Al/GaAs表面量子阱界面层的原位光调制反射光谱研究

用分子束外延（MBE）方法在GaAs表面量子阱上外延生长不同厚度的Al层，以超高真空下的原位光调制光谱（PR）作为测量手段，研究Al扩散形成的表面势垒层对于GaAs表面量子阱中带间跃迁峰位和峰形的影响.根据跃迁峰的变化，采用有效质量近似理论计算出了Al和GaAs 的互扩散长度为0.5nm，这是半导体工艺中的一个重要常数. 关键词： Al GaAs 原位光调制反射光谱（PR） 分子束外延（MBE）     

纳米锗颗粒镶嵌薄膜的荧光特性研究

研究了不同颗粒尺寸的纳米Ge-SiO₂镶嵌薄膜的室温荧光光谱以及不同激发光能量对荧光峰的影响．实验结果表明，沉积态Ge-SiO₂薄膜样品在可见光区域不发光．退火后的样品（平均锗颗粒尺寸为3.2—6.0nm）在380—520nm波长范围内有明显的蓝光发射现象．当用λ=300nm的光激发，观测到中心波长为420nm（2.95eV）的光致荧光峰；而用633nm波长的光激发，谱图上出现中心波长分别为420和470nm的两个荧光峰．随着纳米锗颗粒尺寸的增加，光致荧光峰的相 关键词：     

蓝光ZnO薄膜的特性研究

采用反应溅射法在n型硅（100）衬底上制备了ZnO薄膜,分别用X射线衍射仪、原子力显微镜和荧光分光光度计对样品的结构、表面形貌和光致发光特性进行了表征。X射线衍射结果表明,实验中制备出了应变小的c轴择优取向的ZnO薄膜;原子力显微镜观察表明,薄膜表面平整,颗粒大小约为50nm,为柱状结构,颗粒垂直于硅衬底表面生长;在室温光致发光（PL）谱中观察到了波长位于434nm处的较窄的强蓝光发射峰,该蓝光峰的半峰全宽约为50meV。对蓝光峰的发光机制进行了讨论,并推断出该蓝光峰来源于电子从Zn填隙缺陷能级向价带顶跃迁。     

YBCO超导薄膜中磁通宏观量子蠕动现象的研究

我们对低温下YBCO（123）超导薄膜样品中磁通的宏观量子蠕动效应进行了研究。用SQUID磁强计测量了厚度分别为2．4nm、6．0nm、10．8nm和40．0nm的YBCO超导超薄膜样品和厚度为200nm和YBCO薄膜样品的磁化驰豫性质。通过对样品磁化驰豫性质的分析我们在YBCO超导超薄膜样品中以观察到明显的磁通的宏观量子蠕动效应。各样品发生量子蠕动效应的温度Tct在8－15K之间，大大高于以前人们在YBCO单晶样品中观察到的1K的结果。     

Co-Zr/Pd多层膜的磁性与结构

Co-Zr/Pd多层膜由高频溅射方法制得．磁性合金Co-Zr层厚度固定为1.8nm，改变Pd层厚度0.5—6nm．由振动样品磁强计测量，发现随Pd层厚度增加，磁化强度发生周期性振荡变化，周期约为1nm，这是由Pd层的极化振荡引起的．经X射线衍射测得Pd层厚度超过1.3nm时，磁性合金Co-Zr层发生晶化，而厚的Co-Zr单层膜是非晶结构．X射线大角衍射图中的超晶格峰表明，在Co-Zr层和Pd层之间存在相关生长．而且还发现，随Pd层厚度增加，样品在垂直膜面方向的晶粒尺寸及fcc（111）面的面间距发生周期性 关键词：     

射频磁控溅射法制备ZnO薄膜的发光特性

利用射频磁控溅射法在硅衬底上制备出具有（002）择优取向的氧化锌薄膜，用波长为300nm的光激发，观察到在446nm处有一强的光致发光峰，它来自于氧空位浅施主能级上的电子到价带上的跃迁。并讨论了发光峰与氧压的关系以及退火对它的影响，且给出了解释。     

Co与Cu掺杂ZnO薄膜的制备与光致发光研究

采用溶胶-凝胶旋涂法在玻璃衬底上制备了Co, Cu单掺杂及Co,Cu共掺杂ZnO薄膜.用金相显微镜观察了Co与Cu掺杂对ZnO薄膜形貌的影响.X射线衍射（XRD）研究揭示所有ZnO薄膜样品都存在（002）择优取向,在Cu单掺的ZnO薄膜中晶粒尺寸最大.对所有样品的室温光致发光测量都观察到较强的蓝光双峰发射和较弱的绿光发射,其中长波长的蓝光峰和绿光峰都能够通过掺杂进行控制.对不同掺杂源的ZnO薄膜发光性能进行了分析,认为蓝光峰来源于电子由导带底到锌空位能级的跃迁及锌填隙到价带顶的跃迁,绿光峰是由于掺杂造成的 关键词： ZnO薄膜 溶胶-凝胶 Co Cu掺杂 光致发光     

Ag/Fe/Ag 纳米颗粒膜磁特性和微结构

"利用对靶磁控溅射法制备了一系列Ag/Fe/Ag纳米薄膜,沉积态样品Fe层厚度固定为35 nm,Ag层厚度为1、2、3、4、5 nm．随后对沉积态样品进行了退火处理,退火温度分别为200、300、400、500、600 ℃ , 退火30 min． 利用VSM测量了样品的磁特性, 利用SPM观察样品表面形貌和磁畴结构,并且利用XRD分析了样品的晶体结构．研究结果表明,沉积态样品随Ag层厚度的变化,垂直和平行膜面矫顽力均先增加后减小．当Ag层厚度为3 nm时,垂直膜面矫顽力最大约为260 Oe,样品颗粒分布均     

ZnO粉末的直流电致发光特性研究

用溶胶凝胶法制备了几种ZnO粉末, 测量了它们的直流电致发光. 在样品中观察到了较强的绿带（556 nm）发射; 对十二胺处理的样品, 绿带发光强度最高可提高8倍, 十八胺处理的样品, 绿带发光强度最高可提高12倍. 在同电压下, 十八胺处理的ZnO的发光强度也较十二胺处理的ZnO的发光强度大1.5～2倍; 并在十二胺处理的样品中, 还观察到了强度较小的蓝光谱带（406 nm）. 在一定电压范围内, ZnO电致发光强度随直流电压增强而线性增强. 所得ZnO样品在2V/μm场强下起亮, 在测量的近1 h内, 发光强度稳定, 重复性好. 分析认为：406 nm处的蓝光谱带是由于VZn空位在禁带中（距离价带0.3 eV）形成缺陷能级, 从导带到价带跃迁的结果, 而556 nm处的绿色发射带是由ZnO中氧空位所导致.     

输运层厚度对双层有机器件复合发光的影响

采用ITO/PVK/Alq/Al双层电致发光（EL）结构,制备了三种载流子输运层厚度分别为30、60、120nm,发光层厚度均为300nm的有机薄膜EL器件,测试其EL谱及J-V特性曲线。根据有机EL器件中载流子的产生和输运过程导出了载流子复合几率及电子和空穴密度分布表示式,用以解释其发光强度随输运层厚度的变化关系,用一维无序结构载流子随机跃迁模型讨论输运层厚度对器件电流密度及启动电压的影响,探讨了载流子在薄膜中的输运过程,其理论与实验符合得很好。     

SPR and SERS characteristics of gold nanoaggregates with different morphologies

In this study, surface plasmon resonance (SPR) and surface-enhanced Raman scattering (SERS) characteristics of gold nanoaggregates with different morphologies are examined to elucidate the correlation between SPR and SERS of the object. Nanoaggregates, defined as random aggregates (hereafter RA), elongated aggregates (hereafter EA) and two-dimensional layered aggregates (hereafter 2DLA) are fabricated by immobilizing colloidal gold nanoparticles on glass substrates. The color variation observed in the RA and EA samples indicates the variation in localized SPR excitations excited on the samples. The RA sample mostly shows a broadened and shifted SPR peak centered at 570 nm in addition to another peak in the longer wavelength region (∼700 nm), whereas in the EA sample a weak blue-shifted peak is observed near 450 nm in addition to a broadened peak centered at 570 nm covering a trail for another one near 700 nm. In the case of the 2DLA sample, more than one SPR peaks are observed in the longer wavelength region. The SERS observation confirms million times higher enhancement at least in Raman intensity using the gold nanoaggregates adsorbed by dye molecules. The EA sample of gold nanoparticles shows ∼5 times higher enhancement in Raman signal compared to that of the RA and 2DLA sample.     

用热脱附谱研究氢在Si(100)清洁表面的吸附

用超高真空中对样品进行闪烁加热的方法,测量了Si(100)清洁表面吸附氢以后的热脱附谱。得到在室温下暴露氢时,低暴露量下只有一个脱附峰A,暴露量增大后,出现第二个脱附峰B。升高温度暴露氢,如在230℃以上暴露,热脱附谱中不出现B峰;在530℃以上暴露,则A,B峰均不出现。在室温下吸附氢后再加热退火,温度超过350℃,则热脱附谱中B峰不再存在;在530℃退火,则A峰也消失。热脱附的这些规律,使我们相信A峰和B峰分别对应于Si(100)表面的单氢化相和双氢化相的脱附。测量了它们的脱附活化能分别为52.9kcal/mol和14.5kcal/mol。从级数图证实了A峰的脱附属于一级脱附,但其机理并不与一般的一级或二级脱附机理相同。 关键词：     

Dose response of thermoluminescence emission spectra of LiF:Mg,Ti with different Mg, Ti impurity concentrations

The dose response of the TL emission spectra of an LiF:Mg,Ti (TLD-100) sample and three LiF:Mg,Ti samples with different impurity concentrations (0–6 ppm Ti and 80–100 ppm Mg) have been measured. At a dose less than 22 Gy the emission spectrum of the TLD-100 sample comprises one emission band at 420 nm. The sample without Ti shows also one emission band but now at 620 nm. The spectra of the other two samples comprises two emission bands at 420 nm and 620 nm of which the intensity of the 420 nm band increases with increasing Ti concentration. The dose response of the glow peaks is different for peaks at different temperatures and emission bands. From these observations it can be concluded than in LiF:Mg,Ti at least some of the traps and luminescent centers are coupled.     

Synthesis and characterization of zinc oxide nanoparticles by laser ablation of zinc in liquid

We report formation of colloidal suspension of zinc oxide nanoparticles by pulsed laser ablation of a zinc metal target at room temperature in different liquid environment. We have used photoluminescence, atomic force microscopy and X-ray diffraction to characterize the nanoparticles. The sample ablated in deionized water showed the photoluminescence peak at 384 nm (3.23 eV), whereas peaks at 370 nm (3.35 eV) were observed for sample prepared in isopropanol. The use of water and isopropanol as a solvent yielded spherical nanoparticles of 14-20 nm while in acetone we found two types of particles, one spherical nanoparticles with sizes around 100 nm and another platelet-like structure of 1 μm in diameter and 40 nm in width. The absorption peak of samples prepared in deionized water and isopropanol are seen to be substantially blue shifted relative to that of the bulk zinc oxide due to the strong confinement effect. The technique offers an alternative for preparing the nanoparticles of active metal.     

掺镱硅酸盐激光玻璃的制备与光谱特性分析

采用高温熔融工艺制备了两块组分差别不大的掺镱(Yb3+)硅酸盐激光玻璃.测试出两块玻璃样品的吸收光谱和荧光光谱;计算了Yb3+掺杂玻璃的积分吸收截面、受激发射截面、荧光线宽、能级寿命、最小粒子数、饱和泵浦强度、最小泵浦强度等参数,比较发现样品的吸收截面图与倒易法计算所得的受激发射截面图线型相似,而与F-L法计算所得的受激发射截面图筹别较大,这与理论分析相吻合.两块玻璃样品的吸收光谱的线型基本一致,吸收主峰位于975 nm,次峰位于908 nm,这就说明影响激光玻璃吸收光谱线型的主要因素足玻璃基质的组成.两块玻璃样晶的荧光光谱差别比较大,样品1主峰位于993 nm,次峰位于1 029 nm;样品2主峰位于1 035 nm,次峰位于994nm,差别原因主要在于Yb3+离子的掺杂浓度不同.     

Effects of substrate on surface morphology, crystallinity, and photoluminescence properties of sputtered ZnO nano films

Effects of substrate on crystallinity, surface morphology, and luminescence properties of radio frequency sputtered zinc oxide (ZnO) thin films were investigated. A variety of materials such as Si (100), Si (111), Al₂O₃, quartz, and silicon carbide (SiC) wafers were examined as substrates for deposition of ZnO thin films. The results showed smooth and uniform growth of c-axis orientation films. The thickness of the layers was about 50 nm. The average grain sizes of films were about 10, 13, and 12 nm for Si (111), quartz, and SiC samples, respectively. The deposited film on Al₂O₃ showed the largest grain size, about 500 nm. Grazing incidence x-ray diffraction patterns of the samples revealed that sputtered layers on Al₂O₃ and quartz had better crystallinity with higher peak at (002) orientation compared to Si and SiC substrates. Moreover, the Al₂O₃ sample exhibited a weak peak at position of (100) planes of ZnO too. The photoluminescence spectra of the samples showed a typical luminescence behavior with a broad UV band, including a main peak at around 388 nm and a weak shoulder peak at around 381 nm, corresponding with bound excitonic recombination and free excitonic recombination, respectively. The luminescence peak revealed that the intensity of UV emission is not necessarily dependent on the grain sizes and the micro-structural quality of ZnO films.     

Stripe domains in Permalloy films as observed by ferromagnetic resonance and magnetic force microscopy

We have studied the static and dynamic responses of three (62, 115 and 308 nm thick) Permalloy (Ni_0.81Fe_0.19) films by DC magnetization, ferromagnetic resonance and magnetic force microscopy. The thickest film presents very regular stripe domains with widths slightly smaller than the film thickness. Ferromagnetic resonance performed on the thinnest film shows one absorption peak when the field is applied along the film plane, and more than one in the other samples. These multiple absorptions are analogous to the high frequency susceptibility peaks observed at zero field in Permalloy films above the critical thickness reported previously by other authors.     

Morphology, optical and electrical properties of Cu-Ni nanoparticles in a-C:H prepared by co-deposition of RF-sputtering and RF-PECVD

We report optical and electrical properties of Cu-Ni nanoparticles in hydrogenated amorphous carbon (Cu-Ni NPs @ a-C:H) with different surface morphology. Ni NPs with layer thicknesses of 5, 10 and 15 nm over Cu NPs @ a-C:H were prepared by co-deposition of RF-sputtering and RF-Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) from acetylene gas and Cu and Ni targets. A nonmetal-metal transition was observed as the thickness of Ni over layer increases. The surface morphology of the sample was described by a two dimensional (2D) Gaussian self-affine fractal, except the sample with 10 nm thickness of Ni over layer, which is in the nonmetal-metal transition region. X-ray diffraction profile indicates that Cu NPs and Ni NPs with fcc crystalline structure are formed in these films. Localized Surface Plasmon Resonance (LSPR) peak of Cu NPs is observed around 600 nm in visible spectra, which is widen and shifted to lower wavelengths as the thickness of Ni over layer increases. The variation of LSPR peak width correlates with conductivity variation of these bilayers. We assign both effects to surface electron delocalization of Cu NPs.     

Influence of the Si cap layer on the SiGe islands morphology

Transmission electron microscopy (TEM), atomic force microscopy (AFM), and EDX methods were used to study morphology and chemical composition of SiGe/Si(001) islands grown at 700 degrees C and covered at 550 degrees C and 700 degrees C by Si layers of different thickness. The samples were grown in ultra high vacuum chemical vapor deposition process (UHVCVD) controlled with in situ reflection of high-energy electron diffraction (RHEED). The islands transformed from initial pyramid and dome shapes to lens shape for 1.4 nm and 3.7 nm cap layer thickness at 550 degrees C and 700 degrees C, respectively. An increase of lateral to vertical ratio was observed during the transformation. For the higher depositing temperature the ratio was bigger and was increasing continuously with cap layer thickness. Also, with increasing Si cap layer thickness, the Ge concentration was decreasing, which was more observable for higher capping temperature.     

近红外波段锑基铋掺杂薄膜厚度对光学常数与光学带隙的影响

采用磁控溅射法制备了不同厚度的锑基铋掺杂薄膜,用X射线衍射(XRD)和透射电子显微镜(TEM)研究了薄膜结构随厚度的变化。利用椭圆偏振法测定了样品薄膜在近红外波段的光学常数与光学带隙,研究了膜厚对样品薄膜光学常数和光学带隙的影响。结果表明,膜厚从7 nm增加至100 nm时,其结构由非晶态转变为晶态。在950～2200 nm波段,不同厚度薄膜样品的折射率在4.6～8.9范围,消光系数在0.6～5.8范围,光学带隙在0.32～0.16 eV范围。随着膜厚的增加,薄膜的折射率和光学带隙减小,而消光系数升高;光学常数在膜厚50 nm时存在临界值,其原因是临界值前后薄膜微观结构变化不同。