Modulation of absorption manner in helicon discharges by changing profile of low axial magnetic field

The modulation of absorption manner in helicon discharge by changing the profile of low axial magnetic field is explored experimentally in this work. The experiments are carried out in Boswell-type antenna driven by 13.56-MHz power source in 0.35-Pa argon environment. The peak of the external non-uniform magnetic field(B_(ex)) along the axis is observed in a range from 0 Gs to 250 Gs(1 Gs = 10~(-4) T), where the electron density varies from 0.5×10~(16) m~(-3) to 9×10~(16) m~(-3).When Bex is located near the tube upper end sealed by a dielectric plate, or near the tube bottom end connected with a diffusion chamber, the plasmas are centralized in the tube in the former case while the strong luminance appears between the edge of the tube and the axial line in the latter case. When Bex is located in the middle of the antenna, moreover, an effective resistance(R_(eff)) peak appears apparently with increasing magnetic field. The glow moves toward first the edge of the tube and then the two antenna legs as the magnetic field increases. The discharge in this case is caused by the absorption of Trivelpiece–Gould(TG) wave. It is suggested that B_(ex) is located in the middle of the antenna to obtain a higher efficiency of power transfer.     

Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology

Metal aluminum (Al) thin films are prepared by 2450-MHz electron cyclotron resonance plasma-assisted atomic layer deposition on glass and p-Si substrates using trimethylaluminum as the precursor and hydrogen as the reductive gas. We focus our attention on the plasma source for thin-film preparation and annealing of as-deposited films related to the surface square resistivity. The square resistivity of as-deposited Al film is greatly reduced after annealing and almost reaches the value of bulk metal. Through chemical and structure analysis we conclude that the square resistivity is determined by neither contaminant concentration nor surface morphology, but by both crystallinity and crystal size in this process.     

短管螺旋波放电中等离子体参数测量和模式转化研究

对长度为45 cm的短放电管螺旋波放电等离子体进行了Langmuir探针、原子发射光谱以及集成电荷耦合检测器(ICCD)检测诊断,研究螺旋波等离子体的放电特性.Langmuir探针数据显示电子密度在射频功率增加过程中出现两次大幅增长,由此确认了放电模式的转换及螺旋波放电模式的出现.发射光谱测量结果与Langmuir探针测量的电子密度数据一致,发现Ar原子和Ar离子的谱线强度与放电模式变化有着密切相关性.而通过对不同放电模式的ICCD测量,获得射频功率吸收因放电模式转变而变化的方式,认为放电模式转换时电子行为和能量传递方式也发生着变化.     

Characteristics and properties of metal aluminum thin films prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology

Metal aluminum (Al) thin films are prepared by 2450 MHz electron cyclotron resonance plasma-assisted atomic layer deposition on glass and p-Si substrates using trimethylaluminum as the precursor and hydrogen as the reductive gas. We focus our attention on the plasma source for the thin-film preparation and annealing of the as-deposited films relative to the surface square resistivity. The square resistivity of as-deposited Al films is greatly reduced after annealing and almost reaches the value of bulk metal. Through chemical and structural analysis, we conclude that the square resistivity is determined by neither the contaminant concentration nor the surface morphology, but by both the crystallinity and crystal size in this process.     

介质阻挡放电等离子体中·OH和HO2·自由基的数值模拟计算

在介质阻挡放电等离子体N2／O2／H2O／HCHO体系中通过解Boltzmann方程,得到电子能量分布函数,利用得到的电子能量分布函数计算电子。分子碰撞反应速率常数。然后把有关的反应速率常数带入速率方程,计算得到该体系在介质阻挡放电时,·OH、HO2·和电子的浓度随时间的演变以及·OH、HO2·浓度随H2O、O2摩尔分数的变化,并将模拟结果与实验值进行了对比,两者符合得较好。     

介质阻挡放电等离子体中OH自由基的光腔衰荡光谱原位诊断

研制了一套等效噪声吸收可达3×10^-9cm^-1的连续波光腔衰荡光谱装置。用该装置对介质阻挡放电等离子体中的OH自由基和水进行了原位定量测量,考察了OH自由基数密度随气压和放电电压以及放电频率的变化情况。实验结果表明,在(2.13~22.0)Χ10³Pa范围内,随着气压增加,OH自由基数密度在气压较低时增加;而在较高气压时由于H₂O的解离吸附作用使得体系中电子密度减小,OH自由基数密度随之减小。随放电电压和放电频率增加介质阻挡放电等离子体中电子密度和电子能量增加而导致OH数密度增加。     

介质阻挡放电氢等离子体中氢原子浓度的光谱诊断

在化学气相沉积功能材料等离子体刻蚀及表面处理等过程中, 氢原子起着非常重要的作用。文章详细论述了利用发射光谱技术诊断氢原子的基本原理,以氩气作为内标对介质阻挡放电氢等离子体中的氢原子浓度进行了定量的诊断,研究了氢原子浓度、氢分子解离率随气压的变化规律。发现在0.32到5.1 kPa气压范围内,氢分子的解离率由5.2%下降到0.089%,相应的氢原子浓度由4.9×1015·cm-3下降到1.3×1015·cm-3。文章还研究了氢Balmer系以及氩(750.4 nm)谱线的发射强度随气压、放电电压、频率等放电参数的变化规律。     

不同电介质结构下介质阻挡放电特性研究

设计制作了单面有氧化铟锡(ITO)导电介质层的双玻璃介质层的介质阻挡放电装置,研究了其放电特性,并将其与双玻璃介质层和单玻璃介质层的介质阻挡放电进行了比较.从电荷输运的角度分析,上述三种装置分别实现了电荷的二维、零维和三维输运.采用两种不同的双玻璃介质层装置,获得了单个稳定的放电丝.与无ITO导电层的双玻璃结构得到的单个放电丝相比,单面有导电ITO介质的双玻璃结构中,单放电丝呈"T"字型,其光晕是前者光晕的2倍,其放电电流大于前者电流,其放电时间间隔长短交替现象更为明显,且存在强度大小交替的现象.分析表明,壁电荷输运及二次电子发射的不同导致了不同电介质结构放电特性的不同. 关键词： 介质阻挡放电 壁电荷 二次电子发射     

介质阻挡放电等离子体中·OH和HO2·自由基的数值模拟计算

在介质阻挡放电等离子体N2/O2/H2O/HCHO体系中通过解Boitzmann方程,得到电子能量分布函数,利用得到的电子能量分布函数计算电子-分子碰撞反应速率常数.然后把有关的反应速率常数带入速率方程,计算得到该体系在介质阻挡放电时,·OH、HO2·和电子的浓度随时间的演变以及·OH、HO2·浓度随H2O、O2摩尔分数的变化,并将模拟结果与实验值进行了对比,两者符合得较好.     

大气压射流等离子体中O及OH自由基的发射光谱在线诊断

OH自由基及氧原子在大气化学、表面处理及化学污染物分解等方面有着重要的作用。利用发射光谱技术在线测量了大气压射流等离子体中OH自由基紫外波段与O自由基777,844 nm波段的发射光谱。研究了OH自由基与氧原子光谱强度随放电功率及放电体系中所加入的氧浓度的变化。将实验测得的OH自由基光谱图与用Lifbase数据库模拟光谱图进行比较,估算了OH自由基的转动温度。结果表明:OH自由基的转动温度随放电功率的增加而增加,随工作气体流速的增加而减小。