质子辐照ZnO白漆光学退化的慢正电子湮没分析

 采用慢正电子湮没光谱研究低能质子辐照下ZnO白漆的光学退化。研究结果表明,随质子辐照注量的增加, 多普勒展宽谱的S参数逐渐减小,W参数逐渐增大。质子辐照下S-W参数拟合曲线的斜率发生改变。S参数的减小可以归结为锌空位含量的减少以及准正电子素的形成。准正电子素{单电离氧空位（捕获一个电子）+正电子}的形成,能够降低正电子湮没的速率,导致S参数减小。S参数的减小证实了质子辐照导致ZnO白漆中单电离氧空位数量的增加。S-W参数拟合曲线斜率的变化可以归结于质子辐照下双电离氧空位向单电离氧空位的转变。     

低能质子辐照ZnO/silicone白漆产生微观损伤的红外光谱研究

 通过空间综合辐照模拟设备对能量小于200 keV质子辐照下ZnO/silicone白漆光学性能变化及损伤机理进行研究。结果表明,ZnO/silicone白漆的光学性能退化主要发生在可见光区,太阳吸收比随质子辐照能量、注量的增加而增大。借助傅里叶变换红外光谱分析技术研究了质子辐照ZnO/silicone白漆时有机硅树脂的光学性能退化机理。质子辐照使ZnO/silicone白漆中游离氧含量增加,氧化硅原子上的有机取代基使Si—C链断裂,并生成活性羟基,而这种活性羟基能促使有机硅树脂内Si—O—Si键的裂解。同时Si—O—Si链内氧原子未成键的孤对电子与邻近硅原子的3d空轨道配位,降低了π*轨道的能量,提高了对光吸收的几率,增强了n→π*电子跃迁,使吸收带红移,从而导致ZnO/silicone白漆光学性能退化。     

掺Sb纳米ZnO的光致发光的研究

用柠檬酸盐法合成了不同掺杂浓度的纳米ZnO,粒径约为15nm。探讨了Sb掺杂对ZnO光致发光峰的影响。随着掺杂量的提高,样品的发射峰从428nm移至444nm。未掺杂ZnO的发光主要是源于电子从锌填隙形成的缺陷能级到价带顶的跃迁;随着掺杂量的提高,体系的氧空位增加,从而使得电子从氧空位所形成的缺陷能级到价带顶的跃迁占据主导,光致发射峰向长波方向移动。     

质子辐照硼硅酸盐玻璃盖片的物理效应分析

作为航天器电源系统的重要组成部分,太阳电池需要更高的转换效率和可靠性以及更长的使用寿命。通过在太阳电池表面覆盖抗辐照玻璃盖片,可以增强太阳电池对粒子辐射的防护,延长太阳电池的服役寿命,使航天器获得可靠的能源供应。硼硅酸盐玻璃就是一种理想的太阳电池玻璃盖片材料。采用蒙特卡罗方法,结合SRIM软件模拟研究质子辐照硼硅酸盐玻璃的损伤物理机理。基于粒子与物质相互作用的理论以及基本公式,通过分析不同入射能量的质子在硼硅酸盐玻璃中的阻止本领、电离能损、位移能损、空位的产生情况,对辐照损伤的物理机制进行研究。结果表明:能量为30~120 keV的质子辐照损伤主要发生在硼硅酸盐玻璃表面;质子沉积、空位分布等均为Bragg峰型分布;电离能损是能量损失的主要部分,随入射能量的增加而增大,导致电子的电离和激发;位移能损在玻璃内部随能量降低而增大,导致硼、氧和硅等空位缺陷的产生;电离效应和缺陷的产生是硼硅酸盐玻璃色心形成的重要原因。     

正电子湮没谱和光致发光谱研究掺锌GaSb质子辐照缺陷

用正电子湮没谱和光致发光谱研究了质子辐照后掺锌GaSb中的缺陷.通过分析正电子的缺陷寿命τ₂及强度I₂的变化发现,在高能质子的辐照下产生了双空位缺陷V_GaV_Sb,可能同时产生了小的空位团.正电子平均寿命τ_av和S参数随着质子辐照剂量的变化也证明了这一结论.通过分析不同质子辐照剂量下掺锌GaS     

溶胶-凝胶法纳米ZnO薄膜的绿光发射

利用溶胶-凝胶法制备了纳米ZnO薄膜,室温下测量了样品的光致发光谱(PL)和X射线衍射谱(XRD),观测到中心波长在523 nm附近的绿色荧光发射,研究了纳米ZnO薄膜的绿光发射机制,证实了纳米ZnO薄膜绿光可见发射带来自氧空位(Vo)形成的浅施主能级和锌空位(Vzn)形成的浅受主能级之间的复合。     

质子辐照对纯铝薄膜微观结构的影响

利用透射电子显微镜(TEM)详细分析了不同剂量的质子辐照纯铝薄膜样品的微观结构, 质子的能量E=160 keV.实验表明,质子辐照能够在Al薄膜中诱发空位位错圈,在实验范围内,位错密度随辐照剂量的增加而增加;质子辐照在1×10¹¹—4×10¹¹/mm²范围内随辐照剂量的增加,位错圈数量密度以及位错圈尺寸都随之增加.在较高剂量6×10¹¹/mm²辐照下,位错圈数量密度减小,但其尺寸显著 关键词： 质子辐照 空位簇缺陷 位错圈 微观结构     

ZnO纳米花的制备及其性能

利用化学气相沉积法, 在铜箔上成功制备出形似自然界中刺球花的ZnO纳米花结构. 实验进一步研究了氧气和氩气流量比例分别为1:150, 1:200, 1:250和1:400时对ZnO纳米花结构和性能的影响. 结果表明, ZnO纳米花上的ZnO纳米棒的长径比随氧气氛的减少而减小; 在氧气和氩气流量比例为1:250时制备出的ZnO纳米花尺寸均匀、形貌均一、花型结构最完美. ZnO 纳米花的室温光致发光谱表明, 随着氧气氛的减少, 可见区域的发光从一个波包变成一个宽峰, 且与锌空位相关的缺陷发光峰在减弱, 与氧空位相关的缺陷发光峰在增强. 基于实验结果, 提出了一种在铜箔上制备ZnO纳米花结构的生长模型.     

3 MeV质子辐照对AlGaN/GaN高电子迁移率晶体管的影响

研究了AlGaN/GaN 高电子迁移率晶体管(HEMT)的质子辐照效应. 在3 MeV质子辐照下, 当辐照剂量达到1× 10¹⁵ protons/cm²时, 漏极饱和电流下降了20%, 最大跨导降低了5%. 随着剂量增加, 阈值电压向正向漂移, 栅泄露电流增加. 在相同辐照剂量下, 1.8 MeV质子辐照要比3 MeV质子辐照退化严重. 从SRIM软件仿真中得到不同能量质子在AlGaN/GaN异质结中的辐射损伤区, 以及在一定深度形成的空位密度. 结合变频C-V测试结果进行分析, 表明了质子辐照引入空位缺陷可能是AlGaN/GaN HEMT器件电学特性退化的主要原因.     

GaN厚膜中的质子辐照诱生缺陷研究

本文采用正电子湮没谱研究质子辐照诱生缺陷, 实验发现: 能量为5 MeV的质子辐照在GaN厚膜中主要产生的是Ga单空位, 没有双空位或者空位团形成; 在10 K测试的低温光致发光谱中, 带边峰出现了"蓝移", 辐照后黄光带的发光强度减弱, 说明黄光带的起源与Ga空位(V_Ga)之间不存在必然的联系, 各激子发光峰位置没有改变, 仅强度随质子注量发生变化; 样品(0002)面双晶XRD扫描曲线的半峰宽在辐照后明显增大, 说明质子辐照对晶格的周期性产生了影响, 薄膜晶体质量下降. 关键词： GaN 缺陷 质子 辐照     

Ferromagnetism in High-Surface-Area ZnO Nanosheets Prepared by a Template-Assisted Hydrothermal Method

High-surface-area ZnO nanosheets are prepared using a template-assisted hydrothermal method.A saturation moment as high as 0.02 emu/g is obtained for the ZnO nanosheets.Both photoluminescence spectroscopy and x-ray photoelectron spectroscopy demonstrate the existence of abundant oxygen vacancies on the surfaces of the nanosheets.In addition,the oxygen vacancy concentration increases with an increasing nanosheet surface area.The results show that the origin of the room-temperature ferromagnetism is closely related with a large surface area and oxygen vacancies of the nanosheets.This finding suggests that the high-surface-area ZnO nanosheets are promising to be applied to spintronic devices.     

Photoluminescence and positron annihilation spectroscopic investigation on a H(+) irradiated ZnO single crystal

Low temperature photoluminescence and room temperature positron annihilation spectroscopy have been employed to investigate the defects incorporated by 6?MeV H(+) ions in a hydrothermally grown ZnO single crystal. Prior to irradiation, the emission from donor bound excitons is at 3.378?eV (10?K). The irradiation creates an intense and narrow emission at 3.368?eV (10?K). The intensity of this peak is nearly four times that of the dominant near band edge peak of the pristine crystal. The characteristic features of the 3.368?eV emission indicate its origin as a 'hydrogen at oxygen vacancy' type defect. The positron annihilation lifetime measurement reveals a single component lifetime spectrum for both the unirradiated (164?±?1?ps) and irradiated crystal (175?±?1?ps). It reflects the fact that the positron lifetime and intensity of the new irradiation driven defect species are a little higher compared to those in the unirradiated crystal. However, the estimated defect concentration, even considering the high dynamic defect annihilation rate in ZnO, comes out to be ～4?×?10(17)?cm(-3) (using SRIM software). This is a very high defect concentration compared to the defect sensitivity of positron annihilation spectroscopy. A probable reason is the partial filling of the incorporated vacancies (positron traps), which in ZnO are zinc vacancies. The positron lifetime of ～175?ps (in irradiated ZnO) is consistent with recent theoretical calculations for partially hydrogen-filled zinc vacancies in ZnO. Passivation of oxygen vacancies by hydrogen is also reflected in the photoluminescence results. A possible reason for such vacancy filling (at both Zn and O sites) due to irradiation has also been discussed.     

Room temperature ferromagnetic pure ZnO

Pure ZnO films were prepared by pulsed laser deposition on oxidized Si substrates under different oxygen pressure and substrate temperature. Clear room temperature ferromagnetism has been observed in the ZnO film prepared under high vacuum and room temperature. The observation of anomalous Hall effect confirms the intrinsic nature of the ferromagnetism. The photoluminescence and X-ray photoelectron spectroscopy spectra show the high concentration of oxygen vacancies in the ferromagnetic ZnO film. Our results clearly demonstrate the ferromagnetic contribution of the oxygen vacancies mediated by the spin polarized electrons hopping between discrete states in pure ZnO.     

Dark current suppression of amorphous selenium based photosensors by the ZnO hole blocking layer

To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field.     

Quantum dot light emitting diodes using size-controlled ZnO NPs

The particle size and trap energy level of ZnO were adjusted by varying the concentration of precursors using a sol–gel process, and the energy transport properties of the electron transport layer in quantum dot light-emitting diodes (QD-LEDs) were analyzed. Thus far, no study has considered the efficient electron transport properties of quantum dot light-emitting devices with respect to trap energy levels owing to the oxygen vacancies of ZnO. The particle size and trap energy levels of ZnO were analyzed based on optical properties such as photoluminescence and absorbance. The optimized device showed excellent performance, with a maximum luminance of 50,120 cd/m², a high efficiency of 5.85 cd/A, and a threshold voltage of 2.5 V. The Y-ZnO (yellow photoluminescence ZnO)-based QD-LEDs not only enhanced the injection efficiency of electrons into the emitting layer but also confined the holes in the emitting layer due to the shallow trap level of Y-ZnO, in contrast to the deep trap levels of G-ZnO (green photoluminescence ZnO) and B-ZnO (blue photoluminescence ZnO). Here, we present the first attempt to analyze the electron transport behavior of the electron transport layer of the resulting device.     

Yellowish-white photoluminescence from ZnO nanoparticles doped with Al and Li

ZnO nanoparticles codoped with Al and Li were chemically synthesized with a low temperature drying process. They are crystalline and can be made as small as 5 nm. Intense yellowish white photoluminescence was observed from smaller ZnO nanoparticles with a higher concentration of Al and Li. The photoluminescence peak consists of yellow and green emission bands. Both peak intensities increase with increasing the Al and Li concentrations and with decreasing the size of ZnO nanoparticles. The green and yellow emission bands were attributed to donor–acceptor-pair recombination involving Zn vacancies and lithium as the acceptor state, respectively, and the donor responsible for both emissions to oxygen vacancies. Both enhanced emissions by codoping may be explained by an increase in the number of electrons occupying the deep donor level on account of doping with Al. Although the yellowish white emission decays with time, passivation of the crystallite surface with poly(p-phenylene vinylene) suppresses the degradation. The observed high-intensity and stable yellowish white emission makes PPV-passivated ZnO nanoparticles, codoped with Al and Li, more attractive as a candidate for “white” phosphor.     

超声处理对ZnO薄膜光致发光特性的影响

对于结晶状态好的ZnO薄膜，测量了其光致发光(PL)光谱，发射光谱中只发现了峰值波长约389 nm的近紫外光.样品进行超声处理后，发射谱中不仅观察到近紫外峰，又观察到波长约508 nm的绿光峰.绿光峰的强度比近紫外光的强度强得多，且近紫外峰红移.进一步的热处理使绿光峰大大增强.超声处理改变了ZnO薄膜的质量和结晶状态，使晶格中产生氧空位.处理过程中的热效应使得薄膜晶格振动加剧.当晶格振动加剧到一定程度，晶格中的氧脱离格点形成氧空位.510 nm左右的绿色发光峰是ZnO晶体中的氧空位产生的.薄膜的温度越高， 关键词： ZnO薄膜 超声 光致发光     

退火温度及退火气氛对ZnO薄膜的结构及发光性能的影响(英文)

采用脉冲激光沉积技术在Si/蓝宝石衬底上制备了ZnO薄膜,结合快速退火设备研究了不同退火温度(500~900℃)及退火气氛(N2,O2)对薄膜的结构及其发光性能的影响。并优化条件得到具有最小半峰全宽及最大晶粒尺寸的薄膜。X射线衍射(XRD)结果表明:氮气氛下退火的ZnO薄膜最佳退火温度为900℃;氧气氛下退火的ZnO薄膜最佳退火温度为800℃。红外(IR)光谱中,退火后Zn-O特征振动峰红移,说明在退火过程中,原子重新排布后占据较低能量位置;同样的退火温度下,氮气氛下退火的薄膜质量更优。同步辐射光电子能谱(synchrotron-based XPS)分别表征了未退火及N2,O2下900℃退火的ZnO薄膜,分峰拟合结果表明氧气氛下退火产生更多的氧空位。结构表征结合光致发光(PL)谱表明绿光的发光峰与氧空位有关。