P(o)schl-Teller势阱中非局域效应对透射光谱的影响

在考虑半导体量子阱中导带电子对外加激光场非局域光学响应的情况下,利用格林函数方法推导出了光透射率的解析表达式,并以典型的GaAs/AlGaAs为材料的P(o)schl-Teller量子势阱为例进行数值计算.计算结果表明,由于电子对激光场的非局域光学响应,半导体量子阱的透射光谱的谱线在共振峰附近出现明显地蓝移,蓝移的大小与量子阱宽度有紧密的联系.在有效的纳米尺度范围内,半导体量子阱越宽,透射谱线的蓝移也就越大.另外,光场强度和量子阱结构参数等因素对透射光谱的影响也被澄清.     

有机量子阱的光学性质

采用多源有机分子气相沉积系统(OMBD)制备了Alq₃，PBD/Alq₃，PBD/Alq₃/PBD单层、双层以及量子阱结构，利用电化学循环伏安法和吸收光谱、荧光光谱研究了量子阱的类型和样品的光致发光特性.电化学循环伏安法和吸收光谱的测量结果表明，PBD/Alq₃有机量子阱为Ⅰ型量子阱结构.荧光光谱的研究结果表明，单层Alq₃的光致发光峰不随Alq₃厚度变化而变化；但是双层PBD/Alq₃结构光致发光峰随Alq₃厚度的减小而发生蓝移；同样对于PBD/Alq₃/PBD量子阱结构光致发光峰随Alq₃厚度的减小而发生蓝移.对引起光谱蓝移的原因进行了讨论. 关键词： 有机量子阱 光谱蓝移     

Si杂质扩散诱导InGaAs/AlGaAs量子阱混杂的研究（英文）

光学灾变损伤(COD)常发生于量子阱半导体激光器的前腔面处,极大地影响了激光器的出光功率及寿命。通过杂质诱导量子阱混杂技术使腔面区波长蓝移来制备非吸收窗口是抑制腔面COD的有效手段,也是一种高效率、低成本方法。本文选择了Si杂质作为量子阱混杂的诱导源,使用金属有机化学气相沉积设备生长了InGaAs/AlGaAs量子阱半导体激光器外延结构、Si杂质扩散层及Si 3 N 4保护层。热退火处理后,Si杂质扩散诱导量子阱区和垒区材料互扩散,量子阱禁带变宽,输出波长发生蓝移。退火会影响外延片的表面形貌,而表面形貌则可能会影响后续封装工艺中电极的制备。结合光学显微镜及光致发光谱的测试结果,得到825℃/2 h退火条件下约93 nm的最大波长蓝移量,也证明退火对表面形貌的改变,不会影响波长蓝移效果及后续电极工艺。     

Zn杂质扩散诱导AlGaInP/GaInP量子阱混杂

杂质扩散诱导量子阱混杂技术可用于制作腔面非吸收窗口,提高大功率半导体激光器的输出功率.以Zn2As2为扩散源,采用闭管扩散方式,在550℃下对650 nm半导体激光器的外延片进行了一系列Zn杂质扩散诱导量子阱混杂的实验.实验发现,随着扩散时间从20～120 min,样品光致发光(PL)谱蓝移偏移增加,峰值波长蓝移53 nm;当扩散时间超过60 min后,样品的PL谱中不仅出现了常见的蓝移峰,同时还出现了红移峰,峰值波长红移32 nm.分析表明PL谱蓝移来自Zn扩散引起的AlGaInP/GaInP间的量子阱混杂;红移来自Zn杂质扩散对样品中Ga0.51In0.49P缓冲层的影响.还研究了扩散温度(550℃)和扩散时间对样品晶体品质的影响,并在理论上计算了AlGaInP/GaInP量子阱混杂巾的Al-Ga的互扩散系数.     

聚焦Ga~ 离子束注入方法研制半导体量子线结构

采用聚焦Ga~ 离子束注入方法,在GaAs/Al_(0.3)Ga_(0.7)As多量子阱材料上尝试制备半导体量子线。通过低温光致发光谱,测量了量子线的光电特性,并观察了由于沟道效应导致的深层量子阱的光谱蓝移。     

InAs／InP量子点的喇曼散射谱

对LP－MOCVD生长InAs量子点进行了背散射几何配置下的拉曼散射分析和比较，发现InAs量子点的LO模和TO模与体材料相比发生了较大程度的蓝移。考虑应变和限制效应的理论计算结果与实验吻合较好。加入GaAs薄张应变层的InAs量子点的LO模和TO模发生了更大程度的蓝移，同时无InP盖层的样品观察到应变的部分释放。     

InGaAs(P)/InP量子阱混合处理对其光电特性的影响

用离子注入诱导无序（IICD）和无杂质空位扩散诱导无序（IFVD）方法研究了InGaAs(P)/InP量子阱结构的混合造成材料光电特性变化，带隙蓝移的规律。研究结果发现，IICD造成的带隙蓝移与离子注入的种类、剂量、注入后退火温度，时间有关，也和样品存在的应力有关。具有压应力的样品产生的蓝移量比具有应力的大。IFVD方法造成的带隙蓝移量与介质膜的种类，后继退火温度，退火时间有关。同时还发现，蓝移量与半导体盖层成分和介质层成分的组合有关，InGaAs与SiO2组合产生的蓝移比InP与SiO2组合的大。介质层的掺杂也影响蓝移量，掺P的SiOxPyNx可以产生高达224meV的蓝移，目前尚未见其他报道，二次离子质谱（SIMS）研究说明，量子阱层元素的互扩散可能是造成带隙蓝移的主要原因。     

组分对Cu-Zn-In-S/ZnS核壳量子点发光性能的影响

利用热注射法通过调控Cu/Zn比例制备了不同组分的Cu-Zn-In-S/ZnS核壳量子点,通过紫外-可见吸收光谱以及稳态和时间分辨光谱分析Cu/Zn比例对量子点发光性能的影响.结果表明,不同组分Cu-Zn-In-S/ZnS核壳量子点呈现闪锌矿结构且晶粒尺寸接近;随着Cu/Zn比例的减小,Cu-Zn-In-S/ZnS核壳量子点的带隙变宽,导致吸收光谱发生蓝移;当Cu/Zn比例从6/1减小到1/6时,量子点的发光峰位从640nm蓝移529nm.由于Zn2+替代Cu+能够减少Cu原子缺陷的形成,从而提高了量子点的荧光效率;当Cu/Zn=1/6时,样品中观测到Cu+离子发光和较长的荧光寿命.     

NPB/Alq3有机量子阱光电特性研究

利用热蒸发的方法制备了有机量子阱发光器件和Alq3单层发光器件,其中NPB(N,N′-Di-[(lnaphthalenyl)-N,N′-diphenyl]-(1,1′-biphenyl)-4,4′-diamine)作垒层,Alq3(Tris-(8-quinolinolato) aluminum)作阱层,量子阱结构类似于无机半导体的Ⅱ型量子阱结构.实验发现有机量子阱发光器件结构中存在垒层向阱层的F(o)rster无辐射共振能量转移,具有良好的电流-电压特性,光谱的窄化及蓝移,并且光谱的蓝移程度随电压的增大而逐渐增强.     

异丙醇对油溶性CdSe团簇量子点荧光的影响

为了探究异丙醇对胶体CdSe团簇量子点荧光光谱的影响,使用胶体化学法在油酸-石蜡体系下合成CdSe团簇量子点,对团簇量子点和异丙醇采用不同的混合比例,得到了其修饰之后的荧光发光谱(PL)和紫外吸收(UV)光谱,并采用曲线拟合的方法对团簇量子点的光学性能进行了研究。通过对AFM和傅里叶红外光谱的分析,探讨了CdSe团簇量子点光学性能改变的内在联系。结果表明:随着异丙醇浓度的增加,量子点的荧光峰出现11 nm的蓝移,且蓝移曲线呈阶梯状变化;相对荧光强度也呈现出先上升再下降的波动性变化,且波动幅度最大能达到1 000 a.u.;量子点的第一吸收峰和第二吸收峰都会发生不同程度的红移,且最大红移达到12 nm。     

Photoluminescence studies of confined states in AlGaAs/GaAs asymmetric quantum well

In the recombination spectra of AlGaAs/GaAs heterostructures, a peculiar and asymmetric photoluminescence (PL) band F has previously been reported [Aloulou et al., Mater. Sci. Eng. B 96 (2002) 14] to be due to recombinations of confined electrons from the two-dimensional electron gas (2DEG) formed at AlGaAs/GaAs interface in asymmetric quantum well (AQW). Detailed experiments are reported here on GaAs/Al_0.31Ga_0.69As/GaAs:δSi/Al_0.31Ga_0.69As/GaAs samples with different spacer layer thicknesses. We show that the band F is the superposition of two PL bands F′ and F″ associated, respectively, to AQW and a symmetric quantum well (SQW). In the low excitation regime, the F′ band present a blue shift (4.4 meV) followed by important red shift (16.5 meV) when increasing optical excitation intensity. The blue shift in energy is interpreted in terms of optical control of the 2DEG density in the AQW while the red shift is due to the narrowing of the band gaps caused by the local heating of the sample and band bending modification for relatively high-optical excitation intensity. Calculation performed using self-consistent resolution of the coupled Schrödinger–Poisson equations are included to support the interpretation of the experimental data.     

图形衬底量子线生长制备与荧光特性研究

报道了在V型槽图形衬底上利用分子束外延技术外延生长的GaAs/AlGaAs量子线.外延截面在扫描电子显微镜下可以看到在V型槽底部形成了弯月型量子线结构,量子线尺寸约为底边60 nm高14 nm的近三角形.低温87 K下光致发光谱测试在793.7和799.5 nm处出现峰值,验证了量子线的存在.理论近似计算结果显示,相比等宽度量子阱有8 meV的蓝移正是由于横向量子限制引起的. 关键词： V型槽图形衬底 量子线 GaAs     

Applications of neutral impurity disordering in fabricating low-loss optical waveguides and integrated waveguide devices

Novel applications of impurity-induced disordering (IID) in semiconductor integrated optoelectronics are discussed and some requirements of the IID process are quantified. The effect of boron and fluorine as disordering species, in both GaAs/AlGaAs and GaInAs/AlGaInAs, has been studied. Because boron and fluorine are not active dopants at room temperature, low-loss high-resistivity waveguides can be formed. In the GaAs/AlGaAs system fluorine has been found to produce larger changes than boron for similar annealing conditions. Fluorine-disordered multiple quantum well waveguide structures exhibited blue shifts of up to 100 meV in the absorption edge (representing complete disordering). The absorption coefficient in partially disordered structures at near-band-edge wavelengths was as low as 4.7 dB cm^–1. This absorption edge shift was accompanied by substantial changes, (>1%) in the refractive index. Boron- and fluorine-induced disordering of GaInAs/AlGaInAs quantum well structures lattice-matched to InP has also been investigated. Only small blue shifts in the exciton peak, ascribed to implantation damage, were observed in boron-implanted samples, but blue shifts of over 40 meV (again representing complete disordering) were observed in the fluorine-implanted samples.     

Growth of quantum wire arrays by MBE on nonplanar substrates

With single-step molecular beam epitaxy growth, GaAs/AlGaAs quantum wire (QW wire) arrays were fabricated over mesas an GaAs nonplanar substrates patterned by conventional photolithography and wet chemical etching. Faceting and surface migration of atoms during crystal growth resulted in lateral variation in the quantum well (QW) layer thickness on different facet planes. This caused the tops of the mesas to be sharp enough to provide lateral quantum-size-effects (QSEs). In conventional photoluminescence (PL), PL with a micro-optical-system, and photoreflectance measurements under different conditions, a large blue shift was observed in the energy level positions for electronic transitions corresponding to QWs at the tops of mesas compared with those corresponding to QWs on nonpatterned areas of the same substrate. The blue shift was in contradiction with the fact that the GaAs QW layers at the tops of mesas were thicker than those on nanpatterned areas, and illustrated the realization of QW wires at the tops of mesas. Calculations also proved that there was a lateral QSE at the tops of mesas and this was further proof for the formation of QW wires there.     

Structural and optical properties of a catalyst-free GaAs/AlGaAs core–shell nano/microwire grown on (1 1 1)Si substrate

Heterostructure in the catalyst-free GaAs nanowire grown on the Si substrate was studied for the application of optical devices in the next generation. We fabricated AlGaAs/GaAs/AlGaAs quantum well (QW) structure on the side facet of the catalyst-free GaAs nanowire grown by molecular beam epitaxy (MBE). The cathode luminescence (CL) measurement showed that the uniform GaAs quantum well was formed between AlGaAs shell layers. On the basis of this structure, we also grew the thick AlGaAs shell layers (∼700 nm) on GaAs nanowires, and observed whispering gallery mode (WGM) resonant in the thick AlGaAs hexagonal structure.     

Electron paramagnetic resonance study of the nuclear spin dynamics in an AlAs quantum well

The nuclear spin dynamics in an asymmetrically doped 16-nm AlAs quantum well grown along the [001] direction has been studied experimentally using the time decay of the Overhauser shift of paramagnetic resonance of conduction electrons. The nonzero spin polarization of nuclei causing the initial observed Overhauser shift is due the relaxation of the nonequilibrium spin polarization of electrons into the nuclear subsystem near electron paramagnetic resonance owing to the hyperfine interaction. The measured relaxation time of nuclear spins near the unity filling factor is (530 ± 30) min at the temperature T = 0.5 K. This value exceeds the characteristic spin relaxation times of nuclei in GaAs/AlGaAs heterostructures by more than an order of magnitude. This fact indicates the decrease in the strength of the hyperfine interaction in the AlAs quantum well in comparison with GaAs/AlGaAs heterostructures.     

A study of GaInP/GaAs interfaces: metallurgical coupling of successive quantum wells

We present a study of GaInP/GaAs interfaces by means of photoluminescence (PL) of multi quantum wells (MQW), embedded in GaInP, or asymmetric structures having an AlGaAs barrier GaInP/GaAs/AlGaAs. The PL energies of quantum wells were compared with calculations based on the transfer matrix envelope function approximation, well suited for asymmetric structures. GaInP/GaAs/AlGaAs MQW structures (GaInP grown first) are in reasonably good agreement with calculations. Reverse ones, AlGaAs/GaAs/GaInP, present a lower PL energy than calculated. But the agreement with theory is recovered on single quantum well samples, or in MQW when the GaInP thickness is increased up to 100 nm. We interpret this phenomenon as a diffusion of arsenic atoms from the next GaAs well through the GaInP barrier. Arsenic atoms exchange with phosphorus atoms at the GaInP-on-GaAs interface of the former well, leading to a small gap strained InGaAs region responsible for the lowering of PL energies.     

Suppressed intermixing in InAlGaAs/ AlGaAs/GaAs and AlGaAs/GaAs quantum well heterostructures irradiated with a KrF excimer laser

The influence of gallium arsenide surface modification induced by irradiation with a KrF excimer laser on the magnitude of the quantum well (QW) intermixing effect has been investigated in InAlGaAs/AlGaAs/GaAs QW heterostructures. The irradiation in an air environment with laser pulses of fluences between 60 and 100 mJ/cm² has resulted in the formation of a gallium oxide-rich film at the surface. Following the annealing at 900 °C, up to 35 nm suppression of the band gap blue shift was observed in all the laser irradiated samples when compared to the non-irradiated samples. The origin of suppression has been discussed in terms of stress controlled diffusion. PACS 78.55.Et; 66.30.Lw; 73.21.Fg     

GaAs quantum well structures investigation by local cathodoluminescence

The article shows the cathodoluminescence technique application to a quality analysis of a semiconductor multilayer heterostructures. Two structures with a GaAs quantum well embedded between the AlGaAs and GaInP barriers were investigated. The AlGaAs/GaAs/GaInP and GaInP/GaAs/AlGaAs structures were grown by MOCVD on a GaAs substrate. In this work we study the interface quality of quantum-dimensional GaAs layer by means of the local cathodoluminescence. Degradation and broadening of GaAs/GaInP interface occurring during the growth process of GaAs on GaInP layer was assumed to result in the formation of a layer with mixed composition at the interface. In addition, the presence of the layer prevented the formation of a quantum well in the GaAs layer. The transition layer was clearly observed by the cathodoluminescence. In the other case it was found that the growth of a structure with GaAs layer on top of AlGaAs produced a quantum well with a 10 nm thickness. The interface quality and layer thicknesses were also confirmed by the X-ray diffraction investigation of these structures.     

脉冲软X光辐射三种材料的喷射冲量实验研究

在强光一号脉冲加速器上进行了国内首次的实验室软X光辐射三种材料的喷射冲量研究。结果表明，在能量为(0.2～0.33)keV、平均脉宽为39ns左右的X光辐射下，对灰漆、白漆和硬铝，在能注量分别为(92～152)J/cm2、(115～136)J/cm2和(163～192)J/cm2时，它们的冲量耦合系数分别为(0.61～0.80)Pa·s/(J·cm-2)、(0.58～0.97)Pa·s/(J·cm-2)和(0.61～0.84)Pa·s/(J·cm-2)。