基于X射线衍射的GaN薄膜厚度的精确测量

结合Williamson-Hall plot方法和线型分析方法的优点,提出了一种有效分离有限晶粒尺寸和非均匀应力等X射线衍射展宽效应的方法,可以用于GaN外延层厚度等参数的快速精确测量.用该方法对一系列在蓝宝石衬底上生长的厚度在0.7—4.2μm的GaN外延膜进行了测量,并与椭圆偏振光谱法测量结果进行了比较,结果表明其差别<4%,反应了这种方法的准确性. 关键词： GaN薄膜 厚度测量 X射线衍射     

类金字塔状GaN微米锥的形貌及发光性能

三维结构GaN基LED能够解决二维GaN基薄膜LED中存在的量子限制斯塔克效应、效率骤降、发光波长单一等问题。基于此,本文对三维类金字塔状GaN微米锥的发光性能进行了详细的研究。通过金属有机化合物化学气相沉积原位沉积SiN_x掩模层后,首先制备了底面尺寸为8μm、高度7.5μm的类金字塔状GaN微米锥,之后在其半极性面外延生长了3个周期的InGaN/GaN多量子阱。通过阴极荧光测试发现,类金字塔状GaN微米锥的半极性面上不同位置发光波长不同;变功率微区光致发光测试表明,类金字塔状GaN微米锥的半极性面在InGaN/GaN多量子阱沉积之后极化场较弱;对InGaN/GaN多量子阱进行了透射电镜表征,结合阴极荧光光谱的结果最终解释了In原子在类金字塔状GaN微米锥上的迁移机理。利用其半极性面不同位置发光波长不同的结构特点及光学特性,可以制备多波长发射LED。     

具有条纹磁畴结构的NiFe薄膜的制备与磁各向异性研究

具有条纹磁畴结构的磁性薄膜表现出面内转动磁各向异性,对于解决高频电子器件的方向性问题起着至关重要的作用.本文采用射频磁控溅射的方法,研究了NiFe薄膜的厚度、溅射功率密度、溅射气压等制备工艺参数对条纹磁畴结构、面内静态磁各向异性、面内转动磁各向异性、垂直磁各向异性的影响规律.研究发现,在功率密度15.6 W/cm~2与溅射气压2 mTorr(1 Torr=1.33322×102Pa)下生长的NiFe薄膜,表现出条纹磁畴的临界厚度在250 nm到300 nm之间.厚度为300 nm的薄膜比250 nm薄膜的垂直磁各向异性场增大近一倍,从而磁矩偏离膜面形成条纹磁畴结构,并表现出面内转动磁各向异性.高溅射功率密度可以降低薄膜出现条纹磁畴的临界厚度.在相同功率密度15.6 W/cm~2下生长300 nm的NiFe薄膜,随着溅射气压由2 mTorr增大到9 mTorr,NiFe薄膜的垂直磁各向异性场逐渐由1247.8 Oe(1 Oe=79.5775 A/m)增大到3248.0 Oe,面内转动磁各向异性场由72.5 Oe增大到141.9 Oe,条纹磁畴周期从0.53μm单调减小到0.24μm.NiFe薄膜的断面结构表明柱状晶的形成是表现出条纹磁畴结构的本质原因,高功率密度下低溅射气压有利于柱状晶结构的形成,表现出规整的条纹磁畴结构,高溅射气压会导致柱状晶纤细化,面内转动磁各向异性与面外垂直磁各向异性增强,条纹磁畴结构变得混乱.     

利用金属有机物化学气相沉积技术生长的a面GaN表面形貌和位错的研究

采用金属有机物化学气相淀积技术在r面蓝宝石衬底上制备了a面GaN薄膜,用熔融的KOH在400 ℃对样品分别腐蚀1.0,1.5和2.0 min.用扫描电镜、原子力显微镜、X射线衍射谱和阴极射线荧光对腐蚀前后的表面形貌进行分析.研究表明,400 ℃下腐蚀1.5 min后出现了长平行四边形的条纹状,这是由于无极化的a面GaN表面极性各向异性,c向与m向上N原子悬挂键密度不同,同时稳定性不同,对OH^-离子的吸附能力不同造成的,其中沿c方向易于腐蚀.同时,a面GaN腐蚀后出现了六角突起.我们认为这与穿透位错有关,而其形貌则与GaN薄膜的位错局部极性有关. 关键词： a面GaN')" href="#">a面GaN 堆垛层错 极性     

利用MOCVD在r面蓝宝石上生长的α面GaN中两步AlN缓冲层的优化

采用两步AlN缓冲层(一层低温AlN和一层高温AlN)在r面蓝宝石衬底上生长了非极性的α面GaN,并利用高分辨X射线衍射和光致荧光谱对所生长的材料进行了研究.两步AIN缓冲层在我们之前的工作中已被证明比单步高温AlN或低温GaN缓冲层更有利于减小材料各向异性和提高晶体质量,本文进一步优化了两步AlN缓冲层的结构,并得到了各向异性更小,晶体质量更好的α面GaN薄膜.分析表明,两步AlN缓冲层中的低温AlN层在减小各向异性中起着关键作用.低温AlN层能抑制了优势方向(c轴)的原子迁移,有利于劣势方向(m轴)的原子迁移,从而减小了Al原子在不同方向迁移能力的差异,并为其后的高温AlN缓冲层和GaN层提供"生长模板",以得到各向异性更小、晶体质量更好的α面GaN材料.     

SiC衬底上外延GaN:Mg材料特性研究

利用扫描电子显微镜、拉曼散射光谱和光致发光谱对在SiC衬底上采用MOCVD异质外延的GaN:Mg薄膜特性进行研究发现：除了一部分Mg原子替代Ga原子呈现受主性外，大部分Mg原子以间隙原子状态（Mg_i）存在，并且在缺陷或者位错处大量聚集引起薄膜张力应力减小，薄膜在降温过程中由于应力不均匀会在部分区域内出现大量的裂纹；Mg的掺杂会加剧GaN无序化程度，致使薄膜质量变差；而室温下的PL谱测量表明蓝带发光由DAP（深施主—浅受主）复合引起，其中D为Mg_GaV_{N 关键词： GaN∶Mg 异质外延 扫描电子显微镜 拉曼散射 光致发光谱}     

界面对Fe65Co35薄膜微结构和软磁性的影响

用不同的材料（Co₉₃Fe₇和Fe）作衬底层,利用磁控溅射法成功制备了Fe₆₅Co₃₅（主层）/衬底层结构的双层薄膜．通过X射线衍射和磁性测量发现,在不同的衬底上沉积的Fe₆₅Co₃₅薄膜的织构不同,并且（200）取向的Fe₆₅Co₃₅薄膜的面内各向异性和软磁性优于（110）取向的Fe₆₅Co_{35关键词： 65}Co₃₅薄膜')" href="#">Fe₆₅Co₃₅薄膜 衬底层 界面各向异性 软磁性     

GaN外延层中的缺陷研究

采用阴极射线致发光法观察金属有机物汽相外延法生长的具有不同表面形貌的GaN外延层中黄色发光带的强度分布.结果表明六角金字塔形表面形貌对发光强度分布的测量有很大影响.测量和比较表面镜面加工样品的黄色发光带强度分布、原子序数衬度和X射线波谱发现,黄色发光带的强度在含有O和C等杂质缺陷附近较强.高分辨透射电子显微镜观察表明,杂质缺陷区的晶格结构不同于GaN基质,以及位错和裂缝等由应力引起的缺陷.认为此类缺陷可能是生长过程中,杂质在结晶小丘合并处的V形凹角中的沉积所产生. 关键词：     

非故意掺杂GaN薄膜方块电阻与载气中N2比例关系研究

利用金属有机气相外延方法研究了非故意掺杂GaN薄膜的方块电阻与高温GaN体材料生长时载气中N₂比例的关系.研究发现,随着载气中N₂比例的增加,GaN薄膜方块电阻急剧增加.当载气中N₂比例为50%时,GaN薄膜方块电阻达1.1×10⁸Ω/□,且GaN表面平整,均方根粗糙度为0.233nm.二次离子质谱分析发现,载气中N₂比例不同的样品中碳、氧杂质含量无明显差别.随着载气中N₂比 关键词： 半绝缘GaN薄膜 载气 金属有机气相外延 位错     

掺铒Si/Al2O3多层结构中结晶形态对1.54 μm发光的影响

利用脉冲激光沉积的方法制备掺铒 Si/Al₂O₃多层结构薄膜,获得了由纳米结构的Si作为感光剂增强的Er³⁺在1.54 μm高效发光.利用拉曼散射、高分辨透射电镜和光致发光测量研究了在不同退火温度下（600—1000 ℃）纳米结构Si层的结晶形态变化,及对Er³⁺在1.54 μm的发光的影响特征.研究发现最佳发光是在退火温度600—700 ℃.在这个条件下纳米Si的尺寸和密度,Si和Er的作用距离以及Er^{3+ 关键词： 铒 纳米硅 能量转移 氧化铝}     

Strain effects on the polarized optical properties of InGaN with different In compositions

Strain effects on the polarized optical properties of c-plane and m-plane In_x1-xN were discussed for different In compositions (x=0, 0.05, 0.10, 0.15) by analyzing the relative oscillator strength (ROS) and energy level splitting of the three transitions related to the top three valence bands (VBs). The ROS was calculated by applying the effective-mass Hamiltonian based on k. p perturbation theory. For c-plane In_xGa_1-xN, it was found that the ROS of | X > and | Y >-like states were superposed with each other. Especially, under compressive strain, they dominated in the top VB whose energy level also went up with strain, while the ROS of the | Z >-like state decreased in the second band. For m-plane In_xGa_1-xN under compressive strain, the top three VBs were dominated by | X >, | Z >, and | Y >-like states, respectively, which led to nearly linearly-polarized light emissions. For the top VB, ROS difference between | X > and | Z >-like states became larger with compressive strain. It was also found that such tendencies were more evident in layers with higher In compositions. As a result, there would be more TE modes in total emissions from both c-plane and m-plane InGaN with compressive strain and In content, leading to a larger polarization degree. Experimental results of luminescence from InGaN/GaN quantum wells (QWs) showed good coincidence with our calculations.     

Optical anisotropy in nonpolar (101̄0)-oriented m-plane GaN/AlGaN quantum wells and comparison with experiment

Optical anisotropy in nonpolar ()-oriented m-plane GaN/InGaN quantum wells was investigated using the multi-band effective-mass theory. The optical matrix element near the Γ point (k_||=0) is shown to increase with increasing polarization angle ϕ’. The anisotropy calculated at the Γ point (k_||=0) is nearly 1 and it rapidly decreases with increasing in-plane wave vector. The reduction of the anisotropy at a large k_|| is attributed to the fact that the state of the first subband is equally mixed of |X〉 and |Y〉 at a large k_||. The photoluminescence intensity increases with ϕ’, becomes a maximum at ϕ’=π/2, and decreases again when ϕ’ further increases. The theoretical result is found to be in good agreement with the experimental results. PACS 85.60.Bt; 85.30.De; 85.30.Vw; 78.20.Bh     

Polarization properties of nonpolar GaN films and (In,Ga)N/GaN multiple quantum wells

We have grown GaN films and (In,Ga)N/GaN multiple quantum wells (MQWs) by plasma-assisted molecular-beam epitaxy on -LiAlO₂(100) substrates. Due to the crystal symmetry of -LiAlO₂(100), GaN films and (In,Ga)N/GaN MQWs can be realized in a nonpolar (M-plane) configuration, i.e., the c axis of the wurtzite unit cell lies in the growth plane. For compressively, anisotropically strained M-plane GaN films, the band structure of the valence band changes in such a way that the optical transmittance becomes 100% linearly polarized for two orthogonal in-plane directions, where one of these directions is parallel to the c axis of the GaN film. The photoluminescence properties of M-plane In_0.1Ga_0.9N/GaN MQWs exhibit a strong in-plane optical anisotropy for linear polarization with an energy-dependent polarization degree of up to 96%, which is presumably also due to a large valence-band splitting induced by the large compressive strain in the QWs. PACS 78.40.Fy; 78.66.Fd; 71.20.Nr     

Investigation of β-Ga_2O_3 films and β-Ga_2O_3/GaN heterostructures grown by metal organic chemical vapor deposition

In this work,(-201) β-Ga_2O_3 films are grown on GaN substrate by metal organic chemical vapor deposition(MOCVD). It is revealed that the β-Ga_2O_3 film grown on GaN possesses superior crystal quality, material homogeneity and surface morphology than the results of common heteroepitaxial β-Ga_2O_3 film based on sapphire substrate. Further, the relevance between the crystal quality of epitaxial β-Ga_2O_3 film and the β-Ga_2O_3/GaN interface behavior is investigated. Transmission electron microscopy result indicates that the interface atom refactoring phenomenon is beneficial to relieve the mismatch strain and improve the crystal quality of subsequent β-Ga_2O_3 film. Moreover, the energy band structure of β-Ga_2O_3/GaN heterostructure grown by MOCVD is investigated by X-ray photoelectron spectroscopy and a large conduction band offset of 0.89 eV is obtained. The results in this work not only convincingly demonstrate the advantages of β-Ga_2O_3 films grown on GaN substrate, but also show the great application potential of MOCVD β-Ga_2O_3/GaN heterostructures in microelectronic applications.     

Optical and crystal improvements of semipolar (11-22) GaN/m-sapphire by in-situ thermal etching process

We investigated the optical and crystal qualities of semipolar (11-22) GaN grown on m-plane sapphire using three-step growth technique which consisted of seed GaN growth, in-situ thermal etching process (I-STEP), and lateral growth step. By introducing three-step growth, we achieved high optical and crystal qualities of semipolar (11-22) GaN films compared with those grown by conventional one-step growth. In particular, as the positions of I-STEP were decreased from 1.0 to 0.25 μm toward sapphire substrate, the full width at half maximum of the X-ray rocking curve was effectively decreased from 1083 to 828 arcsec, respectively. Furthermore, photoluminescence results showed that the bandedge emission intensity of semipolar (11-22) GaN with I-STEP was 56% higher than that with conventional growth technique. Based on these results, we suggested that the three-step growth would be effective to improve the crystal and optical qualities of semipolar (11-22) GaN/m-sapphire.     

The influence of strain-reducing layer on strain distribution and ground state energy levels of GaN/AlN quantum dot

This article deals with the strain distributions around GaN/AlN quantum dots by using the finite element method. Special attention is paid to the influence of Al_0.2Ga_0.8N strain-reducing layer on strain distribution and electronic structure. The numerical results show that the horizontal and the vertical strain components are reinforced in the GaN quantum dot due to the presence of the strain-reducing layer, but the hydrostatic strain in the quantum dot is not influenced. According to the deformation potential theory, we study the band edge modifications and the piezoelectric effects. The result demonstrates that with the increase of the strain reducing layer, the transition energy between the ground state electron and the heavy hole increases. This result is consistent with the emission wavelength blue shift phenomenon observed in the experiment and confirms that the wavelength shifts toward the short wavelength range is realizable by adjusting the structure-dependent parameters of GaN/AlN quantum dot.     

Optical isotropization of anisotropic wurtzite Al‐rich AlGaN via asymmetric modulation with ultrathin (GaN)m/(AlN)n superlattices

Symmetric anisotropy in wurtzite semiconductors, e.g., AlGaN, has led to the significant optical anisotropy that is rather difficult to resolve. Here, a novel scheme for achieving optical isotropization in Al‐rich AlGaN through the introduction of additional asymmetric elements is demonstrated to compensate the native asymmetry. Asymmetric modulation of alloy composition and periodicity of (GaN)_m/(AlN)_n superlatices was proposed with first‐principles simulations. Results showed that the compensation for the c‐axial symmetry with the asymmetric ultrathin (GaN)_m/(AlN)_n superlatices (m ≤ 2) could well achieve the equivalence of the ordinary and extraordinary imaginary dielectric functions ε₂ at the band edge. Measurement with spectroscopic ellipsometry for this (GaN)_m/(AlN)_n superlatice insertion in AlGaN host confirmed the theoretical predictions of the optical isotropization. This method can be transferred to other semiconductors in anisotropic structure and with troubles of optical anisotropy.     

Thermal motion induced resonant forbidden reflections in wurtzite GaN

We report on an experimental study of forbidden reflections in GaN (wurtzite structure) by resonant X-ray scattering at the Gallium K edge. Resonant reflections are explained by the coherent sum of a Thermal Motion Induced (TMI) scattering amplitude and a temperature independent term. We show that the shape of the TMI energy spectrum is the same for a number of reflections that are exactly forbidden by spacegroup symmetry, as well as one that relies on approximate cancellation due to special atomic sites. In addition to demonstrating new selection rules, several non-trivial aspects of the theory of TMI scattering in wurtzite crystals are quantitatively verified, including dependence on temperature, energy, azimuthal angle and polarization. The temperature-dependent and temperature independent spectra of GaN are very similar to those found in ZnO, suggesting strong similarities in the anisotropy of their electronic states. This is also supported by the strong linear dichroism observed in GaN. TMI spectra are determined by the evolution of the electronic anisotropy with nuclear position, and are likely to be extremely valuable for developing theories of electronic properties at elevated temperatures.     

Analysis of GaN epilayers on sapphire substrates with GaN and AlN sublayers

The features and results of X-ray diffraction analysis of GaN films are presented. The films are grown by metalorganic vapor-phase epitaxy on c-plane sapphire substrates using GaN or AlN nucleation layers deposited at a low temperature. Measurements of the twist angle and concentrations of Al _x Ga_1-x N solid solutions are discussed in detail.     

Depth-resolved X-ray determination of surface strain in free-standing films of HVPE-grown GaN and <Superscript>71</Superscript>Ga NMR characterization

Free-standing GaN films grown by hydride vapor phase epitaxy (HVPE) on c-plane sapphire have been studied for in-plane anisotropic strain. Lattice parameters are obtained from high-resolution X-ray diffraction data and the film quality is determined by measuring the rocking curves and by ⁷¹Ga nuclear magnetic resonance (NMR). The in-plane strain was determined using grazing incidence X-ray diffraction and conventional X-ray measurements. It is found that the in-plane lattice parameter varies with depth and has estimated surface strain anisotropy of 4.0791×10^-3 up to a thickness of 0.3 μm. The ⁷¹Ga NMR experiments reveal different degrees of inhomogeneity amongst the three samples. This is shown by the appearance of an additional broad central-transition peak shifted to higher frequency by a Knight shift from conduction electrons in sample regions having high carrier concentrations. PACS 72.80.Ey; 61.10.-i; 61.72.Hh