大功率短波长InAlGaAs/AlGaAs量子点超辐射发光管

为了满足超辐射发光管的短波长应用,采用InAlGaAs/AlGaAs量子点有源区和干法刻蚀工艺制备了短波长弯曲波导超辐射发光管。在1.6A脉冲电流注入下,器件峰值输出功率为29mW,中心波长为880nm,光谱半高宽为20.3nm。比较了干法刻蚀工艺和湿法腐蚀工艺对超辐射发光管器件性能的影响。在1.6A脉冲电流注入下,湿法腐蚀制备的器件峰值输出功率仅为7mW。与湿法腐蚀相比,干法刻蚀可以精确控制波导形状和参数,降低波导损耗,有效增大器件输出功率。     

InAs/GaAs submonolayer quantum-dot superluminescent diodes with active multimode interferometer configuration

With a chirped InAs/GaAs SML-QD (quantum dot) structure serving as the active region, the superluminescent diodes emitting at wavelength of around 970nm are fabricated. By using an active multimode interferometer configuration, these devices exhibit high continue-wave output powers from the narrow ridge waveguides. At continue-wave injection current of 800mA, an output power of 18.5mW, and the single Gaussian-like emission spectrum centered at 972nm with a full width at half maximum of 18nm are obtained.     

氦压对类金刚石薄膜结构和光学性质的影响

使用脉冲激光沉积技术在不同氦压下制备了系列无氢类金刚石薄膜,测量了样品的Raman光谱、光吸收光谱和光致发光光谱,采用原子力显微镜测试了薄膜的表面形貌,研究了薄膜的微结构和光学性质与制备条件的依赖关系. 结果表明,该薄膜是由sp2和sp3杂化碳原子组成的非晶碳膜. 薄膜的光学带隙在1.45～1.78 eV. 薄膜的发光在可见光区呈宽带结构,氦压能够对类金刚石薄膜的结构和光学性质产生较大影响. 当氦压从0.05 Pa升高至15 Pa时,sp2团簇变大,带尾态增多,从而导致薄膜的发光增强,光学带隙变窄,发光峰位红移. AFM 形貌表明随着氦压的升高,薄膜的表面由致密光滑变得粗糙,并且许多大小不均匀的球状颗粒出现在薄膜表面.     

Short-wavelength InAlGaAs/AlGaAs quantum dot superluminescent diodes

This paper reports the fabrication of J-shaped bent-waveguide superluminescent diodes utilizing an InAlGaAs/AlGaAs quantum dot active region. The emission spectrum of the device is centred at 884 nm with a full width at half maximum of 37 nm and an output power of 18 mW. By incorporating an Al composition into the quantum dot active region, short-wavelength superluminescent diode devices can be obtained. An intersection was found for the light power-injection current curves measured from the straight-waveguide facet and the bent-waveguide facet, respectively. The result is attributed to the conjunct effects of the gain and the additional loss of the bent waveguide. A numerical simulation is performed to verify the qualitative explanation. It is shown that bent waveguide loss is an important factor that affects the output power of J-shaped superluminescent diode devices.     

原子气室中碱金属含量的测量方法

原子气室作为新型量子惯性仪表的核心部件，其中填充的碱金属量直接决定了惯性仪表设备的寿命，准确测量气室内的碱金属对后续碱金属填充等气室制备工艺的优化至关重要。重点研究了气室内碱金属分布以及升温速率对碱金属含量测试结果的影响，发现碱金属集中分布有利于碱金属量的准确测量，当碱金属分布直径足够小时，碱金属量测量值趋于稳定，而测量过程升温速率对测试结果影响较小。通过优化，实现了碱金属铷含量的测量精度优于7%。     

退火处理对ZnS薄膜的结构和光学性质的影响

在200 ℃下利用激光沉积技术分别在玻璃和Si(100)上沉积制备了ZnS薄膜,并在300,400,500 ℃下退火1 h。用X射线衍射(XRD)仪、紫外/可见光/近红外分光光度计、台阶仪和原子力显微镜(AFM)分别对不同衬底上样品的特征进行了观察。结果表明,玻璃上的ZnS薄膜只在28.5°附近存在着(111)方向的高度取向生长。在可见光范围内透射率为60%~90%。计算显示薄膜的光学带隙在3.46~3.53 eV之间,其小于体材料带隙的原因在于硫元素的缺失。根据光学带隙判断薄膜是单晶立方结构的β-ZnS。Si(100)上生长的是多晶ZnS薄膜:500 ℃下退火后,表面也比未退火表面更加平整致密,变化规律与ZnS/glass的类似。说明高温下退火可以有效地促进晶粒的结合并改善薄膜质量。     

A grating-coupled external cavity InAs/InP quantum dot laser with 85-nm tuning range

The optical performance of a grating-coupled external Continuous tuning from 1391 nm to 1468 nm is realized at cavity laser based on InAs/InP quantum dots is investigated. an injection current of 1900 mA. With the injection current increasing to 2300 mA, the tuning is blue shifted to some extent to the range from 1383 nm to 1461 nm. By combining the effect of the injection current with the grating tuning, the total tuning bandwidth of the external cavity quantum-dot laser can reach up to 85 nm. The dependence of the threshold current on the tuning wavelength is also presented.     

A mode-locked external-cavity quantum-dot laser with a variable repetition rate

A mode-locked external-cavity laser emitting at 1.17-μm wavelength using an InAs/GaAs quantum-dot gain medium and a discrete semiconductor saturable absorber mirror is demonstrated. By changing the external-cavity length, repetition rates of 854, 912, and 969 MHz are achieved respectively. The narrowest -3-dB radio-frequency linewidth obtained is 38 kHz, indicating that the laser is under stable mode-locking operation.     

InAs/GaAs submonolayer quantum dot superluminescent diode emitting around 970 nm

According to the InAs/GaAs submonolayer quantum dot active region, we demonstrate a bent-waveguide superluminescent diode emitting at a wavelength of around 970 nm. At a pulsed injection current of 0.5 A, the device exhibits an output power of 24 mW and an emission spectrum centred at 971 nm with a full width at half maximum of 16 nm.     

AlN缓冲层对ZnO薄膜质量的影响

采用脉冲激光沉积法以AlN为缓冲层在Si(100)衬底上制备了ZnO薄膜,并测量了样品的XRD谱、SEM图和PL谱.结果表明,AlN缓冲层可以提高Si衬底上外延生长ZnO薄膜的晶体质量.改变缓冲层的生长温度(50～500 ℃)所制备样品的测量结果表明,较低温度下生长的AlN缓冲层有利于制备高质量的ZnO外延层薄膜,其中AlN缓冲层生长温度为100 ℃时外延生长ZnO薄膜晶体质量最好.