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1.
Ag掺杂对ZnO薄膜的光电性能影响 总被引:4,自引:1,他引:3
采用超声喷雾热分解法在石英衬底上以醋酸锌水溶液为前驱体,以硝酸银水溶液为Ag掺杂源,以高纯O2为载气生长了Ag掺杂ZnO(ZnO∶Ag)薄膜。研究了Ag掺杂ZnO薄膜的表面结构、电学和光学性质。结果表明所得ZnO∶Ag薄膜表面结构良好,扫描电子显微镜(SEM)测试表明薄膜表面光滑平整,结构致密均匀;在室温光致发光(PL)光谱中检测到很强的近带边紫外发光峰;透射光谱中观测到非常陡峭的紫外吸收截止边和较高的可见光区透过率,表明薄膜具有较高的晶体质量与较好的光学特性;霍尔效应测试表明,在550℃下获得了p型导电的ZnO∶Ag薄膜。 相似文献
2.
采用超声喷雾热分解(Ultrasonic Spray Pyrolysis,USP)方法,以醋酸锌、醋酸镁、醋酸铵、氯化铝的混合水溶液为前驱溶液,在单晶Si(100)衬底上制备了ZnO,Zn0.81Mg0.19O,N-Al共掺杂ZnO和N-Al共掺杂Zn0.81Mg0.19O薄膜。以X射线衍射(XRD)、场发射-扫描电镜(FE-SEM)、霍尔效应(Hall-effect)、光致发光(Photoluminescence,PL)谱等手段研究了薄膜的晶体结构、表面形貌、电学性能、光学性能和带隙变化。电学测试结果表明,未掺杂ZnO及Zn0.81Mg0.19O薄膜为n型导电;而N-Al共掺杂ZnO和N-Al共掺杂Zn0.81Mg0.19O薄膜呈p型导电。Zn0.81Mg0.19O和N-Al共掺杂Zn0.81Mg0.19O(p型)薄膜在维持ZnO纤锌矿结构的前提下,光学带隙随Mg掺杂量增加而增大。初步结果显示,优化工艺参数下通过Mg掺杂制备光学带隙可调的p型Zn0.81Mg0.19O薄膜,对于试制Zn1-xMgxO基同质p-n结、短波长(紫外、深紫外)器件等方面有重要意义。 相似文献
3.
采用溶胶-凝胶法在n型Si(100)衬底上沉积Li-N双掺杂ZnO薄膜,经X射线衍射和扫描电镜图片分析,所制备薄膜具有多晶纤锌矿结构和高的c轴择优取向.室温下霍尔效应测试结果显示Li-N双掺杂ZnO薄膜具有p型导电特性.在Li掺杂量为15.0at%,Li/N(摩尔比)为1∶1,700℃退火等优化条件下得到的最佳电学性能结果是:电阻率为0.34 Ω·cm,霍尔迁移率为16.43 cm2/V·s,载流子浓度为2.79×1019 cm-3关键词:
Li-N双掺
p型ZnO薄膜
溶胶-凝胶
性能 相似文献
4.
5.
通过溶胶凝胶(sol-gel)法分别在玻璃衬底上制备了ZnO纳米薄膜和ZnO-SiO2纳米复合薄膜,并利用紫外-可见光分光光度计对薄膜的光学性能进行了分析.可见光-紫外透射谱显示,随着ZnO溶胶浓度从0.7mol/L降低到0.006mol/L,制备的ZnO薄膜从只出现一个380nm(对应的光学禁带宽度为3.27eV)左右的吸收边到在380和320nm(对应的光学禁带宽度为3.76eV)左右各出现一个吸收边,并且随着ZnO溶胶浓度的降低,在380—320nm波段内的透过率明显提高.而Z
关键词:
纳米ZnO
2复合薄膜')" href="#">ZnO-SiO2复合薄膜
溶胶凝胶法
透射率 相似文献
6.
采用磁控溅射技术在Si基片上生长了Ag掺杂的ZnO薄膜,XRD测试表明所得薄膜结晶性质良好,未出现Ag的分相。未掺杂和Ag掺杂氧化锌薄膜的低温(10K)光致发光(PL)谱显示:Ag的掺入使得中性施主束缚激子发射(D0X)显著减弱,并且在3.315eV处观测到了与Ag有关的施主-受主对(DAP)发射,受主缺陷的形成归因于掺入的Ag替位Zn。计算得到受主能级离价带顶约110meV。霍尔效应测得电阻率约0.1Ω.cm,迁移率约36cm2/V.s,空穴浓度约1.7×1018cm-3。在此基础上制备了ZnO∶Ag/ZnO的同质结,I-V测试显示了明显的整流特性,且反向漏电流很小。所有结果表明Ag掺杂的氧化锌薄膜已经转化为p型。 相似文献
7.
8.
采用射频反应溅射法在玻璃衬底上制备Zn3N2薄膜,然后向真空室中通入纯氧气进行热氧化制备ZnO薄膜.利用X射线衍射、扫描电子显微镜、霍尔效应测量、透射光谱和光致发光光谱等表征技术,研究了氧化温度和氧化时间对ZnO薄膜的结晶质量、电学性质和光学性能的影响.研究结果显示,450 ℃ 下氧化2 h后的样品中除含有ZnO外,还有Zn3N2成分,500 ℃下氧化2 h可以制备出电阻率为0.7 Ωcm,空穴载流子浓度为10关键词:
p型ZnO薄膜
3N2薄膜')" href="#">Zn3N2薄膜
射频溅射
原位氧化 相似文献
9.
以B2H6为掺杂剂,采用射频等离子体增强化学气相沉积技术在玻璃衬底上制备p型氢化微晶硅薄膜.研究了衬底温度和硼烷掺杂比对薄膜的微结构和暗电导率的影响.结果表明:在较高的衬底温度下很低的硼烷掺杂比即可导致薄膜非晶化;在实验范围内,随着衬底温度升高薄膜的晶化率单调下降,暗电导率先缓慢增加然后迅速下降,变化趋势与硼烷掺杂比的影响极为相似.最后着重讨论了p型氢化微晶硅薄膜的生长机理.
关键词:
p型氢化微晶硅薄膜
衬底温度
晶化率
电导率 相似文献
10.
不同衬底温度下PLD法制备的氧化锌薄膜的特性 总被引:1,自引:1,他引:0
利用GCR-170型脉冲激光器Nd:YAG的三次谐波(355nm),以蓝宝石Al2O3(0001)为衬底,在不同温度下采用脉冲激光沉积法制备了ZnO薄膜.通过原子力显微镜、Raman谱、光致发光谱、红外透射谱、霍尔效应和表面粗糙度分析仪对制备的ZnO薄膜进行了测试.分析了在不同衬底温度下薄膜的表面形貌、光学特性,同时进行了薄膜结构和厚度的测试.研究表明:衬底温度对ZnO薄膜的表面形貌、光学特性、结构特性都是重要的工艺参量,尤其在500℃时沉积的ZnO薄膜致密均匀,并表现出较强的紫外发射峰. 相似文献
11.
W.J. Li C.Y. Kong H.B. Ruan G.P. Qin G.J. Huang T.Y. Yang W.W. Liang Y.H. Zhao X.D. Meng P. Yu Y.T. Cui L. Fang 《Solid State Communications》2012,152(2):147-150
Ag-doped ZnO thin films were deposited on quartz glass substrates by a radio-frequency (RF) magnetron sputtering technique at room temperature (RT). The influence of Ag doping content on the electrical and Raman scattering properties of ZnO films were systematically investigated by Hall measurement system and Raman scattering spectrum. Two additional local vibrational modes (LVMs) at 230.0 and 394.5 cm?1 induced by Ag dopant in ZnO:Ag films were observed by Raman analyses at RT, corresponding to Ag atoms located at O sites (LV MZn?Ag) and Zn sites (LV MAg?O) in ZnO lattice. Moreover, we further studied the effect of donor AgO and acceptor AgZn defects on the electrical properties of ZnO:Ag films. The results indicate that O-rich condition is preferred to suppress the formation of AgO defects and enhance AgZn defects. The p-type ZnO:Ag film was achieved by properly optimizing the annealing conditions under O-rich condition. 相似文献
12.
Preparation of p-type ZnO:(Al, N) by a combination of sol--gel and ion-implantation techniques 下载免费PDF全文
We report the preparation of p-type ZnO thin films on (0001)
sapphire substrates by a combination of sol--gel and
ion-implantation techniques. The results of the Hall-effect
measurements carried out at room temperature indicate that the
N-implanted ZnO:Al films annealed at 600\du\ have converted to
p-type conduction with a hole concentration of
$1.6\times1018cm-3, a hole mobility of
3.67cm2/V.s and a minimum resistivity of
4.80cm.\Omega$. Ion-beam induced damage recovery has been
investigated by x-ray diffraction (XRD), photoluminescence (PL) and
optical transmittance measurements. Results show that diffraction
peaks and PL intensities are decreased by N ion implantation, but
they nearly recover after annealing at 600\du. Our results
demonstrate a promising approach to fabricate p-type ZnO at a low
cost. 相似文献
13.
Ga doped ZnO (GZO) thin films were deposited on glass substrates at room temperature by continuous composition spread (CCS) method. CCS is thin films growth method of various GaxZn1−xO(GZO) thin film compositions on a substrate, and evaluating critical properties as a function position, which is directly related to material composition. Various compositions of Ga doped ZnO deposited at room temperature were explored to find excellent electrical and optical properties. Optimized GZO thin films with a low resistivity of 1.46 × 10−3 Ω cm and an average transmittance above 90% in the 550 nm wavelength region were able to be formed at an Ar pressure of 2.66 Pa and a room temperature. Also, optimized composition of the GZO thin film which had the lowest resistivity and high transmittance was found at 0.8 wt.% Ga2O3 doped in ZnO. 相似文献
14.
Al and N codoped ZnO thin films were grown on n-Si (100) substrate by sputtering technique. Hall effect measurements of as-grown films exhibited n-type conduction, however 500 °C Ar annealed codoped films showed p-type conductivity with a hole concentration of 9.9 × 1016 cm− 3, resistivity of 15.95 Ω-cm and hole mobility of 3.95 cm2/Vs, respectively. Codoped ZnO thin films were found to be highly c-axis oriented with good crystal quality. A neutral acceptor-bound exciton and donor-acceptor-pair emissions that appeared at room temperature photoluminescence measurement verify p-type conduction in Al and N codoped ZnO film. The current-voltage characteristics of p-n heterojunction evidently showed a diode like rectifying behaviour. 相似文献
15.
Arsenic doped p-type ZnO thin films were grown on sapphire substrate by magnetron sputtering. As grown films reveal p-type conduction confirmed by Hall-effect and photoluminescence measurements. The p-type film with a hole concentration of 2.16× 1017 cm−3, mobility of 1.30 cm2/V.s and resistivity of 22.29 Ω-m were obtained at substrate temperature of 700 °C. ZnO homojunction synthesized by in-situ deposition of As doped p-ZnO layer on Al doped n-ZnO layer showed p-n diode like characteristics. X-ray pole figure and Transmission Electron Microscope studies confirm epitaxial nature of the films. Photoluminescence results exhibit the peaks associated with donor acceptor pair emission. 相似文献
16.
Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering 总被引:1,自引:0,他引:1
Xue-Yong Li Hong-Jian Li Zhi-Jun Wang Zhi-Yong Xiong Bing-Chu Yang 《Optics Communications》2009,282(2):247-240
ZnO and Al-doped ZnO(ZAO) thin films have been prepared on glass substrates by direct current (dc) magnetron sputtering from 99.99% pure Zn metallic and ZnO:3 wt%Al2O3 ceramic targets, the effects of substrate temperature on the crystallization behavior and optical properties of the films have been studied. It shows that the surface morphologies of ZAO films exhibit difference from that of ZnO films, while their preferential crystalline growth orientation revealed by X-ray diffraction remains always the (0 0 2). The optical transmittance and photoluminescence (PL) spectra of both ZnO and ZAO films are obviously influenced by the substrate temperature. All films exhibit a transmittance higher than 86% in the visible region, while the optical transmittance of ZAO films is slightly smaller than that of ZnO films. More significantly, Al-doping leads to a larger optical band gap (Eg) of the films. It is found from the PL measurement that near-band-edge (NBE) emission and deep-level (DL) emission are observed in pure ZnO thin films. However, when Al was doped into thin films, the DL emission of the thin films is depressed. As the substrate temperature increases, the peak of NBE emission has a blueshift to region of higher photon energy, which shows a trend similar to the Eg in optical transmittance measurement. 相似文献
17.
采用射频磁控溅射法在富氧环境下制备ZnO薄膜, 继而结合N离子注入及热退火实现薄膜的N掺杂及p 型转变, 借助霍尔测试和拉曼光谱研究了N离子注入富氧ZnO薄膜的p型导电及拉曼特性. 结果表明, 在 600 ℃温度下退火120 min可获得性能较优的p-ZnO: N薄膜, 其空穴浓度约为2.527×1017 cm-3. N离子注入ZnO引入了三个附加拉曼振动模, 分别位于274.2, 506.7和640.4 cm-1. 结合电学及拉曼光谱的分析发现, 退火过程中施主缺陷与N受主之间的相互作用对p-ZnO的形成产生重要影响. 相似文献
18.
Jiangnan Dai Fengyi Jiang Yong Pu Li Wang Wenqing Fang Fan Li 《Applied Physics A: Materials Science & Processing》2007,89(3):645-650
In this paper, we investigated the two effects of a little H2 and NH3 gas on the properties of ZnO films grown by atmospheric pressure metal organic chemical vapor deposition (AP-MOCVD) using
deionized water (H2O) and diethylzinc (DEZn) as the O and Zn sources, respectively. Experimental results showed that compared to the effect of
a little H2, it could more effectively improve the surface morphology, crystalline structure, and optical quality of ZnO epilayers by
adding a little NH3 gas into the growth ambient. Furthermore, by adding a little NH3 gas into the growth ambient, the hydrogen-related D0X1 (I4):3.365 eV peak disappeared in 10 K photoluminescence spectrum of ZnO films, which indicated the elimination of the unintended
hydrogen impurity. The result of the Huang–Rhys factor S (0.113) showed that it was effective for reducing the probability
of exciton–phonon scattering of ZnO films by adding a little NH3 gas into the growth ambient. The electron mobility of ZnO films were also significantly improved by this method with the
mobility of 100 cm2V-1s-1 measured by Hall measurement at room temperature.
PACS 71.55.Gs; 81.15.Gh; 78.55.-m; 78.55.Et; 68.55.-a 相似文献
19.
ZnO thin films were prepared by pulsed laser deposition at room temperature on glass substrates with oxygen pressures of 10-30 Pa. The structural, electrical, and optical properties of ZnO films were studied in detail. ZnO films had an acceptable crystal quality with high c-axis orientation and smooth surface. The resistivity was in the 102 Ω cm order for ZnO films, with the electron concentration of 1016-1017 cm−3. All the films showed a high visible transmittance ∼90% and a high UV absorption about 90-100%. The UV emission ∼390 nm was observed in the photoluminescence spectra. The oxygen pressures in the 10-30 Pa range were suitable for room temperature growth of high-quality ZnO films. 相似文献
20.
L. BalakrishnanS. Gowrishankar J. ElanchezhiyanN. Gopalakrishnan 《Physica B: Condensed Matter》2011,406(23):4447-4452
We report the influence of Al concentration on electrical, structural, optical and morphological properties of Al-As codoped p-ZnO thin films using RF magnetron sputtering. Al-As codoped p-ZnO films with different Al concentrations were fabricated using As back diffusion from the GaAs substrate and sputtering Al2O3 mixed ZnO targets (1, 2 and 4 at%). The grown films were investigated by Hall effect measurement, X-ray diffraction (XRD), electron probe microanalysis (EPMA), energy dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), photoluminescence (PL) and atomic force microscopy (AFM) to study the electrical, structural, optical and morphological properties of the films. From the XRD, it was observed that both full-width at half-maximum (FWHM) and c-axis lattice constant have similar trends with respect to Al concentration. Hall measurements showed that the hole concentration increases as the Al concentration increases from 1015 to 1020 cm−3. The increase in hole concentration upon codoping was supported by the red shift in the near-band-edge (NBE) emission observed from room temperature PL spectra. The proposed p-type mechanism due to AsZn-2VZn complex was confirmed by low temperature PL and XPS analysis. The low FWHM, resistivity and peak-to-valley roughness observed by XRD, Hall measurement and AFM, respectively, suggest that 1 at% Al-doped ZnO:As film is the best codoped film. 相似文献