decreases in an early stage of deformation. While no new peak appeared in the electron trap DLTS spectrum after plastic deformation, in the hole trap DLTS spectrum a broad spectrum, seemingly composed of many peaks, newly appeared in a middle temperature range, which may be attributed to electronic energy levels of dislocations with various characters.     

Electrical characterization of impurity-free disordering-induced defects in n-GaAs using native oxide layers

Defects created in rapid thermally annealed n-GaAs epilayers capped with native oxide layers have been investigated using deep-level transient spectroscopy (DLTS). The native oxide layers were formed at room temperature using pulsed anodic oxidation. A hole trap H0, due to either interface states or injection of interstitials, is observed around the detection limit of DLTS in oxidized samples. Rapid thermal annealing introduces three additional minority-carrier traps H1 (E_V+0.44 eV), H2 (E_V+0.73 eV), and H3 (E_V+0.76 eV). These hole traps are introduced in conjunction with electron traps S1 (E_C-0.23 eV) and S2 (E_C-0.45 eV), which are observed in the same epilayers following disordering using SiO₂ capping layers. We also provide evidence that a hole trap whose DLTS peak overlaps with that of EL2 is present in the disordered n-GaAs layers. The mechanisms through which these hole traps are created are discussed. Capacitance–voltage measurements reveal that impurity-free disordering using native oxides of GaAs produced higher free-carrier compensation compared to SiO₂ capping layers. Received: 12 March 2002 / Accepted: 15 July 2002 / Published online: 22 November 2002 RID="*" ID="*"Corresponding author. Fax: +61-2/6125-0381, E-mail: pnk109@rsphysse.anu.edu.au     

Optical properties of electron irradiation induced defects in InP

The optical properties of deep hole traps H₄ and H₅ in p type and of the deep electron trap E₁₁ in n type InP, introduced by electron irradiation, have been studied using deep level optical spectroscopy. Comparison of the optical threshold with the thermal activation energy of H₅ level shows that it is highly relaxed with a Frank-Condon shift d_Fc = 0.45 eV. The electron level E₁₁ is weakly relaxed and its optical cross section σ ⁰ is well accounted for by transitions to the Γ_6c minimum. The optical absorption σ_p⁰ associated to level H₄ shows two successive onsets at hν = 0.5 and hν = 1.2 eV which can be attributed to hole transitions to the Γ_7–8 and to the L_4–5 valence band extrema, respectively. The deduced Frank-Condon shift, d_Fc = 0.23 eV, agrees with the measured difference of 40 meV between its apparent activation energy E_a and its thermal activation energy E_T.     

Direct detection of carrier traps in Si solar cells after light‐induced degradation

In solar cells fabricated from boron‐doped Cz‐Si wafers minority and majority carrier traps were detected by deep level transient spectroscopy (DLTS) after so‐called “light‐induced degradation” (LID). The DLTS signals were detected from mesa‐diodes with the full structure of the solar cells preserved. Preliminary results indicate metastable traps with energy levels positioned at E_V + 0.37 eV and E_C – 0.41 eV and apparent carrier capture cross‐sections in the 10^–17–10^–18 cm² range. The concentration of the traps was in the range of 10¹²–10¹³ cm^–3. The traps were eliminated by annealing of the mesa‐diodes at 200 °C. No traps were detected in Ga‐doped solar cells after the LID procedure or below the light protected bus bar locations in B‐doped cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Electron and hole injection in metal-oxide-nitride-oxide-silicon structures

The kinetics of electron and hole accumulation in metal-oxide-nitride-oxide-semiconductor structures is studied. Experimental data are compared with a theoretical model that takes into account tunnel injection, electron and hole capture by traps in amorphous silicon nitride SiN_x, and trap ionization. Agreement between experimental and calculated data is obtained for the bandgap width E _g = 8.0 eV of amorphous SiO₂, which corresponds to the barrier for holes Φ_h = 3.8 eV at the Si/SiO₂ interface. The tunneling effective masses for holes in SiO₂ and SiN_x are estimated at m _h ^* ≈ (0.4–0.5)m ₀. The parameters of electron and hole traps in SiN_x are determined within the phonon-coupled trap model: the optical energy W _opt = 2.6 eV and the thermal energy W _T = 1.3 eV.     

Deep level transient spectroscopy in Hg1−xCdxTe

We report the application of Deep Level Transient Spectroscopy (DLTS) in Hg_1-xCd_xTe, demonstrating for the first time the utilization of DLTS techniques in a narrow band-gap semiconductor, E_g < 0.40 eV. DLTS measurements performed on an n⁺-p diode with E_g (x=0.21, T=30 K) =0.096 eV have identified an electron trap with an energy of E_v + 0.043 eV and a hole trap at E_v + 0.035 eV. Measurements of trap densities, capture cross sections, and the close proximity of the electron and hole trap locations within the band-gap suggest that DLTS may be observing both the electron and hole capture at a single Shockley-Read recombination center. The trapping parameters measured by DLTS predict minority carrier lifetime versus temperature data to be comparable with the experimentally measured values.     

Heat-stimulated currents in semi-insulating gallium arsenide

The energy spectrum of charge carrier traps of semi-insulating n-type gallium arsenide has been investigated by the method of heat-stimulated currents and the parameters characterizing these traps have been estimated. Trap acceptor levels with energies 0.37, 0.41 and 0.17, 0.28, 0.32, 0.34, 0.38, 0.40 eV have been found for samples with the specific resistivity 2.7 · 10⁷ and 1.6 · 10⁸ · cm, respectively. The results obtained are well explained within the framework of the theory of a compensated semiconductor.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii Fizika, No. 11, pp. 22–26, November, 1971.The authors are grateful to A. P. Vyatkin, V. G. Voevodin, and E. V. Kozeev for kindly providing the gallium arsenide crystals and stimulating the research.