Diagnostic of capacitively coupled radio frequency plasma by homogeneous discharge model

In this Letter, a plasma diagnostic technique is reported to evaluate the plasma parameters of capacitively coupled radio frequency argon plasma on the basis of homogeneous discharge model. The technique is implemented for wide range of operating pressure ranging from few mTorrs to atmospheric pressure. Considerable dependence of plasma parameters on the plasma series resonance effect and the drift velocity of the electron for low pressure plasma and on the ion density for atmospheric pressure plasma jet were observed.     

Plasma characteristics and broadband electromagnetic wave absorption in argon and helium capacitively coupled plasma

A one-dimensional self-consistent calculation model of capacitively coupled plasma(CCP) discharge and electromagnetic wave propagation is developed to solve the plasma characteristics and electromagnetic wave transmission attenuation.Numerical simulation results show that the peak electron number density of argon is about 12 times higher than that of helium, and that the electron number density increases with the augment of pressure, radio frequency(RF) power, and RF frequency. However, the electron number density first increases and then decreases as the discharge gap increases. The transmission attenuation of electromagnetic wave in argon discharge plasma is 8.5-d B higher than that of helium. At the same time, the transmission attenuation increases with the augment of the RF power and RF frequency, but it does not increase or decrease monotonically with the increase of gas pressure and discharge gap. The electromagnetic wave absorption frequency band of the argon discharge plasma under the optimal parameters in this paper can reach the Ku band. It is concluded that the argon CCP discharge under the optimal discharge parameters has great potential applications in plasma stealth.     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

脉冲射频容性耦合氩等离子体的发射探针诊断

利用工作在浮点模式下的发射探针,对500 Hz脉冲调制的27.12 MHz容性耦合氩气等离子体的空间电位和电子温度的时变特性进行了诊断.等离子体空间电位是通过测量强热状态下的发射探针电位获得的,而电子温度则是由发射探针在冷、热状态下的电位差来估算得到.测量结果表明:脉冲开启时,空间电位会快速上升并在300μs内趋于饱和;当脉冲关断后,空间电位经历了快速下降后趋于稳定的过程.电子温度在脉冲开启时存在过冲并趋于稳定的特征;而在脉冲关断期间,电子温度在300μs内则快速下降到0.45 e V后略有上升.无论在脉冲开启或关断期间,空间电位基本上都随功率和气压的变化存在有线性的依赖关系;而放电功率对脉冲开启期间过冲电子温度与稳态电子温度差异的影响较大.针对空间电位和电子温度在各阶段及不同放电条件下的时变特性,给出了相应的解释.     

双频容性耦合等离子体相分辨发射光谱诊断

采用相分辨发射光谱法, 对双频容性耦合纯Ar和不同含O₂量的Ar-O₂混合气体放电等离子体的鞘层激发模式进行了探究. 在射频耦合电源上极板的鞘层区域处观察到两种电子激发模式: 鞘层扩张引起的电子碰撞激发模式和二次电子引起的电子碰撞激发模式; 并发现这两种激发模式均受到低频射频电源周期的调制. 在纯Ar放电等离子体中, 两种激发模式的激发轮廓相似; 而在Ar-O₂混合气放电等离子体中, 随着含O₂量的增加, 二次电子的激发轮廓变弱. 此外, 利用相分辨发射光谱法对不同含O₂量的Ar-O₂混合气放电下Ar的 750.4 nm谱线的平均低频电源周期轴向分布进行了研究, 得到了距耦合电源上极板约3.8 mm处为双频容性耦合射频等离子体的鞘层边界. 关键词： 双频容性耦合等离子体 等离子体鞘层 发射光谱     

双频容性耦合等离子体密度径向均匀性研究

利用自主研制的全悬浮双探针, 对影响双频容性耦合等离子体径向均匀性的因素进行了研究. 发现低频功率、放电气压和放电间距对径向均匀性有明显影响. 合适的低频功率、放电气压及较大的极板间距可以得到更均匀的等离子体. 采用与实验相同的放电参数, 利用改进的二维流体模型进行理论模拟, 得到了不同极板间距下径向离子密度分布, 并和实验测量结果进行了比较, 两者的变化趋势基本符合. 关键词： 双频容性耦合等离子体 径向均匀性 全悬浮双探针 二维流体模型     

等离子体刻蚀工艺的物理基础

介绍了等离子体刻蚀工艺背景以及有关等离子体刻蚀机理的研究进展，综述了等离子体刻蚀机理的研究方法，着重阐述了电容耦合放电和电感耦合放电等离子体物理特性，特别是双频电容耦合放电等离子体和等离子体鞘层研究中的关键问题。     

具有空心阴极放电特征的射频放电的两电子组模型

 运用两电子组模型，考虑了射频放电中的α过程和γ过程两种电离机制，并结合流体模型，研究了中等气压下窄电极间隙容性耦合射频放电在运行模式转变区的等离子体密度以及电离速率分布等特性。理论研究表明，γ电离过程在高电流模式运行中起主要作用，并证实了此类放电中存在显著的电子摆钟效应，具有类似于空心阴极放电的特征。     

60MHz电容耦合等离子体中电子能量分布函数特性研究

甚高频(频率大于30 MHz)耦合放电源由于能产生大面积高密度的等离子体而受到了人们的广泛关注. 采用电流、电压探针以及朗缪尔探针诊断技术对60MHz射频激发产生的容性耦合等离子体的放电特性及电子行为进行了研究. 实验结果表明,等离子体的等效电阻/电容随着射频输入功率的增加而减小/增加;等离子体中电子行为不仅依赖于射频输入功率,还与放电气压密切相关;放电气压的增加导致电子能量概率分布函数(EEPF)从双温Maxwellian分布向Druyvesteyn分布转变,而且转变气压远低于文献所报道的数值,这主要是由于在60MHz容性耦合等离子体中电子反弹共振加热效率大为降低. 关键词： 甚高频容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

大气压脉冲调制射频氩气放电等离子体特性的数值研究

基于等离子体流体理论,建立了大气压脉冲调制射频氩气放电的一维流体模型。通过数值模拟的方 法研究了放电参数(放电电极间距、射频频率)对氩等离子体特性的影响。研究结果表明：当电压固定时,随着电 极间距的增加,等离子体区逐渐增大,最大电子密度也增加,在 0.20cm 达到最大值后略有降低;放电电流密度 与输入功率密度随着电极间距的增加而增加;鞘层区电子温度随着电极间距的增加而降低;在脉冲开启前期,等 离子体区电子温度随着电极间距的增加而增加,但当脉冲开启后期,电极间距对等离子体区电子温度影响较小。 不同射频频率下最大电子密度随电极间隙的增加而减小,也具有一个最优值。      

短管螺旋波放电中等离子体参数测量和模式转化研究

对长度为45 cm的短放电管螺旋波放电等离子体进行了Langmuir探针、原子发射光谱以及集成电荷耦合检测器(ICCD)检测诊断,研究螺旋波等离子体的放电特性.Langmuir探针数据显示电子密度在射频功率增加过程中出现两次大幅增长,由此确认了放电模式的转换及螺旋波放电模式的出现.发射光谱测量结果与Langmuir探针测量的电子密度数据一致,发现Ar原子和Ar离子的谱线强度与放电模式变化有着密切相关性.而通过对不同放电模式的ICCD测量,获得射频功率吸收因放电模式转变而变化的方式,认为放电模式转换时电子行为和能量传递方式也发生着变化.     

Basic characteristics of an atmospheric pressure rf generated plasma jet

A plasma jet has been developed which operates using radio frequency (rf) power and produces a stable homogeneous discharge at atmospheric pressure. Its discharge characteristics, especially the dependence of stable discharge operating range on the feed gas, were studied, and the electric parameters such as RMS current, RMS voltage and reflected power were obtained with different gas flows. These studies indicate that there is an optimum range of operation of the plasma jet for a filling with a gas mixture of He and O_2. Two "failure" modes of the discharge are identified. One is a filamentary arc when the input power is raised above a critical level, another is that the discharge disappears gradually as the addition of O_2 approaches 3.2%. Possible explanations for the two failure modes have been given. The current and voltage waveform measurements show that there is a clear phase shift between normal and failure modes. In addition, I－V curves as a function of pure helium and for 1% addition of oxygen have been studied.     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Non-linear lumped model circuit of capacitively coupled plasmas at the intermediate radio-frequencies

The discharge dynamics in geometrically asymmetric capacitively coupled plasmas are investigated via a lumped model circuit. A realistic reactor configuration is assumed. A single and two separate RF voltage sources are considered. One of the driven frequencies (the higher frequency) has been adjusted to excite a plasma series resonance, while the second frequency (the lower frequency) is in the range of the ion plasma frequency. Increasing the plasma pressure in the low pressure regime ($\le 100\text{mTorr}$) is found to diminish the amplitude of the self-excited harmonics of the discharge current, however, the net result is enhancing the plasma heating. The modulation of the ion density with the lower driving frequency affect the plasma heating considerably. The net effect depends on the amplitude and the phase of the ion modulation.     

Using sensitivity derivatives for design and parameter estimation in an atmospheric plasma discharge simulation

The problem of applying sensitivity analysis to a one-dimensional atmospheric radio frequency plasma discharge simulation is considered. A fluid simulation is used to model an atmospheric pressure radio frequency helium discharge with a small nitrogen impurity. Sensitivity derivatives are computed for the peak electron density with respect to physical inputs to the simulation. These derivatives are verified using several different methods to compute sensitivity derivatives. It is then demonstrated how sensitivity derivatives can be used within a design cycle to change these physical inputs so as to increase the peak electron density. It is also shown how sensitivity analysis can be used in conjunction with experimental data to obtain better estimates for rate and transport parameters. Finally, it is described how sensitivity analysis could be used to compute an upper bound on the uncertainty for results from a simulation.     

Driving frequency effects on the mode transition in capacitively coupled argon discharges

A one-dimensional fluid model is employed to investigate the discharge sustaining mechanisms in the capacitively coupled argon plasmas, by modulating the driving frequency in the range of 40 kHz-60 MHz. The model incorporates the density and flux balance of electron and ion, electron energy balance, as well as Poisson's equation. In our simulation, the discharge experiences mode transition as the driving frequency increases, from the γ regime in which the discharge is maintained by the secondary electrons emitted from the electrodes under ion bombardment, to the α regime in which sheath oscillation is responsible for most of the electron heating in the discharge sustaining. The electron density and electron temperature at the centre of the discharge, as well as the ion flux on the electrode are figured out as a function of the driving frequency, to confirm the two regimes and transition between them. The effects of gas pressure, secondary electron emission coefficient and applied voltage on the discharge are also discussed.     

悬浮型微波共振探针在电负性容性耦合等离子体中电子密度的测量

本文首先利用悬浮型微波共振探针测量了Ar等离子体的电子密度,并与朗缪尔双探针的测量结果进行了比较,表明了微波共振探针在低密度等离子体测量的可行性.对40.68 MHz单射频容性耦合Ar/SF₆和SF₆/O₂等离子体的测量结果表明:电负性气体SF₆掺入Ar等离子体显著降低了等离子体电子密度,但随着增加SF₆的流量,电子密度表现为缓慢下降;而O₂掺入SF₆等离子体中,电子密度则随着O₂流量的增加表现为持续的下降.另外,40.68 MHz/13.56 MHz双频激发的SF₆/O₂容性耦合离子体的电子密度并不随低频功率的变化而变化.本文对上述的实验现象进行了初步的解释.     

Influence of gas pressure on the pattern evolutions of dust clusters and fractals in a dusty plasma system

Dusty plasma has been produced through chemical reaction in a capacitively coupled radio frequency (rf) discharge system. Dust clusters with a few particles and dust fractals are observed. As gas pressure is increased, the suspended height of dust particles descends and the average interparticle distance decreases accordingly. The influence of gas pressure on the pattern evolutions is investigated. Dust clusters or fractals not only can evolve regularly on a horizontal plane, but also can evolve from a horizontal plane to a vertical line array. Under appropriate conditions, the evolutions are reversible. When the evolution is from a symmetrical pattern with a centre particle to another pattern, the centre particle will first show its unsteadiness.     

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

The plasma parameters such as electron density, effective electron temperature, plasma potential, and uniformity are investigated in a new dual‐frequency cylindrical inductively coupled plasma (ICP) source operating at two frequencies (2 and 13.56 MHz) and two antennas (a two‐turn high‐frequency antenna and a six‐turn low‐frequency (LF) antenna). It is found that the electron density increases with 2 MHz power, whereas the electron temperature and plasma potential decrease with 2 MHz power at a fixed 13.56 MHz power. Moreover, the plasma uniformity can be improved by adjusting the LF power. These results indicate that a dual‐frequency synergistic discharge in a cylindrical ICP can produce a high‐density, low‐potential, low‐effective‐electron‐temperature, and uniform plasma.