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La掺杂浓度对PLZT薄膜红外光学性质的影响   总被引:2,自引:0,他引:2       下载免费PDF全文
采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱,采用经典色 散模型拟合获得PLZT薄膜的红外光学常数,同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大,折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外,呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ 关键词: PLZT薄膜 红外光学性质 红外椭圆偏振光谱  相似文献   
2.
越方禹  陈璐  李亚巍  胡志高  孙琳  杨平雄  褚君浩 《中国物理 B》2010,19(11):117201-117201
Based on our previous work,the influence of annealing conditions on impurity species in in-situ arsenic (As)-doped Hg 1 x Cd x Te (x ≈ 0.3) grown by molecular beam epitaxy has been systematically investigated by modulated photoluminescence spectra.The results show that (i) the doped-As acting as undesirable shallow/deep levels in as-grown can be optimized under proper annealing conditions and the physical mechanism of the disadvantage of high activation temperature,commonly assumed to be more favourable for As activation,has been discussed as compared with the reports in the As-implanted HgCdTe epilayers (x ≈ 0.39),(ii) the density of V Hg has an evident effect on the determination of bandgap (or composition) of epilayers and the excessive introduction of V Hg will lead to a short-wavelength shift of epilayers,and (iii) the V Hg prefers forming the V Hg-As Hg complex when the inactivated-As (As Hg or related) coexists in a certain density,which makes it difficult to annihilate V Hg in As-doped epilayers.As a result,the bandedge electronic structures of epilayers under different conditions have been drawn as a brief guideline for preparing extrinsic p-type epilayers or related devices.  相似文献   
3.
采用化学溶液方法在(111)Pt/Ti/SiO2/Si衬底上制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜.x射线衍射测试表明,两种薄膜都为单一的层状钙钛矿结构.扫描电子显微镜分析显示,BNT薄膜由大而均匀的棒状晶粒组成,BLT薄膜的组成晶粒则较小.采用紫外-近红外椭圆偏振光谱仪测试了200-1700nm波长范围的椭圆偏振光谱,拟合得到薄膜的光学常数(折射率和消光系数)和厚度,确定BLT和BNT薄膜的禁带宽度分别为4.30和3.61eV,并采用单电子振子模型分析了薄膜在带间跃迁区的折射率色散关系.  相似文献   
4.
Modulated photoluminescence spectra have been performed to investigate the impurity activation in MBE-grown As-doped Hg1-xCdxTe (x ≈ 0.3). The results show that the doped As mainly acting as donors in the as-grown samples can be fully activated as AsTe by two-stage anneals of 285℃/16 h + 240℃/48h, of which the ionization energy has been determined to be about lO.5 meV, slightly smaller than that of intrinsic VHg (about 14.5 meV). However, the higher activation temperature (e.g. 400℃) at the first-stage can produce large numbers of excessive VHg and seriously deteriorate the quality of epilayers. This couM give a brief guideline for preparing extrinsic p-type HgCdTe materials or devices.  相似文献   
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