Super-Resolution with a Photochromic Mask Layer in an Optical Memory

The possibility of a super-resolution optical memory using a photochromic mask layer was theoretically discussed. An equation which estimates the transmittance change of the mask layer was derived. The numerical simulation based on the equation showed that the reflectance increase of the layer by photo-irradiation is nonlinear when the optical density of the layer is high. The nonlinear response decreased the crosstalk in adjacent recording tracks and improved the MTF (modulation transfer function) characteristics, resulting in a higher recording density.     

Spot Shape on Super-Resolution Optical Disks with a Photon-Mode Mask Layer

The spot shape on super-resolution optical disks with a photon-mode mask layer was theoretically analyzed. The spot shape was found to depend on the lifetime of the bleached state of the dyes, the light power, and the disk rotation speed. When the lifetime is short, the super-resolution spot shape is not produced at high disk speeds. On the other hand, a dye mask layer with long lifetime, such as a photochromic mask, can produce a sharp spot shape in the higher disk speed region, and therefore is suitable for obtaining a super-resolution disk with a high data transfer rate.     

Theoretical Analysis of Super-Resolution Optical Disk Mastering Using a Photoreactive Dye Mask Layer

The super-resolution mastering of read-only optical disks using a photoreactive bleachable dye mask layer was theoretically analyzed. Equations have been derived which describe the photoreactions of the resist layer and mask layer. A numerical simulation based on these equations showed that the transmittance of the mask directly affects the quality of the formed pit shape. A high-quality pit shape is obtained by using a low transmittance mask.     

Read—out of a read—only super—resolution optical disc with a Si mask

A novel read-only super-resolution optical disc structure (substrate/mask layer/dielectric layer) is proposed in this paper. By using a Si thin film as the mask layer, the recording pits with a diameter 380nm and a depth 50nm are read out on the dynamic measuring equipment; the laser wavelength α is 632.8nm and the numerical aperture is 0.40. In the course of reproduction, the laser power is 5mW and the rotation velocity of the disc is 4m·s^-1. The optimum thickness of the Si thin film is 18nm and the signal-to-noise ratio is 32dB.     

超分辨近场结构技术及其应用

超分辨近场结构(Super RENS)技术是在传统的超分辨光盘技术和近场光学的基础上发展起来的新技术。介绍了Super RENS技术的基本原理:利用掩膜层的非线性效应或表面等离子体增强效应,在近场区域可以记录、读出超过衍射极限的信号。综述了该技术在纳米光信息存储和光刻方面应用研究的最新进展,提出了存在的问题,展望了它的发展前景。     

Low-Power Super-resolution Readout with Antimony Bismuth Alloy Film as Mask layer

Sb-Bi alloy flms are proposed as a new kind of super-resolution mask layer with low readout threshold power. Using the Sb-Bi alloy film as a mask layer and SiN as a protective layer in a read-only memory disc, the superresolution pits with diameters of 380 nm are read out by a dynamic setup, the laser wavelength is 780 nm and the numerical aperture of pickup lens is 0.45. The effects of the Sb-Bi thin film thickness, laser readout power and disc rotating velocity on the readout signal are investigated. The results show that the threshold laser power of super-resolution readout of the Sb-Bi mask layer is about 0.5 m W, and the corresponding carrier-to-noise ratio is about 20 dB at the film thickness of 50nm. The super-resolution mechanism of the Sb-Bi alloy mask layer is discussed based on its temperature dependence of reflection.     

Si掺杂Ag基超分辨薄膜读出性能研究

超分辨薄膜是一种能够实现突破光学衍射极限的功能薄膜,它在超分辨近场光存储技术中起到至关重要的作用。采用磁控溅射共溅的方式制备了Ag掺杂一定量Si的超分辨复合薄膜,测试了其作为掩膜层的超分辨光盘读出性能,并获得了最佳的薄膜制备条件,即当Ag溅射功率为55 W,Si为95 W,溅射时间为80s,薄膜厚度为39nm时,超分辨光盘的读出信号载噪比(CNR)最高为28dB。用X射线光电子能谱测量了上述薄膜的组成,用扫描电子显微镜观察了薄膜微区形貌,并用椭圆偏振光谱仪测量了薄膜的光学常数和厚度。超分辨复合薄膜的读出机理可以用Ag的散射型机理解释。光盘在持续读出10万次以后读出信号基本没有下降。     

Static recording characteristics of new type super-resolution near-field structure

A novel super-resolution near-field optical structure (super-RENS) with bismuth (Bi) mask layer is proposed in this paper. Static optical recording tests with and without super-RENS are carried out using a 650-nm semiconductor laser at recording powers of 14 and 7 mW with pulse duration of 100 ns. The recording marks are observed by high-resolution optical microscopy with a charge-coupled device (CCD)camera. The results show that the Bi mask layer can also concentrate energy into the center of a laser beam at low laser power similar to the traditional Sb mask layer. The results above are further confirmed by another Ar+ laser system. The third-order nonlinear response induced by the plasma oscillation at the Bi/SiN interface during laser irradiation can be used to explain the phenomenon. The calculation results are basically consistent with our experimental results.     

Optical characterization of antimony-based bismuth-doped thin films with different annealing temperatures

Antimony-based bismuth-doped thin film,a new kind of super-resolution mask layer,is prepared by magnetron sputtering.The structures and optical constants of the thin films before and after annealing are examined in detail.The as-deposited film is mainly in an amorphous state.After annealing at 170-370℃,it is converted to the rhombohedral-type of structure.The extent of crystallization increased with the annealing temperature.When the thin film is annealed,its refractive index decreased in the most visible region,whereas the extinction coefficient and reflectivity are markedly increased.The results indicate that the optical parameters of the film strongly depend on its microstructure and the bonding of the atoms.     

微型太阳敏感器光学掩模的镀膜设计

太阳敏感器是空间飞行器进行姿态确定和方位测定的重要器件，传统太阳敏感器大而重，无法应用到微小卫星特别是皮纳卫星上。介绍了基于CMOS APS探测器的微型太阳敏感器的工作原理，基于黑体辐射理论和太阳光谱特性，结合CMOS APS探测器工作特性，分析给出了这种敏感器像元表面产生光电子数的计算方法，并采用Matlab软件，编程计算了地球表面太阳垂直入射条件下，探测器像元表面产生的光电子数。采用光学薄膜设计方法，分析设计了掩模表面光学薄膜的膜系结构，计算了各膜层的透射特性。在此基础上，得到了基于CMOS APS探测器微型太阳敏感器光学掩模的光学薄膜的设计方法，最后给出了设计结果。     

可用于光存储的氧化物、次氧化物薄膜材料的研究及发展

介绍了可用于可录、可擦除、全息光存储及超分辨掩膜层的氧化物、次氧化物薄膜材料的种类、制备方法、光存储特性和存储机制。这类薄膜材料由于具有种类多、应用范围广、制备方法多样、写入灵敏度高和记录稳定性好等优点 ,正受到各国研究者越来越多的关注。分析总结了这类材料的研究现状、存在的主要问题和未来发展方向     

Super-resolution readout property of bismuth-doped antimony-based thin film as a functional mask for read-only memory

Bismuth-doped antimony-based (Sb_100?x Bi _x , x=2.46) thin films were presented as a functional mask for super-resolution readout of read-only memory (ROM). The pit size of the ROM was 390?nm, and super-resolution readout was realized on a dynamic tester with laser wavelength of 780?nm and the numerical aperture of the focusing objective lens of 0.45. The carrier-to-noise ratio (CNR) of 22?dB, readout threshold power of 0.8?mW and super-resolution readout cycles of 2×10⁴ was achieved. The influence of film thickness and readout power on CNR was investigated. The reflectivity and transmittance of the film with different temperature at wavelength of 780?nm were detected, and the super-resolution mechanism of the bismuth-doped antimony-based thin films as the functional mask layer was discussed.     

一种新的超分辨记录点的读出技术

提出一种新的超分辨记录点的读出技术—超分辨反射膜技术，详细分析了其原理。用该技术，以Sb为超分辨反射膜，SiN为介电层，在激光波长为632．8nm和光学头的数值也径为0．40的读出光学系统中实现了直径为380nm的超分辨记录点的读出。同时研究了Sb薄膜厚度对读出信噪比的影响规律，发现最佳的Sb薄膜厚度为28～30nm，所得的信噪比为38～40dB。     

光学图像加密中随机模板的特性比较

为比较光学图像加密中随机模板的特性,分别利用随机相位模板和随机振幅模板对几种典型的光学图像加密系统进行了光学图像加密的数值模拟和加密效果分析。模拟结果表明,将随机振幅模板用于基于光学傅里叶变换的双随机模板图像加密系统时,原始图像和加密图像的相关系数大于0.5,不能有效加密原始图。但将其用于基于菲涅耳变换全息的光学图像加密系统时,原始图像和加密图像的相关系数趋于0,可获得与使用随机相位模板时非常接近的加密效果。     

超分辨率成像荧光探针材料应用进展

为了进一步认知复杂环境中的细胞生物学过程,研究人员发展了各种各样的生物成像技术。在这些技术中,生物荧光成像因简单的成像条件以及对生物样品的相容性而得到了广泛的发展。然而,传统的荧光成像技术受到了光学衍射极限的限制,无法分辨低于200 nm的空间结构,阻碍了对亚细胞结构的生物学过程研究。超分辨荧光显微镜技术突破了传统光学衍射对成像分辨率的限制,能够获取纳米尺度的细胞动态过程。除了对传统的宽场荧光显微镜框架的改进及升级改造之外,目前典型的超分辨成像显微镜技术通常依赖于荧光探针材料的光物理性质。常用的荧光探针材料包括荧光蛋白、有机荧光分子和纳米荧光材料等。本文介绍了几种主流的超分辨荧光显微成像技术并总结了已经成功应用到超分辨生物荧光成像中的荧光探针材料的应用进展。     

一种可移动超分辨成像系统的制备及其性质研究

基于浸没透镜设计了一种超分辨成像系统,利用SU-8光刻胶和直径为4.87 m的微球实现纳米级别的超分辨成像。介绍微球成像放大率的求解方法,并通过软件模拟了超分辨成像系统的焦距。通过改变SU-8胶的厚度（从3.4 m到0）,系统的放大率也随之改变（放大率从1.6x到2.6x）。实验表明:SU-8胶的厚度对微球放大率有直接影响,通过该系统可以在普通光学显微镜下观察到蓝光光碟条纹。     

近场光学显微镜下的生物世界

扫描近场光学显微镜由于其超过常规光学显微镜的光学分辨能力及其一些特殊的功能,正在受到生物学家们越来越多的关注。文章介绍了近年来近场光学显微技术在生命科学研究中的应用和进展。     

高密度蓝光存储及其扩展技术

蓝光技术被认为是第三代光存储的主流技术。介绍了蓝光存储中关键技术的发展过程,并对Blu_Ray和HD_DVD两种蓝光光盘的主流技术方案进行了比较分析。通过分析和比较后认为:HD_DVD技术方案具有较好的兼容性,因而较适合在PC机中应用;Blu_Ray技术方案具有容量大的优势,因而较适用于作为视频传播媒体。对蓝光存储的一些扩展技术,如蓝光多阶技术、蓝光超分辨近场结构技术和蓝光多波长技术等进行了综述。展望了蓝光技术的发展前景。     

结构光照明超分辨光学显微成像技术与展望

结构光照明显微镜(Structured Illumination Microscopy,SIM)通过结构化照明在频率域以空间混频的方式将物体高频信息载入光学系统的探测通带内实现突破衍射极限的超分辨光学显微成像。SIM凭借其较低的激发光强、对荧光染料的非特异性需求以及快速的宽场成像优势已成为活细胞超分辨光学显微成像方面应用最多的技术。本文系统回顾了SIM的技术进展,对SIM的基本原理与实现方法进了详细的分析,重点介绍了本课题组研发的基于光谱分辨的单光子激发超分辨显微镜和结合自适应光学的双光子激发超分辨显微镜这两种最新的SIM技术,最后简要讨论了SIM技术在生物成像中的应用及未来发展方向。     

银层超透镜光学传递函数的研究

银层超透镜对基于表面等离子体激元的超分辨光刻、 成像和生物传感有着重要作用.利用银层超透镜的光学传递函数详 细研究了银板的表面等离子体激元共振和成像特性, 并利用时域有限差分法计算模拟了银层超透镜的成像过程, 得到与理论推导公式相符合的结果, 证明了光学传递函数的可靠性, 为基于表面等离子体激元的传感器件、 超分辨成像以及辅助增强干涉光刻提供了快速参数优化方法.