微波等离子体化学气相沉积方法在Si衬底上生长SiC纳米线

应用微波等离子体化学气相沉积方法,在单晶Si(100)衬底上生长出SiC纳米线.应用扫描电子显微镜、透射电子显微镜、能量损失谱(EDS)和选区电子衍射(SAD)等方法对纳米线化学组成和结构进行了分析和表征.给出该纳米线的生长机理 关键词： 微波等离子体化学气相沉积 SiC纳米线 生长机理     

等离子体增强化学气相沉积法实现硅纳米线掺硼

用等离子体增强化学气相沉积(PECVD)方法成功实现硅纳米线的掺B.选用Si片作衬底，硅烷 （SiH4）作硅源，硼烷（B2H6）作掺杂气体， Au作催化剂，生长温度440℃.基于气-液-固(VLS)机制，探讨了掺B硅纳米线可能的生长机制.PECVD法化学成分配比更灵活，更容易实现纳米线掺杂，进一步有望生长硅纳米线pn结，为研制纳米量级器件提供技术基础. 关键词： 硅纳米线 化学气相沉积 纳米器件     

不同气氛下SiOx纳米线的制备及形貌、红外、光致发光研究

以N2/H2、N2或NH3为载气,利用碳辅助化学气相沉积法,常压1140℃下在石英衬底上制备了大量直径为20-300 nm,长数百微米的非晶SiOx纳米线.制备得到的纳米线具有高度定向生长的特性.利用透射电子显微镜、扫描电子显微镜及电子能谱对SiOx纳米线的形貌及组分进行了分析,Si与O原子之比为1∶1.8.傅里叶红外吸收谱显示了非晶氧化硅的三个特征峰(482,806和1095 cm-1)及1132 cm-1无序氧化硅结构的强吸收峰.SiOx纳米线光致发光光谱(PL)在440 nm(2.83 eV)处具有较强的荧光峰;N2为载气生长的SiOx纳米线的PL峰强比NH3为载气生长的SiOx纳米线峰强大四个数量级.     

Si衬底上InP纳米线的晶体结构和光学性质

采用金属有机化学气相沉积技术,利用自催化法,在Si(100)、(111)衬底上成功生长了InP纳米线。利用扫描电镜观察样品表面,在Si(100)、(111)衬底上生长的纳米线形貌相似,纳米线面密度不同。利用X射线衍射和透射电镜研究纳米线的生长取向和晶体结构,结果显示纳米线具有闪锌矿结构,生长方向〈111〉,并且具有层状孪晶结构。与InP体材料相比,纳米线的光致发光峰位蓝移,半峰全宽增大,拉曼散射TO和LO峰向低波数频移,频移随激发光功率减弱而减小。     

ZnO纳米线的合成与生长机理

采用化学气相沉积系统制备ZnO纳米线,以覆盖一层约5nm厚的Ag薄膜的单晶Si(001)为衬底,纳米线的生长遵循气-液-固(VLS)机理。对得到的样品采用X射线衍射(XRD)和扫描电镜(SEM)进行晶体结构和形貌的表征。XRD结果表明衬底温度在600~700℃时生长的ZnO纳米线具有六方结构和统一的取向。通过扫描电子显微镜分析,比较了生长温度对纳米线直径和长度的影响。实验表明我们可以通过催化剂和温度来实现ZnO纳米线生长的可控。与传统的VLS生长方式不同的是在我们制备的ZnO纳米线顶端并没有看到催化剂颗粒,表明纳米线的生长方式是底部生长,我们对其生长机理进行了研究。     

掺AlZnO纳米线阵列的光致发光特性研究

采用化学气相沉积方法，以金做催化剂，在Si (100)衬底上制备了掺AlZnO纳米线阵列.扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在30nm左右.X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰，说明ZnO纳米线沿c轴择优取向.掺AlZnO纳米线阵列的室温光致发光(PL)谱中出现了3个带边激子发射峰：373nm，375nm，389nm.运用激子理论推算出掺AlZnO纳米线的禁带宽度为3.343eV ，束缚激子结合能为0.156eV；纯ZnO纳米线阵列PL谱中3个带边激子发射 关键词： 光致发光 化学气相沉积(CVD) 激子 ZnO纳米线阵列     

不同气氛下SiOx纳米线的制备及形貌、红外、光致发光研究

以N₂/H₂、N₂或NH₃为载气,利用碳辅助化学气相沉积法,常压1140℃下在石英衬底上制备了大量直径为20—300 nm,长数百微米的非晶SiO_x纳米线.制备得到的纳米线具有高度定向生长的特性.利用透射电子显微镜、扫描电子显微镜及电子能谱对SiO_x纳米线的形貌及组分进行了分析,Si与O原子之比为1∶18.傅里叶红外吸收谱显示了非晶氧化硅的三个特征峰（482,806和1095 cm^-1）及1132 cm^-1无序氧化硅结构的强吸收峰.SiO_x纳米线光致发光光谱（PL）在440 nm（283 eV）处具有较强的荧光峰;N₂为载气生长的SiO_x纳米线的PL峰强比NH₃为载气生长的SiO_x纳米线峰强大四个数量级. 关键词： x纳米线')" href="#">SiO_x纳米线 碳辅助化学气相沉积法 傅里叶红外吸收 光致发光     

化学气相沉积法制备GaN纳米结构设计性实验

在无催化剂辅助条件下,采用化学气相沉积法生长了GaN纳米线.通过调整衬底、NH3气流、生长时间等,实现了半导体GaN纳米线的生长以及形貌调控.用X射线衍射仪和扫描电子显微镜对产物的物相及形貌进行了表征.获得了合成GaN纳米线的优化条件.     

低温CVD法在玻璃衬底上制备ZnO纳米线阵列

采用化学气相沉积(CVD)法在镀Cr(20nm)的玻璃衬底上,低温制备了ZnO纳米线阵列。利用扫描电子显微镜(SEM)和X射线衍射(XRD)对样品的表面形貌和微结构进行了分析表征。结果表明:源分解温度1350℃,衬底温度450～500℃,氩气流量为35sccm时,ZnO纳米线在玻璃衬底上呈现有序生长;XRD谱图中只观测到ZnO(002)衍射峰。表明制备的纳米线阵列具有高度c轴择优取向生长特性和较高的结晶质量。     

衬底位置对化学气相沉积法制备的磷掺杂p型ZnO纳米材料形貌和特性的影响

采用化学气相沉积方法,在无催化剂的条件下,通过改变衬底位置在Si(100)衬底上制备出了高取向的磷掺杂ZnO纳米线和纳米钉.测试结果表明,当衬底位于反应源上方1.5 cm处时,所制备的样品为钉状结构,而当衬底位于反应源下方1 cm处时样品为线状结构.对不同形貌磷掺杂ZnO纳米结构的生长机理进行了研究.此外,在ZnO纳米结构的低温光致发光谱中观测到了一系列与磷掺杂相关的受主发光峰.还对磷掺杂ZnO纳米结构/n-Si异质结I-V曲线进行了测试,结果表明,该器件具有良好的整流特性,纳米线和纳米钉异质结器件的开启电压分别为4.8和3.2 V.     

Well-aligned ZnO nanowires grown on Si substrate via metal–organic chemical vapor deposition

ZnO nanowires were grown on silicon substrate by metal–organic chemical vapor deposition (MOCVD) without catalysts. The scanning electron microscopy (SEM) observations along with X-ray diffraction (XRD) results suggest that the ZnO nanowires are single crystals vertically well-aligned to silicon substrate. Room-temperature photoluminescence (PL) measurement reveals strong UV emission and weak green emission, which demonstrates that the nanowires are of good optical properties. The mechanism of the catalyst-free growth of ZnO nanowires on silicon substrate is proposed.     

高取向As掺杂ZnO纳米线阵列的制备与表征

在不采用任何金属催化剂的条件下,运用化学气相沉积法,在Si(100)衬底上制备出高取向的As掺杂ZnO纳米线阵列.样品的X射线衍射(XRD)谱显示获得了单一取向的衍射峰,表明样品具有较好的结晶质量.场发射扫描电镜(FE-SEM)观察表明,As掺杂ZnO纳米线阵列具有均一的直径和长度,其顶部和根部直径分别为70 nm和1...     

Tribological characteristics of ZnO nanowires investigated by atomic force microscope

Zinc oxide (ZnO) nanowires have attracted great interest in nanodevices. In this work, the tribological characteristics of vertically grown ZnO nanowires obtained by metalorganic chemical vapor deposition were investigated by using an atomic force microscope (AFM). The ZnO nanowires were slid against flattened silicon and diamond-coated AFM probes under 50–150 nN normal force while monitoring the frictional force. The wear of the ZnO nanowires was observed by a scanning electron microscope and quantified based on Archard’s wear law. Also, the wear debris accumulated on the silicon probe was analyzed by using a transmission electron microscope (TEM). The results showed that the wear of ZnO nanowires slid against the silicon probe was extremely small. However, when the ZnO nanowires were slid against the diamond-coated probe, the wear coefficients ranged from 0.006 to 0.162, which correspond to the range of severe wear at the macroscale. It was also shown that the friction coefficient decreased from 0.30 to 0.25 as the sliding cycles increased. From TEM observation, it was found that the ZnO wear debris was mainly amorphous in structure. Also, crystalline ZnO nanoparticles were observed among the wear debris. PACS  07.79.Lh; 46.55.+d; 81.07.Bc     

Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating

This paper describes our finding that optical properties of semiconductor nanowires were modified by depositing a thin layer of metal oxide. Indium phosphide nanowires were grown by metal organic chemical vapor deposition on silicon substrates with gold catalyst resulting in three‐dimensional nanowire networks, and optical properties were obtained from the collective nanowire networks. The networks were coated with an aluminum oxide thin film deposited by plasma‐enhanced atomic layer deposition. We studied the dependence of the peak wavelength of photoluminescence spectra on the thickness of the oxide coatings. A continuous blue shift in photoluminescence spectra was observed when the thickness of the oxide coating was increased. The observed blue shift is attributed to the Burstein–Moss effect due to increased carrier concentration in the nanowire cores caused by repulsion from intrinsic negative fixed charges located at the inner oxide surface. Samples were further characterized by scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, and selective area diffractometry to better understand the physical mechanisms for the blue shift. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Long Si nanowires with millimeter-scale length by modified thermal evaporation from Si powder

A modified thermal evaporation processing is reported to fabricate silicon nanowires starting from Si powder under normal pressure. In a temperature range of 1250–1290 °C, long single-crystal Si nanowires with an amorphous layer were grown in relative large quantity, and they had a millimeter-scale length and a uniform diameter of about 100 nm. A high-resolution transmission electron microscopy image indicated that the growing direction of the long Si nanowires is [111]. PACS 81.07.Bc     

Epitaxial growth of zinc oxide by the method of atomic layer deposition on SiC/Si substrates

For the first time, zinc oxide epitaxial films on silicon were grown by the method of atomic layer deposition at a temperature T = 250°C. In order to avoid a chemical reaction between silicon and zinc oxide (at the growth temperature, the rate constant of the reaction is of the order of 10²²), a high-quality silicon carbide buffer layer with a thickness of ~50 nm was preliminarily synthesized by the chemical substitution of atoms on the silicon surface. The zinc oxide films were grown on n- and p-type Si(100) wafers. The ellipsometric, Raman, electron diffraction, and trace element analyses showed that the ZnO films are epitaxial.     

Field-emission enhancement of molybdenum oxide nanowires with nanoprotrusions

The field-emission properties of molybdenum oxide nanowires grown on a silicon substrate and its emission performance in various vacuum gaps are reported in this article. A new kind of molybdenum oxides named nanowires with nanoscale protrusions on their surfaces were grown by thermal vapor deposition with a length of ~1 μm and an average diameter of ~50 nm. The morphology, structure, composition and chemical states of the prepared nanostructures were characterized by scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). According to XRD, XPS, and TEM analyses, the synthesized samples were composed of MoO₂ nanowires formed over a thin layer of crystalline Mo₄O₁₁. TEM observation revealed that these nanowires have some nanoscale protrusion on their surface. These nanoprotrusions resulted in enhancement of field-emission properties of nanowires comprising nanoprotrusions. The turn-on emission field and the enhancement factor of this type of nanostructures were measured 0.2 V/μm and 42991 at the vacuum gap of 300 μm, respectively. These excellent emission properties are attributed to the special structure of the nanowires that have potential for utilizing in vacuum nanoelectronic and microelectronic applications.     

Y掺杂Si纳米线的光致发光特性

以n型单晶Si(111)为衬底,利用Au作为催化剂,在温度、N₂流量和生长时间分别为1 100 ℃,1.5 L·min-1和60 min的条件下,基于固-液-固生长机制,生长了直径为60～80 nm、长度为数十微米的高密度Si纳米线。随后,以Y₂O₃粉末为掺杂源,采用高温扩散方法对Si纳米线进行了钇(Y)掺杂。利用扫描电子显微镜、X射线衍射仪和荧光分光光度计对不同掺杂温度(900～1 200 ℃)、掺杂时间(15～60 min)和N₂流量(0～400 sccm)等工艺条件下制备的Y掺杂Si纳米线的形貌、成分、结晶取向以及激发光谱和发射光谱特性进行了详细的测量和表征。结果表明,在掺杂温度为1 100 ℃,N₂流量为200 sccm、掺杂时间为30 min和激发波长为214 nm时,Y掺杂Si纳米线样品表现出较好的发光特性。样品分别在470～500和560～600 nm范围内出现了两条发光谱带。560～600 nm的发光带由两个发光峰组成,峰位分别为573.6和583.8 nm,通过结构分析可以推测,这两个发光峰是由Y3+在Si纳米线的带隙中引入的杂质能级引起的。而470～500 nm较宽的发光带同样来源于Y离子在Si纳米线带隙中引入的与非晶SiO_x壳层中氧空位能级十分接近的杂质能级。