HfO2/SiO2高反射膜的缺陷及其激光损伤

用原子力、Normaski和扫描电子显微镜等分析仪器,对高损伤阈值薄膜常采用的HfO2光损伤所形成的孔洞,与镀制过程中形成的孔洞形貌相似,激光再损伤能力也相似。低能量密度的激光把节瘤缺陷变为孔洞缺陷是激光预处理提高薄膜损伤阈值的原因之一。     

HfO2／SiO2高反射膜的缺陷及其激光损伤

用原子力、Normaski和扫描电子显微镜等分析仪器,对高损伤阈值薄膜常采用HfO2/SiO2薄膜进行了表面显微图象研究,分析了薄膜常见的表面缺陷,如节瘤,孔洞和划痕等。薄膜表面缺陷的激光损伤实验表明,不同缺陷的抗激光损伤能力不大相同。节瘤缺陷最低,约为15J/cm^2,薄膜的损伤阈值主要由其决定,孔洞的激光损伤能力与节瘤相比较高,约为节瘤的2－3倍。节瘤缺陷在低能量密度的激光损伤所形成的孔洞,与镀制过程中形成的孔洞形貌相似,激光再损伤能力也相似。低能量密度的激光把瘤缺陷变为孔洞缺陷是激光预处理提高薄膜损伤阈值的原因之一。     

HfO2/SiO2多层高反膜激光预处理技术

采用不同的光斑移动距离,对电子束蒸发制备的HfO2/SiO2多层高反膜进行了单步及多步预处理。结果表明:为了使薄膜不产生损伤,预处理最高能量密度最好不超过薄膜零几率损伤阈值的90%; 相同预处理效率下进行的单步预处理对提高光学薄膜抗激光损伤阈值的效果比多步预处理好;对HfO2/SiO2高反膜进行98.4%能量覆盖的两步预处理后薄膜损伤阈值提高81%;控制薄膜的缺陷源,初始物质应采用金属Hf。     

532nm HfO_2/SiO_2高反膜的激光预处理效应

采用单台阶能量光栅扫描以及R-on-1测试两种不同预处理方式研究了激光预处理技术对532nm HfO2/SiO2高反膜的阈值提升效果。用Nd:YAG二倍频激光对电子束蒸发制备的532nm HfO2/SiO2高反膜进行1-on-1损伤阈值测试,然后分别进行单台阶能量光栅扫描以及R-on-1测试。通过对损伤概率以及损伤形貌的分析,发现激光预处理能够去除薄膜内低阈值缺陷,达到提高损伤阈值的目的,损伤阈值分别提高38%和30%。     

多功能抗激光损伤高反射膜

为了能同时满足半导体激光器和YAG激光器对薄膜的特殊要求,在分析高反射膜理论的基础上,选取TiO2和SiO2为高、低折射率材料镀制了周期性多层介质高反射膜。研究了材料的光学及机械特性,重点解决了薄膜的消偏振和抗激光损伤问题。实验采用电子束真空镀膜并加以考夫曼离子源辅助沉积,利用TFC软件进行膜系设计,通过调整镀膜工艺参数和监控方法,在10mm×1．8mm的K9基底上镀制了符合要求的高反射膜,结果表明,当激光以45°入射时,薄膜在900～1100nm的P光与s光的反射率均大于99．95％。所制备的高反射膜性能稳定,抗激光损伤阈值高,能同时满足两种激光器的使用要求。     

HfO_2/SiO_2高反射膜的缺陷及其激光损伤

用原子力、Normaski和扫描电子显微镜等分析仪器 ,对高损伤阈值薄膜常采用的 Hf O2 /Si O2 薄膜进行了表面显微图象研究 ,分析了薄膜常见的表面缺陷 ,如节瘤 ,孔洞和划痕等。薄膜表面缺陷的激光损伤实验表明 ,不同缺陷的抗激光损伤能力大不相同 ,节瘤缺陷最低 ,约为 1 5 J/ cm2 ,薄膜的损伤阈值主要由其决定 ,孔洞的激光损伤能力与节瘤相比较高 ,约为节瘤的 2～ 3倍。节瘤缺陷在低能量密度的激光损伤所形成的孔洞 ,与镀制过程中形成的孔洞形貌相似 ,激光再损伤能力也相似。低能量密度的激光把节瘤缺陷变为孔洞缺陷是激光预处理提高薄膜损伤阈值的原因之一     

激光预处理中缺陷上的激光能量覆盖

分析了不同预处理方式下缺陷上的激光能量的覆盖特点。理论分析表明,相同预处理效率下,单步预处理缺陷上激光能量覆盖率优于多步预处理。实验研究了电子束蒸发制备的HfO2/SiO2多层高反膜的激光预处理,结果发现单步预处理后薄膜的单脉冲激光损伤阈值比相同效率的4步预处理后薄膜的单脉冲激光损伤阈值要好。采用最高能量密度为112%激光损伤阈值的5步预处理后,光学薄膜的激光损伤阈值提高了83.5%。     

退火对EBE,IBS和ALD沉积HfO2薄膜的抗激光损伤性能影响

结合自身实验条件采用电子束蒸发(EBE)、离子束溅射(IBS)和原子层沉积(ALD)三种工艺制备了HfO2薄膜,对其进行退火实验,采用1064 nm Nd:YAG激光测定了即时沉积和退火后各HfO2薄膜的抗激光损伤能力。研究发现,ALD HfO2薄膜的激光损伤阈值最高,EBE HfO2薄膜次之,IBS HfO2薄膜的损伤阈值最低;300℃退火对各工艺薄膜抗激光损伤能力的影响均为负面,500℃退火则会显著降低ALD HfO2薄膜的抗激光损伤能力。     

溶胶-凝胶ZrO_2/SiO_2薄膜的激光损伤研究

采用溶胶-凝胶工艺分别制备了SiO2和ZrO2单层薄膜、ZrO2/SiO2双层膜以及ZrO2/SiO2多层高反膜。用输出波长为1064nm、脉宽为6.3ns的YAG激光器对薄膜进行了激光损伤实验。观察了薄膜经强激光辐照后的损伤情况,讨论了薄膜的激光损伤行为,并从理论上分析了产生这些损伤的原因,为进一步镀制高质量的ZrO2/SiO2多层高反膜提供了依据。     

中等口径光斑激光预处理

介绍了一种基于中等口径光斑的新型激光预处理技术。采用基频最大输出10 J的Nd:YAG调Q激光器,获得了直径5 mm、能量密度满足预处理需求的中等口径光斑。较之于小光斑处理方案,采用中等光斑进行扫描,可以显著压缩大口径光学元件的预处理总耗时。为了验证效果,搭建了实验平台,在陪镀片上开展了光斑扫描与损伤阈值测量实验,设计了合理的中等光斑预处理流程,并对阈值提升效果进行了验证。在此基础上,开展了正式元件的预处理实验,采用大行程二维电动位移台,对430 mm430 mm口径的金属铪蒸发工艺高反膜元件进行了夹持和扫描。实验结果表明,经处理后的高反薄膜元件初步达到了27 J/cm2的阈值水平,证明了该技术对薄膜抗损伤能力的提升效果。     

Study on the feasibility of double stack high reflector coating at 355 nm

The feasibility of the idea of double stack HR coating was discussed in this paper both in theory and experiment. The theoretical simulation was made by employing optical coating design software. The analysis results showed that the design of double stack HR coating was feasible, which made the HR coating have ascendancy not only at reflectance but also at laser damage resistance. Then, the LaF₃/MgF₂ HR coating, the HfO₂/SiO₂ HR coating and the double stack HR coating were prepared for comparison, respectively. Transmittance spectra, surface morphologies and damage morphologies of these coatings were measured. Measurement of laser-induced damage threshold (LIDT) of S polarized light of the samples was performed at 355 nm, 45° incidence. The measurement results showed that the LIDT value of the LaF₃/MgF₂ HR coating with 30 layers was very high, but the reflectance was low. When the layer number was increased up to 36, lots of cracks appeared on the surface of the LaF₃/MgF₂ HR coating, with the LIDT badly declining. It was thought that the residual stress resulted in the cracks and the decline of the LIDT. The spectra measurement showed the double stack HR coatings could provide higher reflectance and wider reflection band than LaF₃/MgF₂ HR coating with less layer pairs. Any crack was also not found on the surface of the double stack coatings. Meanwhile, the double stack HR coatings possessed greater laser damage resistances than the HfO₂/SiO₂ HR coating. The damage morphologies showed that the damage of the double stack coating was even milder than that of the HfO₂/SiO₂ coating. Therefore, the double stack design was effective to gain high reflectance and great UV laser radiation resistance simultaneously.     

氧化物薄膜抗1064nm脉冲激光损伤的特性研究

对向种氧化物介质膜料的单层膜、增透膜及高反膜的激光损伤特性进行了实验研究,分别测试了单脉冲和多脉冲１０６４ｎｍ激光的损伤阈值,分析和讨论了实验的物理现象及其结果。研究表明ＳｉＯ２、Ｇｄ２Ｏ３、Ｅｒ２Ｏ３、Ｙ２Ｏ３具有激光损伤阈值高、损伤程度轻的特点,特别对１０Ｈｚ激光而言,更是明显;增透膜及高反膜加λ／２层ＳｉＯ２对其激光损伤程度和损伤几率。     

Optimization of facet coating for highly strained InGaAs quantum well lasers operating at 1200 nm

The optical output power of a laser diode can be enhanced by anti-reflection (AR) and high-reflection (HR) facet coatings, respectively, at the front and back facet. AR and HR coatings also serve the purpose of protection and passivation of laser diode facets. In this work, we have designed and optimized a single layer λ/4 thick Al₂O₃ film for the AR coating and a stack of λ/4 thick Al₂O₃/λ/4 thick Si bi-layers for the HR coating for highly strained InGaAs quantum-well edge emitting broad area (BA) laser diodes. Effect of the front and back facet reflectivities on output power of the laser diodes has been studied. The light output versus injected current (L–I characteristics) measurements were carried out on selected devices before and after the facet coatings. We have also carried out the numerical simulation and analysis of L–I characteristics for this particular diode structure. The experimental results have been compared and verified with the numerical simulation.     

Study on high-reflective coatings of different designs at 532 nm

Conventional HfO2/SiO2 and Al2O3/HfO2/SiO2 double stack high reflective （HR） coatings at 532 nm are deposited by electron beam evaporation onto BK7 substrates. The laser-induced damage threshold （LIDT） of two kinds of HR coatings is tested, showing that the laser damage resistance of the double stack HR coatings （16 J/cm2） is better than that of the conventional HR coatings （12.8 J/cm2）. Besides, the optical properties, surface conditions, and damage morphologies of each group samples are characterized. The results show that laser damage resistance of conventional HR coatings is determined by absorptive defect, while nodular defect is responsible for the LIDT of double stack HR coatings.     

KrF Laser-induced Damage to ZrO_2/SiO_2 Coatings

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Effect of λ/2 SiO_2 overcoat on the laser damage of HfO_2/SiO_2 high-reflector coatings

The effect of λ/2 SiO2 overcoat on the laser damage characteristics of HfO2/SiO2 high-reflector (HR) coatings is investigated with 1-on-l and N-on-1 laser damage test methods. The laser damage surface of 1-on-l is analyzed by a step analyzer. The surface morphologies show that laser damage makes the coating damaged area protrudent and rough for HR coating without λ/2 silica overcoat, but concave and smooth for HR coating with A/2 silica overcoat. The result of 10-on-l multi-pulse irradiation on the same point of the coating shows that there is an energy density stage on the damage curve. If the laser energy density is within the range of the stage, HfO2/SiO2 HR coatings with λ/2 silica overcoat will not be damaged more than 2 times for multi-shots, and the surface damages are very slight so that there is no impact on the coating performance. Another interesting result is that the energy density stage extends from the damage threshold to the point of about 3 times of threshold, which is similar to the     

808 nm大功率半导体激光器腔面膜的制备

采用等离子体辅助电子束蒸发方法在808 nm大功率量子阱半导体激光器腔面设计镀制了HfO₂/SiO₂系前后腔面膜. 用直接测量法测量并比较了各种常用膜系的相对损伤阈值. 增透膜的反射率为12.2％,高反膜的反射率为97.9％. 对于100 μm条宽、1000 μm腔长的条形结构通过器件测量结果是出光功率提高79％、外微分量子效率提高80％、功率效率由没镀膜之前的22.2％提高到镀膜之后的39.8％.     

实时测量308 nm 激光对薄膜的损伤阈值

 用散射光法, 建立了一套实时监视与测量308nm 激光对全反膜和增透膜的损伤的实验装置。实时观察到了损伤从起始、加深直至饱和的整个过程的波形。用这一装置测量了全反膜和增透膜在308nm 激光作用下的损伤阈值。测得全反膜在0°与45°入射角时的损伤阈值分别为1.7与1.0J/cm²。而增透膜的阈值为1.3J/cm²。