La掺杂对Bi4Ti3O12薄膜铁电性能的影响

利用Sol-Gel法在Pt/Ti/SiO2/Si衬底上制备出Bi4Ti3O12和Bi3.25La0.75Ti3O12薄膜,研究了La掺杂对Bi4Ti3O12薄膜的晶体结构、铁电性能和疲劳特性的影响,发现La掺杂没有改变Bi4Ti3O12薄膜的基本晶体结构,并且提高了Bi4Ti3O12铁电薄膜的剩余极化值和抗疲劳性能,对La掺杂改善Bi4Ti3O12铁电薄膜性能的机理进行了讨论.     

MOD法制备Bi4-xLaxTi3O12铁电薄膜及其谱图分析

采用有机金属沉积法(MOD)制备了Bi4Ti3O12(BIT)和Bi3.25La0.75Ti3O12(BLT)前驱体溶液,分别在单晶硅基片上制备了BIT和BLT铁电薄膜.前驱体溶液的干凝胶粉体和铁电薄膜分别用红外光谱(FTIR)、拉曼光谱和环境扫描电镜(ESEM)进行了表征.结果表明600℃时晶粒实现了由焦绿石相向类钙钛矿相结构的完全转变;温度升高,晶粒尺寸增大,薄膜结晶效果得到改善;引入镧使Ti-O和Bi-O键吸收峰位置向低波数频移,高温时频移率较大;500℃热处理时,干凝胶中乙二醇甲醚、乙酰丙酮完全分解,温度超过600℃后,残留的水及硝酸根离子挥发或分解.     

Bi_2Ti_2O_7/Si薄膜的制备及C-V特性研究

采用化学溶液分解法 (CSD)在Si衬底上制备了Bi2 Ti2 O7薄膜 .X射线双晶衍射和原子力显微镜检测表明 ,所制备的薄膜主要为Bi2 Ti2 O7相的多晶材料 .同时还研究了Au Bi2 Ti2 O7 n Si(10 0 )结构的电容 电压 (C V)特性 ,结果表明 ,在Bi2 Ti2 O7薄膜中同时存在固定的与可移动的负电荷 ,可移动的负电荷导致了C V曲线的回线效应     

Si基Bi3.25La0.75Ti3O12铁电薄膜的制备与特性研究

采用Sol-Gel工艺低温制备了Si基Bi3.25La0.75Ti3O12铁电薄膜.研究了退火温度对薄膜微观结构、介电特性与铁电性能的影响.500℃退火处理的Bi3.25La0.75Ti3O12薄膜未能充分晶化,晶粒细小且有非晶团聚,介电与铁电性能均较差.高于550℃退火处理的Bi3.25La0.75Ti3O12薄膜表面平整无裂纹,晶粒均匀,无焦碌石相或其他杂相,薄膜为多晶生长,具有较好的介电与铁电性能,4V电压下的漏电流密度低于2×10-8A/cm2.随退火温度升高,晶化程度的提升和晶粒尺寸的增大使薄膜的剩余极化增大而矫顽电场降低.600℃退火处理的Bi3.25La0.75Ti3O12薄膜显示了优于Bi4Ti3O12薄膜的铁电性能,其剩余极化Pr和矫顽电场Ec分别达到17.5μC/cm2和102kV/cm.     

化学溶液法制备的Bi3.25La0.75Ti3 O12和Bi3.25Ndo.75 Ti3 O12薄膜的光学特性

采用化学溶液方法在(111)Pt/Ti/SiO2/Si衬底上制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜.x射线衍射测试表明,两种薄膜都为单一的层状钙钛矿结构.扫描电子显微镜分析显示,BNT薄膜由大而均匀的棒状晶粒组成,BLT薄膜的组成晶粒则较小.采用紫外-近红外椭圆偏振光谱仪测试了200-1700nm波长范围的椭圆偏振光谱,拟合得到薄膜的光学常数(折射率和消光系数)和厚度,确定BLT和BNT薄膜的禁带宽度分别为4.30和3.61eV,并采用单电子振子模型分析了薄膜在带间跃迁区的折射率色散关系.     

Si基Bi4Ti3O12铁电薄膜的制备与特性研究

采用sol-gel工艺,在分层快速退火的工艺条件下成功地制备了高质量Si基BiTi3O12铁电薄膜.研究了Si基Bi4Ti3O12薄膜的生长行为、铁电性能、C-V特性和疲劳特性.研究表明:Si基Bi4Ti3O12薄膜具有随退火温度升高沿c轴择优生长的趋势;退火温度通过影响薄膜的晶粒尺寸、生长取向和薄膜中载流子的浓度来改变Si基Bi4Ti3O12薄膜的铁电性能;Ag/Bi4Ti3O12/p-Si异质结的C-V特性曲线呈现顺时针回滞,可以实现极化存储;109次极化反转后Bi4Ti3O12薄膜的剩余极化仅下降12%,具有较好的疲劳特性.     

La掺杂对Bi4Ti3O12薄膜铁电性能的影响

利用Sol-Gel法在Pt/Ti/SiO₂/Si衬底上制备出Bi₄Ti₃O₁₂和Bi_3.25La_0.75Ti₃O₁₂薄膜，研究了La掺杂对Bi₄Ti₃O₁₂薄膜的晶体结构、铁电性能和疲劳特性的影响，发现La掺杂没有改变Bi₄Ti₃O₁₂薄膜的基本晶体结构，并且提高了Bi₄Ti₃O₁₂铁电薄膜的剩余极化值和抗疲劳性能，对La掺杂改善Bi₄Ti₃O₁₂铁电薄膜性能的机理进行了讨论. 关键词： 铁电性能 4Ti₃O₁₂薄膜')" href="#">Bi₄Ti₃O₁₂薄膜 3.25La_0.75Ti₃O₁₂薄膜')" href="#">Bi_3.25La_0.75Ti₃O₁₂薄膜 sol-gel法 La掺杂     

Bi4-xLaxTi3O12-SrBi4Ti4O15,共生结构铁电材料拉曼光谱研究

在常温下，对La掺杂共生结构铁电陶瓷Bi_4-xLa_xTi_3O_12-SrBi_4-yLayTi_4O_15［BLT-SBLT(x+y),x+y= 0.00, 0.25,0.50,0.75,1.00,1.25,1.50］进行了拉曼光谱研究.结果表明，在掺杂量低于0.50时，La只取代类钙钛矿层中的Bi，当掺杂 量高于0.50后，部分La开始进入(Bi_2O_2)^2+层. La取代(Bi_2O_2)^2+层中的部分Bi以后，(Bi_2O_2)^2+层结构发生变化 ，原有的绝缘层和空间电荷库的作用减弱，导致材料剩余极化下降. La掺杂量增至1.50时，样品出现弛豫铁电性，这与30cm^-1以下模的软化相对应，说明La掺杂可引起材料 的结构相变. 关键词： Bi4-xLaxTi3O12-SrBi4Ti4O15 La掺杂 声子模 拉曼频移     

SrBi2Ta2O9/Bi4Ti3O12复合铁电薄膜的制备与特性研究

采用溶胶凝胶工艺在p-Si衬底上制备了SrBi2Ta2O9/Bi4Ti3O12复合铁电薄膜. 研究了SrBi2Ta2O9/Bi4Ti3O12复合薄膜的微观结构与生长行为、铁电性能和疲劳特性. 研究表明: Si衬底Bi4Ti3O12薄膜易于沿c轴择优生长,并有利于SrBi2Ta2O9/Bi4Ti3O12复合薄膜的生长.合理的SrBi2Ta2O9/Bi4Ti3O12厚度配比能获得较好的铁电性能和优良的抗疲劳特性,SrBi2Ta2O9/Bi4Ti3O12厚度配比为1∶3的复合薄膜的剩余极化强度和矫顽电场分别为8.1 μC/cm2 和 130 kV/cm,其无疲劳极化开关次数达1011以上.     

Bi4-xLax Ti3O12-SrBi4-y Lay Ti4O15共生结构铁电材料拉曼光谱研究

在常温下 ,对La掺杂共生结构铁电陶瓷Bi4 -xLaxTi3O1 2 _SrBi4 -yLayTi4 O1 5[BLT_SBLT(x y) ,x y =0 0 0 ,0 2 5 ,0 5 0 ,0 75 ,1 0 0 ,1 2 5 ,1 5 0 ]进行了拉曼光谱研究 .结果表明 ,在掺杂量低于 0 5 0时 ,La只取代类钙钛矿层中的Bi,当掺杂量高于 0 5 0后 ,部分La开始进入 (Bi2 O2 ) 2 层 .La取代 (Bi2 O2 ) 2 层中的部分Bi以后 ,(Bi2 O2 ) 2 层结构发生变化 ,原有的绝缘层和空间电荷库的作用减弱 ,导致材料剩余极化下降 .La掺杂量增至 1 5 0时 ,样品出现弛豫铁电性 ,这与 30cm- 1 以下模的软化相对应 ,说明La掺杂可引起材料的结构相变     

Thickness Effect on (La_(0.26)Bi_(0.74))_2Ti_4O_(11) Thin-Film Composition and Electrical Properties

Highly oriented(00l)(La_(0.26)Bi_(0.74))_2Ti_4O_(11 )thin films are deposited on(100) SrTiO_(3 )substrates using the pulsed laser deposition technique.The grains form a texture of bar-like arrays along Sr Ti O_3110directions for the film thickness above 350 nm,in contrast to spherical grains for the reduced film thickness below 220 nm.X-ray diffraction patterns show that the highly ordered bar-like grains are the ensemble of two lattice-matched monoclinic(La,Bi)_4Ti_3O_(12 )and TiO_(2 )components above a critical film thickness.Otherwise,the phase decomposes into the random mixture of Bi_2Ti_2O_(7 )and Bi_4Ti_3O_(4 )spherical grains in thinner films.The critical thickness can increase up to 440 nm as the films are deposited on LaNiO_3-buffered SrTiO_(3 )substrates.The electrical measurements show the dielectric enhancement of the multi-components,and comprehensive charge injection into interfacial traps between(La,Bi)_4Ti_3O_(12 )and TiO_(2 )components occurs under the application of a threshold voltage for the realization of high-charge storage.     

The influence of lanthanum doping on the physical and electrical properties of BTV ferroelectric thin films

In this study, the ferroelectricity of as-deposited Bi_3.9La_0.1Ti_2.9V_0.1O₁₂ (BLTV), Bi_3.9Ti_2.9V_0.1O₁₂ (BTV), and Bi₄Ti₃O₁₂ (BIT) thin films was prepared and compared by rf magnetron sputtering technology. For the BLTV, BTV, and BIT thin films deposited on Pt/Ti/SiO₂/Si and SiO₂/Si substrate, the physical and electrical characteristics of lanthanum doped BTV (BLTV) were better than those of BIT and BTV thin films. Regarding the physical properties, the micro-structure of as-deposited BTV and BLTV thin films were obtained and compared by XRD patterns and SEM images. The BLTV and BTV thin films were also exhibited clear the ferroelectricity. The remanent polarization (P _r ) of as-deposited BLTV thin films was 11 μC/cm² as the measured frequency of 100 kHz. It was higher than those of BTV thin films. Finally, the polarization of BLTV thin film capacitor decreased by 9%, while that of the BTV decreased by 15% after the fatigue test with 10⁹ switching cycles.     

存储器用铁电薄膜及电极材料的研究

铁电体独特的自发电极化双稳性质和非线性光学性质使其在光电子器件中得到广泛应用．为了实现器件的小型化和与微电子、光电子工艺兼容，铁电薄膜已成为一个研究热点．自发电极化的大小和取向以及外电场、缺陷和铁电薄膜／电极界面与自发电极化的交互作用决定了铁电薄膜的性质和服役行为．文章以铁电存储器和光电子器件应用为背景，选择了具有重大应用前景的Bi4-xLaxTi3O12（BLT）、SrBi2Ta2O9（SBT）、PbZrxTi1-xO3（PET）和LiNbO3（LN）铁电薄膜以及相关的La（Sr，Co）O3（LSCO）和LaNiO3（LNO）等电极材料为研究对象，研究了缺陷电荷和电畴的交互作用和它们在交变外电场中的动力学行为，探明了铁电薄膜疲劳现象的物理本质；从晶格结构与缺陷的观察研究入手，探索了材料铁电性质的起源和优化材料铁电性质的途径；从铁电薄膜／电极界面结构与性质的研究入手，寻找更有效、更稳定的电极材料与结构，从而为器件应用打下了基础；在研究外电场对铁电薄膜生长机制影响的基础上，找到了利用外电场调控铁电薄膜结构的新途径，发展了新的、与半导体器件和光电子器件工艺兼容的制膜方法．     

Sb_2Te_3热电薄膜的离子束溅射制备与表征

采用离子束溅射技术交替沉积Sb-Te-Sb多层薄膜后进行高真空热处理,直接制备Sb2Te3薄膜.利用X射线衍射(XRD)仪、霍尔系数测试仪、薄膜Seebeck系数测量系统对所制备的薄膜特性进行表征.XRD测量结果显示,薄膜的主要衍射峰与Sb2Te3标准衍射峰相同,在[101]/[012]晶向取向明显,存在较多的Te杂质峰;霍尔系数测试结果表明,薄膜为p型半导体薄膜,薄膜电阻率较低,其电导率接近于金属电导率,载流子浓度量级为1023cm-3,具有良好的电学性能;Seebeck系数测量结果显示,薄膜具有良好的热电性能,在不同条件下制备的薄膜的Seebeck系数在7.8—62μV/K范围;在所制备的薄膜中,退火时间为6h、退火温度为200℃的薄膜其Seebeck系数达到最大,约为62μV/K,且电阻率最小.     

Effect of substitution of vanadium on the structure and electrical properties of Bi<Subscript>3.25</Subscript>La<Subscript>0.75</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> thin films

The ferroelectric and dielectric properties of Bi_4-xLa_xTi₃O₁₂ (BLT) and Bi_4-xLa_xTi_2.97V_0.03O₁₂ (BLTV) thin films deposited on (111)Pt/Ti/SiO₂/Si substrates using a chemical solution method were investigated. The BLTV thin films showed a larger remanent polarization (9.6 C/cm²) than the BLT thin films (6.5 C/cm²), while the coercive field for both thin films was nearly the same. The capacitance of the films as a function of a small ac driving field was measured, and the data were processed using Rayleighs law. The results show that the Rayleigh constant of the BLT films was smaller than that of the BLTV films, indicating that the defect concentration was lower in the latter case. The superior ferroelectricity of the BLTV films was attributed to a decrease of both the (001) orientation and the defect concentration. PACS 77.80.Bh; 77.55.+f     

金属有机物化学气相法制备YBCO超导薄膜研究

运用金属有机物化学气相沉积法(MOCVD),在LaAlO3(LAO)单晶上沉积YBa2Cu3O7-x(YBCO)超导薄膜。通过使用优化的进液装置,使金属有机源连续、稳定地输送至蒸发皿进行闪蒸。通过优化总气压、氧分压等生长条件,获得高质量的YBCO薄膜。在固定的温度条件下,调节反应总气压和氧分压,在总压为380Pa,氧分压为180Pa获得YBCO薄膜临界电流密度Jc=0.6MA/cm2。随着氧分压增大,YBCO薄膜产生a轴取向,(005)峰向左偏移,且薄膜中的Cu/Ba由1.0变化至1.63。在Cu/Ba=1.48时,YBCO薄膜结构与性能较优。     

Effect of an in-situ applied electric field on growth of Bi4Ti3O12 films by sol-gel

Bi₄Ti₃O₁₂ (BIT) films were prepared on Pt/TiO₂/SiO₂/Si substrates by the sol-gel method. A low electric field was in-situ applied to BIT films during rapid thermal annealing (RTA). It was first found that a bias electric field has great influence on the structure, orientation, and morphology of BIT films at proper temperatures. Under the electric field of very low V/cm, BIT films show highly c-axis-oriented growth with second phase of bismuth oxide at 600 and 650 °C. The possible origin is proposed. On one hand, the electrostatic energy provides an extra driving force and the co-interaction of the electrostatic energy and interface energy promotes the c-axis-oriented growth of the BIT grains. On the other hand, the second phase of bismuth oxide produced during RTA in an electric field also plays an important role in the control of film orientation.     

Electrical analysis of inter-growth structured Bi_4Ti_3O_(12)-Na_(0.5)Bi_(4.5)Ti_4O_(15) ceramics

Inter-growth bismuth layer-structured ferroelectrics(BLSFs), Bi_4Ti_3O_(12)-Na_(0.5)Bi_(4.5)Ti_4O_(15)(BIT-NBT), were successfully synthesized using the traditional solid-state reaction method. X-ray diffraction(XRD) Rietveld refinements were conducted using GSAS software. Good agreement and low residual are obtained. The XRD diffraction peaks can be well indexed into I2 cm space group. The inter-growth structure was further observed in the high-resolution TEM image. Dielectric and impedance properties were measured and systematically analyzed. At the temperature range 763-923 K(below T_c), doubly ionized oxygen vacancies(OVs) are localized and the short-range hopping leads to the relaxation processes with an activation energy of 0.79-1.01 eV. Above T_c, the doubly charged OVs are delocalized and become free ones, which contribute to the long-range dc conduction. The reduction in relaxation species gives rise to a higher relaxation activation energy ~ 1.6 eV.