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1.
研究了Si3N4层在ZrN/Si3N4纳米多层膜中的晶化现象及其对多层膜微结构与力学性能的影响. 一系列不同Si3N4层厚度的ZrN/Si3N4纳米多层膜通过反应磁控溅射法制备. 利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能. 结果表明,由于受到ZrN调制层晶体结构的模板作用,溅射条件下以非晶态存在的Si3N4层在其厚度小于0.9 nm时被强制晶化为NaCl结构的赝晶体,ZrN/Si3N4纳米多层膜形成共格外延生长的柱状晶,并相应地产生硬度升高的超硬效应. Si3N4随层厚的进一步增加又转变为非晶态,多层膜的共格生长结构因而受到破坏,其硬度也随之降低. 相似文献
2.
采用反应磁控溅射法制备了一系列具有不同Si3N4层厚度的AlN/Si3N4纳米多层膜,利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能.研究了Si3N4层在AlN/Si3N4纳米多层膜中的晶化现象及其对多层膜生长结构与力学性能的影响.结果表明,在六方纤锌矿结构的晶体AlN调制层的模板作用下,通常溅射条件下以非晶态存在的Si3N4层在其厚度小于约1nm时被强制晶化为结构与AlN相同的赝形晶体,AlN/Si3N4纳米多层膜形成共格外延生长的结构,相应地,多层膜产生硬度升高的超硬效应.Si3N4随层厚的进一步增加又转变为非晶态,多层膜的共格生长结构因而受到破坏,其硬度也随之降低.分析认为,AlN/Si3N4纳米多层膜超硬效应的产生与多层膜共格外延生长所形成的拉压交变应力场导致的两调制层模量差的增大有关.
关键词:
3N4纳米多层膜')" href="#">AlN/Si3N4纳米多层膜
外延生长
赝晶体
超硬效应 相似文献
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Gao Bo Liu Gang Wang Li-Xin Han Zheng-Sheng Song Li-Mei Zhang Yan-Fei Teng Rui Wu Hai-Zhou 《中国物理 B》2013,22(3):36103-036103
Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor (VDMOS) devices with composite SiO2-–Si3N4 film gate are investigated. The relationships among the important electrical parameters of the samples with different thickness SiO2-–Si3N4 films, such as threshold voltage, breakdown voltage, and on-state resistance in accumulated dose, are discussed. The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose. However, the relationships between the threshold voltages of the samples and the accumulated dose are more complex, not only positive drift, but also negative drift. At the end of the total dose experiment, we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies. We find that the samples with appropriate thickness ratio SiO2-–Si3N4 films have a good radiation-hardening ability. This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-–Si3N4 films. 相似文献
5.
L.G. Gao K.B. Yin L. Chen H.X. Guo Y.D. Xia J. Yin Z.G. Liu 《Applied Surface Science》2009,256(1):90-95
Thermal stability, interfacial structures and electrical properties of amorphous (La2O3)0.5(SiO2)0.5 (LSO) films deposited by using pulsed laser deposition (PLD) on Si (1 0 0) and NH3 nitrided Si (1 0 0) substrates were comparatively investigated. The LSO films keep the amorphous state up to a high annealing temperature of 900 °C. HRTEM observations and XPS analyses showed that the surface nitridation of silicon wafer using NH3 can result in the formation of the passivation layer, which effectively suppresses the excessive growth of the interfacial layer between LSO film and silicon wafer after high-temperature annealing process. The Pt/LSO/nitrided Si capacitors annealed at high temperature exhibit smaller CET and EOT, a less flatband voltage shift, a negligible hysteresis loop, a smaller equivalent dielectric charge density, and a much lower gate leakage current density as compared with that of the Pt/LSO/Si capacitors without Si surface nitridation. 相似文献
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利用直流脉冲磁控溅射法在室温下制备无氢SiNx薄膜.通过傅里叶变换红外光谱、台阶仪、紫外—可见分光光度计、接触角测量仪、透湿测试仪等表征技术,分析了N2流量、Si靶溅射功率等实验参数对SiNx薄膜成分、结构、及阻透性能、透光性能、接触角等性能的影响.研究结果表明,Si靶溅射功率固定时,在低N2流量条件下,或N2流量固定时,在高Si靶溅射功率条件下,制备的SiN
关键词:
x')" href="#">SiNx
磁控溅射
微观结构
阻透性能 相似文献
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Xiang FengXiang Qi Jun LiLiwen Yang Mengchun QiuJinjie Yin Fang LuJianxin Zhong 《Applied Surface Science》2011,257(13):5571-5575
Bi2SiO5 modified Si nanowire array films were fabricated as photo-catalysts via dip-coating Bi(NO3)3 on silver-assisted electroless wet chemical etching Si nanowires and subsequently annealing. The structures and morphologies of as-prepared samples are characterized by X-ray diffraction, Fourier transform infrared spectrum, scanning electron microscopy and transmission electron microscopy. The results of photocatalytic experiments indicated that the Bi2SiO5 modified Si nanowire arrays benefit the improvement for efficient electron-hole separation and photo-catalytic stability, thereby possessing superior photo-degradation performance. These hybrid nanowire arrays will be promising materials for photo-catalysts and degradation agents. 相似文献
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HfC/Si3N4 nanomultilayers with various thicknesses of Si3N4 layer have been prepared by reactive magnetron sputtering. Microstructure and mechanical properties of the multilayers have been investigated. The results show that amorphous Si3N4 is forced to crystallize and grow coherently with HfC when the Si3N4 layer thickness is less than 0.95 nm, correspondingly the multilayers exhibit strong columnar structure and achieve a significantly enhanced hardness with the maximum of 38.2 GPa. Further increasing Si3N4 layer thickness leads to the formation of amorphous Si3N4, which blocks the coherent growth of multilayer, and thus the hardness of multilayer decreases quickly. 相似文献
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A series of TiSixNy superhard coatings with different Si contents were prepared on M42 steel substrates using two Ti and two Si targets by reactive magnetron sputtering at 500 °C. These samples were subsequently vacuum-annealed at 500, 600, 700, 800 and 900 °C, respectively. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), microindenter, Rockwell hardness tester and scratch tester were applied to investigate the microstructure, phase configuration, hardness and adhesion properties of as-deposited and annealed samples. The results indicated that there were two bonds, TiN and Si3N4, in all presently deposited TiSixNy thin films, that structure was nanocomposite of nanocrystalline (nc-) TiN embedded into amorphous Si3N4 matrices. Annealing treatment below 900 °C played a little role in microstructure and hardness of the coatings although it greatly affected those of steel substrates. The film-substrate adhesion strength was slightly increased, followed by an abrupt decrease with increasing annealing temperature. Its value got to the maximum at 600 °C. Annealing had little effect on the friction coefficient with its value varying in the range of 0.39-0.40. 相似文献
11.
成功生长了Co50Ni21Ga29:Si(x=1,2)单晶样品,对其磁性,马氏体相变及其相关性质进行了细致的测量.发现掺Si成分的单晶具有非常迅速的马氏体相变行为、2.5%的大相变应变、大于100 ppm的磁感生应变和4.5%的相变电阻.进一步研究指出,在CoNiGa合金中掺入适量Si元素,能够降低材料的马氏体相变温度,减小相变热滞后,提高材料的居里温度,并使得磁性原子的磁矩有所降低.尤其重要的是Si元素的添加能够增大材料马氏体的磁晶各向异性能,改善马氏体变体的迁移特性,从而获得更大的磁感生应变.
关键词:
铁磁形状记忆合金
Heusler合金
50Ni21Ga29Six')" href="#">Co50Ni21Ga29Six 相似文献
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B. Podmiljšak B. Markoli P.J. McGuiness S. Kobe 《Journal of magnetism and magnetic materials》2009,321(4):300-304
Gd5Si2Ge2-based alloys can exhibit a giant magnetocaloric effect (GMCE); this gives them the potential for use in cooling technologies. It has also been reported that a small addition of iron reduces the hysteresis losses in Gd5Si2Ge2-based alloys, thus increasing the net refrigerating capacity. In this investigation, we have been the first to look at the effect on the microstructure and magnetic properties of Gd5Si2Ge2 resulting from a wide range of substitutions of Si by Fe. The macrostructures of the arc-melted buttons revealed some very unusual surface morphologies, and the analytical results revealed a gradual substitution of the Gd5(Si,Ge,Fe)4-type phase by a Gd5(Si,Ge,Fe)3-type phase and the presence of three grain-boundary phases, two of which contain substantial amounts of iron. The magnetic measurements indicated that larger amounts of iron reduced the hysteresis losses, but at the same time reduced the Curie temperatures to below lower values that would make the material useful in practice. 相似文献
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Amorphous silicon nitride (a-SiNx) films were deposited using plasma-enhanced chemical-vapor deposition (PECVD) and subsequently, thermal annealing processes were performed at 700-1000 °C in the ultra-high vacuum (UHV) condition. A strong photoluminescence (PL) peak induced by luminescent defect centers was observed at 710 nm for the as-deposited sample. When the sample was annealed at 700-1000 °C, the PL peak intensity became about 3-12 times stronger with no shift of the PL peak. To investigate the origin of the change in PL peak intensity after the thermal annealing, Si 2p and N 1s core-level spectra were systematically analyzed by high-resolution photoemission spectroscopy (HRPES) using synchrotron radiation. In particular, N 1s spectra were decomposed with three characteristic nitrogen-bonding states. It is revealed that the nitrogen bonding state with N-Si and NSi2 configurations (denoted as N3) contributes mainly to the change in PL peak intensity. We note that luminescent nitrogen related defect centers such as N4+ and N2° are localized in the state N3. Detailed analysis of the experimental results shows that the state N3 is located in the interface bounded by the region of the nano-sized stoichiometric silicon nitride Si3N4 (denoted as N1) and is considerably influenced by the thermal annealing, which is an appropriate process to cause strong photoluminescence of the related samples as mentioned above. 相似文献
15.
Zuci Quan Hao Hu Shishang Guo Wei Liu Sheng Xu Huiming Huang Bobby Sebo Guojia Fang Meiya Li Xingzhong Zhao 《Applied Surface Science》2009,255(22):9045-9053
Ba0.9Sr0.1TiO3 (BST) thin films were deposited on fused quartz and Pt/TiN/Si3N4/Si substrates by radio frequency magnetron sputtering technique. Microstructure and chemical bonding states of the BST films annealed at 700 °C were characterized by field emission scanning electron microscopy, X-ray photoelectron spectroscopy, glancing angle X-ray diffraction and Raman spectrum. Optical constants including refractive indices, extinction coefficients and bandgap energies of the as-deposited BST film and the BST films annealed at 650, 700 and 750 °C, respectively, were determined from transmittance spectra by envelope method and Tauc relation. Dielectric constant and remnant polarization for the BST films increase with increasing annealing temperature. Leakage current density-applied voltage (J–V) data indicate that the dominant conduction mechanism for all the BST capacitors is the interface-controlled Schottky emission under the conditions of 14 V < V < 30 V and −30 V < V < −14 V. Furthermore, the inequipotential J–V characteristics for the BST films annealed at various temperatures are mainly attributed to the combined effects of the different thermal histories, relaxed stresses and strains, and varied Schottky barrier heights in the BST/Pt and Pt/BST interfaces. 相似文献
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SiCxNy thin films with different nitrogen contents were deposited by way of incorporation of different amounts of nitrogen into SiC0.70 using unbalanced reactive dc magnetron sputtering method. Their phase configurations, nanostructures and mechanical behaviors were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, high-resolution transmission electron microscopy (HRTEM) and microindentation methods. The result indicated SiC0.70 and all SiCxNy thin films exhibited amorphous irrespective of the nitrogen content. The phase configuration and mechanical behaviors of SiCxNy thin films strongly depended on nitrogen content. SiC0.70 exhibited a mixture consisting of SiC, Si and a small amount of C. Incorporated nitrogen, on one hand linked to Si, forming SiNx, on the other hand produced CNx and C at the expense of SiC. As a result, an amorphous mixture consisting of SiC, SiNx, C and CNx were produced. Such effects were enhanced with increase of nitrogen content. A low hardness of about 16.5 GPa was obtained at nitrogen-free SiC0.70. Incorporation of nitrogen or increase of nitrogen content increased the film hardness. A microhardness maximum of ∼29 GPa was obtained at a nitrogen content of 15.7 at.%. This value was decreased with further increase of N content, and finally a hardness value of ∼22 GPa was obtained at a N content of ∼25 at.%. The residual compressive stress was consistent with the hardness in the nitrogen content range of 8.6-25.3 at.%. 相似文献
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Pb(Zr0.52Ti0.48)O3 (PZT) thin films with large remanent polarization and SrBi2Ta2O9 (SBT) thin films with excellent fatigue-resisting characteristic have been widely studied for non-volatile random access memories, respectively. To combine these two advantages, bilayered Pb(Zr0.52Ti0.48)O3/SrBi2Ta2O9 (PZT/SBT) thin films were fabricated on Pt/TiO2/SiO2/Si substrates by chemical solution deposition method. X-ray diffraction patterns revealed that the diffraction peaks of PZT/SBT thin films were completely composed of PZT and SBT, and no other secondary phase was observed. The electrical properties of the bilayered structure PZT/SBT films have been investigated in comparison with pure PZT and SBT films. PZT/SBT bilayered thin films showed larger remanent polarization (2Pr) of 18.37 μC/cm2 than pure SBT and less polarization fatigue up to 1 × 109 switching cycles than pure PZT. These results indicated that this bilayered structure of PZT/SBT is a promising material combination for ferroelectric memory applications. 相似文献
18.
Two-layer ZrO2/SiO2 and SiO2/ZrO2 films were deposited on K9 glass substrates by sol–gel dip coating method. X-ray photoelectron spectroscopy (XPS) technique was used to investigate the diffusion of ZrO2/SiO2 and SiO2/ZrO2 films. To explain the difference of diffusion between ZrO2/SiO2 and SiO2/ZrO2 films, porous ratio and surface morphology of monolayer SiO2 and ZrO2 films were analyzed by using ellipsometry and atomic force microscopy (AFM). We found that for the ZrO2/SiO2 films there was a diffusion layer with a certain thickness and the atomic concentrations of Si and Zr changed rapidly; for the SiO2/ZrO2 films, the atomic concentrations of Si and Zr changed relatively slowly, and the ZrO2 layer had diffused through the entire SiO2 layer. The difference of diffusion between ZrO2/SiO2 and SiO2/ZrO2 films was influenced by the microstructure of SiO2 and ZrO2. 相似文献
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The fracture toughness property (K1C) of Si3N4 and ZrO2 engineering ceramics was investigated by means of CO2 and a fibre laser surface treatment. Near surface modifications in the hardness were investigated by employing the Vickers indentation method. Crack lengths and the crack geometry were then measured by using the optical microscopy. A co-ordinate measuring machine was used to investigate the diamond indentations and to measure the lengths of the cracks. Thereafter, computational and analytical methods were employed to determine the K1C. An increase in the K1C of both ceramics was found by the CO2 and the fibre laser surface treatment in comparison to the as-received surfaces. The K1C of the CO2 laser radiated surface of the Si3N4 was over 3% higher in comparison to that of the fibre laser treated surface. This was by softening of the near surface layer of the Si3N4 which comprised of lowering of hardness, which in turn increased the crack resistance. The effects were not similar in ZrO2 ceramic to that of the Si3N4 as the fibre laser radiation in this case had produced an increase of 34% compared to that of the CO2 laser radiation. This occurred due to propagation of lower crack resulting from the Vickers indentation test during the fibre laser surface treatment which inherently affected the end K1C through an induced compressive stress layer. The K1C modification of the two ceramics treated by the CO2 and the fibre laser was also believed to be influenced by the different laser wavelength and its absorption co-efficient, the beam delivery system as well as the differences in the brightness of the two lasers used. 相似文献
20.
The thermal effects of fibre laser surface treatment on a Si3N4 engineering ceramic were studied using a computational finite element analysis (FEA). Temperature increases on the surface of the Si3N4 during fibre laser processing were measured using an infra-red thermometer; temperature distributions in the bulk were measured with specifically located thermocouples. A computational model by using FEA was then developed to model the flow and the distribution of the radiated heat resulting from the fibre laser treatment of the Si3N4 ceramic. By utilising data obtained from a TG-DSC analysis the FEA model predictions of the temperature distribution were used to map phase transformations and significant events occurring during the fibre laser surface treatment of the Si3N4. The TG-DSC analysis also indicated that the fibre laser surface treatment generally resulted in a phase transformation of the Si3N4 from α-phase to β-phase modification as elongated rod-like grains were found. 相似文献