晶格失配对GaInP/In_xGa_(1-x)As/In_yGa_(1-y)As倒装三结太阳电池性能影响的分析

传统GaInP/(In)GaAs/Ge三结太阳电池因受其带隙组合的限制,转换效率再提升空间不大.倒装结构三结太阳电池因其更优的带隙组合期望可以得到更高的效率.基于细致平衡原理,结合P-N结形成机理,应用MATLAB语言对双晶格失配GaInP(1.90 eV)/In_xGa_(1-x)As/In_yGa_(1-y)As倒装结构三结太阳电池底、中电池的不同带隙组合进行模拟优化.模拟结果表明在AM1.5D,500倍聚光(500 suns)下,禁带宽度组合为1.90/1.38/0.94 eV的带隙最优,综合材料成本与试验条件,当顶、中电池最优厚度组合为4μm和3.2μm时理论转化效率高达51.22%,此时两个异质结的晶格失配度分别为0.17%和2.36%.忽略渐变缓冲层生长后底电池位错的影响,通过计算0.17%的晶格失配引入1.70×105cm~(-2)的插入位错密度,对比单晶格失配GaInP/GaAs/In_(0.32)Ga_(0.68)As(0.99 eV)倒装结构三结太阳电池光电转化效率仍提高了0.3%.     

空间用倒装三结太阳能电池及其抗辐射性能研究

使用金属有机化学气相沉积技术,在4英寸GaAs衬底上获得了空间用GaInP/GaAs/In_(0.3)Ga_(0.7)As倒装三结太阳能电池.高分辨X射线衍射和阴极射线发光测试结果表明AlInGaAs应力渐变缓冲层的晶格弛豫度约100%,其整面平均穿透位错密度约5.4×10~6/cm~2.与GaInP/InGaAs/Ge常规三结太阳能电池相比,在AM0光谱、25℃测试条件下,面积24 cm~2的倒装三结太阳能电池转换效率达到32%,输出功率提高了5%.采用1 MeV高能电子对倒装三结电池进行粒子辐照测试,电池各项性能参数随不同辐照剂量发生改变,在1×10~(15)/cm~2辐照总剂量下电池转换效率衰降比例达到15%.     

应力导致InAs/In0.15Ga0.85As量子点结构中In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术，在In_0.15Ga_0.85As/GaAs量子阱生长了两个InAs/In_0.15Ga_0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In_0.15Ga_0.85As阱层的厚度和生长温度，获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果，发现该样品量子点的光学性质也同时得到 关键词： 合金分解效应 0.15Ga_0.85As量子点')" href="#">InAs/In_0.15Ga_0.85As量子点 光致发光光谱 压电调制光谱     

p-n 型GaInP2/GaAs叠层太阳电池研究

报道了对p-n型 GaInP2/GaAs叠层太阳电池的研究结果.采用低压金属有机物化学气相沉积工艺制备电池样品.通过对GaInP2顶电池中场助收集效应的计算机模拟，提出用p+p-n-n+结构取代常用的p+n 结构，显著改善了GaInP2顶电池和GaInP2/GaAs叠层太阳电池的光伏性能，使其光电转换效率(Eff)分别达到14.26% 和23.82% (AM0, 25℃, 2×2cm2). 关键词： 场助收集效应 镓铟磷 砷化镓 叠层太阳电池     

赝配GaAs/In0.2Ga0.8As量子阱导带不连续量的C-V和电容瞬态测量

分别采用二种不同方法测量分子束外延(MBE)生长GaAs/In_0.2Ga_0.8As单量子阱结构的导带不连续量ΔE_c:1) 考虑样品界面电荷修正的电容-电压(C-V)分布；2) 量子阱载流子热发射产生的电容瞬态(DLTS).C-V测得的ΔE_c=0.227eV,大约相当于89% ΔE_g.DLTS测得的ΔE_c=0.229eV,大约相当于89.9% ΔE_g.结果 关键词：     

缓冲层InxGa1-xAs组分对In0.82Ga0.18As结晶质量和表面形貌的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料.研究缓冲层In_xGa_1-xAs的In组分对In_0.82Ga_0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层In_xGa_1-xAs的In组分影响高温生长的外延层In_0.82Ga_0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In_0.82Ga_0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳.     

高迁移率In0.6Ga0.4As沟道MOSHEMT与MOSFET器件特性的研究

从模拟和实验两个方面对高迁移率In_0.6Ga_0.4As沟道金属氧化物半导体高电子迁移率晶体管（MOSHEMT）和金属氧化物半导体场效应晶体管（MOSFET）器件开展研究工作.研宄发现InAlAs势垒层对Ino_0.6Ga_0.4AsMOSHEMT的特性具有重要影响.与Ino_0.6Ga_0.4As MOSFET相比,Ino_0.6Ga_0.4As MOSHEMT表现出优异的电学特性.实验结果表明,In_0.6Ga_0.4As MOSHEMT的有效沟道迁移率达到2812 cm²/V.s^-1,是In_0.6Ga_0.4As MOSFET的3.2倍.0.02 mm栅长的MOSHEMT器件较相同栅长的MOSFET器件具有更高的驱动电流、更大的跨导峰值、更大的开关比、更高的击穿电压和更小的亚阈值摆幅.     

InAs/GaAs和InAs/InxGa1-xAs/GaAs纳米线异质结构的生长研究

利用金辅助金属有机化学气相沉淀法(MOCVD)在GaAs(111)B衬底上分别制备了InAs/GaAs和InAs/In _{x Ga1-xAs/GaAs(0≤x≤1)纳米线异质结构.实验结果显示,直接生长在GaAs纳米线上的InAs纳米线生长方向杂乱或者沿着GaAs纳米线侧壁向衬底方向生长,生长的含有In x Ga1-xAs组分渐变缓冲段的InAs/In x Ga1-x关键词： 纳米线异质结构 xGa1-xAs')" href="#">InxGa1-xAs 组分渐变缓冲层 金属有机化学气相沉淀法}     

等离子体活化硒对电沉积Cu-In-Ga金属预制层硒化的影响

使用等离子体活化硒源对电沉积制备的Cu-In-Ga金属预制层进行了硒化处理时, 发现等离子体功率对Cu(In_1-xGa_x)Se₂(CIGS)晶粒的生长有重要影响, 当等离子体功率为75 W时, 制备出单一Cu(In_0.7Ga_0.3)Se₂相的CIGS薄膜. 通过对不同衬底温度的等离子体活化硒源硒化的CIGS 薄膜进行了研究与分析, 并与普通硒化后的薄膜进行对比, 发现高活性硒在低温下会促进Ga-Se二元相的生成, 从而有利于Cu(In_0.7Ga_0.3)Se₂单相的生长. 对等离子体硒化后的CIGS薄膜进行了电池制备, 发现单相CIGS薄膜没有显著提高电池性能. 通过优化工艺, 所制备的CIGS电池效率达到了9.4%. 关键词： 0.7Ga_0.3)Se₂')" href="#">Cu(In_0.7Ga_0.3)Se₂ 电沉积 Cu-In-Ga金属预制层 等离子体活化硒     

两个子带占据的In0.53Ga0.47As/In0.52Al0.48As量子阱中填充因子的变化规律

研究了低温(15K)和强磁场(0—13T)条件下, InP基In_053Ga_047As/In_052Al_048As量子阱中电子占据两个子带时填充因子随磁场的变化规律.结果表明,在电子自旋分裂能远小于朗道能级展宽的情况下,如果两个子带分裂能是朗道分裂能的整数倍时,即ΔE₂₁=kω_c(其中k为整数),填充因子为偶数;当两个子带分裂能为朗道分裂能的半奇数倍时,即ΔE₂₁=(2k+1)ω_c/2,填充因子出现奇数. 关键词： 053Ga_047As/In_052Al_048As量子阱')" href="#">In_053Ga_047As/In_052Al_048As量子阱 填充因子 磁输运     

Degradation behavior of electrical properties of GaInAs (1.0 eV) and GaInAs (0.7 eV) sub-cells of IMM4J solar cells under1-MeV electron irradiation

In this work the degradation effects of the Ga_(0.7)In_(0.3)As(1.0 eV) and Ga_(0.42)In_(0.58)As(0.7 eV) sub-cells for IMM4J solar cells are investigated after 1-MeV electron irradiation by using spectral response and photoluminescence(PL) signal amplitude analysis, as well as electrical property measurements. The results show that, compared with the electrical properties of traditional single junction(SJ) GaAs(1.41 eV) solar cell, the electrical properties(such as Isc, Voc, and Pmax)of the newly sub-cells degrade similarly as a function of log ?, where ? represents the electron fluence. It is found that the degradation of Voc is much more than that of Isc in the irradiated Ga_(0.42)In_(0.58)As(0.7 eV) cells due to the additional intrinsic layer, leading to more serious damage to the space charge region. However, of the three types of SJ cells with the gap widths of 0.7, 1.0, and 1.4 eV, the electric properties of the Ga_(0.7)In_(0.3)As(1.0 eV) cell decrease largest under each irradiation fluence. Analysis on the spectral response indicates that the Jsc of the Ga_(0.7)In_(0.3)As(1.0 eV) cell also shows the most severe damage. The PL amplitude measurements qualitatively confirm that the degradation of the effective minority carrier life-time(τeff) in the SJ Ga_(0.7)In_(0.3)As cells is more drastic than that of SJ GaAs cells during the irradiation. Thus,the output current of Ga_(0.7)In_(0.3)As sub-cell should be controlled in the irradiated IMM4J cells.     

Improved thermal property of strained InGaAlAs/AlGaAs quantum wells for 808-nm vertical cavity surface emitting lasers

The 808-nm vertical cavity surface emitting laser (VCSEL) with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is designed and fabricated. Compared with the VCSELs with Al_0.05Ga_0.95As/Al_0.3Ga_0.7As quantum wells, the VCSEL with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is demonstrated to possess higher power conversion efficiency (PCE) and better temperature stability. The maximum PCE of 43.8% for 10-μm VCSEL is achieved at an ambient temperature of 30 ℃. The size-dependent thermal characteristics are also analyzed by characterizing the spectral power and output power. It demonstrates that small oxide-aperture VCSELs are advantageous for temperature-stable performance.     

Control of symmetric properties of metamorphic In_(0.27)Ga_(0.73)As layers by substrate misorientation

Asymmetry in dislocation density and strain relaxation has a significant impact on device performance since it leads to anisotropic electron transport in metamorphic materials. So it is preferred to obtain metamorphic materials with symmetric properties. In this paper, we grew metamorphic In_(0.27)Ga_(0.73) As epilayers with symmetric low threading dislocation density and symmetric strain relaxation in two (110) directions using In Al Ga As buffer layers on 7°misoriented Ga As(001)substrates. To understand the control mechanism of symmetric properties of In_(0.27)Ga_(0.73) As layers by the substrate miscut angles, In_(0.27)Ga_(0.73) As grown on 2°and 15°misoriented substrates were also characterized as reference by atomic force microscopy, transmission electron microscopy, and high resolution triple axis x-ray diffraction. The phase separation and interaction of 60°misfit dislocations were found to be the reasons for asymmetry properties of In_(0.27)Ga_90.73 As grown on 2and 15°substrates, respectively. Photoluminescence results proved that the In_(0.27)Ga_(0.73) As with symmetric properties has better optical properties than the In_(0.27)Ga_(0.73) As with asymmetric properties at room temperature. These results imply that high quality metamorphic In_(0.27)Ga_(0.73) As can be achieved with controllable isotropic electron transport property.     

GaInP/GaAs/Ge三结太阳电池不同能量质子辐照损伤模拟

以GaInP/GaAs/Ge三结太阳电池为研究对象,开展了能量为0.7, 1, 3, 5, 10 MeV的质子辐照损伤模拟研究,建立了三结太阳电池结构模型和不同能量质子辐照模型,获得了不同质子辐照条件下的I-V曲线,光谱响应曲线,结合已有实验结果验证了本文模拟结果,分析了三结太阳电池短路电流、开路电压、最大功率、光谱响应随质子能量的变化规律,利用不同辐照条件下三结太阳电池最大输出功率退化结果,拟合得到了三结太阳电池最大输出功率随位移损伤剂量的退化曲线.研究结果表明,质子辐照会在三结太阳电池中引入位移损伤缺陷,使得少数载流子扩散长度退化幅度随质子能量的减小而增大,从而导致三结太阳电池相关电学参数的退化随质子能量的减小而增大.相同辐照条件下,中电池光谱响应退化幅度远大于顶电池光谱响应退化幅度,中电池抗辐照性能较差,同时中电池长波范围内光谱响应的退化幅度比短波范围更大,表明中电池相关电学参数的退化主要来源于基区损伤.     

GaInP/GaAs/Ge三结太阳电池的电子辐照损伤效应

研究了1 MeV和1.8 MeV电子辐照下GaInP/GaAs/Ge三结太阳电池的辐照损伤效应.电学性能研究结果表明,GaInP/GaAs/Ge三结太阳电池的开路电压、短路电流和最大功率随辐照剂量的增加发生明显衰降,在1 MeV电子辐照下剂量为1×10¹⁵cm^-2时,与辐照前相比最大功率衰降了17.7%.暗I-V特性分析表明,高能电子辐照下三结电池串、并联电阻的变化是引起太阳电池电学性能衰降的重要原因.光谱响应分析结果表明,GaInP 关键词： GaInP/GaAs/Ge太阳电池 电子辐照 电学性能 光谱响应     

轻质柔性GaInP/Ga(In)As/Ge三结太阳电池及其性能研究

为了研究柔性太阳能电池的性能,通过太阳能电池减薄工艺制备出轻质柔性Ga In P/Ga(In)As/Ge三结太阳能电池芯片。尺寸为40 mm×60 mm的电池芯片重量为0.7 g,仅为常规175μm厚度电池重量的30%。验证了柔性电池工艺的可行性,制得的柔性电池转换效率达到了30.64%,同常规厚度电池十分接近。对比测试了两种样品不同温度下的暗电流曲线,拟合了两种电池样品的温度系数,结果表明:电池的温度系数与衬底类型无关,只与电池PN结本身相关。     

Radiation Damage Analysis of Individual Subcells for GaInP/GaAs/Ge Solar Cells Using Photoluminescence Measurements

The radiation damage of three individual subcells for GaInP/GaAs/Ge triple-junction solar cells irradiated with electrons and protons is investigated using photoluminescence(PL) measurements. The PL spectra of each subcell are obtained using different excitation lasers. The PL intensity has a fast degradation after irradiation,and decreases as the displacement damage dose increases. Furthermore, the normalized PL intensity varying with the displacement damage dose is analyzed in detail, and then the lifetime damage coefficients of the recombination centers for GaInP top-cell, GaAs mid-cell and Ge bottom-cell of the triple-junction solar cells are determined from the PL radiative efficiency.     

实用型三谱段太阳模拟器的设计与研制

本文设计并研制了一种实用型三谱段太阳模拟器,其光谱匹配可同时调整3个谱段(300~700 nm,700~900 nm,900~1 700 nm)范围的能量,修正后可满足三结砷化镓太阳电池的测试使用要求。本文重点阐述了三谱段太阳模拟器滤光片的设计和氙灯光谱的修正及测试,介绍了太阳模拟器的光机结构。实验表明:三谱段太阳模拟器的光谱匹配满足三结砷化镓太阳电池各子电池的响应电流值。在有效辐照面150 mm×150 mm上,平均辐照度可以达到2个太阳常数(2 730 W/m²),辐照不均匀度达到±1.77%,辐照不稳定度达到±0.83%,为太阳电池自动分拣系统提供了可靠稳定的平台。     

Surface deformation phenomena induced by electron-beam irradiation in strained InGaAs/AlGaAs layers on GaAs (1 0 0) and (3 1 1)B substrates

The strained InGaAs/AlGaAs layer structures have been grown on GaAs ( 10 0) and (3 1 1)B substrates in a horizontal low-pressure metalorganic vapor-phase epitaxy system at a temperature of 800°C. In the surface observation using a high-resolution scanning electron microscope, we have found that surface deformation phenomena induced by electron-beam irradiation in strained In_0.36Ga_0.64As,/Al_0.3Ga_0.7As layers on GaAs (1 0 0) and (3 1 1)B substrates. The change of the surface morphology was observed in real time on the display of SEM with the accelerating voltage of 30 kV and the irradiated time of 60–120 s. The surface deformation through mass transport seems to be the cause of the residual strain relaxation due to electron-beam irradiation.