共查询到18条相似文献,搜索用时 908 毫秒
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离子束反应溅射沉积SiO2薄膜的光学特性 总被引:1,自引:0,他引:1
主要研究采用离子束反应溅射(RIBS)制备SiO2薄膜的折射率、消光系数、化学计量比与氧气在氩氧混合工作气体中含量及其沉积速率的关系。研究结果表明:RIBS制备的SiO2薄膜在0.63 μm处折射率n= 1.48,消光系数小于10-5;随着沉积速率的增加,薄膜的折射率和消光系数随之变大,当沉积速率超过0.3 nm/s,即使是在纯氧环境溅射,折射率值也不低于1.5;通过对红外透射光谱的主吸收峰位置研究得到沉积的SiO2薄膜为缺氧型,化学计量比不超过1.8,且红外吸收峰位置和SiO2折射率存在对应关系,因此在不加热衬底情况下使用RIBS制备SiO2薄膜时,会限制沉积速率的提高。 相似文献
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" 采用射频磁控溅射法在石英衬底上沉积了纳米BST(Ba0:65Sr0:35TiO3)薄膜.为了制备优质的BST薄膜,借助X射线衍射仪、场发射扫描电镜和原子力显微镜研究了BST薄膜的晶化行为和显微结构.结果显示在衬底温度600 ℃下制备的BST薄膜经700 ℃退火处理后,具有较强的特征衍射峰和极好的晶化.同时还研究了纳米BST薄膜的制备参数和特性,BST薄膜的折射率是由测量的透射谱中获得的.实验结果表明:纳米BST薄膜的沉积参数对其折射率特性的影响是不尽相同的.折射率随着衬底温度的上升而增加;在较低的溅射 相似文献
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采用金属有机分解法(MOD)在石英衬底上沉积了SrTiO3薄膜。所制备的薄膜是晶格常数为a=b=c=3.90?的多晶结构。通过测量190—1100nm波段内的透射光谱,采用包络方法计算了薄膜的光学常数(折射率n和消光系数k)。结果表明,采用MOD方法制备的薄膜的折射率大于采用射频磁控溅射、溶胶—凝胶和化学气相沉积方法制备的薄膜的折射率;薄膜的折射率色散关系满足单振子模型,其中振子强度S0为0.88′1014m-2,振子能量E0为6.40eV;薄膜的禁带宽度为3.68eV。 相似文献
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脉冲激光沉积法制备钛酸锶钡薄膜及其光电性质 总被引:3,自引:0,他引:3
用脉冲激光沉积技术制备了钛酸锶钡(Ba0.5Sr0.6TiO3薄膜.用X射线光电子能谱和原子力显微镜分别分析了薄膜的化学组分和表面形貌.在交流信号为50 mV和100 kHz时测量了薄膜的介电系数和介电损耗随外加电场的变化关系,得出最高的介电可调率达到45%.利用单光束纵向Z扫描的方法研究了薄膜的非线性光学性质,得到非线性折射率为5.04×10-6cm2/kW,非线性吸收系数为3.59×10-6m/W,测量所用光源的波长为532 nm,脉宽为55 ps,表明Ba0.5Sr0.5TiO3薄膜有较快的非线性光学响应. 相似文献
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Yanming Shen Hua Yu Jianke Yao Shuying Shao Zhengxiu Fan Hongbo He Jianda Shao 《Optics & Laser Technology》2008,40(3):550-554
TiO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO2 thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO2 thin films all were amorphous because deposition particles did not possess enough energy to crystallize. 相似文献
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光电变色器件用纳米晶氧化钛薄膜的微结构与特性 总被引:2,自引:2,他引:0
纳米晶TiO2薄膜在光电变色器件中具有很重要的作用。它的微结构直接影响染料的吸附、光的散射以及电荷输运的特性。因此,探索TiO2薄膜的微结构(如粒径、表面形貌和厚度等)及光电性能是非常有意义的。采用电子束蒸发工艺制备了光电变色器件用纳晶TiO2薄膜,利用原子力显微镜、X射线衍射、俄歇电子能谱等手段对纳米晶TiO2薄膜的表面形貌、结晶状态及组分进行了分析。从理论上研究和讨论了纳米晶TiO2薄膜晶粒尺寸对光电性能的影响,并用量子限制效应解释了吸收光谱峰值波长随粒径减小而发生蓝移的现象。 相似文献
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Lukas Pietzonka Thomas Lautenschläger Daniel Spemann Annemarie Finzel Jürgen W. Gerlach Frank Frost Carsten Bundesmann 《The European Physical Journal B - Condensed Matter and Complex Systems》2018,91(10):252
TiO2 thin films were grown by ion beam sputter deposition (IBSD) using oxygen ions, with the ion energy and geometrical parameters (ion incidence angle, polar emission angle, and scattering angle) being varied systematically. Metallic Ti and ceramic TiO2 served as target materials. The thin films were characterized concerning thickness, growth rate, surface topography, structural properties, mass density, and optical properties. It was found that the scattering geometry has the main impact on the film properties. Target material, ion energy, and ion incidence angle have only a marginal influence. Former studies on reactive IBSD of TiO2 using Ar and Xe ions reported equivalent patterns. Nevertheless, the respective ion species distinctively affects the film properties. For instance, mass density and the refractive index of the TiO2 thin films are remarkably lower for sputtering with oxygen ions than for sputtering with Ar or Xe ions. The variations in the thin film properties are tentatively attributed to the angular and the energy distribution of the film-forming particles, especially, to those of the backscattered primary particles. 相似文献
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TiO2膜消光系数的确定及制备参量的影响 总被引:5,自引:2,他引:3
基于窄带干涉滤光片的峰值透射率测量可以直接反演出薄膜的消光系数,从而得到了一种简易而又精确的评价薄膜微弱损耗的新方法。阐述了确定弱吸收薄膜消光系数的基本原理,并分析了这种评价方法的基本精度。讨论了离子束溅射TiO2薄膜的制备参量对薄膜消光系数的影响。发现溅射速率和氧分压是影响TiO2薄膜损耗的灵敏因素。在保持其它参量不变的条件下,溅射速率从0.35nm/s下降到0.23nm/s,TiO2薄膜的消光系数从3.9×10-5下降到2.1×10-5;辅助离子源的Ar∶O比从1∶2变化为1∶4,对应的消光系数从5.6×10-5下降到2.3×10-5。此外,随着基板温度的提高,损耗也会有所增加。TiO2薄膜消光系数评价的合理性表明由窄带滤光片的峰值透射率来反演薄膜的消光系数是可行的。 相似文献
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Tantalum pentoxide thin films are prepared by oblique angle electron beam evaporation. The influence of flux angle on the surface morphology and microstructure is investigated by scanning electron microscopy (SEM). The Ta2O5 thin films are anisotropic with highly orientated nanostructure of slanted columns. The porous microstructure of the as-deposited films results in the decrease of effective refractive index and packing density with increasing deposition angle. The anisotropic structure results in optical birefringence. The in-plane birefringence increases with the increase of deposition angle and reaches the maximum of 0.055 at the deposition angle of 70°. Anisotropic microstructure and critical packing density are the two key factors to influence the in-plane birefringence. 相似文献
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采用溶胶-凝胶(sol-gel)工艺在Pt/TiO2/SiO2/p-Si(100)衬底上制备出Bi4Ti3O12(BIT)和Bi3.25La0.75Ti2.97V0.03O12(BLTV)铁电薄膜,研究了La,V共掺杂对BIT薄膜的晶体结构和电学性能的影响.BIT薄膜为c轴择优取向,BLTV薄膜为随机取向,拉曼光谱分析表明V掺杂降低了TiO6(或VO6)八面体的对称性,也增强了Ti—O键(或V—O键)杂化.BLTV薄膜的剩余极化Pr为25.4μC/cm2,远大于BIT薄膜的9.2μC/cm2,表现出良好的铁电性能.疲劳、漏电流测试显示BLTV薄膜具有优良的抗疲劳特性和漏电流特性,表明La,V共掺杂能有效地降低薄膜中的氧空位. 相似文献