Structure and photoluminescence properties of ZnS films grown on porous Si substrates

ZnS films were deposited on porous silicon (PS) substrates with different porosities. With the increase of PS substrate porosity, the XRD diffraction peak intensity decreases and the surface morphology of the ZnS films becomes rougher. Voids appear in the films, due to the increased roughness of PS structure. The photoluminescence (PL) spectra of the samples before and after deposition of ZnS were measured to study the effect of substrate porosity on the luminescence properties of ZnS/PS composites. As-prepared PS substrates emit strong red light. The red PL peak of PS after deposition of ZnS shows an obvious blueshift. As PS substrate porosity increases, the trend of blueshift increases. A green emission at about 550 nm was also observed when the porosity of PS increased, which is ascribed to the defect-center luminescence of ZnS. The effect of annealing time on the structural and luminescence properties of ZnS/PS composites were also studied. With the increase of annealing time, the XRD diffraction peak intensity and the self-activated luminescence intensity of ZnS increase, and, the surface morphology of the ZnS films becomes smooth and compact. However, the red emission intensity of PS decreases, which was associated with a redshift. White light emission was obtained by combining the luminescence of ZnS with the luminescence of PS.     

The effect of PS porosity on the structure,optical and electrical properties of ZnS/PS

ZnS films were deposited on porous silicon (PS) substrates with different porosities by pulsed laser deposition (PLD). The crystalline structure, surface morphology of ZnS films on PS substrates and optical, electrical properties of ZnS/PS composites were studied. The results show that, ZnS films deposited on PS substrates were grown in preferred orientation along β-ZnS (111) direction corresponding to crystalline structure of cubic phase. With the increase of PS porosity, the XRD diffraction peak intensity of ZnS films decreases. Some voids and cracks appear in the films. Compared with as-prepared PS, the PL peak of PS for ZnS/PS has a blueshift. The larger the porosity of PS, the greater the blueshift is. A new green light emission located around 550 nm is observed with increasing PS porosity, which is ascribed to defect-center luminescence of ZnS. The blue, green emission of ZnS combined with the red emission of PS, a broad photoluminescence band (450–750 nm) is formed. ZnS/PS composites exhibited intense white light emission. The I–V characteristics of ZnS/PS heterojunctions showed rectifying behavior. Under forward bias conditions, the current density is large. Under reverse bias conditions, the current density nearly to be zero. The forward current increases with increasing PS porosity. This work lay a foundation for the realization of electroluminescence of ZnS/PS and solid white light emission devices.     

The effect of annealing on structural,optical and electrical properties of ZnS/porous silicon composites

ZnS films were prepared by pulsed laser deposition (PLD) on porous silicon (PS) substrates. This paper investigates the effect of annealing temperature on the structural, morphological, optical and electrical properties of ZnS/PS composites by x-ray diffraction (XRD), scanning electron microscope (SEM), photoluminescence (PL) and I–V characteristics. It is found that the ZnS films deposited on PS substrates were grown in preferred orientation along β-ZnS (111) direction, and the intensity of diflraction peak increases with increasing annealing temperature, which is attributed to the grain growth and the enhancement of crystallinity of ZnS films. The smooth and uniform surface of the as-prepared ZnS/PS composite becomes rougher through annealing treatment, which is related to grain growth at the higher annealing temperature. With the increase of annealing temperature,the intensity of self-activated luminescence of ZnS increases, while the luminescence intensity of PS decreases, and a new green emission located around 550 nm appeared in the PL spectra of ZnS/PS composites which is ascribed to the defect-center luminescence of ZnS. The I-V characteristics of ZnS/PS heterojunctions exhibited rectifying behavior, and the forward current increases with increasing annealing temperature.     

Effect of annealing on structural, optical and electrical properties of ZnS/porous silicon composites

ZnS films were prepared by pulsed laser deposition (PLD) on porous silicon (PS) substrates. This paper investigates the effect of annealing temperature on the structural, morphological, optical and electrical properties of ZnS/PS composites by x-ray diffraction (XRD), scanning electron microscope (SEM), photoluminescence (PL) and I--V characteristics. It is found that the ZnS films deposited on PS substrates were grown in preferred orientation along β-ZnS (111) direction, and the intensity of diffraction peak increases with increasing annealing temperature, which is attributed to the grain growth and the enhancement of crystallinity of ZnS films. The smooth and uniform surface of the as-prepared ZnS/PS composite becomes rougher through annealing treatment, which is related to grain growth at the higher annealing temperature. With the increase of annealing temperature, the intensity of self-activated luminescence of ZnS increases, while the luminescence intensity of PS decreases, and a new green emission located around 550~nm appeared in the PL spectra of ZnS/PS composites which is ascribed to the defect-center luminescence of ZnS. The I--V characteristics of ZnS/PS heterojunctions exhibited rectifying behavior, and the forward current increases with increasing annealing temperature.     

退火对ZnS/PS复合体系光致发光特性的影响

用脉冲激光沉积(PLD)技术以多孔硅(PS)为衬底生长了ZnS薄膜,分别测量了ZnS、PS以及ZnS/PS复合体系在室温下的光致发光(PL)光谱。结果发现,ZnS/PS复合体系的PL光谱中PS的发光峰位相对于新制备的PS有所蓝移。把该ZnS/PS样品分成三块,在真空400℃分别退火10,20,30 min,研究不同退火时间对ZnS/PS复合体系光致发光特性的影响。发现退火后样品的PL光谱中都出现了一个新的绿色发光带,归结为ZnS的缺陷中心发光。随着退火时间的延长,PS的发光强度逐渐降低且峰位红移。把ZnS的蓝、绿光与PS的红光相叠加,整个ZnS/PS复合体系在可见光区450~700 nm形成一个较宽的光致发光谱带,呈现较强的白光发射。     

ZnS／PS异质结的光学和电学性质

用脉冲激光沉积（PLD）的方法在多孔硅衬底上沉积了ZnS薄膜,并在室温下研究了ZnS／PS异质结的结构、光学和电学性质。X射线衍射仪（XRD）测量结果表明．制备的ZnS薄膜在28．5°附近有一较强的衍射峰,对应于β-ZnS（111）晶向,说明薄膜沿该方向高度择优取向生长。ZnS／PS复合体系的光致发光谱表明,ZnS的发光与PS的发光叠加在一起,在可见光区形成一个450-700nm较宽的光致发光谱带。呈现较强的白光发射。对ZnS／PS异质结I-V,特性曲线的测量结果表明,异质结呈现出与普通二极管相似的整流特性。在正向偏置下,电流密度较大．电压降较低;在反向偏置下,电流密度接近于零。异质结的理想因子的值为77。     

The study of structure and optoelectronic properties of ZnS and ZnO films on porous silicon substrates

ZnS and ZnO films were prepared on porous silicon (PS) substrates with the same porosity by pulsed laser deposition (PLD), and the structural, optical and electrical properties of ZnS and ZnO films on PS were investigated at room temperature by X-ray diffraction (XRD), scanning electron microscope (SEM), optical absorption measurement, photoluminescence (PL) and I–V characteristic studies. The prepared ZnS was obtained in the cubic phase along β-ZnS (1 1 1) orientation which showed a perfect match with the earlier report while ZnO films were obtained in c-axis orientation. There appeared some cracks in the surface of ZnS and ZnO films due to the roughness of PS substrates. Luminescence studies of ZnS/PS and ZnO/PS composites indicated room temperature emission in a broad, intense, visible photoluminescence band, which cover the blue emission to red emission, exhibiting intensively white light emission. Based on the I–V characteristic, ZnS/PS heterojunction exhibited the rectifying junction behavior, while the I–V characteristic of ZnO/PS heterostructure was different from that of the common diode, whose reverse current was not saturated.     

Efficient visible electroluminescence from porous silicon diodes with low driven voltage

By using n-butylamine as carbon resource, diamond-like carbon film (DLCF) was deposited on the p-n porous silicon (PS) surface by means of a radio-frequency glow discharge plasma system. Electroluminescent (EL) spectra show that EL intensity of the passivated PS diodes increases by 4.5 times and 30-nm blue-shift of EL peak occurs compared with the diodes without treatment and both of them are stable while the passivated diodes are exposed to the air indoor. The current-voltage (Ⅰ-Ⅴ) characteristics exhibit that the passivated diodes have a smaller series resistance and a lower onset voltage. The EL intensityvoltage (ⅠEL-Ⅴ) relations of the PS devices with different DLCF thicknesses show that only medium DLCF thickness is optimum. These experimental phenomena have been explained based on Raman spectra and IR spectra of the diamond-like carbon films and IR spectra of the passivated PS samples.     

ZnO/P-Si异质结的光电特性研究

利用脉冲激光沉积方法在P-Si(100)衬底上生长ZnO薄膜,制备ZnO/P-Si异质结,研究衬底温度对异质结光电特性的影响.结果表明,在400℃,500℃,550℃和600℃下生长ZnO制备的异质结都有一定的整流特性,反向暗电流随着衬底温度的升高略有增加,在550℃下制备的样品具有最明显的光电效应.ZnO/P-Si异质结对可见光和紫外光呈现出不同的响应性.在可见光照射下,光电流随反向偏压急剧增大,偏压增大到某一值时,光电流增速变小,而在紫外光下,光电流有逐渐增大的趋势.根据ZnO的透射谱认为,可见光和紫外光是异质结不同的耗尽区诱导电子-空穴对产生光电流的.     

非晶氧化硅薄膜带尾发光特性

采用等离子体增强化学气相沉积技术,通过改变CO2流量制备了不同氧含量的非晶氧化硅薄膜。利用紫外可见吸收谱、傅里叶红外吸收谱和稳态/瞬态光致发光谱等技术研究了薄膜的微观结构和光学特性。实验结果表明,随着氧含量的增加,薄膜的带隙增大,光致发光强度增加、峰值朝高能方向移动、光谱半峰全宽展宽。时间分辨光谱显示薄膜发光峰值处的衰减时间随氧含量的增加从6.2ns单调增加到21ns,而同一样品的发光寿命随发射波长能量增加而减小。综合分析光学吸收、发射及发光衰减特性表明,薄膜的发光机制主要归结为非晶材料带尾态之间的辐射复合。     

退火处理对ZnS薄膜的结构和光学性质的影响

在200 ℃下利用激光沉积技术分别在玻璃和Si(100)上沉积制备了ZnS薄膜,并在300,400,500 ℃下退火1 h。用X射线衍射(XRD)仪、紫外/可见光/近红外分光光度计、台阶仪和原子力显微镜(AFM)分别对不同衬底上样品的特征进行了观察。结果表明,玻璃上的ZnS薄膜只在28.5°附近存在着(111)方向的高度取向生长。在可见光范围内透射率为60%~90%。计算显示薄膜的光学带隙在3.46~3.53 eV之间,其小于体材料带隙的原因在于硫元素的缺失。根据光学带隙判断薄膜是单晶立方结构的β-ZnS。Si(100)上生长的是多晶ZnS薄膜:500 ℃下退火后,表面也比未退火表面更加平整致密,变化规律与ZnS/glass的类似。说明高温下退火可以有效地促进晶粒的结合并改善薄膜质量。     

ZnS/CdS复合窗口层对CdTe太阳能电池短波光谱响应的影响

采用磁控溅射法制备了ZnS/CdS复合窗口层,并将其应用于CdTe太阳能电池。对所制备薄膜的形貌和结构等进行了研究。测试了具有不同窗口层的CdTe太阳电池的量子效率和光Ⅰ-Ⅴ特性,分析了ZnS薄膜制备条件对CdTe电池器件性能影响;研究了CdS薄膜厚度和ZnS/CdS复合窗口层对短波区透过率以及CdTe太阳电池的光谱响应的影响。着重研究了具有ZnS/CdS复合窗口层的CdTe太阳电池的短波光谱响应。结果表明,CdS窗口层厚度从100 nm减至50 nm后,其对短波区光子透过率平均提高了18.3%,CdTe太阳电池短波区光谱响应平均提高了27.6%。衬底温度250 ℃条件下制备的ZnS晶粒尺寸小于室温下制备的ZnS。具有ZnS/CdS复合窗口层的CdTe电池中,采用衬底温度250 ℃沉积ZnS薄膜来制备窗口层的电池器件,其性能要优于室温下沉积ZnS制备窗口层的电池器件。这说明晶粒尺寸的大小对电子输运有一定影响。在相同厚度CdS的前提下,具有ZnS/CdS复合窗口层的CdTe电池比具有CdS窗口层在短波的光谱响应提高了约2%。这说明ZnS/CdS复合窗口层能够做到减少对短波光子的吸收,从而使更多的光子被CdTe电池的吸收层吸收。     

Influence of argon ambience on the structural,morphological and optical properties of pulsed laser ablated zinc sulfide thin films

Nanostructured zinc suplhide thin films are successfully deposited on quartz substrates using pulsed laser deposition (PLD) under different argon pressures (0, 5, 10, 15 and 20 Pa). The influence of argon ambience on the microstructural, optical and luminescence properties of zinc sulfide (ZnS) thin films is systematically investigated. The GIXRD data suggests rhombohedral structure for ZnS films prepared under different argon ambience. Self-assembly of grains into well-defined patterns along the y direction is observed in the AFM image of the film deposited under argon pressure 20 Pa. All the films show a blue shift in optical band gap. This can be due to the quantum confinement effect and less widening of conduction and valence band for the films with less thickness and smaller grain size. The PL spectra of the different films are recorded at excitation wavelengths 250 nm and 325 nm and the spectra are interpreted. The PL spectra of the films recorded at excitation wavelength 325 nm show intense yellow emission. The film deposited under an argon pressure of 15 Pa shows the highest PL intensity for excitation wavelength 325 nm. For the PL spectra (excitation at 250 nm), the highest PL intensity is observed for the film prepared under argon free ambience. In our study, 15 Pa is the optimum argon pressure for better crystallinity and intense yellow emission when excited at 325 nm.     

Effect of KI/LiF/CdCl2 on photoluminescent and electroluminescent properties of nanocrystalline (Zn-Cd)S: Cu films

The effect of KI/LiF/CdCl₂ on photoluminescent and electroluminescent (EL) spectra have been reported for (Zn-Cd)S:Cu films. Nanocrystalline films of (Zn-Cd)S:Cu have been prepared using chemical deposition technique in aqueous alkaline bath and their subsequent condensation on substrates. Important results in terms of XRD, SEM, absorption spectra, PL and EL spectra, voltage and frequency dependence of EL brightness are presented. Also, EL brightness waves, EL decay and dependence of EL brightness on nature of electrode material are presented and discussed. SEM studies show best growth conditions in the presence of CdCl₂. Results of XRD studies are associated to ZnS and CdS. Both the studies show average particle sizes to be in the nano order. PL and EL emissions from different films show emission peaks in the blue–green region. Results of absorption spectra show a slight change in band gaps owing to the addition of impurities. Voltage dependence of EL brightness shows effectiveness of acceleration–collision mechanism. Frequency dependence of EL brightness first shows an increase in brightness in the lower frequency range, followed by saturation at higher frequencies. Brightness waves consist of primary and secondary waves, which depend on voltage and frequency of excitation. EL cells with Al electrode give better brightness compared with cells with Ag electrodes. The lifetimes of EL emission are found to be of the order of microseconds.     

电化学沉积高c轴取向ZnO薄膜及其光学性能分析

采用阴极还原方法，在透明导电玻璃(ITO)上制备了高c轴择优取向的ZnO薄膜.通过X射线衍射、扫描电子显微镜等表征技术，研究了沉积电流对ZnO薄膜的结构、应力状态及表面形貌的影响；利用光致荧光光谱及透射光谱等分析方法，探讨了沉积电流变化对ZnO薄膜的光学性能的影响.研究结果显示：各沉积电流下均可制得高c轴取向的ZnO薄膜；薄膜表面形貌受电流的影响较大；从透射谱可以看出，薄膜在可见光波段有较高透射率，且薄膜厚度随沉积电流的增大而增大.光致荧光测量表明，电化学沉积的ZnO薄膜具有明显的带隙展宽.而且，随着沉积电流的增加，带隙发光强度逐渐减弱，缺陷发光逐渐增强.     

倾斜式生长ZnS纳米柱状薄膜及其透射性能的研究

采用倾斜式生长的方法,在本底真空为3×10-4 Pa,生长率为0.2 nm·s-1的条件下,通过改变衬底的法线方向与入射粒子流的夹角α,在ITO导电玻璃衬底上制备了ZnS纳米薄膜。在α=80°和85°时,样品的Ｘ射线衍射谱证实了不同倾斜角时所制备薄膜中均有纳米ZnS晶体形成,扫描电子显微镜(SEM)图像显示,所形成的薄膜均呈现出了柱状结构,并且倾斜角为85°时所得到的纳米柱直径大于80°时所得结果;在α=0°时,相应测量结果表明,虽然在不同衬底上也形成了纳米ZnS晶体薄膜,但并未见柱状结构,而是形成了一层均匀且致密的薄膜。对两种薄膜结构的生长动力学过程作了分析。ITO衬底上薄膜的透射光谱表明ZnS柱状薄膜能够提高可见光的透过率,因此对柱状ZnS纳米薄膜的研究将有利于提高电致发光器件的发光效率。     

Temperature dependence of excitonic luminescence from nanocrystalline ZnO films

The properties of the excitonic luminescence for nanocrystalline ZnO thin films are investigated by using the dependence of excitonic photoluminescence (PL) spectra on temperature. The ZnO thin films are prepared by thermal oxidation of ZnS films prepared by low-pressure metalorganic chemical vapor deposition (LP-MOCVD) technique. The X-ray diffraction (XRD) indicates that ZnO thin films have a polycrystalline hexagonal wurtzite structure with a preferred (0 0 2) orientation. A strong ultraviolet (UV) emission peak at 3.26 eV is observed, while the deep-level emission band is barely observable at room temperature. The strength of the exciton-longitudinal-optical (LO) phonon coupling is deduced from the temperature dependence of the full-width at half-maximum (FWHM) of the fundamental excitonic peak, decrease in exciton-longitudinal-optical (LO) phonon coupling strength is due to the quantum confinement effect.     

Influence of mesoporous substrate morphology on the structural, optical and electrical properties of RF sputtered ZnO layer deposited over porous silicon nanostructure

Morphological, optical and transport characteristics of the RF sputtered zinc oxide (ZnO) thin films over the mesoporous silicon (PS) substrates have been studied. Effect of substrate porosity on the grain growth and transport properties of ZnO has been analyzed. Physical and optical properties of ZnO-PS structures were investigated using scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and photoluminescence (PL) spectroscopy. Our experimental results indicate that on changing porosity of the PS substrates, regularity of the spatial distribution of the ZnO nanocrystallites can be controlled. While the morphology and grain size of ZnO depended strongly on the morphology and pore size of the PS substrates, the rectifying factors of the metal semiconductor junction were found to be different by a factor of 3. The deposition of semiconducting oxides on such mesoporous substrates/templates offers the possibility to control their properties and amplify their sensing response.     

沉积温度对硫化锌(ZnS)薄膜的结晶和光学特性影响研究

对不同温度下沉积的ZnS薄膜的结晶情况和光学特性进行了研究, 结果表明：沉积温度对ZnS薄膜的物理和光学特性有较大影响, 不同的温度沉积的ZnS薄膜具有不同的择优取向, 牢固度也大不相同; 不同沉积温度下, ZnS薄膜的光学常数也不尽相同. 温度为115 ℃和155 ℃时, ZnS薄膜的物理性能和光学性能较差, 不适合空间用光学薄膜的研制使用. 而190 ℃和230 ℃沉积温度下所得薄膜具有较好的物理和光学性能, 适合于不同要求的空间用薄膜器件的研制使用. 关键词： 硫化锌薄膜 沉积温度 表面形貌 光学常数     

温度对CdSe/ZnS量子点吸收光谱和光致发光谱的影响

测量了分散于正己烷溶液和甲苯溶液中的CdSe/ZnS量子点在室温到近溶液沸点温度间的吸收与光致发光光谱,比较了两种不同的CdSe/ZnS量子点的光谱特性,讨论了温度对吸收和光致发光光谱峰值波长以及相对强度的影响。结果表明:在25~100℃范围内,CdSe/ZnS量子点激子吸收峰波长有微小红移,最大约为4nm;光致发光光谱峰值波长略有红移,但最大不超过6nm。根据光致发光光谱测量的结果,确定了Varshni定律中关于CdSe/ZnS量子点禁带宽度的两个经验参数:α=(2.0±0.2)×10^-4eV/K和β=(200±30)K。温度对CdSe/ZnS量子点吸收强度影响不大,荧光发射强度与温度呈线性关系增强。