铁电存储器中高能质子引发的单粒子功能中断效应实验研究

利用中国原子能科学研究院的中高能质子实验平台,针对两款商用铁电存储器开展了中高能质子单粒子效应实验研究,发现其中一款器件在质子辐照下发生了单粒子翻转和单粒子功能中断.本文主要针对单粒子功能中断效应展开了后续实验研究.首先通过改变质子能量对器件进行辐照,发现单粒子功能中断截面随质子能量的提高而增加.为进一步研究器件发生单粒子功能中断的机理,利用激光微束平台开展了辅助实验,对铁电存储器的单粒子功能中断效应的敏感区域进行了定位,最后发现铁电存储器单粒子功能中断是由器件外围电路发生的微锁定导致的.     

空间用GaN功率器件单粒子烧毁效应激光定量模拟技术研究

利用飞秒脉冲激光对氮化镓(GaN)功率器件进行单粒子烧毁效应定量评估技术研究,针对器件结构建立脉冲激光有效能量传输模型,理论计算了激光有效能量与重离子线性能量传输(LET)的等效关系并开展了试验验证.考虑器件材料反射率与吸收系数对激光的影响,针对介质层界面间的激光多次反射进行参数修正,减小有源区有效能量计算误差.选择一款氮化镓高电子迁移率晶体管(GaN HEMT)与一款肖特基势垒二极管(SBD)功率器件作为典型案例,分别开展飞秒脉冲激光正面与背部辐照试验,计算诱发单粒子烧毁的有效能量,并得到不同入射激光波长的烧毁等效LET阈值,对比了模型理论计算值与实际测量值.同时,研究结果对材料参数未知的GaN功率器件,提供了正面与背部辐照模型的激光试验波长选择参考.该工作将为激光定量评估空间用GaN等宽禁带半导体器件的单粒子烧毁效应机理研究及加固设计与验证提供技术支撑.     

激光与半导体材料相互作用的双电子共振吸收模型

通过提出双电子共振吸收模型,解释了激光与半导体材料相互作用时材料吸收光子的物理机制,分析了温度、掺杂数密度对吸收系数的影响;结合热峰模型,将激光的能量注入视为热源,计算出了激光入射时材料中电子温度的时空演化,通过费米狄拉克分布计算出自由电荷数密度分布,得到了电荷激发过程的计算模型,模拟了激光诱发单粒子翻转的过程。模拟结果表明,激光能量与激发电荷总量的关系是非线性的,这意味着激光能量与粒子的线性能量传输之间为非线性对应关系,与实验结果相符。     

SiC-pn结二极管α粒子辐射效应

为了研究6HSiC材料制作的pn结二极管探测器的辐照特性,采用蒙卡程序模拟研究了4.3和1.8MeV能量的α粒子在辐照探测器中的物理过程。介绍了二极管探测器的工艺制作和物理参数,根据其结构建立了仿真模型,利用蒙卡程序进行了α粒子照射的仿真研究。研究结果直观地反映了α粒子在探测器中的输运情况。α粒子在探测器中的辐射效应主要是电离作用,电离产生的电子空穴对形成一定的分布。给出了α粒子在探测器中的电离能量损失分布及二极管探测器的电荷收集效率表达式。     

CCD质子辐照损伤效应的三维蒙特卡罗模拟

针对空间质子诱发CCD性能退化问题,开展了CCD质子辐照效应的三维蒙特卡罗模拟研究。采用三维蒙特卡罗软件Geant4模拟计算了不同能量质子在Si和SiO₂中的射程及Bragg峰,分析了不同能量质子在材料中能量沉积的过程,并将模拟结果与相关数据进行对比,模拟误差在5%以内。根据质子与材料相互作用的物理过程,选取了合适的Lindhard分离函数,添加合适的物理过程,模拟计算了不同能量质子在SiO₂中的电离能量损失和Si中的非电离能量损失,并将结果与国外相关数据进行对比。根据CCD的生产工艺参数,建立了单个像元的三维模拟模型,确定了质子辐照损伤的灵敏体积,模拟计算了不同能量质子在像元灵敏体积内的电离能量沉积与非电离能量沉积,分析了CCD不同能量质子的辐照损伤差异产生的机理。结合粒子输运计算结果与CCD质子辐照实验结果,分析了质子辐照诱发CCD辐射敏感参数退化的物理机制。     

反场构型等离子体靶压缩过程中强磁场对α粒子能量的约束效应

基于一维弹塑性磁流体力学程序（SSS-MHD）,研究了反场构型（FRC）等离子体靶在磁驱动固体套筒压缩过程中强磁场对α粒子能量约束效应,分析了α粒子的非局域和局域自加热对FRC等离子靶压缩峰值温度的影响,以及α粒子能量在整个压缩过程中端部损失效应。等离子体部分采用多温单流体的模型,能量的计算中引入了DT离子、电子及α粒子多成分温度的能量方程,同时考虑了等离子体压缩过程热平衡下的核反应和非局域自加热问题。研究结果表明,磁化靶聚变等离子体在压缩过程中具有较好的稳定性,能够保持刚性转子的靶结构,压缩过程形成的强磁场能够将α粒子的能量约束在O点附近的区域,有利于等离子体靶的点火及燃烧;α粒子对等离子体的自加热效应主要集中在等离子体电流中心区,而非等离子体中心轴处;α粒子对DT等离子体局域和非局域自加热过程存在差异,局域自加热过程的功率大于非局域自加热过程的功率,FRC等离子靶压缩峰值状态温度相差0.5倍。在反场构型的刮离层区,α粒子的能量端部损失在FRC等离子体靶的压缩和膨胀过程中逐渐增大。     

双极器件ELDRS效应研究进展

电离总剂量是航天电子系统辐射效应研究的重要问题,其中双极器件因其特有的低剂量率损伤增强（Enhanced low Dose Rate Sensitivity,ELDRS）效应,已成为航天用双极器件抗电离总剂量效应发展重点突破的方向及难点问题。本文综述了ELDRS效应及低剂量率加速评估技术的研究进展,并结合ELDRS效应难点问题,给出了最新关于ELDRS效应的研究结果。试验结果表明,采用变温辐照方法不仅可以保守地用于双极器件在0~200 krad （Si）范围的ELDRS效应评估,将评估时间从7.7个月缩短至11 h,还可将其应用于双极模拟电路总剂量和单粒子协同效应的评估,同样可以获得保守且快速的评估效果。     

基于蒙特卡洛和器件仿真的单粒子翻转计算方法

文章提出了一种基于蒙特卡洛和器件仿真的存储器单粒子翻转截面获取方法,可以准确计算存储器单粒子效应,并定位单粒子翻转的灵敏区域.基于该方法,计算了国产静态存储器和现场可编程门阵列(FPGA)存储区的单粒子效应的截面数据,仿真结果和重离子单粒子效应试验结果符合较好.仿真计算揭示了器件单粒子翻转敏感程度与器件n,p截止管区域面积相关的物理机理,并获得了不同线性能量转移(LET)值下单粒子翻转灵敏区域分布.采用蒙特卡洛方法计算了具有相同LET、不同能量的离子径迹分布,结果显示高能离子的电离径迹半径远大于低能离子,而低能离子径迹中心的能量密度却要高约两到三个数量级.随着器件特征尺寸的减小,这种差别的影响将会越来越明显,阈值LET和饱和截面将不能完全描述器件单粒子效应结果.     

纳米静态随机存储器质子单粒子多位翻转角度相关性研究

器件特征尺寸的减小带来单粒子多位翻转的急剧增加, 对现有加固技术带来了极大挑战. 针对90 nm SRAM(static random access memory, 静态随机存储器)开展了中高能质子入射角度对单粒子多位翻转影响的试验研究, 结果表明随着质子能量的增加, 单粒子多位翻转百分比和多样性增加, 质子单粒子多位翻转角度效应与质子能量相关. 采用一种快速计算质子核反应引起单粒子多位翻转的截面积分算法, 以Geant4中Binary Cascade模型作为中高能质子核反应事件发生器, 从次级粒子的能量和角度分布出发, 揭示了质子与材料核反应产生的次级粒子中, LET(linear energy transfer)最大, 射程最长的粒子优先前向发射是引起单粒子多位翻转角度相关性的根本原因. 质子能量、临界电荷的大小是影响纳米SRAM器件质子多位翻转角度相关性的关键因素. 质子能量越小, 多位翻转截面角度增强效应越大; 临界电荷的增加将增强质子多位翻转角度效应.     

质子与金属布线层核反应对微纳级静态随机存储器单粒子效应的影响分析

金属布线层对微纳级静态随机存储器(static random access memory, SRAM) 质子单粒子效应敏感性的影响值得关注. 利用Geant4针对不同能量(30 MeV, 100 MeV, 200 MeV和500 MeV)的质子与微纳级SRAM器件的核反应过程开展计算, 研究了核反应次级粒子的种类、线性能量传输值(linear energy transfer, LET)及射程情况, 尤其对高LET 值的核反应次级粒子及其射程开展了详细分析. 研究表明, 金属布线层的存在和质子能量的增大为原子序数大于或等于30的重核次级粒子的产生创造了条件, 器件体硅区中原子序数大于60的重核离子来源于质子与钨材料的核反应, 核反应过程中的特殊作用机理会生成原子序数在30至50之间的次级粒子, 且质子能量的增大有助于这种作用机理的发生, 原子序数在30至50之间的次级粒子在器件体硅区的LET值最大约为37 MeV·cm²/mg, 相应射程可达到几微米, 对于阱深在微米量级的微纳级SRAM器件而言, 有引发单粒子闩锁的可能. 研究结果为空间辐射环境中宇航器件的质子单粒子效应研究提供理论支撑.     

Heat flow through a plasma sheath in the presence of secondary electron emission from plasma‐wall interaction

The formation of a plasma sheath in front of a negative wall emitting secondary electron is studied by a one‐dimensional fluid model. The model takes into account the effect of the ion temperature. With the secondary electron emission (SEE ) coefficient obtained by integrating over the Maxwellian electron velocity distribution for various materials such as Be, C, Mo, and W, it is found that the wall potential depends strongly on the ion temperature and the wall material. Before the occurrence of the space‐charge‐limited (SCL ) emission, the wall potential decreases with increasing ion temperature. The variation of the sheath potential caused by SEE affects the sheath energy transmission and impurity sputtering yield. If SEE is below SCL emission , the energy transmission coefficient always varies with the wall materials as a result of the effect of SEE , and it increases as the ion temperature is increased. By comparison of with and without SEE , it is found that sputtering yields have pronounced differences for low ion temperatures but are almost the same for high ion temperatures.     

电离总剂量对纳米SRAM器件单粒子翻转敏感性的影响

电离总剂量（TID）与单粒子效应（SEE）是纳米SRAM器件在航天应用中的主要威胁。随着CMOS工艺的进步,两种辐射效应在纳米SRAM器件中的协同效应出现了一些新现象,有必要进一步开展深入研究。利用γ射线以及不同种类重离子对两款纳米SRAM器件开展了辐照实验,研究了不同辐照参数、测试模式以及数据图形条件下,电离总剂量对单粒子翻转（SEU）敏感性的影响。研究结果表明,γ射线辐照过后,存储单元中反相器开关阈值减小,漏电流增大,导致SRAM存储单元抗翻转能力降低,SEU截面有明显增大;未观察到"印记效应",数据图形对测试结果没有明显影响;多位翻转（MBU）比例无明显变化。     

Elastic displacement of surface due to laser picosecond pulse heating of gold

Laser picosecond pulse heating initiates nonequilibrium energy transport in the surface vicinity of the metallic substrates. In this case, electron temperature rises rapidly while lattice site temperature is slow during the heating period. Although the rise of lattice site temperature is low, the temperature gradient is high. This results in elastic displacement of the surface. To model the heating process thermomechanical coupling needs to be introduced in the analysis. In the present study, picosecond pulse heating of gold surface is considered. Three-dimensional analysis of electron kinetic theory is introduced when formulating the electron and the lattice site temperatures. The analysis is extended to include the thermomechanical coupling due to mechanical response of the substrate material. The lattice site temperatures obtained from the electron kinetic theory are compared with the predictions of the two-equation model. It is found that both models predict almost identical temperature profiles in the surface vicinity of the substrate material. In addition, the surface displacement on the order of 10⁻¹¹ m is predicted.     

Improved formulation of electron kinetic theory approach for laser shortpulse heating: Thermal stress consideration

Nonequilibrium energy transport between excited electrons and lattice site is re-formulated after considering the ballistic contribution of the electron energy to the energy transport process. The improved formulation of the electron kinetic theory predictions are compared with the previously obtained electron kinetic and two-equation models. Thermal stress developed in the region irradiated by a laser beam is formulated during the heating pulse. Copper with variable properties is used in the simulations. It is found that improved electron kinetic theory model predicts less temperature rise than that corresponding to previously formulated electron kinetic theory and two equation models in the surface region; in this case, electron temperature attains high values. Thermal stress developed is compressive and attains the maximum at some depth below the surface. The thermal stress level is well below the yielding limit of the substrate material.     

金纳米结构表面二次电子发射特性

使用低气压蒸发工艺制备了金纳米结构,研究了金纳米结构的二次电子发射特性及其对表面形貌的依赖规律,表征了金纳米结构表面出射二次电子能量分布.实验结果表明:蒸发气压升高时,金纳米结构孔隙率增大,表面电子出射产额降低;能量分布表明金纳米结构仅对低能真二次电子有明显抑制作用,对背散射电子的作用效果则依赖于表面形貌.使用由半球和沟槽构成的复合结构,并结合二次电子发射唯象概率模型,对金纳米结构进行模型等效及电子发射特性仿真,模拟结果表明:纳米结构中的半球状纳米颗粒对两种电子产额均有增强作用;沟槽对真二次电子产额有强抑制作用,而对背散射电子产额仅有微弱抑制作用.本工作深入研究了金纳米结构表面电子发射机理,对于开发空间微波系统中纳米级低电子产额表面有重要参考价值.     

Discussion of the metric in characterizing single-event effect induced by heavy ions

Single-event effect (SEE) is the most serious problem in space environment. The modern semiconductor technology worries about the feasibility of the linear energy transfer (LET) as metric in characterizing SEE induced by heavy ions. In the paper, we calibrate the detailed static random access memory (SRAM) cell structure model of advanced field programmable gate array (FPGA) device using the computer-aided design tool, and calculate the heavy ion energy loss in multi-layer metal utilizing Geant4. Based on the heavy ion accelerator experiment and numerical simulation, it is proved that the metric of LET at the device surface, with ignoring the top metal material in advanced semiconductor device, would underestimate the SEE. In the SEE evaluation in space radiation environment the top-layers on the semiconductor device must be taken into consideration.     

Laser short pulse heating: Influence of pulse intensity on temperature and stress fields

Laser short-pulse heating of gold surface is considered and the influence of laser pulse intensity on the temperature and stress fields is investigated. Laser step input pulses with different pulse lengths and the same energy content are employed in the simulations. The electron kinetic theory approach employing thermomechanical coupling is introduced to model the non-equilibrium energy transport in the electron and lattice sub-systems. Thermal stress development in the lattice sub-system and temperature rise in the lattice and electron sub-systems are computed. It is found that electron temperature rises rapidly while lattice site temperature rise is gradual in the early heating period, which is more pronounced for high intensity pulses. Thermal stress component in the axial direction is compressive and its magnitude is considerably less than the yielding limit of the substrate material.     

Discussion of the metric in characterizing the single-event effect induced by heavy ions

The single-event effect(SEE) is the most serious problem in space environment.The modern semiconductor technology is concerned with the feasibility of the linear energy transfer(LET) as metric in characterizing SEE induced by heavy ions.In this paper,we calibrate the detailed static random access memory(SRAM) cell structure model of an advanced field programmable gate array(FPGA) device using the computer-aided design tool,and calculate the heavy ion energy loss in multi-layer metal utilizing Geant4.Based on the heavy ion accelerator experiment and numerical simulation,it is proved that the metric of LET at the device surface,ignoring the top metal material in the advanced semiconductor device,would underestimate the SEE.In the SEE evaluation in space radiation environment the top-layers on the semiconductor device must be taken into consideration.     

数值模拟飞秒激光加热金属的热电子发射

研究了超短超强激光脉冲与薄膜靶相互作用中产生的电子热发射.当超短激光脉冲与薄膜靶相互作用时,首先入射超短脉冲激光对吸收深度内的自由电子进行热激发,接下来热激发电子将能量传递到附近的晶格,再通过电子和晶格二体系的热传导,以及电子晶格间的热耦合,将能量传递到材料的内部.因此,电子在皮秒级甚至更短的时间内不能与晶格进行能量耦合,使电子温度超出晶格温度很多,电子热发射就变得非常明显了.用双温方程联合Richardson-Dushman方程的方法对飞秒脉冲激光照射金属靶的电子热发射进行了研究,结果发现电子热发射对飞