In-plane magnetization with high coercivity in terbium iron garnet thin films deposited on Pt/Si substrate by PLD

We report on the growth of terbium iron garnet (TbIG, Tb₃Fe₅O₁₂) thin films having anomalously large coercivity and in-plane easy axis of magnetization. The TbIG thin films were prepared at room temperature (RT) on Pt/Si(1 0 0) substrates by pulsed laser deposition technique. The films deposited at RT were X-ray amorphous and do not show any magnetic order. Annealing of the RT deposited film at 900 °C resulted into fully textured (532) TbIG film. Atomic force microscopy and cross-sectional scanning electron microscopy studies of the TbIG films showed good surface quality with an average surface roughness of 5.0 nm and thickness of about 300 nm, respectively. The M-H loops measured at 20 K for TbIG films, exhibit about an order of magnitude enhancement in the coercivity value (H_c) than the single crystal. In-plane and out-of-plane M-H loops revealed that the easy axis of the magnetization lies within the film’s plane. In-plane magnetization combining with large H_c value of the TbIG thin film may be of scientific interest for the possible applications.     

Xenon-ion Induced Magnetic and Structural Modifications of Ferromagnetic Alloys

Thin polycrystalline films of permalloy (Ni₇₉Fe₂₁) and permendur (Co₅₀Fe₅₀) have been irradiated with Xe-ions to fluences of 10¹⁴–10¹⁶ ions/cm². Ion-induced structural and magnetic modifications have been measured by grazing angle X-ray diffraction, Rutherford backscattering and magneto-optical Kerr effect. In the case of permendur, the Xe-ion implantation first reduced the coercivity, because of stress relaxation, while higher ion fluences increased the coercivity due to pinning centers generated in the film. The ion irradiation aligned the in-plane easy axis of the magnetization along the direction of the external magnetic field during implantation. Phase shifts obtained from magnetic force microscopy confirmed these modifications. The effects of Xe-ion irradiation in permalloy films are much weaker and underline the importance of magnetostriction in the variation of the coercivity and anisotropy.     

Mechanical stability of ferrimagnetic CoFe2O4 flexible thin films

We fabricated high-quality ferrimagnetic CoFe₂O₄ (CFO) thin films on a mica substrate using a pulsed laser deposition technique. High-resolution X-ray diffraction and transmission electron microscopy revealed that the film grew epitaxially with the relationships of CFO <1-10> || Mica [010] and CFO [111] || Mica [001]. The films were highly flexible in terms of both inward and outward bending, and exhibited clear ferrimagnetic hysteresis with weak anisotropy in both the in-plane and out-of-plane directions. We observed that the magnetization of CFO films was robust against mechanical stimuli without microcracks. The remnant magnetization and coercive field were within 8% and 11% over a strain of ±0.54%. As the number of bending cycles increased, the magnetic easy axis became more closely aligned to the out-of-plane direction, without any noticeable change in domain size.     

Co0.9Fe0.1薄膜面内元素分辨的磁各向异性

利用X射线磁性圆二色技术对Co_0.9Fe_0.1薄膜面内元素分辨的磁各向异性进行了研究，通过剩磁模式测量不同磁化方向的样品组分原子单位空穴磁矩的变化，发现除了在生长的磁诱导方向存在易磁化轴外，在与该轴垂直的方向还存在一个类似易轴的软磁化轴；面内的两个难磁化轴与易磁化轴取向大约成66°夹角，从而构成了面内双轴磁各向异性；对不同组分元素，其单位空穴磁矩随磁化方向的变化趋势基本相同，不同磁化方向Fe原子单位空穴的磁矩值约为Co的对应值的87%，反映了Fe原子和Co原子之间存在着强烈的铁磁性耦合. 关键词： 磁各向异性 X射线磁性圆二色 铁磁耦合 CoFe合金薄膜     

Magnetic anisotropy of Fe films on GaAs(113)A substrates

We employ superconducting quantum interference device magnetometry to study the thickness dependence of in-plane and out-of-plane magnetic anisotropic properties of Fe films grown on high-index GaAs(113)A substrates by molecular beam epitaxy. The evolution of the in-plane magnetic anisotropy with film thickness is distinguished into two regions. First, for Fe film thicknesses ≤50 MLs, we observe an in-plane uniaxial magnetic anisotropy with the easy axis along the in-plane 〈332̄〉 axes. Second, for Fe film thicknesses ≥70 MLs, we observe a four-fold magnetic anisotropy with the easy axis along the in-plane 〈031̄〉 axes. The existence of an out-of-plane perpendicular magnetic anisotropy is also detected in ultrathin Fe films. Similar to Fe on GaAs(001), our results provide evidence for the interfacial origin of the in-plane uniaxial and out-of-plane perpendicular magnetic anisotropy. Both the uniaxial and the perpendicular interface anisotropy are found to be independent of the epitaxial orientation and are hence an intrinsic property of the Fe/GaAs interface. PACS 75.70.-i; 75.50.Bb; 81.15.Hi     

Effect of oxygen pressure on microstructure and magnetic properties of strontium hexaferrite (SrFe12O19) film prepared by pulsed laser deposition

The effects of oxygen pressure during deposition on microstructure and magnetic properties of strontium hexaferrite (SrFe₁₂O₁₉) films grown on Si (100) substrate with Pt (111) underlayer by pulsed laser deposition have been investigated. X-ray diffraction pattern confirms that the films have c-axis perpendicular orientation. The c-axis dispersion (Δθ₅₀) increases and c-axis lattice parameter decreases with increasing oxygen pressure. The films have hexagonal shape grains with diameter of 150-250 nm as determined by atomic force microscopy. The coercivities in perpendicular direction are higher than those in in-plane direction, which shows the films have perpendicular magnetic anisotropy. The saturation magnetization and anisotropy field for the film deposited in oxygen pressure of 0.13 mbar are comparable to those of the bulk strontium hexaferrite. Higher oxygen pressure leads to the films having higher coercivity and squareness. The coercivity in perpendicular and in-plane directions of the film deposited in oxygen pressure of 0.13 mbar are 2520 Oe and 870 Oe, respectively.     

Out-of-plane magnetic anisotropy in columnar grown Fe–Ni films

Polycrystalline thin films usually present magnetic anisotropy resulting from a conjunction of textures, residual stresses, surface effects, and magnetic dipole distribution. The shape anisotropy, which is caused by the magnetic dipole distribution, is dominant in most of the cases, and it forces the occurrence of in-plane easy axes for the magnetization. Contrary to this common expectation, we have found predominant out-of-plane easy axes in a series of Fe–Ni thin films produced by DC sputtering. Films with different thicknesses, from 40 to 1000 nm, and different deposition temperatures have been tested and show similar results. These unusual characteristics are results of a particular columnar structure formed during the films growth. The magnetic characterization of the samples has been done by Mössbauer spectroscopy, magnetometry, and ferromagnetic resonance. The unusual anisotropy observed is not believed to be uniform along the film thickness. This interpretation comes from the comparison of the experimental results with hysteresis obtained by micromagnetic simulations. Five distinct configurations for the anisotropies have been simulated for this comparison.     

Dependence of magnetic characteristics on sputtering-power and substrate-temperature in amorphous Tb40(FeCoV)60 films

The amorphous Tb₄₀(Fe₄₉Co₄₉V₂)₆₀ films were deposited at different sputtering powers and substrate temperatures. The microstructural and magnetic characteristics were investigated by means of field emission scan electron microscope, magnetic force microscope and vibrating sample magnetometer. Our results show that with increasing sputtering power, out-of-plane coercivity decreases monotonically while saturation magnetization has a maximum value of 231 kA/m for the sample prepared at 50 W. The as-deposited alloy films are amorphous, whereas the coercivity and saturation magnetization are strongly dependent on the substrate temperature. An out-of-plane hysteresis loop with coercivity below 22 mT and saturation magnetization over 290 kA/m is obtained combining dc power and substrate temperature. The dominant mechanism of room temperature coercivity appears to be domain wall pinning, rather than nucleation under all conditions measured. The variation of saturation magnetization is similar to that of perpendicular magnetic anisotropy with either sputtering power or substrate temperature according to the difference of magnetic domain structure.     

Enhancement of in-plane magnetic anisotropy in (111)-oriented Co0.8Fe2.2O4 thin film by deposition of PZT top layer

The CoFe₂O₄ and Co_0.8Fe_2.2O₄ single layer (CFO) as well as PZT/CoFe₂O₄ and PZT/Co_0.8Fe_2.2O₄ bilayer thin films were grown using the pulsed laser deposition technique on Pt(111)/Si substrates at 600 °C. All films had a perfect (111)-orientation and the degree of orientation of CFO films was improved by the deposition of a PZT top layer. Precision X-ray diffraction analysis (avoiding the shift of peaks due to sample misalignment) revealed that the CFO films on Pt(111)/Si substrate were under an out-of-plane contraction and the deposition of a PZT top layer led to the increase in the out-of-plane contraction. The (111)-oriented CFO single layer films had a strong in-plane magnetic anisotropy as a result of orientation as well as the stress-induced magnetic anisotropy. The magnetic properties of CFO film were altered by the deposition of a PZT top layer leading to the enhancement of in-plane magnetic anisotropy. The enhanced in-plane magnetic anisotropy was more detectable in PZT/Co_0.8Fe_2.2O₄ rather than PZT/CoFe₂O₄ bilayer film, which could be expected from its higher magnetocrystalline as well as magnetostriction constants.     

High-frequency characteristics of CoFeVAlONb thin films

High-frequency characteristics of CoFeVAlONb thin films were studied. A thin film of Co_43.47Fe_35.30V_1.54Al_5.55O_9.93Nb_4.21 is observed to exhibit excellent magnetic properties; magnetic coercivity of 1.24 Oe, uniaxial in-plane anisotropy field of 66.99 Oe, and saturation magnetization of 19.8 kG. The effective permeability of the film is as high as 1089 and is stable up to 1.8 GHz, and with ferromagnetic resonance over 3 GHz. This film also has very high electrical resistivity of about 628 μΩ cm. These superior properties make it ideal for high-frequency magnetic applications.     

高电阻率多层纳米颗粒膜软磁特性及微波磁导率

研究了应用于微波频段的多层纳米颗粒膜的电阻率、软磁特性和微波磁导率.采用多次顺序沉积Co₄₀Fe₄₀B₂₀和SiO₂薄层制备了薄膜.在100kA/m均匀面内磁场经过250℃真空退火2h,制备的Co₄₀Fe₄₀B₂₀/SiO₂多层膜具有难轴矫顽力为210A/m、饱和磁化强度为838.75kA/m、电阻率为2.06×10^{3关键词： 纳米颗粒膜 电阻率 软磁特性 微波磁导率}     

Thermally activated magnetization reversal process of self-assembled Fe55Co45 nanowire arrays

We have investigated the temperature dependence of the magnetic properties and the magnetic relaxation of the Fe₅₅Co₄₅ nanowire arrays electrodeposited into self-assembled porous alumina templates with the diameter about 10 nm. X-ray diffraction (XRD) pattern indicates that the nanowire arrays are BCC structure with [1 1 0] orientation along the nanowire axes. Owing to the strong shape anisotropy, the nanowire arrays exhibit uniaxial magnetic anisotropy with the easy magnetization direction along the nanowire axes. The coercivity at 5 K can be explained by the sphere chains of the symmetric fanning mechanism. The temperature dependence of coercivity can be interpreted by thermally activated reversal mechanism as being the localized nucleation reversal mechanism with the activation volume much smaller than the wire volume. Strong field and temperature-dependent magnetic viscosity effects were also observed.     

Magnetic anisotropy properties of CoZrNb thin films deposited on PET substrate by magnetron sputtering

Soft magnetism and magnetic anisotropy properties of CoZrNb thin films deposited on polyethylene terephthalate (PET) substrate by magnetron sputtering were investigated. As the film thickness increases, the coercivity of films decreases from 7 to 4 Oe. It exhibits an in-plane uniaxial magnetic anisotropy as the thickness of CoZrNb thin films increases. An easy axis is observed in CoZrNb films along the direction transverse to the rolling direction of the polymer web.     

Reactive sputtering of (Co,Fe) nitride thin films on TiN-bufferd Si

Epitaxial (Co,Fe) nitride films were prepared on TiN buffered Si(001) substrates by dual-target reactive co-sputtering method. With lower Co content, thin films mainly consist of (Co _x Fe_1?x )₄N phase. With higher Co content, STEM EELS found no N signal in the thin film, and, combined with XRD results, shows that fcc Co is the main phase of the thin films instead of Co₄N. The N₂ atmosphere is helpful to induce the fcc Co phase formation during dual-target reactive co-sputtering deposition. For the films with less Co content, the RT magnetization measurements show similar magnetic properties as epitaxial Fe₄N(001) films, while increasing the Co content, the resulting fcc Co thin films show biaxial anisotropy with the [110] in-plane easy axis.     

Effect of substrate temperature on the magnetic properties and internal stresses of CoPt/AlN multilayer deposited by dc magnetron sputtering

Magnetic properties and internal stresses of AlN(20 nm)/[CoPt(2 nm)/AlN(20 nm)]₅ multilayer structure deposited at different substrate temperatures by dc magnetron sputtering have been studied. It is found that with increasing the substrate temperature from room temperature to 400 °C, in-plane magnetic anisotropy field of the film becomes smaller, and the out-of-plane magnetization becomes stronger. Especially when the film is deposited at substrate temperature of 400 °C, the out-of-plane magnetization becomes as strong as the in-plane magnetization. On the other hand, the total in-plane residual stress of the film changes gradually from compressive to tensile. The compressive intrinsic stress is generated during deposition process and decreases with increasing the substrate temperature. After annealing at high temperatures, the films show strong perpendicular magnetic anisotropy. With increasing the annealing temperature, the in-plane thermal stress also increases and becomes dominant, which is considered to result in the perpendicular magnetic anisotropy of the films.     

Highly oriented La2/3Ca1/3MnO3 films grown on silicon-on-insulator substrates by pulsed laser deposition

High quality La_2/3Ca_1/3MnO₄(LCMO) thin films have been deposited on silicon-on-insulator (SOI) substrates only buffered by yt tria-stabilized zirconia (YSZ) by using the pulsed laser deposition (PLD) technique. The results obtained from X-ray diffraction (XRD), reflection high energy electron diffraction (RHEED), scanning electron microscopy (SEM) and magnetization investigations indicate that the LCMO films are highly oriented both in-plane and out-of-plane. The Curie temperature T _c is close to 260 K and the insulator–metal (I–M) transition appears around 220 K. The conducting mechanism at low temperatures is dominated by the electron–magnon scattering. A tensile stress from the film–substrate lattice mismatch results in magnetic ‘easy axes’ in the film plane and the magnetic anisotropy energy increases with cooling. A maximum magnetoresistance (MR) is observed near 190 K, with the external magnetic field either parallel or vertical to the LCMO film plane. Moreover, the large intrinsic high-field magnetoresistance (HFMR) and the very small extrinsic low-field magnetoresistance (LFMR) again reveal that the LCMO films on SOI substrates are highly oriented thin films of good crystallinity.     

Magnetization reversal processes in FeSm thin films

We have investigated the in-plane magnetization reversal in FeSm thin films and discovered that it can be controlled through an induced anisotropy. For films with an induced easy direction, reversal is ultra fast and can be characterized approximately using the Fatuzzo model. In films with no pronounced induced easy axis, the reversal is much slower and can be described using a logarithmic model. We have also investigated the short time (1–50 s) dependence of the remanent coercivity and fitted to logarithmic equations. For films with no pronounced easy axis, the time dependence of the coercivity correlates with the film thickness, indicating that the switching volume scales with thickness. For films with an induced easy direction, the time dependence of the coercivity is essentially constant, independent of film thickness, indicating no scalable switching volume.     

Strongly in-plane magnetized FePt thin film on ultrathin Fe underlayer

The effect of ultrathin Fe underlayer on the strong in-plane magnetization of FePt magnetic thin film was investigated. This FePt thin film could be attained using the ultrathin Fe underlayer with 1 nm thickness. The in-plane coercivity of FePt film with 20 nm thickness grown on ultrathin Fe underlayer was high up to 7400 Oe. However, its out-of-plane coercivity was extremely low to 350 Oe compared to those of FePt thin films in other conventional studies. This result indicates that FePt thin film was strongly in-plane magnetized by ultrathin Fe underlayer. The strong ordering phase transformation kinetics and the high texturing to in-plane direction of the FePt thin film by ultrathin Fe underlayer were confirmed by Kinetics Monte Carlo (KMC) simulation and XRD measurement result, respectively. It is also supposed that they are associated with the reduction of an interface free energy between the film and the substrate with an introduction of ultrathin underlayer.     

Dependence of the microstructure and magnetic properties of amorphous TbFeCo films on the type and pressure of the gas in sputtering

Amorphous Tb₃₀Fe₆₀Co₁₀ films have been fabricated by magnetron sputtering. The dependences of the microstructure and magnetic properties of these films on the type and pressure of the gas in the sputtering chamber have been studied. The pressure of the Ar, Kr, and Xe gases used in the experiments is varied in the sputtering chamber from 0.01 to 4.00 Pa. It has been established that sputtering in the heavy gas (Kr) conducted within the pressure range covered does not permit fabricating TbFeCo films with the easy magnetization axis perpendicular to the film plane. With Xe used at pressures below 1.0 Pa, one observes in TbFeCo films an increase of the coercivity, with the hysteresis loop approaching rectangular shape. Sputtering and deposition in Ar at a pressure of ??0.67 Pa result in the formation of amorphous Tb₃₀Fe₆₀Co₁₀ films with magnetic characteristics satisfying the requirements imposed upon information carriers intended to be employed in perpendicular recording. It has been demonstrated that, by magnetron sputtering in an Ar atmosphere performed at pressures below 1 Pa, one can produce amorphous Tb₃₀Fe₆₀Co₁₀ films suitable for magneto-optical ultra-high-density information recording.     

Effect of carbon mixing on the perpendicular magnetization of [FePt/C]n=4/FePt multilayer nanocomposite films

The effect of carbon mixing on the perpendicular magnetization of magnetron sputtered FePt thin films was studied using magnetic property measurement, X-ray diffraction, and TEM microscopy. Micromagnetic simulation was carried out to study the effect of texture on the perpendicular coercivity. Unlike general conviction, the mixing of FePt with carbon led to a significant enhancement in the perpendicular magnetization. The maximum enhancement of perpendicular magnetization was observed at about 20 vol% of carbon, where carbon amorphous film started to completely enclose the individual FePt grains. This reason was explained that the epitaxial growth and thus perpendicular texture of ordered FePt grains were maximized due to the relaxation of coherency for epitaxial growth which was maximized in the isolated grains. The perpendicular coercivity reached 8500 Oe, while the in-plane coercivity (120 Oe) remained negligible. The simulation showed that the enhancement of perpendicular texture can largely increase the perpendicular coercivity of FePt:C thin film.