六方相InGaN外延膜的显微Raman散射

用X射线衍射(XRD)技术和显微Raman散射方法对金属有机化学气相沉积(MOCVD)法生长的六方相In_xGa_1-xN薄膜样品进行了研究，观察到了相分离现象和LO声子-等离子耦合模(LPP⁺)，讨论了In_xGa_1-xN的A₁(LO)模被屏蔽的主要物理机制.同时，对Raman谱中E₂和A₁(TO)声子模进行了分析和讨论.在In_xGa_1-xN样品的低温Raman谱中还观察到单电子跃迁产生的Raman散射信号. 关键词： Raman散射 X射线衍射 相分离 应力 LO声子-等离子耦合     

超晶格中GaAs/InGaAs界面与InGaAs/GaAs界面的特性差异

In_xGa_1-xAs缓冲层上生长In_yGa_1-yAs/GaAs超晶格（x＜y）．阱层处于压缩应变，垒层处于伸张应变，其厚度均小于Mathews-Blakeslee（M-B）平衡理论计算的临界厚度．透射电子显微镜及俄歇电子能谱、二级离子质谱测试发现，GaAs/In_yGa_1-yAs界面铟组分过渡区比In_yGa_1-yAs/GaAs界面铟组 关键词：     

Peak response wavelengths of p- and n-type InxGa1-xAs-InP quantum well infrared photodetectors

p- and n-type In_xGa_1-xAs-InP quantum wells are suitable for multi-color infrared photodetector applications in atmospheric windows due to improved barrier quality and carrier-transport properties. We apply the k ·p method to study the energy band structures and optical transition properties, which show that the peak response wavelengths of p- and n-type In_xGa_1-xAs-InP quantum well infrared photodetectors (QWIPs) are determined not only by the energy distance from the ground sublevels in the quantum well to the energy band edges of extended states, but also by the characteristics of the extended states. The optical phonon scattering process converts the broad absorption spectrum of the p-QWIP from 0 to 16 m into a short-wavelength spectrum centered at 4.5 m. The transport of electrons in the extended states of the n-QWIP is characterized by running wave boundary conditions, resulting in a theoretically optimal absorption rate by a 8-nm-thick In_0.53Ga_0.47As quantum well. Moreover, a conduction-band offset of 0.5 for an In_xGa_1-xAs-InP (x=0.53) heterostructure gives the best data fitting of theoretical and experimental response peaks, whereas 0.55 is generally recommended in the literature. PACS 73.21.-b; 73.63.Hs; 78.67.-n     

A theoretical study of band structure properties for III–V nitrides quantum wells

Reliable and precise knowledge about the strain and composition effects on the band structure properties is crucial for the optimization of InGaN based heterostructures for electronic and optoelectronic device applications. AlInGaN as quaternary barrier material permits to control the band gap and the lattice constant independently. Using the model solid theory and the multi-band k.p interaction model, we investigate the composition effects on band offsets and band structure for pseudomorphic Ga_1−xIn_xN/Al_zIn_yGa_1−y−zN (0 0 1) heterointerfaces having zinc-blende structure. The results show that both conduction and valence band states are strongly modified while varying In and Al contents in the well and barrier materials. Furthermore, it is found that using AlInGaN as the barrier material allows the design of heterostructures including InGaN wells with tensile, zero or compressive strain. Such results give new insights for III-nitride compounds based applications and especially may guide the design of white-light emission diodes.     

InxGa1－xAs缓冲层上InyGa1－yAs/(Al)Ga

本文中,发现在In_xGa_1-xAs缓冲层上非故意掺杂的In_yGa_1-yAs/(Al)GaAs超晶格样品中存在着两个互相反向的自建电场区,一个位于样品表面,另一个位于In_xGa_1-xAs缓冲层和超晶格界面。据此,合理地解释了样品的光伏测试结果,并对此类样品的MOCVD生长工艺给予指导。     

Tight-binding studies of the electronic band structure of GaAlN and GaInN alloys

The semi-empirical tight-binding (TB) approach with an sp³s^* orbital basis is used to investigate the electronic band structure of cubic Ga_1-xAl_xN and Ga_1-xIn_xN alloys. The spin–orbit splitting in the Hamiltonian and first- and second-neighbour interactions are considered to explore the gap evolution as a function of the concentration x. The TB parameters used in the studies were obtained within the virtual crystal approximation using those of the binary compounds AlN, GaN, and InN. The binary parameters are calculated by applying an empirical TB Hamiltonian taking into account first- and second-neighbour interactions. A direct to indirect gap transition is obtained for Ga_1-xAl_xN at x=0.60. In contrast, the Ga_1-xIn_xN alloys exhibit direct-gap characteristics as a consequence of being formed by the direct-gap binary compounds GaN and InN. PACS 71.20.Nr; 71.23.-k; 71.55.Eq     

Performance characteristics of deep violet InGaN DQW laser diodes with InGaN/GaN superlattice waveguide layers

The effect of the indium (In) composition of In_xGa_1−xN (GaN) waveguide layers on the performance of deep violet In_0.082Ga_0.918N/GaN double quantum well (DQW) laser diodes (LDs) emitting at 390 nm output emission wavelength has been numerically investigated. Simulation results indicated that by increasing In composition of the In_xGa_1−xN waveguide layers, the threshold current decreases, the slope efficiency, and differential quantum efficiency (DQE) increase, whereas the output power decreases. The increase in the In composition of the InGaN waveguide layers increases the refractive index and consequently increases the optical confinement factor (OCF) which result in the increase in the slope efficiency and DQE and the decrease in the threshold current. The decreasing movement of electron and hole carriers from the bulk waveguide layers to the active regions also causes to decrease the output power. A new LD structure with InGaN/GaN superlattice (SL) waveguide layers has been proposed to exploit the increased OCF of InGaN waveguide structures, and the enhanced electron and hole mobilities and the tunneling effect of the periodic structure of the SL structures. The results also showed that the use of InGaN/GaN SL waveguide structures effectively improves the output power, slope efficiency and DQE and decreases the threshold current of the LD compared with (In)GaN bulk waveguide structure.     

InGaN/GaN multiple quantum well solar cells with an enhanced open-circuit voltage

In this paper,InGaN/GaN multiple quantum well solar cells (MQWSCs) with an In content of 0.15 are fabricated and studied.The short-circuit density,fill factor and open-circuit voltage (V oc) of the device are 0.7 mA/cm 2,0.40 and 2.22 V,respectively.The results exhibit a significant enhancement of V oc compared with those of InGaN-based hetero and homojunction cells.This enhancement indicates that the InGaN/GaN MQWSC offers an effective way for increasing V oc of an In-rich In x Ga 1 x N solar cell.The device exhibits an external quantum efficiency (EQE) of 36% (7%) at 388 nm (430 nm).The photovoltaic performance of the device can be improved by optimizing the structure of the InGaN/GaN multiple quantum well.     

Effects of strain-compensated AlGaN/InGaN superlattice barriers on the optical properties of InGaN light-emitting diodes

In this article, metalorganic chemical vapor deposition (MOCVD)-grown InGaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with Al_0.03Ga_0.97N and Al_0.03Ga_0.97N/In_0.01Ga_0.99N superlattices-barrier layers on c-plane sapphire were studied for the influence of the strain-compensated barrier on the optical properties of the LEDs. High-resolution X-ray diffraction (HRXRD) analysis shows that the LEDs with a strain-compensated superlattice barrier (SC-SLB) have better interface quality than those using AlGaN. This difference in quality may result from the alleviation of strain relaxation in superlattice layers to improve the crystalline perfection of the epitaxial structures. It was also found that the degree of the exciton localization effect rises considerably as InGaN grows directly on the AlGaN barrier layers. However, the increase in the strength of the polarization fields within the MQWs (as evaluated from bias-dependent photoluminescence (PL) measurement) could reduce the radiative efficiency of the LEDs and shift their PL peaks toward long wavelengths. With suitable control of crystalline quality and the reduced quantum-confined Stark effect in the MQWs, the SC-SLB LEDs operating at 150-mA-current show a 22.3% increase in light output power as compared to their conventional counterparts.     

Optical and X-ray diffraction studies of multilayer structures based on InGaN/GaN solid solutions

Multilayer structures based on the In _x Ga_{1 ? x} N/GaN compounds grown by gas-phase epitaxy from organometallic compounds are studied using photoluminescence spectroscopy and high-resolution X-ray diffraction. A method for analyzing the experimental rocking curves of multilayer structures in terms of the Parratt-Speriosu model is developed. This method permits one to determine the thickness, period, and average composition of In _x Ga_{1 ? x} N/GaN layers, as well as the deformation of the active region in the samples under study. The local indium content is determined using the theoretical model which describes the radiation energy as a function of the thicknesses of the InGaN layers taking into account the energy of quantum confinement, the energies of the spontaneous polarization and piezoelectric polarization, and the parameters determined from high-resolution X-ray diffraction data.     

高In组分InxGa1－xN/GaN多量子阱材料电致荧光谱的研究

研究了高In组分In_xGa_1-xN/GaN（x≈30%）多量子阱（MQWs）结构 发光二极管样品在不同注入电流下的电致荧光（EL）谱及反常的双峰现象.结果表明：有源区 内建电场在外界电流注入条件下逐渐受屏蔽，这一效应在高In组分In_xGa_{1 -x}N/GaN MQWs材料的发光复合机理中占有重要地位. 关键词： xGa_1-xN/GaN多量子阱')" href="#">In_xGa_1-xN/GaN多量子阱 电致荧光谱 内建电场     

高空穴浓度Mg掺杂InGaN外延材料性能的研究

采用金属有机物化学气相沉积方法生长得到具有不同Mg掺杂浓度In_xGa_1-xN (0≤x≤0.3)外延材料样品. 对样品的电学特性和光学特性进行了系统的研究. 研究发现：在固定Mg掺杂浓度下，随In组分的提高，样品空穴浓度显著提高,最高达2.4×10¹⁹cm^-3,Mg的活化效率提高了近两个数量级；通过对Mg掺杂InGaN(InGaN：Mg)样品的光致发光(PL)谱的分析，解释了InGaN：Mg样品的载流子跃迁机理，并确定了样品中Mg受主激活能和深施主能级的位置. 关键词： Mg掺杂InGaN 高空穴浓度 光致发光 金属有机物化学气相沉积     

Emission and elastic strain in InAs dot-in-a well InGaAs/GaAs structures

The paper presents the photoluminescence (PL) study of InAs quantum dots (QDs) embedded in the asymmetric GaAs/In_xGa_1?xAs/In_0.15Ga_0.85As/GaAs quantum wells (QWs) with the different compositions of capping In_xGa_1?xAs layers. The composition of the buffer In_0.15Ga_0.85As layer was the same in all studied QD structures, but the In content (parameter x) in the capping In_xGa_1?xAs layers varied within the range 0.10–0.25. The In concentration (x) increase in the In_xGa_1?xAs capping layers is accompanied by the variation non-monotonously of InAs QD emission: PL intensity and peak positions. To understand the reasons of PL variation, the PL temperature dependences and X ray diffraction (XRD) have been investigated. It was revealed that the level of elastic deformation (elastic strain) and the Ga/In interdiffusion at the In_xGa_1?xAs/InAs QD interface are characterized by the non-monotonous dependences versus parameter x. The physical reasons for the non-monotonous variation of the elastic strains and PL parameters in studied QD structures have been discussed.     

Band gaps and charge distribution in quasi-binary (GaSb) (InAs) crystals

Pseudopotential investigation of energy band gaps and charge distribution in quasi-binary (GaSb)_1-x(InAs)_x crystals has been reported. To the best of our knowledge, there had been no reported theoretical work on these materials. In agreement with experiment, the quasi-binary crystals of interest showed a significant narrowing of the optical band gap compared to the conventional Ga_xIn_1-xAs_ySb_1-y quaternary alloys (with x = 1 - y). Moreover, the absorption at the optical gaps indicated that (GaSb)_1-x(InAs)_x is a direct Γ to Γ band-gap semiconductor within a whole range of the x composition. The information derived from the present study predicts that the band gaps cross very important technological spectral regions and could be useful for thermophotovoltaic applications. Received 30 August 2002 Published online 1st April 2003 RID="a" ID="a"Present address: Physics Department, University of M'sila, 28000 M'sila, Algeria e-mail: N_Bouarissa@yahoo.fr     

Different temperature dependence of carrier transport properties between AlxGa1-xN/InyGa1-yN/GaN and AlxGa1-xN/GaN heterostructures

The temperature dependence of carrier transport properties of AlxGa1-xN/InyGa1-yN/GaN and AlxGa1-xN/GaN heterostructures has been investigated.It is shown that the Hall mobility in Al0.25Ga0.75N/In0.03Ga0.97N/GaN heterostructures is higher than that in Al0.25Ga0.75N/GaN heterostructures at temperatures above 500 K,even the mobility in the former is much lower than that in the latter at 300 K.More importantly,the electron sheet density in Al0.25Ga0.75N/In0.03Ga0.97N/GaN heterostructures decreases slightly,whereas the electron sheet density in Al0.25Ga0.75N/GaN heterostructures gradually increases with increasing temperature above 500 K.It is believed that an electron depletion layer is formed due to the negative polarization charges at the InyGa1-yN/GaN heterointerface induced by the compressive strain in the InyGa1-yN channel,which e-ectively suppresses the parallel conductivity originating from the thermal excitation in the underlying GaN layer at high temperatures.     

谱导数法在光谱研究GaInAs/InP和GaInP/AlGaInP多量子阱中的应用

在简要讨论谱导数法物理机理的基础上, 给出了其在光吸收谱和光反射谱方法研究张应变GaInAs/InP和GaInP/AlGaInP多量子阱中的成功应用实例. 比较了不同阶谱导数对测定激子跃 迁能量的影响，论及了其与双调制谱方法、曲线拟合方法的区别. 指出了谱导数法在光谱研 究GaInAs/InP和GaInP/AlGaInP多量子阱中的重要性和易行性. 关键词： 谱导数法 吸收谱 反射谱 多量子阱 激子     

Effect of compressive and tensile stresses in GaMnAs layers on their magnetic properties

The effect of elastic stresses (compressive, tensile) on the magnetic properties of epitaxial GaMnAs layers prepared by laser deposition of solid-state targets in a gas atmosphere on different buffer sublayers (In _x Ga_{1 − x} As and In _x Ga_{1 − x} P) and substrates (GaAs, InP) has been investigated. It has been established from the investigations of magnetic-field dependences of the Hall resistance that all layers exhibit ferromagnetic properties with the Curie temperature ∼50 K. It has been shown that, in the case of tensile stresses in GaMnAs layers (In _x Ga_{1 − x} As and In _x Ga_{1 − x} P buffers and InP substrate), the anomalous Hall effect shape demonstrates a predominant orientation of the easy-magnetization axis in the growth direction, unlike the GaMnAs layers prepared on a GaAs substrate (with compressive stresses), which demonstrate the predominance of the component of the magnetization vector in the layer plane.     

Effects of InGaN barriers with low indium content on internal quantum efficiency of blue InGaN multiple quantum wells

Blue In_0.2Ga_0.8N multiple quantum wells (MQWs) with In_xGa_{1 - x}N (x=0.01-0.04) barriers are grown by metal organic vapour phase epitaxy. The internal quantum efficiencies (IQEs) of these MQWs are studied in a way of temperature-dependent photoluminescence spectra. Furthermore, a 2-channel Arrhenius model is used to analyse the nonradiative recombination centres (NRCs). It is found that by adopting the InGaN barrier beneath the lowest well, it is possible to reduce the strain hence the NRCs in InGaN MQWs. By optimizing the thickness and the indium content of the InGaN barriers, the IQEs of InGaN/InGaN MQWs can be increased by about 2.5 times compared with conventional InGaN/GaN MQWs. On the other hand, the incorporation of indium atoms into the intermediate barriers between adjacent wells does not improve IQE obviously. In addition, the indium content of the intermediate barriers should match with that of the lowest barrier to avoid relaxation.     

High pressure electrical resistivity studies on Ga-Te glasses

Abstract

Bulk, semiconducting Ga_xTe_100-x (17 ≤ x ≤ 25) glasses are prepared by the meltingh quenching method and electrical resistivity measurements are carried out at high pressures up to 8 GPa and low temperatures down to 77 K in a Bridgman anvil system. It is found that all the Ga_xTe_100-x, glasses exhibit metallization under pressure, with a continuous decrease in electrical resistivity and activation energy for conduction. Further, the high pressure metallic phases of Ga_xTe_100-x samples are found to be crystalline.     

Equilibrium critical thickness for a wurtzite InGaN/GaN heterostructure

We present a finite element model to simulate a combined strained In_xGa_1−xN/GaN heterostructure and an edge misfit dislocation on the basal {0001} slip plane, taking the anisotropic elasticity into account. The introduction of a misfit dislocation partially relaxes the misfit strain. The model directly gives the residual strain, which is the exact strain field stored in the system after relaxation. The critical thickness is then determined based on an overall energy minimization approach including the dislocation core contribution. Compared with the results from other methods and available experimental data, our approach is appropriate for describing the critical thickness of the wurtzite InGaN/GaN material system.