| 提拉法SiO_2化学膜厚度与折射率的变化规律研究 |
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| 引用本文： | 张日东,严鸿维,吕海兵,张尽力,晏良宏,赵松楠,王韬,雷洁红.提拉法SiO_2化学膜厚度与折射率的变化规律研究[J].强激光与粒子束,2014,26(7):072005. |
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| 作者姓名： | 张日东 严鸿维 吕海兵 张尽力 晏良宏 赵松楠 王韬 雷洁红 |
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| 作者单位： | 1.西华师范大学 物理与电子信息学院, 四川 南充 637009; |
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| 基金项目： | 核废物与环境安全国防重点实验室开放基金项目(10zxnk07); 四川省教育厅自然科学青年项目(11ZB033) |
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| 摘 要： | 采用提拉法在硅基底上制备了多孔溶胶凝胶SiO2膜,用椭偏法测量薄膜的厚度与折射率,考察了提拉速度和胶体浓度对膜层厚度与折射率的影响。对厚度与提拉速度的关系进行线性与幂函数拟合,并比较分析两种拟合的关系及其对工艺流程的作用。比较了不同浓度胶体所得到的同一厚度薄膜的折射率变化规律。结果表明:对于同一胶体浓度下薄膜厚度与提拉速度的正相关关系,线性拟合相比幂函数拟合可以更好地解释实验结果的规律性。同时,折射率在一定范围内也会随着提拉速度的增加而减小。镀同一厚度膜时,浓度大的胶体膜层折射率大。通过对提拉速度和胶体浓度的控制可以得到理想的薄膜厚度与折射率。
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| 关 键 词： | 提拉法 SiO2膜 薄膜厚度 折射率 |
| 收稿时间： | 2013/9/25 |
Changes of thickness and refractive index of silica sol-gel film by dip coating process |
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| Affiliation: | 1.Physics and Electronic Information Institute,China West Normal University,Nanchong 637009,China;2.Research Center of Laser Fusion,CAEP,P.O.Box 919-988,Mianyang 621900,China |
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| Abstract: | The porous sol-gel silica film was prepared on silicon substrate by the dip coating process. Coating thickness and refractive index were measured by ellipsometry method. Influence of withdrawal speed and concentration of silica was investigated for the thickness and refractive index of silica. The relation of the thickness and withdrawal speed was fitted by the linear and power functions, and the results were analyzed and compared. It was found that the film thickness increased with the withdrawal speed for the same colloid concentration. Linear relation between film thickness and withdrawal speed was better than power function relation for describing the experiment data. The refractive index of the film decreased with the withdrawal speed. For the same thickness, the refractive index of the film increased with the concentration of silica. The experimental results indicated that the thickness and refractive index of the film can be controlled by changing the withdrawal speed and concentration of silica. |
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| Keywords: | dip coating process silica film thickness refractive index |
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