Wavelength Sweep Interferometry for Measuring the Refractive Index and Physical Thickness

1　Ｉｎｔｒｏｄｕｃｔｉｏｎ　　Ｉｎｕｓｕａｌｏｐｔｉｃａｌｒａｎｇｉｎｇｔｅｃｈｎｉｑｕｅｓ,ｓｕｃｈａｓｌｏｗ ｃｏｈｅｒｅｎｃｅｉｎｔｅｒｆｅｒｏｍｅｔｒｙ (ＬＣＩ) [1] ,ｃｏｎｆｏｃａｌｍｉｃｒｏｓｃｏｐｙ[2 ] ,ａｎｄｓｏｏｎ ,ｔｈｅｍｅａｓｕｒａｂｌｅｄｉｓｐｌａｃｅｍｅｎｔｏｒｄｉｓｔａｎｃｅｉｓｊｕｓｔｃａｌｃｕｌａｔｅｄｆｒｏｍｔｈｅｉｎｔｅｒｆｅｒｅｎｃｅｓｉｇｎａｌ,ｗｈｉｃｈｏｎｌｙｇｉｖｅｓｔｈｅｏｐｔｉｃａｌｐａｔｈｌｅｎｇｔｈ ,ｔｈｅｐｒｏｄｕｃｔｏｆｔｈｅｒｅｆｒａｃｔ…     

BK7玻璃保护层掺钕磷酸盐玻璃波导特性

实验研究了基于KNO3稀释AgNO3混合熔盐离子交换法制备的镀有BK7玻璃保护层的N31型掺钕磷酸玻璃平面波导。采用棱镜耦合技术测试了其波导的有效折射率,应用IWBK方法拟合了其折射率分布。实验结果表明:在一定的扩散时间(5～7h)和交换温度(360～380℃)范围内,KNO3与AgNO3混合熔盐比对波导制备的影响起主导作用,引起的表面折射率的变化可达到0.025;BK7玻璃保护层对热离子交换掺钕磷酸盐玻璃表面起到了很好的保护作用,获得了良好的导模传输特性,其光传输损耗约为0.9dB/cm。     

A new method for measuring refractive index and thickness of liquid and deposited solid thin films

We discuss theoretically a new method to determine the refractive index and the thickness of thin films using them as leaky waveguides. It is shown that the refractive index and the thickness can be determined easily by measuring the propagation constants of two leaky modes of this waveguide by means of synchronous angles. Experimentally we measured the refractive index of 1-bromonaphthalene and methylene iodide. This method is not restricted to special liquid and solid materials.     

一种双段多层长周期光纤光栅光谱特性研究

长周期光纤光栅(LPFG)传感器具有非常广泛的应用价值,而有效解决物理量交叉敏感问题是其实用化的关键。基于LPFG对包层外介质折射率和厚度的敏感性,提出一种双段多层折射率横向分布结构的新型LPFG传感器的设计,并利用耦合模理论和传输矩阵方法分析了镀膜材料折射率、膜层厚度和镀层长度对新型LPFG传感器光谱特性的影响。软件仿真结果证明,这种LPFG由于结构设计上的特殊性,将使LPFG的谐振峰发生分裂,即一个透射峰分裂为两个。由于两个分裂峰对应力和温度的灵敏度不同,利用该结构的LPFG作为传感器,可以实现温度、应力等物理量的同步测量,从而解决LPFG传感器的交叉敏感问题。     

Accuracy design of ultra-low residual reflection coatings for laser optics

Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.     

Optical properties and structures of silver thin films deposited by magnetron sputtering with different thicknesses

A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness.Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.     

Graded Index 532HR/1064HT Filter by Glancing Angle Deposition

Glancing angle deposition is a novel method to prepare graded index coatings. By using this method and physical vapour deposition, ZrO2 is used to engineer graded index filter on BK7 glass substrate. Controlling the deposition rate and the periodic oscillation of oblique angle of deposited material, a 10-period graded index ZrO2 filter with high reflection near 532nm and high transmittance at wavelength 1064nm is fabricated. The causes of difference between the theoretical and experimental results are discussed in detail. The material properties and electron gun nonlinearity are possibly the main origins of the difference, which result in the variations in both thickness control and deposition rate of the film material.     

Random thickness errors-effect on reflectance of multilayer

In this paper the effect of thickness errors on the reflectance of multilayer is investigated. Using the matrix method, we deduced an expression for describing the dependence of reflectance on the film thickness errors. It is found that the degree of the thickness error-effect is affected by the ratio of low refractive index with high refractive index and the number of layer of multilayer. The computer simulations show that the degree of this effect is very small when the ratio is small and the number of layer is large. The thickness error hardly influences the reflectance of short-wave multilayer.     

Properties of Defect Modes in Periodic Lossy Multilayer with Negative-Index-Materials

Employing the characteristic matrix method, this study investigates transmission properties of onedimensional defective lossy photonic crystals composed of negative and positive refractive index layers with one lossless defect layer at the center of the crystal. The results of the study show that as the refractive index and thickness of the defect layer increase, the frequency of the defect mode decreases. In addition, the study shows that the frequency of the defect mode is sensitive to the incidence angle, polarization, and physical properties of the defect layer, but it is insensitive to the small lattice loss factor. The peak of the defect mode is very sensitive to the loss factor, incidence angle, polarization, refractive index, and thickness of the defect layer. This study also shows that the peak and the width of the defect mode are affected by the numbers of the lattice period and the loss factor. The results can lead to designing new types of narrow filter structures and other optical devices.     

K+-Na+二次离子交换制作玻璃波导

通过数值计算模拟了K⁺Na⁺二次扩散玻璃波导的折射率轮廓,阐述了利用K⁺Na⁺二次离子交换的方法,在BK7玻璃上制作波导的过程,分析了极化率不同的扩散离子对的选择对波导有效折射率变化的影响,以及扩散平衡时体积变化对表面折射率的影响,描述了扩散引起的波导内部诱导应力变化设计了测试波导损耗以及波导表面折射率改变的实验装置,对尺寸10mm×10mm×1.5mm和10mm×5mm×1.5mm两组BK7玻璃基片上的玻璃波导进行了测试,测试结果与理论吻合较好.     

基底温度对电子束蒸发制备氧化铝薄膜的影响

为了考察基底温度对氧化铝薄膜折射率以及沉积厚度的影响情况,在不同基底温度环境下,通过离子辅助电子束蒸发方式,在玻璃基底上制备了同一Tooling因子条件下所监测到相同厚度的Al2O3薄膜,利用分光光度计测量光谱透过率,依据光学薄膜相关理论,计算了基底温度在25℃～300℃范围内获得的膜层实际物理厚度为275.611 nm～348.447 nm,以及膜层折射率的变化。通过对实验结果的数值计算和曲线模拟,给出了基底温度对于薄膜的折射率和实际厚度的影响情况。     

提拉法SiO_2化学膜厚度与折射率的变化规律研究

采用提拉法在硅基底上制备了多孔溶胶凝胶SiO2膜,用椭偏法测量薄膜的厚度与折射率,考察了提拉速度和胶体浓度对膜层厚度与折射率的影响。对厚度与提拉速度的关系进行线性与幂函数拟合,并比较分析两种拟合的关系及其对工艺流程的作用。比较了不同浓度胶体所得到的同一厚度薄膜的折射率变化规律。结果表明:对于同一胶体浓度下薄膜厚度与提拉速度的正相关关系,线性拟合相比幂函数拟合可以更好地解释实验结果的规律性。同时,折射率在一定范围内也会随着提拉速度的增加而减小。镀同一厚度膜时,浓度大的胶体膜层折射率大。通过对提拉速度和胶体浓度的控制可以得到理想的薄膜厚度与折射率。     

Dual-confocal fiber-optic method for absolute measurement of refractive index and thickness of optically transparent media

We present a novel noncontact optical method for absolute measurement of refractive index and thickness of optically transparent media. The method is based on a simple dual-confocal fiber-optic sensor design. It includes two independent confocal channels consisting of two identical apertureless fiber-optic-type confocal microscopes constructed by use of a single 2x2 fiber coupler. A geometrical-ray model is used to obtain the analytical dependence between the sample's refractive index and its thickness. The measurement method provides high accuracy in spatially locating the specific imaging points that correspond to the backreflected intensity peaks of the confocal responses. Thus, a simultaneous measurement of the sample refractive index and thickness is achieved.     

非线性光栅的自适应光限幅

首次采用液晶为自聚焦媒质,夹在内表面刻有光栅的两玻璃片间,以Ar离子激光514.5nm波长的激光束垂直入射到光栅上,实验验证了该光栅的自适应光限幅特征。     

基于时间控厚离子束溅射技术的宽带减反膜制备

 为了制备满足设计要求的宽角度、宽波段减反膜,利用离子束溅射沉积技术,在时间-功率控厚的模式下,对膜层沉积速率进行了精确修正。在实验中,利用时间-功率控厚的离子束溅射沉积技术,选择HfO₂和SiO₂作为高低折射率组合,在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜,通过对实验后的透过率光谱曲线的数值反演计算,获得膜层厚度修正系数,初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系,在0°~30°入射角度下,600~1 200 nm波段的平均透过率达到99%以上。     

射频磁控反应溅射氮氧化硅薄膜的研究

利用SiOxNy薄膜光学常数随化学计量比连续变化的特性,给出了制备折射率连续可调的SiOxNy薄膜的实验条件。用磁控反应溅射法制备了不同氮氧比的SiOxNy薄膜。研究了不同气流比率条件下薄膜光学常数、化学成分及溅射速率等的变化。用UV-VIS光谱仪测试了透射率曲线,利用改进的单纯型法拟合透射率曲线计算得到了折射率和消光系数。测试了红外傅立叶光谱(FTIR)曲线和X光光电子能谱(XPS)分析了薄膜成分的变化。实验表明薄膜特性与N2／O2流量比率密切相关,通过控制总压和改变气体流量比可控制SiOxNy薄膜的折射率n从1．92到1．46连续变化,应用Wemple-DiDomenico模型计算出光子带隙在6．5eV到5eV之间单调变化。     

光谱型椭偏仪对各向异性液晶层的测量

探讨了利用普通光谱型椭偏仪对各向异性液晶层进行综合性测量的可行性. 并利用法国Jobin Yvon公司的UVISEL SPME(Spectroscopic Phase Modulated Ellipsometer)光谱型椭偏仪测量了光学各向异性液晶层的折射率n_o和n_e及液晶层厚d，进一步利用椭偏仪在透射方式下测量了平行排列液晶层的光延迟特性Δnd，二者取得了很好的一致性，说明利用光谱型椭偏仪可以实现对光学单轴性液晶层及其他材料的测量，测厚精度为纳米量级. 关键词： 光谱型椭偏仪 各向异性 折射率 相位延迟     

光波导技术同步测量棱镜及波导薄膜参数

依据全反射理论和棱镜耦合原理,实现了对棱镜折射率及波导薄膜材料折射率和厚度的同步测量。使用高准直半导体激光器激光入射到棱镜内部与波导膜的分界面上,逐步旋转棱镜或改变棱镜的入射角,得到棱镜耦合M线,曲线前面几组的波谷为波导模激发,在M线左侧收尾处有一个不完整波峰,其反射光强随入射角迅速衰减,为全反射时的临界点,由此可实现棱镜及波导薄膜参数的同步测量;用此法测量了棱镜耦合一体化平面波导棱镜的折射率和聚甲基丙烯酸甲酯(PMMA)聚合物波导薄膜的折射率和厚度。测量棱镜折射率精度为±1.9×10-4,波导薄膜折射率和厚度的精度分别为±6.2×10-4 μm和±1.6×10-2 μm。     

周期结构薄膜在折射率色散下反射区特性研究

周期性结构是光学薄膜设计的基本物理模型,给出了反射区中心波长的一般性条件,研究了在膜层材料存在折射率色散情况下,等厚周期结构和非等厚周期结构的薄膜反射区中心波长与带宽特性.研究结果表明:在等厚和非等厚周期结构中,考虑膜层材料折射率色散与忽略色散情况相比,中心波长向长波方向移动,反射级次与相对波数的线性关系偏离;在薄膜光学厚度一定的非等厚周期结构中,高折射率层光学厚度大于低折射率层时,反射级次与相对波数的线性关系偏离度高;非等厚周期结构薄膜的带宽在低反射级次上小于等厚周期结构,同时膜层的色散对反射带宽影响不大.     

Enhanced Coupling of Light from Organic Electroluminescent Device Using Diffusive Particle Dispersed High Refractive Index Resin Substrate

To improve light extraction from organic electroluminescent (EL) devices, we introduced a diffusive substrate with 25 μm thickness consisting of high refractive index resin and scattering particles. It is expected that the diffusive substrate with high refractive index matrix converts the waveguided emission into external emission from both glass substrate and indium-tin-oxide/organic layer. We used the ray tracing method to optimize the scattering effect and to verify the coupling out effect of the diffusive high refractive index substrate. With the use of the ray tracing calculation, an increase in the external emission up to a factor of 2.7 was expected compared to use of a common glass substrate. Experimentally, the coupling out effect of the diffusive high refractive index substrate strongly depended on the thickness of electron transporting layer (ETL) due to the well-known interference effect. The current efficiency increased by a factor of 1.3 for an organic EL device with a 60-nm-thick ETL and by a factor of 6.8 for one with a 120-nm-thick ETL.